TWI359880B - Method to electrodeposit metals using ionic liquid - Google Patents

Method to electrodeposit metals using ionic liquid Download PDF

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TWI359880B
TWI359880B TW097129448A TW97129448A TWI359880B TW I359880 B TWI359880 B TW I359880B TW 097129448 A TW097129448 A TW 097129448A TW 97129448 A TW97129448 A TW 97129448A TW I359880 B TWI359880 B TW I359880B
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Taiwan
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group
chlorinated
metal
ammonium
chloride
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TW097129448A
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Chinese (zh)
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TW200925334A (en
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Boris Kuzmanovic
Lamberdine Johanna Willemina Maria Nabuurs-Willems
Strien Cornelis Johannes Govardus Van
Franz Winfried Welter
Johanna Christina Speelman
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Akzo Nobel Nv
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/66Electroplating: Baths therefor from melts
    • C25D3/665Electroplating: Baths therefor from melts from ionic liquids
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing

Abstract

The present invention pertains to the use of an additive selected from the group consisting of amorphous silica, graphite powder, and a mixture thereof in a process to electroplate or electropolish a metal on a substrate using an ionic liquid as the electrolyte to increase metal layer thickness. It furthermore pertains to a method to electroplate or electropolish a metal on a metal substrate wherein an ionic liquid is employed as electrolyte, wherein a metal salt added to said ionic liquid or a metal anode is employed as metal source, and wherein said ionic liquid comprises said additive.

Description

1359880 * I* 九、發明說明: 【發明所屬之技術領域】 一離子液體作為 且係關於使用該 本發明係關於一種在添加物存在下利用 電解質於一基板上電沈積—金屬之方法, 添加物於提高該沈積金屬層之層厚度。 【先前技術】1359880 * I* IX. Description of the Invention: [Technical Field of the Invention] An ionic liquid as a method for using the present invention relates to a method for electrodepositing a metal on a substrate by using an electrolyte in the presence of an additive, an additive To increase the layer thickness of the deposited metal layer. [Prior Art]

離子液體係一種豆中之離不T A /、T乙離子不良配位之鹽,其導致此等Ionic liquid system is a salt in a bean that is not coordinated with T A /, T ethyl ion, which causes such a

溶劑在低於丨(HTC之溫度下錢體。其巾許多即使在室溫 下亦為液體。離子液體中至少一離子具有一非定域電荷且 一組份為有機物,其可防止穩定晶格之形成。離子液體一 叙具有極低蒸氣壓,因此,相對於許多習知溶劑,其實質 上不會產生有害蒸氣…般而言,已知離子液體可用於許 多應用巾,例如作為反應溶劑、萃取溶劑、電池及電沈積 中的電解質、催化劑、熱交換流體,塗層中的添加物。 熟知的系統包含由具有一卣化鋁之鹵化烷基吡錠或鹵化 二烷基咪唑鑌形成之系統’及基於氯化膽鹼及一(水合)金 屬鹽諸如氯化鉻(III)之系統。此等系統已被用作電鍍中的 電解質’舉例而言如ΕΡ 0 4〇4 188及ΕΡ 1 322 591中所述。 此外’ WO 2002/026381揭示氣化膽鹼及一(水合)金屬鹽 諸如氯化鉻(III)之離子液體(共熔混合物)及其在電沈積與 電拋光中之用途。該等混合物係由氣化膽鹼及該(水合)金 屬鹽以介於1:1與1:2.5之間的銨與金屬離子之比率所組 成’且據言其等尤其適用於在一金屬基板上沈積鉻、鈷、 鋅或銀。 】33195.doc 1359880 » ,, 此外,pcT/ep/2G()7/()51329描述—種在—基板上電鑛或 電拋光-金屬之方法,其中使用一選自由n+RiR2ra χ_ ' 或N+R5R6R7Rs γ•組成之群之離子液體作為電解質,且使 . 7 —添加至該離子液體之金屬鹽作為金屬源、或使用一金屬 帛極作為金屬源’其中R,至〜之任-者獨立地表示氫、炫 基、環烷基、芳基或芳烷基,經選自〇Η、α、以、F、ς、 苯基、νη2、CN、Ν〇2、C00R9、CH〇、c〇Rg 或 〇R9之基 φ 團取代,R5至Rs之至少一者係脂肪烷基鏈,且心至化之一 或多者可為(聚)氧伸烷基,其中該伸烷基係^至。伸烷基 且氧伸烷基單元之總數可為i至5〇個氧伸烷基單元,且& 至Rs之至少一者係c〗至C4烷基鏈,R9係烷基或環烷基,χ_ 係具有Ν-醯基磺醯亞胺陰離子(_c〇_N._s〇2_)官能性之陰離 子,γ係與N+mRs銨陽離子相容之陰離子,例如鹵化 物陰離子、羧酸根陰離子、硫酸根(有機與無機硫酸鹽兩 者)、磺酸根、碳酸根、硝酸根'亞硝酸根、硫氰酸根、 •氫氧根或磺醯亞胺陰離子。 在電沈積製程中利用離子液體作為電解質具有若干優 點。舉例而言,習知之鉻酸電鍍製程極其危險,因其主要 仰賴具有高度毒性及致癌性之六價鉻。另一方面,離子液 體可免除使用六價鉻之需求並容許使用被認為係極少危險 之三價鉻。此外,習知之鉻電鍍槽需要使用會造成嚴重處 置問題之強酸,而使用離子液體一般可使此等處置困難最 小化或甚至消除。此外,離子液體為非揮發性,因此其不 會造成大氣污染。 133195.doc 1359880 "’)·而利用一離子液體作為電解質之先前技術電沈積製 程之缺點係很難或甚至不可能沈積厚於至⑽之 一些金屬之金屬層。 對於-些應用’例如裝飾性電鍍,薄金屬層係可接受。 」而對於其中該金屬層需要提供保護以防磨損或磨钱, 或提高硬度(功能電鑛)之應用,需要甚厚於200 nm之金屬 層。更特;t言之,需要數微米或甚至數十微米之層。The solvent is lower than the temperature of HTC (the temperature of HTC. Many of the towels are liquid even at room temperature. At least one ion in the ionic liquid has a non-local charge and a group of organic substances, which prevents stable lattice The ionic liquid has a very low vapor pressure, and therefore, it does not substantially generate harmful vapors with respect to many conventional solvents. In general, ionic liquids are known to be used in many applications, for example, as a reaction solvent, Extraction of solvents, batteries and electrolytes in electrodeposition, catalysts, heat exchange fluids, additives in coatings. Well-known systems include systems formed from halogenated alkyl pyrenes with mono-aluminum halides or dialkylimidazolium halides. 'and systems based on choline chloride and a (hydrated) metal salt such as chromium (III) chloride. These systems have been used as electrolytes in electroplating' for example ΕΡ 0 4〇4 188 and ΕΡ 1 322 Further described in 591. WO 2002/026381 discloses the use of vaporized choline and a (hydrated) metal salt such as ionic liquid (eutectic mixture) of chromium (III) chloride and its use in electrodeposition and electropolishing. The The mixture is composed of vaporized choline and the (hydrated) metal salt in a ratio of ammonium to metal ions between 1:1 and 1:2.5 and is said to be particularly suitable for use on a metal substrate. Depositing chromium, cobalt, zinc or silver.] 33195.doc 1359880 » ,, In addition, pcT/ep/2G()7/()51329 describes a method of electroforming or electropolishing-metal on a substrate, in which An ionic liquid selected from the group consisting of n+RiR2ra χ_ ' or N+R5R6R7Rs γ• as an electrolyte, and adding a metal salt to the ionic liquid as a metal source or using a metal ruthenium as a metal source' Wherein R, to any of - independently represents hydrogen, cyclyl, cycloalkyl, aryl or aralkyl, selected from the group consisting of ruthenium, alpha, alpha, fluoro, fluorene, phenyl, νη2, CN, Ν. 〇2, C00R9, CH〇, c〇Rg or 基R9 is substituted by a group φ group, at least one of R5 to Rs is a fatty alkyl chain, and one or more of the cores may be (poly)oxyalkylene a group wherein the alkyl group is alkyl and the total number of oxygen alkyl units may be from i to 5 units of an oxygen alkyl unit, and at least one of & to Rs is c To C4 alkyl chain, R9 alkyl or cycloalkyl, χ_ has an anion of Ν-mercaptosulfonimide anion (_c〇_N._s〇2_), γ system and N+mRs ammonium cation Compatible anions such as halide anions, carboxylate anions, sulfates (both organic and inorganic sulfates), sulfonates, carbonates, nitrates 'nitrites, thiocyanates, hydroxides or sulfoniums Imino anions. The use of ionic liquids as electrolytes in electrodeposition processes has several advantages. For example, conventional chromic acid plating processes are extremely dangerous because they rely primarily on highly toxic and carcinogenic hexavalent chromium. On the other hand, ionic liquids eliminate the need to use hexavalent chromium and allow the use of trivalent chromium which is considered to be of little risk. In addition, conventional chromium plating baths require the use of strong acids which can cause serious disposal problems, and the use of ionic liquids generally minimizes or even eliminates such handling difficulties. In addition, ionic liquids are non-volatile and therefore do not cause atmospheric pollution. The disadvantages of prior art electrodeposition processes using an ionic liquid as the electrolyte are that it is difficult or even impossible to deposit a metal layer thicker than some of the metals of (10). For some applications, such as decorative plating, thin metal layers are acceptable. For applications where the metal layer needs to provide protection against wear or grind, or to increase hardness (functionalized ore), a metal layer that is much thicker than 200 nm is required. More specifically; in other words, layers of several micrometers or even tens of micrometers are required.

因此’有需要可藉以沈積增加厚度之金屬層之改良的離 子液體基電沈積系統。 【發明内容】 令人驚許地’已發現藉由添加—特^添加物至該等離子 液體基電鍍槽,可沈積較厚金屬^。更詳細言之,本發明 係關於在於_基板上讀或f拋光—金叙製程巾使用非 晶形氧化矽、石墨粉或其混合物作為添加物,《中使用一 離子液體作為電解質以提高金屬層厚度。 基於右干原因,已將添加物添加至包含電解質之離子液 體令。舉例而δ ’ us 7’196’221揭示在金屬電鍍與電拋光 製程期間,且特定言之在鍍鉻製料利用亮光劑來改良於 離子液體溶劑/電解質中獲得之塗層之外觀1等亮光劑 包含硫脈、糖精、香草駿、稀丙基脲、#驗酸、_酸、 明膠、2-巯基苯并μ、二水合氟化四乙基錢或五水合氯 氧化四曱基銨。然@,此等添加物對沈積層之均勾 不利影響,或完全無作用。 W〇 2〇〇6/〇74523係關於-種用於回收翻族金屬之方法, 133195.doc 9880 -、ι括自其中可存在氣化還原試劑、錯合劑、傳導性增 強劑之離子液體電沈積鉑族金屬。 US 6,552,843係有關用於控制電磁輻射之反射率及/或透 射之裝置,例如可調節的鏡子、智慧窗、光學衰減器及顯 不器,其揭示一種利用一離子液體電解質之可逆性電沈積 光學調變裝置《該離子液體電解質係由一離子有機化合物 與一可電沈積金屬之鹽之混合物組成。該離子有機化合物 包括一雜環陽離子,例如N_烷基吡咯錠、吡咯錠、卜烷 基-3-甲基咪唑鏽、N_烷基吡錠、2•烷基吡咯啉鑌、1·烷 基咪唑鏽。該可電沈積金屬係銀、銅、錫、鋅、鈀、鉍、 鎘、汞、銦、鉛、銻、鉈及其合金。其提及該離子液體電 解質可藉由添加有機或無機膠凝劑而成為更具黏性、半固 態或固態。可將包括懸浮碳與溶解染料之無機或有機物質 添加至該電解質以賦予所需顏色或降低背景反射。 此等文件皆未教授如何在利用包含電解質之離子液體之 電沈積製程甲獲得較厚金屬層。 本申凊案中之術語電沈積應被理解為包含電鍍與電拋光 兩者。所謂電鍍係指利用電流將一導電物體塗布一金屬層 之製程較佳結果係金屬在該物體上之一薄、平滑且均勻 的塗層電鍍之主要應用係沈積一具有一些所需特性(例 如抗磨蝕與磨損性、防腐蝕性、潤滑性、美觀品質之提高 等)之金屬層於一缺乏該特性之表面上。另一應用係利用 電鍍在尺寸不足的部件上增加厚度。所謂電拋光係指藉由 將一原先粗糙或不平坦之金屬表面塗布一相對薄的金屬層 133195.doc 1359880 而將其平滑化並増進其外觀β 一根據本發明用以提高沈積金屬層厚度之添加物係非晶形 - 氧化矽、石墨粉、或其混合物。 • 術語非晶形氧切係意指包含任何形式的膠體石夕石微 . 彳’、巾該等膠體石夕石微粒(亦被稱為石夕溶膠)可源、自於(例 如)沉澱矽石、矽膠、熱解矽石(發煙矽石)、微矽石(微矽 粉)或其混合物。根據本發明之膠體矽石可經改質且可包 • 含其他元素諸如胺、铭及/或棚’其可以微粒及/或連續相 存在。 該等膠體咬石微粒可分散於—實質上水性的溶劑中,適 當地在穩定陽離子諸如^^…卵卜有機陽離 子、第一、第二、第三及第四胺、及其混合物之存在下, 卩便形成-水性石夕溶膠'然而,亦可使用包含有機溶劑例 如低碳_、丙酮或其混合物之分散液(亦稱為有機石夕溶 膠)。較佳地,該溶膠中的石夕石含量係約5至約8〇重量%。 • 適合根據本發明使用之水性矽溶膠係,例如,由Akzo 驗1購得。適當的有機矽溶膠係,例如,由Nissan化學工 業購得。 所谓石墨粉係意指細粒碳粉或碳 得。 基於電解質之總重量,添加物較佳係以至少〇別 量使用,更佳至少G.G5 wt%,且最佳至”」糾%。基於 解質之總重量’較佳使用不多於5 wt%之添加物,更佳 多於域,且最佳不多於…%。應注意術語電解質係, 133195.doc 135988〇 表全體電解質混合物,亦gp 4八_ 亦即包含溶解金屬鹽與添加物。 藉由本發明,亦即藉由沐 丨稭由添加所述添加物,當與無該 添加物之電沈積比較時,層厚度可增加至少μ倍更佳至 少20倍,且最佳至少4〇倍。Thus, there is a need for an improved ion-based electrodeposition system for depositing a metal layer of increased thickness. SUMMARY OF THE INVENTION It has been surprisingly found that a thicker metal can be deposited by adding an additive to the plasma liquid based plating bath. More specifically, the present invention relates to the use of an amorphous cerium oxide, graphite powder or a mixture thereof as an additive for reading or f-polishing on a substrate, and using an ionic liquid as an electrolyte to increase the thickness of the metal layer. . For the right stem cause, the additive has been added to the ionic liquid containing the electrolyte. For example, δ 'us 7'196'221 discloses a brightener during the metal plating and electropolishing process, and in particular, the chrome-plated material is improved by the use of a brightener to improve the appearance of the coating obtained in the ionic liquid solvent/electrolyte. Contains sulfur veins, saccharin, vanillin, propyl urea, #acid, _acid, gelatin, 2-mercaptobenzopyrene, tetraethylammonium fluoride dihydrate or tetradecylammonium chloride pentoxide. However, @, these additives have an adverse effect on the deposition of the deposited layer, or have no effect at all. W〇2〇〇6/〇74523 relates to a method for recovering a family of metals, 133195.doc 9880 -, including ionic liquid electricity from which a gasification reducing agent, a binder, a conductivity enhancer may be present A platinum group metal is deposited. US 6,552,843 relates to a device for controlling the reflectivity and/or transmission of electromagnetic radiation, such as an adjustable mirror, a smart window, an optical attenuator and a display, which discloses a reversible electrodeposition optics using an ionic liquid electrolyte Modulation device "The ionic liquid electrolyte is composed of a mixture of an ionic organic compound and an electrode of an electrodepositable metal. The ionic organic compound comprises a heterocyclic cation such as N-alkylpyrrole, pyrrole ingot, b-alkyl-3-methylimidazole rust, N-alkylpyridinium, 2·alkylpyrroline quinone, 1·alkane Imidazole rust. The electrodepositable metal is silver, copper, tin, zinc, palladium, iridium, cadmium, mercury, indium, lead, antimony, bismuth and alloys thereof. It is mentioned that the ionic liquid electrolyte can be made more viscous, semi-solid or solid by the addition of an organic or inorganic gelling agent. An inorganic or organic substance including suspended carbon and a dissolved dye may be added to the electrolyte to impart a desired color or to reduce background reflection. None of these documents teaches how to obtain a thicker metal layer in an electrodeposition process using an ionic liquid containing an electrolyte. The term electrodeposition in this application is to be understood to include both electroplating and electropolishing. The so-called electroplating refers to a process of applying a metal layer to a conductive object by using a current. The preferred result is that a thin, smooth and uniform coating of the metal on the object is mainly applied to deposit a certain desired property (for example, anti- The metal layer of abrasion and abrasion, corrosion resistance, lubricity, aesthetic quality, etc.) is on a surface lacking such characteristics. Another application uses electroplating to increase the thickness on undersized components. By electropolishing is meant that a previously rough or uneven metal surface is coated with a relatively thin metal layer 133195.doc 1359880 to smooth it and into its appearance β. According to the invention, the thickness of the deposited metal layer is increased. The additive is amorphous - cerium oxide, graphite powder, or a mixture thereof. • The term amorphous oxygen cut means that it contains any form of colloidal stone. 彳', towel, such colloidal stone particles (also known as Shixi sol) can be sourced from, for example, precipitated vermiculite , tannin extract, pyrolysis vermiculite (smoke vermiculite), micro vermiculite (micro-powder powder) or a mixture thereof. The colloidal vermiculite according to the present invention may be modified and may contain other elements such as amines, imitations and/or sheds which may be present in particulate and/or continuous phases. The colloidal stone particles can be dispersed in a substantially aqueous solvent, suitably in the presence of a stable cation such as an organic cation, first, second, third and fourth amines, and mixtures thereof The sputum forms a water-based sol sol. However, a dispersion containing an organic solvent such as low carbon _, acetone or a mixture thereof (also referred to as an organic sol sol) may also be used. Preferably, the content of the Shishi stone in the sol is from about 5 to about 8 weight percent. • Aqueous sol-gel systems suitable for use in accordance with the present invention, for example, are commercially available from Akzo. Suitable organic sol-gel systems are commercially available, for example, from Nissan Chemical Industries. The term "graphite powder" means fine-grained carbon powder or carbon. The additive is preferably used in at least the amount based on the total weight of the electrolyte, more preferably at least G.G5 wt%, and optimally up to "%". It is preferred to use no more than 5 wt% of the additive based on the total weight of the detoxification, more preferably more than the domain, and most preferably no more than ...%. It should be noted that the term electrolyte system, 133195.doc 135988, refers to the entire electrolyte mixture, and also contains dissolved metal salts and additives. By the present invention, that is, by adding the additive by the mash, the layer thickness can be increased by at least μ times, preferably at least 20 times, and optimally at least 4 times, when compared with electrodeposition without the additive. .

用作電解質之離子液體較佳係選自由N+RiR2r3R4 χ-、 N+R5R6R7R8Y_及其混合物組成之群,其中之任一者 獨立地表示氬、院基、環院基、芳基或芳院基,其可峻選 自 OH'CM'Br'F、!、苯基、NH2、cn N〇2、c〇〇R9、 CHO、CORA〇R9之基團取代,其中至少一者9係 視情況分支的脂肪烷基鏈,其中I可為π”。烷 基)-N+R,6R17R,8(其中〜〜係分別類似於汉丨: 尺3、R4),或CjC4烷基鏈,且其中&至之一或多者可 為(聚)氧伸烷基,其中該伸烷基係。丨至。4伸烷基且氧伸烷 基單元之總數可為1至50個氧伸烷基單元,且其中&至心 之至少-者係C,至Μ基鏈,其中R9㈣基或環燒基,其8 中X·係與N+RlR2R3R4錄陽離子相容之陰離子,例如函化物 陰離子、m酸根陰離子、硫酸根(有機與無機硫酸根兩 者)、磧酸根、碳酸根、硝酸根、亞硝酸根、硫氰酸根、 氫氧根、糖精酸根陰離子或磺醯亞胺陰離子,且其中丫_係 具有磺醯亞胺陰離子或沁醯基磺醯亞胺陰離子(_c〇_n__ s〇2_)官能性之陰離子。 在一實施例_,X·係選自F-、C1-、Br-、j-之基團; R〗〇coo·陰離子之基團,其中Ri0可為氫、^至匕〗烷基、 烯基或芳基;RnS〇4·陰離子之基團,其中R|1可不存在(在 133195.doc 此情況下該陽離子為二價)、為氫、心至匕〗烷基、烯基或 芳基,R^SO3陰離子之基團,其中Riz可不存在(在此情況 下該陽離子為二價)、為氫、(:1至(:22烷基、烯基或芳基;The ionic liquid used as the electrolyte is preferably selected from the group consisting of N+RiR2r3R4 χ-, N+R5R6R7R8Y_, and mixtures thereof, each of which independently represents an argon, a hospital, a ring-based, an aryl or a Fangyuan. Base, which can be selected from OH'CM'Br'F,! a group substituted with a group of phenyl, NH2, cn N〇2, c〇〇R9, CHO, CORA〇R9, at least one of which is a fatty alkyl chain branched as appropriate, wherein I may be π". )-N+R,6R17R,8 (wherein ~~ are respectively similar to Hangu: Ruler 3, R4), or CjC4 alkyl chain, and wherein & one or more can be (poly)oxyalkylene a group, wherein the alkyl group is 丨. 4 alkyl and the number of oxygen alkyl units can be from 1 to 50 oxygen alkyl units, and wherein & a fluorenyl chain, wherein R9(tetra)yl or cycloalkyl, wherein X is an anion compatible with N+RlR2R3R4, such as a complex anion, a m-acid anion, a sulfate (both organic and inorganic sulfate), a citrate, a carbonate, a nitrate, a nitrite, a thiocyanate, a hydroxide, a saccharinate anion or a sulfonium imine anion, and wherein the oxime has an sulfonimide anion or a sulfonium sulfoximine An anion (_c〇_n__ s〇2_) functional anion. In an embodiment _, X · is selected from the group of F-, C1-, Br-, j-; R 〇 coo · anion group , Wherein Ri0 may be a hydrogen, a hydrazine, an alkenyl or an aryl group; a group of an RnS〇4. anion, wherein R|1 may be absent (in the 133195.doc, the cation is divalent), A group of R^SO3 anions, wherein Riz may be absent (in this case, the cation is divalent), hydrogen, (:1 to (:22 alkane). Base, alkenyl or aryl;

RuC〇3陰離子之基團,其中可不存在(在此情況下該陽 離子為二價)、為氫、4至(:22烷基、烯基或芳基;及Rl4_ N -SCVR〗5陰離子之基團,其中及/或Ri5可獨立地為 氫、C|至C22烷基、烯基或芳基,且Rm可藉由一羰基鏈結 至該氮原子。 脂肪烷基鏈係意指包含飽和及/或不飽和鏈且包含8至22 個碳原子;較佳地,其包含1〇至22個碳原子,最佳12至2〇 個碳原子。 在另一實施例中,使用化學式N + 之離子液 體,其中R,、R3及&係如上所述且I係(C2至C6烷基)· n+r16r17r〗a。較佳地,Rl6、Ri7及Ri8係分別於R|、^及 R4相同,其中其等之至少一者係視情況分支的脂肪烷基 鏈’而導致一雙子星型結構(亦即一對稱二-第四銨化合 物)。 在另一實施例中’ γ係基於一種已知為甜味劑之化合 物。在另一實施例中’ N+mi^係胺,其中該等基團尺5 至I係氫或視情況經0H或C1取代之烷基或環烷基;更佳 地,其中至少三個係烷基’更佳係c 1至c4烷基。 在一較佳實施例中,離子液體係選自以下任一者:膽驗 糖精酸鹽、膽鹼乙醯磺胺酸鹽、氣化十六烷基三甲基 敍、氣化十八烷基三曱基銨、氣化椰子三甲基銨、氣化牛 133195.doc 12 1359880 脂三甲基銨、氯化氫化牛脂三甲基銨、氯化氫化棕櫚三甲 基敍、氣化油稀三甲基銨、氣化黃豆三甲基録、氯化挪子 苄基一甲基知、氯化C12-16-焼基苄基二甲基録、氣化氫 化牛脂苄基二曱基銨、氯化二辛基二甲基銨、氯化二癸基 二甲基銨、亞硝酸二椰子二甲基銨、氯化二椰子二曱基 銨、氣化二(氫化牛脂)二曱基銨、氯化二(氫化牛脂)节基 曱基銨、氯化二牛脂二曱基銨、氯化二_十八烷基二甲基 銨、氣化氫化牛脂(2-乙基己基)二甲基銨、曱基硫酸氫化 牛月曰(2·乙基己基)二甲基銨、氣化三_十六烷基甲基銨、氯 化十八烧基f基一(2-經乙基)敍、硝酸椰子二(2_經乙基)甲 基銨、氣化椰子二(2-羥乙基)甲基銨、氣化椰子二(2·羥乙 基)苄基銨、氣化油烯基二(2_羥乙基)甲基銨、氣化椰子 [聚氧伸乙基(1 5)]- f基銨、甲基硫酸椰子[聚氧伸乙基 (15)]甲基銨、氯化椰子[聚氧伸乙基(17)]甲基銨、氯化十 八烷基[聚氧伸乙基(15)]甲基銨、氣化氫化牛脂[聚氧伸乙 基(15)]曱基銨、醋酸三(2_羥乙基)牛脂銨、二氣化牛脂_ 1,3 -丙烧五甲基二錢。 以上指示之適合根據本發明使用之許多離子液體可藉由 一簡單鹽反應而製備,舉例而言,藉由氯化膽鹼與糖精酸 (乙醯磺胺酸)鈉之複分解反應以形成一糖精酸(乙醯磺胺 酸)膽驗離子液體,或藉由相應胺之第四銨化作用。 離子液體之銨陽離子與來自溶解鹽或來自金屬陽極之金 屬鹽之金屬陽離子的莫耳比較佳係介於1,〇〇〇:1與之 間。更佳係離子液體之銨陽離子與金屬鹽之金屬陽離子之 133195.doc 13 1359880 莫耳比介於500:1與5··〗之間,最佳係莫耳比介於1〇〇·ι與 7:1之間,此提供良好品質的金屬層,金屬於離子液體中 之優良溶解及製程成本與電鍍基板產品之外觀之間的良好 平衡。 較佳係沈積金屬鉻、鋁、鈦、辞或銅、或其合金之一 者。更佳係沈積鉻或鋁,最佳係鉻。此金屬沈積可自溶解 ' 於電解質中的金屬鹽進行,其例如為金屬卣化物,較佳為 Φ (仁不限於)金屬氯化物。其亦可使用經應用作為陽極之純 金屬(即鉻、:ig、鈦、鋅或銅陽極)進行。在使用金屬陽極 之實施例中,該陽極可呈金屬板、金屬塊、金屬片之形式 或熟習此項技術者已知之任何其他適當的形式。 可根據本發明經電鍍或電拋光之基板可為任何導電物 體較佳地,其係一固體金屬物體,例如一碳鋼物體,或 • 其包括導電元件例如一複合材料物體。 本發明it-步關於-種在一金屬&板上電鍍或電拋光一 • 金屬之方法,其中離子液體係選自由N+R^m x-、 N+Rshl^R8 Υ·及其混合物組成之群,其中Ri至以之任一者 • 獨立地表示氫、烷基、環烷基、芳基或芳烷基,其可經選 自 OH、C卜 Br ' F、I、苯基、Nh2、CN、N〇2、c〇()R9、 CHO、COR9或OR9之基團取代,其中至心之至少一者係 視情況分支的脂肪烷基鏈,其中I可為(C2至烷基卜 N+R16R17R18(其中r16、Rl7、Ri8係分別類似於汉丨、I、 R〇,或(:丨至(:4烷基鏈,且其中心至尺8之一或多者可為(聚) 氧伸烷基,其中該伸烷基係(^至匕伸烷基且氧伸烷基單元 133195.doc • 14- 之總數可為丨至”個氧伸烷基單元’且其中1至以之至少 -者係C丨至c4烷基鏈’其中尺9係烷基或環烷基,其中χ-係 與N+mt銨陽離子相容之陰離子,例如齒化物陰離 子、羧酸根陰離子、硫酸根(有機與無機硫酸根兩者)、磺 醆根、碳酸根、硝酸根、亞硝酸根、硫氰酸根、氫氧根、 糖精酸根陰離子或磺醯亞胺陰離子,且其中γ_係具有磺醯 亞胺陰離子或Ν-醯基磺醯亞胺陰離子(_c〇_N-_s〇2_)官能性 之陰離子, 其中使用添加至該離子液體之金屬鹽或金屬陽極作為金 屬源,及 其中基於電解質之總重量,該離子液體包括至少〇〇1a RuC〇3 anion group in which the anion may be absent (in this case, the cation is divalent), hydrogen, 4 to (:22 alkyl, alkenyl or aryl; and Rl4_N-SCVR5 anion a group, wherein and/or Ri5 may independently be hydrogen, C| to C22 alkyl, alkenyl or aryl, and Rm may be bonded to the nitrogen atom by a carbonyl group. The fatty alkyl chain means saturated and Or unsaturated chain and comprising from 8 to 22 carbon atoms; preferably, it contains from 1 to 22 carbon atoms, most preferably from 12 to 2 carbon atoms. In another embodiment, the chemical formula N + is used An ionic liquid, wherein R, R3 and & are as described above and I is (C2 to C6 alkyl) n + r16r17r a. Preferably, R16, Ri7 and Ri8 are respectively at R|, ^ and R4 The same, wherein at least one of them depends on the fatty alkyl chain of the branch, resulting in a double sub-star structure (ie, a symmetric di-tetraammonium compound). In another embodiment, the 'gamma system is based on A compound known as a sweetener. In another embodiment, 'N+mi^-amine, wherein the group 5 to I is hydrogen or an alkyl or ring optionally substituted with 0H or C1 More preferably, at least three of the alkyl groups are more preferably c 1 to c 4 alkyl groups. In a preferred embodiment, the ionic liquid system is selected from any of the following: biliary saccharate, gall Alkali acesulfonamide, gasified cetyl trimethyl sulphate, gasified octadecyltrimethylammonium, gasified coconut trimethylammonium, gasified cow 133195.doc 12 1359880 lipid trimethylammonium , Hydrogenated hydrogenated tallow trimethyl ammonium, hydrogenated palmitized palm trimethyl sulphate, gasified oil diluted trimethyl ammonium, gasified soybean trimethyl record, chlorinated benzyl monomethyl, chlorinated C12-16 - mercaptobenzyl dimethyl record, gasified hydrogenated tallow benzyl decyl ammonium, dioctyl dimethyl ammonium chloride, dimercaptodimethylammonium chloride, dicocodimethylammonium nitrite, Dicobalt diammonium chloride, gasified di(hydrogenated tallow) decyl ammonium, chlorinated di(hydrogenated tallow) benzyl ammonium, chlorinated ditallow diammonium chloride, di-octadecyl chloride Dimethylammonium chloride, gasified hydrogenated tallow (2-ethylhexyl) dimethyl ammonium, hydrogenated hydrogenated oxol (2·ethylhexyl) dimethyl ammonium, gasified tris-hexadecyl base , octadecyl chloride, f-based (2-ethyl), dinitromethane di(2-ethyl)methylammonium, gasified coconut bis(2-hydroxyethyl)methylammonium, gasification Coconut bis(2.hydroxyethyl)benzylammonium, gasified oleyl bis(2-hydroxyethyl)methylammonium, gasified coconut [polyoxy-extended ethyl (1 5)]-f-ammonium, A Sulfate-based coconut [polyoxy-extended ethyl (15)] methyl ammonium, chlorinated coconut [polyoxy-extended ethyl (17)] methyl ammonium, octadecyl chloride [polyoxy-extended ethyl (15)] Methylammonium, gasified hydrogenated tallow [polyoxy-extended ethyl (15)] decyl ammonium, tris(2-hydroxyethyl) ammonium taurate, di-gasified tallow _ 1, 3-propanol pentamethyl dim . Many of the ionic liquids suitable for use in accordance with the present invention as described above may be prepared by a simple salt reaction, for example, by metathesis of choline chloride with sodium saccharinate (ethionine) to form a saccharin acid. (Ethyl sulfonamide) biliary ionic liquid, or by the fourth ammoniumation of the corresponding amine. The ammonium cation of the ionic liquid is preferably between 1, 〇〇〇:1 and the molar of the metal cation derived from the dissolved salt or the metal salt from the metal anode. More preferably, the ammonium cation of the ionic liquid and the metal cation of the metal salt are 133195.doc 13 1359880 The molar ratio is between 500:1 and 5··, and the optimal molar ratio is between 1〇〇·ι and Between 7:1, this provides a good quality metal layer, a good balance between the excellent dissolution of the metal in the ionic liquid and the cost of the process and the appearance of the plated substrate product. Preferably, one of the metals chromium, aluminum, titanium, rhodium or copper, or an alloy thereof is deposited. More preferred is the deposition of chromium or aluminum, the best chromium. This metal deposition can be carried out from a metal salt dissolved in the electrolyte, which is, for example, a metal halide, preferably Φ (non-limiting) metal chloride. It can also be carried out using a pure metal (i.e., chromium, ig, titanium, zinc or copper anode) applied as an anode. In embodiments in which a metal anode is used, the anode can be in the form of a metal plate, a metal block, a metal sheet, or any other suitable form known to those skilled in the art. The substrate which may be electroplated or electropolished according to the present invention may be any electrically conductive object, preferably a solid metal object, such as a carbon steel object, or • it comprises a conductive element such as a composite object. The invention relates to a method for electroplating or electropolishing a metal on a metal & plate, wherein the ionic liquid system is selected from the group consisting of N+R^m x-, N+Rshl^R8 Υ· and mixtures thereof a group, wherein Ri to any of them, independently represents hydrogen, alkyl, cycloalkyl, aryl or aralkyl, which may be selected from the group consisting of OH, Cb Br 'F, I, phenyl, Nh2 Substituting a group of CN, N〇2, c〇()R9, CHO, COR9 or OR9, wherein at least one of the centroids is a fatty alkyl chain branched as appropriate, wherein I can be (C2 to alkyl b) N+R16R17R18 (wherein r16, Rl7, and Ri8 are respectively similar to samarium, I, R〇, or (: 丨 to (: 4 alkyl chain, and one or more of the centers to the size 8 may be (poly)) Oxyalkylene, wherein the alkyl group (to the alkyl group and the oxygen alkyl unit 133195.doc • 14- may be a total of 丨 to "oxyalkylene units" and wherein 1 At least one is a C 丨 to c 4 alkyl chain ' wherein 尺 9 is an alkyl or cycloalkyl group, wherein the oxime is an anion compatible with the N + mt ammonium cation, such as a toothing anion, a carboxylate anion, a sulfate ( Organic and none Both sulfates), sulfonate, carbonate, nitrate, nitrite, thiocyanate, hydroxide, saccharinate anion or sulfonium imine anion, and wherein γ_ has sulfonimide anion or An anion of a Ν-mercaptosulfonimide anion (_c〇_N-_s〇2_), wherein a metal salt or a metal anode added to the ionic liquid is used as a metal source, and the total weight based on the electrolyte Ionic liquids include at least 〇〇1

Wt〇/Q之選自由非晶形氧化矽、石墨粉及其混合物組成之群 之添加物。 該添加物較佳係以如上描述之量使用。 電沈積較佳係在低於90。(:之溫度下,且更佳係在室溫 下’在敞開的電沈積容器中實施,但電沈積並不受限於此 等條件。 【實施方式】 根據本發明之方法藉由以下實例進一步闡明。 實例 比較實例1-在不具有添加物的氯化椰子烷基甲基丨聚氧伸 乙基(15)】銨t自CrCl3六水合鹽將鉻電鍍於碳鋼上 將氣化鉻(III)六水合鹽添加至包含0.2 wt%水之氣化椰子 烷基曱基[聚氧伸乙基(15)]銨離子液體中,且在約50°C之 133195.doc -15· 1359880 溫度下攪動該混合物直至該固態鹽溶解。在製備得的溶液 中,六水合氣化鉻(III)之濃度係75 g/kge 將約250毫升之該溶液傾倒至設有一電加熱元件之薄膜 電池(Hull cell)中’其在陽極側具有65毫米長度且在陰極 側具有102毫米長度,陽極-陰極最短距離為48毫米,陽極_ 陰極最長距離為127毫米,且深度為65毫米。加熱該電池 且將溫度維持在約80°C ^該液體係利用一設置於中央的頂 伸式葉輪攪動。 應用鍍翻鈦板作為陽極且連接至一 DC電源之正極端 子’同時使用碳鋼板作為陰極(基板)且連接至負極端子。 在引入至槽中之前,該基板片先利用一商業擦洗粉清潔, 在去礦質水中、在丙酮中且之後在乙醇中、及最終在4 Μ·Ηα 水溶液中清洗。當兩板皆經連接並引入至電池中時,將電 壓差設定至30V。在一串聯連接之儀表上監控電流。 電鍍數小時後,將陰極與電源分離且從電池中取出。將 該板於水及丙酮中清洗然後乾燥。藉由結合χ_射線散射之 掃描電子顯微術(SEM/EDX)對該基板實施化學分析。其確 認鉻沈積於碳鋼上。利用自德國Fischer獲得之厚度測量裝 置測量沈積層厚度。經測得厚度低於〇5 μπι。 實例2-在添加〇·2 Wt%非晶形氧化矽之氣化椰子烷基甲基 [聚氧伸乙基(15)】銨中自〇〇:丨3六水合鹽將鉻電鍍於碳鋼上 於如實例1中所述而製備得之氯化鉻(ΠΙ)六水合鹽溶於 氣化椰子烧基甲基[聚氧伸乙基(15)]敍離子液體中之溶液 中添加包含8 Wt%活性化合物之非晶形氧化石夕含水膠體溶 133195.doc 16 1359880 液:該製備溶液中該非晶形氧化矽之濃度,以活性化合物 之量表示,為1.6 g/kg。 將約250毫升之該溶液傾倒至實例】中描述之該薄膜電池 中。將該電池加熱至約8〇°c之溫度。 實施如實例!中該碳鋼基板(陰極)之相同的前處理,且 再次應用鍍銘鈦板作為陽極。將電位差設定至3〇 v。該液 體係利用-設置於中央的頂伸式葉輪_。在—串聯連接 之儀表上監控電極之間的電流。 電流流通數小時後’將陰極與電源分離且從電池中取 出。將該板於水及丙嗣中清洗然後乾燥。藉由結合χ•射線 散射之掃描電子顯微術(SEM/EDX)對該基板實施的化學分 析確認鉻沈積於該碳鋼板上。經測得利用一厚度測量裝置 (德國Fischer)測量之沈積層厚度在基板之特定區域高達 μιη其顯著地比未使用添加物時厚。如同薄膜電池實驗 的典型情況,層厚度隨基板上之位置而變化—在此情況 係1 μΓη至8 _。為確認'此等測量,亦進行橫切金相學分 析°將基板之樣品嵌入環氧樹脂中並在顯微鏡下評估沈積 物。以此方式測得的層厚度與厚度測量裝置之結果一致。 實例3_於添加0.4 wt〇/〇非晶形氧化發之氣化挪子烧基甲基 [聚氧伸乙基(15)】錄中自Cra3六水合鹽將鉻電鍵於碳鋼上 於如實m中所述而製備得之氣化鉻⑽六水合鹽溶於 氣化椰子烷基曱基[聚氧伸乙基(15)]銨離子液體中的溶液 中添加包含8 Wt〇/0活性化合物之非晶形氧化石夕含水膠體溶 液。該製備得溶液中該非晶形氧化石夕之濃度,以活性化合 133195.doc •17- 1359880 物之量表示,係4 g/kg » 將約250毫升之該溶液傾倒至實例i中描述之該薄膜電池 _。將該電池加熱至約80°C之溫度。 實施如實例1甲該碳鋼基板(陰極)之相同的前處理且 再次應用鍍鉑鈦板作為陽極。將電位差設定至3〇 V。該液 體係利用-設置於中央的頂伸式葉㈣動。在—串聯連接 之儀表上監控電極之間的電流。 在電流流通數小時後,將陰極與電源分離且從t池中取 出。將該板於水及丙酮中清洗然後乾燥。藉由該基板之結 合X-射線散射之掃描電子顯微術(SEM/EDX)的化學分析確 涊鉻沈積於該碳鋼板上。經測得利用厚度測量裝置(德國 Fischer)及藉由橫切金相學分析所測量之沈積層厚度在1至 9 μπι之範圍内。 實例4-於添加1 wt%碳黑之氣化椰子烷基甲基丨聚氧伸乙基 (15)1銨中自CrCh六水合II將鉻電鍍於碳鋼上 於如實例1中所述而製備得之氣化鉻(III)六水合鹽溶於 氯化椰子烷基曱基[聚氧伸乙基(15)]銨離子液體中的溶液 中添加碳黑。該製備得混合物中碳黑之濃度係1 0 g/kg。 將約2 5 0毫升之該混合物傾倒至實例〗中描述之該薄膜電 池中。將該電池加熱至約7〇。〇之溫度。 貫施如實例1十該碳鋼基板(陰極)之相同的前處理,且 再次應用锻始鈦板作為陽極,將電位差設定至3 〇 V。該液 體係利用一設置於中央的頂伸式葉輪攪動。在一串聯連接 之儀表上監控電極之間的電流。 133195.doc •18· 1359880 在電流流通數小時後’將陰極與電源分離且從該電 取出。將該板於水及丙m中清洗然後乾燥。藉由該基板之 結合X-射線散射之掃描電子顯微術(SEM/EDx)的化學分析 確認鉻沈積於該碳鋼板上。極 SFischer).,_ 板上a測付利用厚度測量裝置(德 ® F1SCher)測i之沈積層厚度 卜 等基板樣品之_ '、 至7 範圍内。由該 ”刀金相學分析測得相同的厚度值。The Wt〇/Q is selected from the group consisting of amorphous cerium oxide, graphite powder, and mixtures thereof. The additive is preferably used in the amounts described above. Electrodeposition is preferably below 90. (At the temperature, and more preferably at room temperature 'implemented in an open electrodeposition vessel, but electrodeposition is not limited to such conditions. [Embodiment] The method according to the present invention is further exemplified by the following examples Clarification. Example Comparison Example 1 - Chlorinated Coconut Alkylmethylhydrazine without Additives Polyoxyethyl Ethyl Ethyl (15) Ammonium t From CrCl3 Hexahydrate Salt Electroplating Chromium on Carbon Steel to Calcine Chromium (III The hexahydrate salt is added to a vaporized coconut alkyl fluorenyl [polyoxyethyl (15)] ammonium ionic liquid containing 0.2 wt% water at a temperature of about 133195.doc -15·1359880 at about 50 °C. The mixture is agitated until the solid salt is dissolved. In the prepared solution, the concentration of chromium (III) hexahydrate vaporized is 75 g/kge. About 250 ml of the solution is poured into a thin film battery provided with an electric heating element (Hull In the cell, it has a length of 65 mm on the anode side and a length of 102 mm on the cathode side, a shortest distance of the anode-cathode of 48 mm, an anode-cathode maximum distance of 127 mm, and a depth of 65 mm. The battery is heated and will The temperature is maintained at about 80 ° C ^ The top-extending impeller is stirred in the center. The plated titanium plate is used as the anode and is connected to the positive terminal of a DC power source. At the same time, a carbon steel plate is used as a cathode (substrate) and connected to the negative terminal. The substrate is introduced before being introduced into the groove. The film is first cleaned with a commercial scouring powder, washed in demineralized water, in acetone and then in ethanol, and finally in an aqueous solution of 4 Μ·Ηα. When both plates are connected and introduced into the battery, the voltage difference Set to 30 V. Monitor the current on a series connected meter. After plating for a few hours, separate the cathode from the power supply and remove it from the battery. Wash the plate in water and acetone and then dry. By combining χ-ray scattering Scanning electron microscopy (SEM/EDX) performed chemical analysis on the substrate, which confirmed the deposition of chromium on carbon steel. The thickness of the deposited layer was measured using a thickness measuring device obtained from Fischer, Germany. The thickness was determined to be less than 〇5 μm. Example 2 - Adding 〇·2 Wt% Amorphous Cerium Oxide to Gasified Coconut Methyl Methyl [Polyoxyethyl (15)] Ammonium: 丨3 hexahydrate salt to chrome on carbon steelThe chromium chloride (ruthenium) hexahydrate salt prepared as described in Example 1 is dissolved in a solution of gasified coconut alkylmethyl [polyoxyethyl (15)] ionic liquid to contain 8 Wt % of the active compound of the amorphous oxidized rock hydrate aqueous colloid 133195.doc 16 1359880 liquid: the concentration of the amorphous cerium oxide in the preparation solution, expressed as the amount of the active compound, is 1.6 g / kg. About 250 ml of the solution Pour into the thin film battery described in the example. The battery was heated to a temperature of about 8 ° C. The same pretreatment of the carbon steel substrate (cathode) was carried out as in the example, and the plated titanium plate was again applied. As an anode. Set the potential difference to 3〇 v. The liquid system utilizes a top-mounted impeller _ disposed in the center. The current between the electrodes is monitored on a meter connected in series. After the current has flowed for several hours, the cathode is separated from the power source and taken out of the battery. The plate was washed in water and acetonitrile and then dried. Chemical analysis of the substrate by scanning electron microscopy (SEM/EDX) combined with X-ray scattering confirmed that chromium was deposited on the carbon steel sheet. It has been determined that the thickness of the deposited layer measured by a thickness measuring device (Fischer, Germany) is as high as μηη in a specific region of the substrate, which is significantly thicker than when no additive is used. As is typical for thin-film battery experiments, the layer thickness varies with the position on the substrate—in this case, 1 μΓη to 8 _. To confirm 'these measurements, cross-section metallographic analysis was also performed. A sample of the substrate was embedded in the epoxy resin and the deposit was evaluated under a microscope. The layer thickness measured in this way is consistent with the results of the thickness measuring device. Example 3_ Gasification of a 0.4 〇/〇 amorphous oxidized gas by gasification of a methylene group [polyoxy-extension ethyl (15)] recorded from Cra3 hexahydrate salt chrome on a carbon steel in a solid m The gasified chromium (10) hexahydrate salt prepared in the above is dissolved in a solution of a gasified coconut alkyl sulfhydryl [polyoxyethyl (15)] ammonium ionic liquid, and the active compound containing 8 Wt 〇 / 0 is added. Amorphous oxidized oxide aqueous colloidal solution. The concentration of the amorphous oxidized oxide in the prepared solution is expressed as the amount of active compound 133195.doc • 17-1359880, which is 4 g/kg » about 250 ml of the solution is poured into the film described in Example i battery_. The battery was heated to a temperature of about 80 °C. The same pretreatment as in Example 1 A carbon steel substrate (cathode) was carried out and a platinized titanium plate was again applied as an anode. Set the potential difference to 3 〇 V. The liquid system utilizes a top-extending leaf (four) that is placed in the center. The current between the electrodes is monitored on a meter connected in series. After a few hours of current flow, the cathode was separated from the power source and removed from the t-cell. The plate was washed in water and acetone and then dried. Chemical analysis of the electron microscopy (SEM/EDX) of the substrate by X-ray scattering confirmed that chromium was deposited on the carbon steel sheet. The thickness of the deposited layer measured by the thickness measuring device (Fischer, Germany) and by cross-section metallographic analysis was measured to be in the range of 1 to 9 μm. Example 4 - Electroplating of chromium onto carbon steel from CrCh hexahydrate II in a gasified coconut alkylmethyl hydrazine polyoxyethylidene (15) 1 ammonium with 1 wt% carbon black added as described in Example 1. The prepared vaporized chromium (III) hexahydrate salt is dissolved in a solution of chlorinated coconut alkyl sulfonyl [polyoxyethyl (15)] ammonium ionic liquid to add carbon black. The concentration of carbon black in the prepared mixture was 10 g/kg. About 250 ml of this mixture was poured into the film cell described in the example. The battery was heated to about 7 Torr. The temperature of 〇. The same pretreatment as in the carbon steel substrate (cathode) of Example 10 was carried out, and the forging titanium plate was again applied as an anode, and the potential difference was set to 3 〇 V. The liquid system is agitated using a top-mounted impeller disposed in the center. The current between the electrodes is monitored on a serially connected meter. 133195.doc •18· 1359880 After the current has flowed for several hours, the cathode is separated from the power source and taken out from the electricity. The plate was washed in water and propylene and then dried. Chemical analysis of the combined X-ray scattering by scanning electron microscopy (SEM/EDx) of the substrate confirmed that chromium was deposited on the carbon steel sheet. Extreme SFischer)., _ On-board measurement using a thickness measuring device (German® F1SCher) to measure the thickness of the deposited layer, such as _ ', to 7 in the substrate sample. The same thickness value was measured by the "knife metallographic analysis."

133I95.doc 19·133I95.doc 19·

Claims (1)

1359880 : — •第097129448號專利申請案 中文申請專利範圍替換本(100年12月) ,日修正替換戛j 申請專利範圍: .-種選自由非晶形氧化矽、石墨粉及其混合物組成之群 之添加物之用途,其係用於使用離子液體作為電解質於 基板上電鍍或電拋光一金屬以提高金屬層厚度之製程。1359880 : — • Patent Application No. 097129448 (Chinese Patent Application No. 119129), Japanese Correction Replacement j Patent Application Range: .-Selected from a group consisting of amorphous yttrium oxide, graphite powder and mixtures thereof The use of the additive for the process of electroplating or electropolishing a metal on a substrate using an ionic liquid as an electrolyte to increase the thickness of the metal layer. 2.如請求項1之添加物之用途,其令該離子液體係選自由 N+hl^HX·、n+Hhy•及其混合物組成之群其 中^至尺8之任一者獨立地表示氫、烷基、環烷基、芳基 或^统基,其可經選自〇H、Cl、Br、F、I、苯基、 NH2、CN、N02、CO〇R9、CHO、COR9 或 OR9之基團取 代’其中R9係燒基或環烷基’其中χ-係與n+RiR2R3r4鍵 陽離子相容之陰離子’且其中γ-係具有續醢亞胺陰離子 或Ν·醯基磺醯亞胺陰離子(_(:〇-Ν·-3〇2-)官能性之陰離 〇 • 3.如請求項2之添加物之用途’其中尺丨至尺4之至少一者係 視情況分支的脂肪烷基鏈。 _ 4.如請求項2之添加物之用途’其中&為(C2至C6烷基)_ N+R16R17r18(其中 r16、:r17、R18 係分別與 Ri、、1<_4相 同)、或(^至(:4烷基鏈。 5. 如請求項2之添加物之用途’其尹心至尺8之一或多者為 (聚)氧伸烷基,其中該伸烷基係C〗至C4伸烷基且氧伸烧 基單元之總數為1至50個氧伸烷基單元。 6. 如請求項2之添加物之用途’其中Ri至Re之至少一者係 C!至C4院基鍵。 7. 如請求項2之添加物之用途’其中X係自化物陰離子、 133195-1001228.doc 1359880 liHFu月崎日修正替換 Μ - ‘ ·---1 羧酸根陰離子、硫酸根(有機與無機硫酸根兩者)、磺酸 根、碳酸根、硝酸根、亞硝酸根、硫氰酸根、氫氧根、 糖精酸根陰離子或磺醯亞胺陰離子。 8_如請求項1至7中任一項之添加物之用途,其中經電鑛咬 電拋光於該基板上之該金屬係源自一金屬源,其係一選 自由鉻、鋁、鈦、鋅及銅鹽組成之群的金屬鹽,或一選 自由絡、鋁、鈦、鋅及銅陽極組成之群的陽極。 9. 如請求項1至7中任一項之添加物之用途,其中該離子液 體之%離子與該金屬鹽或由該金屬陽極衍生之該金屬陽 離子之莫耳比係介於1,000:1與3:1之間。 10. 如請求項9之添加物之用途,其中該離子液體之陽離子 與該金屬鹽或由該金屬陽極衍生之該金屬陽離子之莫耳 比係介於100:1與7:1之間。 11 ·如凊求項9之添加物之用途,其中以電解質之總重量 計’該添加物之量係介於〇. 1 wt%與5 wt%之間。 12.如請求項1至7中任一項之添加物之用途’其中該離子液 體係選自由下列所組成之群:膽鹼糖精酸鹽、膽鹼乙醯 項胺酸鹽、氣化十六烧基三甲基錄、氯化十八烧基三甲 基銨、氯化椰子三甲基銨、氯化牛脂三甲基銨、氣化氫 化牛脂三甲基銨、氯化氫化棕櫚三甲基銨、氯化油烯基 二甲基錄、氯化黃豆三甲基銨、氯化椰子苄基二甲基 錄 '氯化C!2」6-烧基苄基二甲基録、氣化氫化牛脂苄基 一甲基敍 '氯化一辛基二甲基録、氯化二癸基二甲基 銨、亞硝酸二椰子二甲基銨、氯化二揶子二甲基銨 '氯 133J95-J00J228.doc K年咖日修正替換頁 化二(氫化牛脂)二甲基銨、氯化二(氫化牛脂)苄基甲基 録、氯化二牛脂二曱基錄、氯化二_十八烧基二甲基敍、 氣化氫化牛脂(2-乙基己基)二曱基銨、甲基硫酸氫化牛 脂(2-乙基己基)二曱基銨、氯化三-十六烷基甲基銨、氣 化十八烷基甲基二(2-羥乙基)銨、硝酸椰子二(2_羥乙基) 甲基敍、氯化椰子二(2-羥乙基)甲基銨、氯化椰子二(2_ 羥乙基)苄基銨、氯化油烯基二(2-羥乙基)甲基銨、氯化 椰子[聚氧伸乙基(15)]-甲基銨、甲基疏酸椰子[聚氧伸乙 基(15)]甲基銨、氣化椰子[聚氧伸乙基(17)]曱基銨、氯 化十八烷基[聚氧伸乙基(15)]甲基銨、氣化氫化牛脂[聚 氧伸乙基(15)]曱基銨、醋酸三(2_羥乙基)牛脂銨、二氣 化牛脂-1,3-丙烷五甲基二銨。 13. 一種在金屬基板上電鍍或電拋光金屬之方法,其中一離 子液體係選自由N+HR^R^X·、N+r5r6R7R8Y-及其混合 物組成之群,其中心至以之任一者獨立地表示氫、烷 基、環烧基、芳基或芳烧基,其可經選自〇H、ci、Br、 F、I、苯基、NH2、CN、N02、COOR9、ch〇、COr9或 OR9之基團取代,其中I係烷基或環烷基,其中χ·係與 N+RlR2R3R4銨陽離子相容之陰離子,且其中γ·係具有磺 醯亞胺陰離子或N-醯基磺醯亞胺陰離子(_c〇_N-_s〇2_)官 能性之陰離子;其中使用一添加至該離子液體之金屬鹽 或一金屬陽極作為金屬源;及其中以電解質之總重量 計,該離子液體包括至少0.01 wt%之選自由非晶形氧化 石夕、石墨粉及其混合物組成之群之添加物。 133195-1001228.doc 1359880 I . 卜月·^修正替換頁 I_______1 丨 14. 15. 16 17 18 19. 20. 21. .如請求項13之方法,其中心至心之至少—者係視情況分 支的脂肪烷基鏈。 如請求項U之方法’其中Rz為(c2至c6烷基)_ N+R丨6R丨7R18(其中Ri6、Ri7、Ru係分別與Ri、R3、I相 同)、或(^至(:4烷基鏈。 .如請求項13之方法,其中心至心之一或多者為(聚)氧伸 烷基,其中該伸烷基係(^至^伸烷基且氧伸烷基單元之 總數為1至5 0個氧伸院基單元。 •如請求項13之方法,其中&至&之至少一者係〇1至〇4烷 基鍵。 如請求項13之方法,其中X-係鹵化物陰離子羧酸根陰 離子、硫酸根(有機與無機硫酸根兩者)、磺酸根、碳酸 根' 硝酸根、亞硝酸根、硫氰酸根、氫氧根、糖精酸根 陰離子或續酿亞胺陰離子。 如請求項13至18中任一項之方法,其中經電鍍或電拋光 於該基板上之該金屬係源自一金屬源,其係一選自由 鉻、鋁、鈦、鋅及銅鹽組成之群的金屬鹽,或一選自由 鉻、銘、欽、鋅及銅陽極組成之群的陽極。 如請求項13至18中任一項之方法,其中該離子液體之陽 離子與該金屬鹽或由該金屬陽極衍生之該金屬陽離子之 莫耳比係介於1,000:1與3:1之間。 如請求項20之方法,其中該離子液體之陽離子與該金屬 鹽或由該金屬陽極衍生之該金屬陽離子之莫耳比係介於 100:1與7:1之間。 133195-1001228.doc 丨卜u月Μ修正替換頁 22.如請求項13至18中任—項之方法,其中該離子液體係選 自由下列所組成之群:膽鹼糖精酸鹽、膽鹼乙醯磺胺酸 鹽、氯化十六烷基三甲基銨、氯化十八烷基三甲基銨、 氯化椰子—甲基録、氯化牛脂三甲基録氯化氫化牛脂 三甲基敍、氯化氫化標櫚三f基録、氯化油稀基三甲基 銨、氯化頁丑二曱基銨、氣化椰子苄基二甲基銨、氯化 C!2·!6-烷基苄基二甲基銨、氣化氫化牛脂苄基二甲基 銨、氯化二辛基二甲基銨、氯化二癸基二甲基銨、亞硝 酸二椰子二甲基銨、氣化二椰子二甲基銨、氯化二(氫化 牛脂)二f基銨、氣化二(氫化牛脂)苄基曱基銨、氯化二 牛脂二甲基銨、氣化二(十八烷基)二甲基銨、氣化氫化 牛月曰(2-乙基己基)二甲基銨、甲基硫酸氫化牛脂(2·乙基 己基)二甲基銨、氯化三-十六烷基甲基銨、氯化十八烷 基甲基二(2-羥乙基)銨、硝酸椰子二(2羥乙基)甲基銨、 氣化椰子二(2-羥乙基)甲基銨、氯化椰子二(2_羥乙基)苄 基銨、氯化油烯基二(2_羥乙基)甲基銨、氯化椰子[聚氧 伸乙基(15)]-甲基銨、f基硫酸椰子[聚氧伸乙基勹]甲 基銨、氯化椰子[聚氧伸乙基(17)]甲基銨、氯化十八烷 基[聚氧伸乙基(15)]甲基銨、氣化氫化牛脂[聚氧伸乙基 (15)]甲基銨、醋酸三(2_羥乙基)牛脂銨、二氣化牛脂_ 1,3-丙烷五甲基二銨β 133I95-1001228.doc2. The use of the additive of claim 1, wherein the ionic liquid system is selected from the group consisting of N+hl^HX·, n+Hhy•, and mixtures thereof, wherein any one of the scales to the ruler 8 independently represents hydrogen Or an alkyl group, a cycloalkyl group, an aryl group or an alkyl group, which may be selected from the group consisting of 〇H, Cl, Br, F, I, phenyl, NH2, CN, N02, CO〇R9, CHO, COR9 or OR9 The group replaces 'an anion wherein R9 is alkyl or cycloalkyl, wherein the oxime is compatible with the n+RiR2R3r4 bond cation' and wherein the γ-line has a ruthenium anion or an anthracene sulfonimide anion (_(:〇-Ν·-3〇2-) Functional cations 〇• 3. Use of the additive of claim 2 'At least one of the 丨 to 尺4 is a fatty alkane branched as appropriate Base chain. _ 4. Use of the additive of claim 2 'where & is (C2 to C6 alkyl)_N+R16R17r18 (wherein r16, :r17, R18 are the same as Ri, 1 <_4, respectively) Or (^ to (: 4 alkyl chain. 5. The use of the additive of claim 2) one or more of Yinxin to Rule 8 is (poly)oxyalkylene, wherein the alkylene group C〗 to C4 alkyl and oxygen extended base The total number of elements is from 1 to 50 oxygen alkyl units. 6. The use of the additive of claim 2 'where at least one of Ri to Re is a C! to C4 yard key. 7. Use of additives 'where X is an anion anion, 133195-1001228.doc 1359880 liHFu yakisaki correction replacement Μ - ' ·---1 carboxylate anion, sulfate (both organic and inorganic sulfate), sulfonate , a carbonate, a nitrate, a nitrite, a thiocyanate, a hydroxide, a saccharinate anion or a sulfonimide anion. The use of the additive according to any one of claims 1 to 7, wherein the electricity is passed through The metal that is electropolished on the substrate is derived from a metal source selected from the group consisting of chromium, aluminum, titanium, zinc, and copper salts, or one selected from the group consisting of complex, aluminum, titanium, The use of the additive of the group of zinc and copper anodes. The use of the additive of any one of claims 1 to 7, wherein the % ion of the ionic liquid is associated with the metal salt or the metal cation derived from the metal anode The molar ratio is between 1,000:1 and 3:1. 10. Addition to claim 9. The use thereof, wherein the cation of the ionic liquid and the metal salt or the metal cation derived from the metal anode have a molar ratio between 100:1 and 7:1. The use of the additive in an amount of between 1 wt% and 5 wt%, based on the total weight of the electrolyte. 12. Use of the additive according to any one of claims 1 to 7 The ionic liquid system is selected from the group consisting of choline saccharinate, choline acetyl sulphate, gasified hexadecyl trimethyl sulphate, octadecyl trimethyl ammonium chloride, chlorine Coconut trimethylammonium chloride, chlorinated tallow trimethylammonium, gasified hydrogenated tallow trimethylammonium, hydrogenated palmitoyltrimethylammonium chloride, chlorinated oleyl dimethyl chloride, chlorinated soybean trimethylammonium, Chlorinated coconut benzyl dimethyl record 'chlorinated C! 2' 6-alkyl benzyl dimethyl record, gasified hydrogenated tallow benzyl monomethyl s 'chlorinated octyl dimethyl record, chlorinated Dimercaptodimethylammonium, dicocodial dimethylammonium nitrite, diammonium dimethylammonium chloride 'chlorine 133J95-J00J228.doc K Year's Day Correction Replacement Page 2 (Hydrogen Tallow) dimethylammonium chloride, di(hydrogenated tallow) benzylmethyl chloride, chlorinated ditallow diterpene, chlorinated di-octadecyl dimethyl sulphate, gasified hydrogenated tallow (2-B Dihexyl)dimethylammonium, hydrogenated taurate (2-ethylhexyl)didecylammonium, tri-hexadecylmethylammonium chloride, vaporized octadecylmethyldi(2-hydroxyl Ethyl ammonium, coconut di(2-hydroxyethyl) methyl chlorinated, chlorinated coconut bis(2-hydroxyethyl)methylammonium, chlorinated coconut di(2-hydroxyethyl)benzylammonium, chlorinated Oleoyl bis(2-hydroxyethyl)methylammonium, chlorinated coconut [polyoxy-extended ethyl (15)]-methylammonium, methyl oxalic acid coconut [polyoxyethyl (15)] methyl Ammonium, gasified coconut [polyoxyethyl (17)] decyl ammonium, octadecyl chloride [polyoxyethyl (15)] methyl ammonium, gasified hydrogenated tallow [polyoxyethylene) 15)] mercapto ammonium, tris(2-hydroxyethyl) taurate acetate, di-gasified tallow-1,3-propane pentamethyl diammonium. 13. A method of electroplating or electropolishing a metal on a metal substrate, wherein an ionic liquid system is selected from the group consisting of N+HR^R^X·, N+r5r6R7R8Y-, and mixtures thereof, from the center to either Independently representing hydrogen, alkyl, cycloalkyl, aryl or aryl, which may be selected from the group consisting of 〇H, ci, Br, F, I, phenyl, NH2, CN, N02, COOR9, ch〇, COr9 Or a group substituted by OR9, wherein I is an alkyl group or a cycloalkyl group, wherein the oxime is an anion compatible with the N+RlR2R3R4 ammonium cation, and wherein the γ is a sulfonium imine anion or an N-mercaptosulfonate An anion of an imine anion (_c〇_N-_s〇2_); wherein a metal salt or a metal anode added to the ionic liquid is used as a metal source; and wherein the ionic liquid comprises, based on the total weight of the electrolyte At least 0.01 wt% of an additive selected from the group consisting of amorphous oxidized oxide, graphite powder, and mixtures thereof. 133195-1001228.doc 1359880 I. Bu Yue·^Revised replacement page I_______1 丨14. 15. 16 17 18 19. 20. 21. As in the method of claim 13, the center of the heart is at least Fat alkyl chain. The method of claim U, wherein Rz is (c2 to c6 alkyl)_N+R丨6R丨7R18 (wherein Ri6, Ri7, Ru are the same as Ri, R3, and I, respectively), or (^ to (:4) The method of claim 13, wherein one or more of the centers to the center are (poly)oxyalkylene groups, wherein the alkylene group is an alkyl group and an oxygen alkyl unit The total number is from 1 to 50 oxygen-extended base units. The method of claim 13, wherein at least one of & to & is a 〇1 to 〇4 alkyl bond. The method of claim 13, wherein X - a halide anion carboxylate anion, sulfate (both organic and inorganic sulfate), sulfonate, carbonate 'nitrate, nitrite, thiocyanate, hydroxide, saccharinate or an imine The method of any one of claims 13 to 18, wherein the metal which is electroplated or electropolished on the substrate is derived from a metal source selected from the group consisting of chromium, aluminum, titanium, zinc and copper salts. a metal salt of a group consisting of, or an anode selected from the group consisting of chrome, indium, ching, zinc, and copper anodes, as in any of claims 13 to 18. The method wherein the cation of the ionic liquid and the metal salt or the metal cation derived from the metal anode have a molar ratio between 1,000:1 and 3:1. The molar ratio of the cation of the ionic liquid to the metal salt or the metal cation derived from the metal anode is between 100:1 and 7:1. 133195-1001228.doc 丨 u u Μ 替换 替换 替换 22 The method of any one of claims 13 to 18, wherein the ionic liquid system is selected from the group consisting of choline saccharate, choline sulfonate, cetyltrimethyl chloride Ammonium, octadecyltrimethylammonium chloride, chlorinated coconut-methyl record, chlorinated tallow trimethyl chloride hydrogenated tallow trimethyl sulphate, chlorinated hydrogenated palmate triflate, chlorinated oil Trimethylammonium, chlorinated uranyl ammonium, gasified coconut benzyl dimethyl ammonium, chlorinated C! 2·! 6-alkylbenzyldimethylammonium, gasified hydrogenated tallow benzyl dimethyl Base ammonium, dioctyldimethylammonium chloride, dimercaptodimethylammonium chloride, dicocodimethylammonium nitrite, gasified two coconut Dimethylammonium, di(hydrogenated tallow) bis-f-ammonium chloride, gasified di(hydrogenated tallow) benzyl ammonium sulfonium chloride, ditallow dimethyl ammonium chloride, gasified di(octadecyl) dimethyl Alkyl ammonium, gasified hydrogenated calfium (2-ethylhexyl) dimethyl ammonium, methyl hydrogenated tallow (2·ethylhexyl) dimethyl ammonium, tri-hexadecylmethyl ammonium chloride, Octadecylmethyl bis(2-hydroxyethyl)ammonium chloride, coconut di(2-hydroxyethyl)methylammonium nitrate, gasified coconut bis(2-hydroxyethyl)methylammonium, chlorinated coconut II (2-hydroxyethyl)benzylammonium, oleyl bis(2-hydroxyethyl)methylammonium chloride, chlorinated coconut [polyoxy-extended ethyl (15)]-methylammonium, f-based sulfuric acid coconut [polyoxyethylidene]methylammonium, chlorinated coconut [polyoxyethyl (17)] methylammonium chloride, octadecyl chloride [polyoxyethyl (15)] methyl ammonium, gas Hydrogenated tallow [polyoxyethyl (15)] methyl ammonium, tris(2-hydroxyethyl) ammonium taurate, di-gasified tallow _ 1,3-propane pentamethyl diammonium β 133I95-1001228.doc
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Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9580772B2 (en) * 2009-03-17 2017-02-28 Commonwealth Scientific And Industrial Research Organisation Electrorecovery of metals
DE102009035660A1 (en) 2009-07-30 2011-02-03 Ewald Dörken Ag Process for the electrochemical coating of a workpiece
US20120189778A1 (en) * 2011-01-26 2012-07-26 Riewe Curtis H Coating method using ionic liquid
CN102888630B (en) * 2011-07-20 2015-11-18 中国科学院过程工程研究所 A kind of ionic liquid/additive system Low-temperature electro-deposition prepares the method for nano aluminum or nano aluminum coating
US9758884B2 (en) * 2012-02-16 2017-09-12 Stacey Hingley Color control of trivalent chromium deposits
DE102012104707A1 (en) * 2012-05-31 2013-12-05 Benteler Automobiltechnik Gmbh Method for producing an exhaust gas heat exchanger
WO2013182631A1 (en) 2012-06-08 2013-12-12 Onderzoekscentrum Voor Aanwending Van Staal N.V. Method for producing a metal coating
CN102839403B (en) * 2012-09-10 2015-02-25 太原理工大学 Method for electroplating aluminum in ionic liquid
CN103484900A (en) * 2013-09-18 2014-01-01 湖南工业大学 Method for preparing crystalline nanocrystal micro-crack-free chromium coating in ionic liquid in direct electro-deposition mode
US10669851B2 (en) 2013-12-10 2020-06-02 Raytheon Technologies Corporation Nickel-chromium-aluminum composite by electrodeposition
US10669867B2 (en) 2013-12-10 2020-06-02 Raytheon Technologies Corporation Electrodeposited nickel-chromium alloy
WO2015088861A1 (en) * 2013-12-11 2015-06-18 Lei Chen Electroformed nickel-chromium alloy
CN104294327B (en) * 2014-10-20 2016-07-13 中国科学院过程工程研究所 A kind of il electrolyte and the method preparing light aluminium coat with this electrolyte
CN105220216B (en) * 2015-09-28 2017-08-25 中国科学院兰州化学物理研究所 A kind of aluminum or aluminum alloy electrochemical polishing method
TWI662162B (en) * 2016-11-15 2019-06-11 財團法人工業技術研究院 Electroplating method and system thereof
JP7072796B2 (en) * 2018-02-19 2022-05-23 国立大学法人 名古屋工業大学 Dimming member
US20210156041A1 (en) * 2019-11-22 2021-05-27 Hamilton Sundstrand Corporation Metallic coating and method of application

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5265120A (en) * 1975-11-26 1977-05-30 Sony Corp Electro plating method of aluminium or aluminium alloy
JPH01132571A (en) * 1987-11-18 1989-05-25 Aguro Kanesho Kk Agricultural and horticultural fungicide
GB0023708D0 (en) * 2000-09-27 2000-11-08 Scionix Ltd Hydrated salt mixtures
GB0023706D0 (en) * 2000-09-27 2000-11-08 Scionix Ltd Ionic liquids
US6552843B1 (en) * 2002-01-31 2003-04-22 Innovative Technology Licensing Llc Reversible electrodeposition device with ionic liquid electrolyte
US20050205425A1 (en) * 2002-06-25 2005-09-22 Integran Technologies Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents
US6721080B1 (en) * 2002-09-27 2004-04-13 D Morgan Tench Optimum switching of a reversible electrochemical mirror device
US6798556B2 (en) * 2003-01-31 2004-09-28 Rockwell Scientific Licensing, Llc. Locally-switched reversible electrodeposition optical modulator
DE102004059520A1 (en) * 2004-12-10 2006-06-14 Merck Patent Gmbh Electrochemical deposition of tantalum and / or copper in ionic liquids
US7320832B2 (en) * 2004-12-17 2008-01-22 Integran Technologies Inc. Fine-grained metallic coatings having the coefficient of thermal expansion matched to the one of the substrate
JP2007070698A (en) * 2005-09-07 2007-03-22 Kyoto Univ Method for electrodepositing metal
WO2007093574A2 (en) * 2006-02-15 2007-08-23 Akzo Nobel N.V. Method to electrodeposit metals using ionic liquids

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ATE493523T1 (en) 2011-01-15
WO2009016189A1 (en) 2009-02-05
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CN101765681A (en) 2010-06-30
EP2171131A1 (en) 2010-04-07
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CA2695488A1 (en) 2009-02-05
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ES2358967T3 (en) 2011-05-17
HK1143194A1 (en) 2010-12-24

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