TWI359880B - Method to electrodeposit metals using ionic liquid - Google Patents
Method to electrodeposit metals using ionic liquid Download PDFInfo
- Publication number
- TWI359880B TWI359880B TW097129448A TW97129448A TWI359880B TW I359880 B TWI359880 B TW I359880B TW 097129448 A TW097129448 A TW 097129448A TW 97129448 A TW97129448 A TW 97129448A TW I359880 B TWI359880 B TW I359880B
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- chlorinated
- metal
- ammonium
- chloride
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 84
- 239000002184 metal Substances 0.000 title claims abstract description 84
- 239000002608 ionic liquid Substances 0.000 title claims abstract description 52
- 238000000034 method Methods 0.000 title claims abstract description 26
- 150000002739 metals Chemical class 0.000 title description 4
- 239000002659 electrodeposit Substances 0.000 title 1
- 239000000654 additive Substances 0.000 claims abstract description 31
- 230000000996 additive effect Effects 0.000 claims abstract description 26
- 239000003792 electrolyte Substances 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 150000003839 salts Chemical class 0.000 claims abstract description 21
- 239000000203 mixture Substances 0.000 claims abstract description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 12
- -1 ruthenium anion Chemical class 0.000 claims description 41
- 125000000217 alkyl group Chemical group 0.000 claims description 33
- 235000013162 Cocos nucifera Nutrition 0.000 claims description 29
- 244000060011 Cocos nucifera Species 0.000 claims description 29
- 239000003760 tallow Substances 0.000 claims description 22
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 21
- 150000001450 anions Chemical class 0.000 claims description 21
- 229910052804 chromium Inorganic materials 0.000 claims description 17
- 239000011651 chromium Substances 0.000 claims description 17
- 150000001768 cations Chemical class 0.000 claims description 15
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims description 9
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 9
- 238000009713 electroplating Methods 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- BAVYZALUXZFZLV-UHFFFAOYSA-O Methylammonium ion Chemical compound [NH3+]C BAVYZALUXZFZLV-UHFFFAOYSA-O 0.000 claims description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 8
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- 239000011701 zinc Substances 0.000 claims description 7
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 claims description 6
- 229960001231 choline Drugs 0.000 claims description 6
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 claims description 6
- 150000002431 hydrogen Chemical class 0.000 claims description 6
- 125000005702 oxyalkylene group Chemical group 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- VUQPJRPDRDVQMN-UHFFFAOYSA-N 1-chlorooctadecane Chemical compound CCCCCCCCCCCCCCCCCCCl VUQPJRPDRDVQMN-UHFFFAOYSA-N 0.000 claims description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 229910002651 NO3 Inorganic materials 0.000 claims description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 4
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 claims description 4
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 4
- 229910052920 inorganic sulfate Inorganic materials 0.000 claims description 4
- 150000002923 oximes Chemical class 0.000 claims description 4
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 4
- 229910021653 sulphate ion Inorganic materials 0.000 claims description 4
- XOAAWQZATWQOTB-UHFFFAOYSA-N taurine Chemical class NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 claims description 4
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 claims description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 3
- CRVGTESFCCXCTH-UHFFFAOYSA-O bis(2-hydroxyethyl)-methylazanium Chemical compound OCC[NH+](C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-O 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229940104261 taurate Drugs 0.000 claims description 3
- OQADVBLQZQTGLL-UHFFFAOYSA-N 2-ethyl-n,n-dimethylhexan-1-amine Chemical compound CCCCC(CC)CN(C)C OQADVBLQZQTGLL-UHFFFAOYSA-N 0.000 claims description 2
- JMHWNJGXUIJPKG-UHFFFAOYSA-N CC(=O)O[SiH](CC=C)OC(C)=O Chemical compound CC(=O)O[SiH](CC=C)OC(C)=O JMHWNJGXUIJPKG-UHFFFAOYSA-N 0.000 claims description 2
- DSLZVSRJTYRBFB-LLEIAEIESA-N D-glucaric acid Chemical compound OC(=O)[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O DSLZVSRJTYRBFB-LLEIAEIESA-N 0.000 claims description 2
- 101100134929 Gallus gallus COR9 gene Proteins 0.000 claims description 2
- 244000068988 Glycine max Species 0.000 claims description 2
- 235000010469 Glycine max Nutrition 0.000 claims description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- VOPQXYCIRQXBGE-UHFFFAOYSA-M dimethyl-bis(sulfanyl)azanium chloride Chemical compound [Cl-].S[N+](C)(C)S VOPQXYCIRQXBGE-UHFFFAOYSA-M 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- 239000003921 oil Substances 0.000 claims description 2
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 3
- 229910052801 chlorine Inorganic materials 0.000 claims 3
- 239000000460 chlorine Substances 0.000 claims 3
- CVHZOJJKTDOEJC-UHFFFAOYSA-M 1,1-dioxo-1,2-benzothiazol-3-olate Chemical compound C1=CC=C2C([O-])=NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-M 0.000 claims 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 150000001879 copper Chemical class 0.000 claims 2
- IQDGSYLLQPDQDV-UHFFFAOYSA-N dimethylazanium;chloride Chemical compound Cl.CNC IQDGSYLLQPDQDV-UHFFFAOYSA-N 0.000 claims 2
- 239000001294 propane Substances 0.000 claims 2
- FAGMGMRSURYROS-UHFFFAOYSA-M trihexadecyl(methyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(CCCCCCCCCCCCCCCC)CCCCCCCCCCCCCCCC FAGMGMRSURYROS-UHFFFAOYSA-M 0.000 claims 2
- XNIOWJUQPMKCIJ-UHFFFAOYSA-N 2-(benzylamino)ethanol Chemical compound OCCNCC1=CC=CC=C1 XNIOWJUQPMKCIJ-UHFFFAOYSA-N 0.000 claims 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims 1
- MIZIOHLLYXVEHJ-UHFFFAOYSA-N 2-[benzyl(2-hydroxyethyl)amino]ethanol Chemical compound OCCN(CCO)CC1=CC=CC=C1 MIZIOHLLYXVEHJ-UHFFFAOYSA-N 0.000 claims 1
- MPNXSZJPSVBLHP-UHFFFAOYSA-N 2-chloro-n-phenylpyridine-3-carboxamide Chemical compound ClC1=NC=CC=C1C(=O)NC1=CC=CC=C1 MPNXSZJPSVBLHP-UHFFFAOYSA-N 0.000 claims 1
- MNNZINNZIQVULG-UHFFFAOYSA-N 2-chloroethylbenzene Chemical compound ClCCC1=CC=CC=C1 MNNZINNZIQVULG-UHFFFAOYSA-N 0.000 claims 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 claims 1
- CPKISUMKCULUNR-UHFFFAOYSA-N 2-methoxy-2-oxoacetic acid Chemical compound COC(=O)C(O)=O CPKISUMKCULUNR-UHFFFAOYSA-N 0.000 claims 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims 1
- MPWXHISHEDTVNN-UHFFFAOYSA-N C[NH2+]C.[Cl-].[NH4+].[NH4+].[Cl-].[Cl-] Chemical compound C[NH2+]C.[Cl-].[NH4+].[NH4+].[Cl-].[Cl-] MPWXHISHEDTVNN-UHFFFAOYSA-N 0.000 claims 1
- XSUAOOKXXGAJGS-UHFFFAOYSA-N N-decyl-N-(2-ethylhexyl)decan-1-amine Chemical compound C(C)C(CN(CCCCCCCCCC)CCCCCCCCCC)CCCC XSUAOOKXXGAJGS-UHFFFAOYSA-N 0.000 claims 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 1
- 239000007983 Tris buffer Substances 0.000 claims 1
- DYTXBXOWZSAASH-UHFFFAOYSA-O [N+](=O)([O-])[O-].OCC[NH+](C)CCO Chemical compound [N+](=O)([O-])[O-].OCC[NH+](C)CCO DYTXBXOWZSAASH-UHFFFAOYSA-O 0.000 claims 1
- HZWXJJCSDBQVLF-UHFFFAOYSA-N acetoxysulfonic acid Chemical compound CC(=O)OS(O)(=O)=O HZWXJJCSDBQVLF-UHFFFAOYSA-N 0.000 claims 1
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims 1
- RBRXPPLNXDVMKG-GMFCBQQYSA-M bis(2-hydroxyethyl)-methyl-[(z)-octadec-9-enyl]azanium;chloride Chemical compound [Cl-].CCCCCCCC\C=C/CCCCCCCC[N+](C)(CCO)CCO RBRXPPLNXDVMKG-GMFCBQQYSA-M 0.000 claims 1
- SUZSZZWHCFLFSP-UHFFFAOYSA-M bis(2-hydroxyethyl)-methyl-octadecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(CCO)CCO SUZSZZWHCFLFSP-UHFFFAOYSA-M 0.000 claims 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- KSYOKLMUUZLFLZ-UHFFFAOYSA-N dimethyl-bis(sulfanyl)azanium Chemical class S[N+](C)(C)S KSYOKLMUUZLFLZ-UHFFFAOYSA-N 0.000 claims 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 claims 1
- 229930004069 diterpene Natural products 0.000 claims 1
- 150000004141 diterpene derivatives Chemical class 0.000 claims 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical group CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 claims 1
- 150000002466 imines Chemical class 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- NQMRYBIKMRVZLB-UHFFFAOYSA-N methylamine hydrochloride Chemical compound [Cl-].[NH3+]C NQMRYBIKMRVZLB-UHFFFAOYSA-N 0.000 claims 1
- TYORYGSZBZPZLR-UHFFFAOYSA-N n-methylmethanamine;nitrous acid Chemical compound C[NH2+]C.[O-]N=O TYORYGSZBZPZLR-UHFFFAOYSA-N 0.000 claims 1
- 125000001117 oleyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])/C([H])=C([H])\C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims 1
- 229940023569 palmate Drugs 0.000 claims 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- RSPCKAHMRANGJZ-UHFFFAOYSA-N thiohydroxylamine Chemical compound SN RSPCKAHMRANGJZ-UHFFFAOYSA-N 0.000 claims 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 12
- 239000010962 carbon steel Substances 0.000 description 12
- 238000004070 electrodeposition Methods 0.000 description 12
- 239000000243 solution Substances 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 229910000420 cerium oxide Inorganic materials 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000010455 vermiculite Substances 0.000 description 5
- 235000019354 vermiculite Nutrition 0.000 description 5
- 229910052902 vermiculite Inorganic materials 0.000 description 5
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000002309 gasification Methods 0.000 description 4
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 4
- 238000000550 scanning electron microscopy energy dispersive X-ray spectroscopy Methods 0.000 description 4
- 239000004575 stone Substances 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229910021556 Chromium(III) chloride Inorganic materials 0.000 description 3
- 238000000333 X-ray scattering Methods 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 235000007831 chromium(III) chloride Nutrition 0.000 description 3
- 239000011636 chromium(III) chloride Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 3
- 238000004626 scanning electron microscopy Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- 239000001763 2-hydroxyethyl(trimethyl)azanium Substances 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 235000019743 Choline chloride Nutrition 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- FLNKWZNWHZDGRT-UHFFFAOYSA-N azane;dihydrochloride Chemical compound [NH4+].[NH4+].[Cl-].[Cl-] FLNKWZNWHZDGRT-UHFFFAOYSA-N 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-O benzylaminium Chemical compound [NH3+]CC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-O 0.000 description 2
- SGMZJAMFUVOLNK-UHFFFAOYSA-M choline chloride Chemical compound [Cl-].C[N+](C)(C)CCO SGMZJAMFUVOLNK-UHFFFAOYSA-M 0.000 description 2
- 229960003178 choline chloride Drugs 0.000 description 2
- LEQZGTOEYZBNNG-UHFFFAOYSA-N chromium(3+) hexahydrate Chemical compound O.O.O.O.O.O.[Cr+3] LEQZGTOEYZBNNG-UHFFFAOYSA-N 0.000 description 2
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 150000004687 hexahydrates Chemical class 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical class C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- GGLZPLKKBSSKCX-YFKPBYRVSA-N L-ethionine Chemical compound CCSCC[C@H](N)C(O)=O GGLZPLKKBSSKCX-YFKPBYRVSA-N 0.000 description 1
- 244000046052 Phaseolus vulgaris Species 0.000 description 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000001784 detoxification Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000001493 electron microscopy Methods 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- ZCRZCMUDOWDGOB-UHFFFAOYSA-N ethanesulfonimidic acid Chemical compound CCS(N)(=O)=O ZCRZCMUDOWDGOB-UHFFFAOYSA-N 0.000 description 1
- 239000000374 eutectic mixture Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 235000003599 food sweetener Nutrition 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- KKWUACQXLWHLCX-UHFFFAOYSA-N hydron;tetradecan-1-amine;chloride Chemical compound Cl.CCCCCCCCCCCCCCN KKWUACQXLWHLCX-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 150000002632 lipids Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- IQQYKULLKVYXCS-UHFFFAOYSA-N n-benzyldecan-1-amine Chemical compound CCCCCCCCCCNCC1=CC=CC=C1 IQQYKULLKVYXCS-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002892 organic cations Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- ZQZJKHIIQFPZCS-UHFFFAOYSA-N propylurea Chemical compound CCCNC(N)=O ZQZJKHIIQFPZCS-UHFFFAOYSA-N 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 239000004984 smart glass Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000003765 sweetening agent Substances 0.000 description 1
- 235000018553 tannin Nutrition 0.000 description 1
- 239000001648 tannin Substances 0.000 description 1
- 229920001864 tannin Polymers 0.000 description 1
- HRTKQUHFGZFPPF-UHFFFAOYSA-M tetraethylazanium;fluoride;dihydrate Chemical compound O.O.[F-].CC[N+](CC)(CC)CC HRTKQUHFGZFPPF-UHFFFAOYSA-M 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- PDSVZUAJOIQXRK-UHFFFAOYSA-N trimethyl(octadecyl)azanium Chemical compound CCCCCCCCCCCCCCCCCC[N+](C)(C)C PDSVZUAJOIQXRK-UHFFFAOYSA-N 0.000 description 1
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 description 1
- FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 description 1
- 235000012141 vanillin Nutrition 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Abstract
Description
1359880 * I* 九、發明說明: 【發明所屬之技術領域】 一離子液體作為 且係關於使用該 本發明係關於一種在添加物存在下利用 電解質於一基板上電沈積—金屬之方法, 添加物於提高該沈積金屬層之層厚度。 【先前技術】1359880 * I* IX. Description of the Invention: [Technical Field of the Invention] An ionic liquid as a method for using the present invention relates to a method for electrodepositing a metal on a substrate by using an electrolyte in the presence of an additive, an additive To increase the layer thickness of the deposited metal layer. [Prior Art]
離子液體係一種豆中之離不T A /、T乙離子不良配位之鹽,其導致此等Ionic liquid system is a salt in a bean that is not coordinated with T A /, T ethyl ion, which causes such a
溶劑在低於丨(HTC之溫度下錢體。其巾許多即使在室溫 下亦為液體。離子液體中至少一離子具有一非定域電荷且 一組份為有機物,其可防止穩定晶格之形成。離子液體一 叙具有極低蒸氣壓,因此,相對於許多習知溶劑,其實質 上不會產生有害蒸氣…般而言,已知離子液體可用於許 多應用巾,例如作為反應溶劑、萃取溶劑、電池及電沈積 中的電解質、催化劑、熱交換流體,塗層中的添加物。 熟知的系統包含由具有一卣化鋁之鹵化烷基吡錠或鹵化 二烷基咪唑鑌形成之系統’及基於氯化膽鹼及一(水合)金 屬鹽諸如氯化鉻(III)之系統。此等系統已被用作電鍍中的 電解質’舉例而言如ΕΡ 0 4〇4 188及ΕΡ 1 322 591中所述。 此外’ WO 2002/026381揭示氣化膽鹼及一(水合)金屬鹽 諸如氯化鉻(III)之離子液體(共熔混合物)及其在電沈積與 電拋光中之用途。該等混合物係由氣化膽鹼及該(水合)金 屬鹽以介於1:1與1:2.5之間的銨與金屬離子之比率所組 成’且據言其等尤其適用於在一金屬基板上沈積鉻、鈷、 鋅或銀。 】33195.doc 1359880 » ,, 此外,pcT/ep/2G()7/()51329描述—種在—基板上電鑛或 電拋光-金屬之方法,其中使用一選自由n+RiR2ra χ_ ' 或N+R5R6R7Rs γ•組成之群之離子液體作為電解質,且使 . 7 —添加至該離子液體之金屬鹽作為金屬源、或使用一金屬 帛極作為金屬源’其中R,至〜之任-者獨立地表示氫、炫 基、環烷基、芳基或芳烷基,經選自〇Η、α、以、F、ς、 苯基、νη2、CN、Ν〇2、C00R9、CH〇、c〇Rg 或 〇R9之基 φ 團取代,R5至Rs之至少一者係脂肪烷基鏈,且心至化之一 或多者可為(聚)氧伸烷基,其中該伸烷基係^至。伸烷基 且氧伸烷基單元之總數可為i至5〇個氧伸烷基單元,且& 至Rs之至少一者係c〗至C4烷基鏈,R9係烷基或環烷基,χ_ 係具有Ν-醯基磺醯亞胺陰離子(_c〇_N._s〇2_)官能性之陰離 子,γ係與N+mRs銨陽離子相容之陰離子,例如鹵化 物陰離子、羧酸根陰離子、硫酸根(有機與無機硫酸鹽兩 者)、磺酸根、碳酸根、硝酸根'亞硝酸根、硫氰酸根、 •氫氧根或磺醯亞胺陰離子。 在電沈積製程中利用離子液體作為電解質具有若干優 點。舉例而言,習知之鉻酸電鍍製程極其危險,因其主要 仰賴具有高度毒性及致癌性之六價鉻。另一方面,離子液 體可免除使用六價鉻之需求並容許使用被認為係極少危險 之三價鉻。此外,習知之鉻電鍍槽需要使用會造成嚴重處 置問題之強酸,而使用離子液體一般可使此等處置困難最 小化或甚至消除。此外,離子液體為非揮發性,因此其不 會造成大氣污染。 133195.doc 1359880 "’)·而利用一離子液體作為電解質之先前技術電沈積製 程之缺點係很難或甚至不可能沈積厚於至⑽之 一些金屬之金屬層。 對於-些應用’例如裝飾性電鍍,薄金屬層係可接受。 」而對於其中該金屬層需要提供保護以防磨損或磨钱, 或提高硬度(功能電鑛)之應用,需要甚厚於200 nm之金屬 層。更特;t言之,需要數微米或甚至數十微米之層。The solvent is lower than the temperature of HTC (the temperature of HTC. Many of the towels are liquid even at room temperature. At least one ion in the ionic liquid has a non-local charge and a group of organic substances, which prevents stable lattice The ionic liquid has a very low vapor pressure, and therefore, it does not substantially generate harmful vapors with respect to many conventional solvents. In general, ionic liquids are known to be used in many applications, for example, as a reaction solvent, Extraction of solvents, batteries and electrolytes in electrodeposition, catalysts, heat exchange fluids, additives in coatings. Well-known systems include systems formed from halogenated alkyl pyrenes with mono-aluminum halides or dialkylimidazolium halides. 'and systems based on choline chloride and a (hydrated) metal salt such as chromium (III) chloride. These systems have been used as electrolytes in electroplating' for example ΕΡ 0 4〇4 188 and ΕΡ 1 322 Further described in 591. WO 2002/026381 discloses the use of vaporized choline and a (hydrated) metal salt such as ionic liquid (eutectic mixture) of chromium (III) chloride and its use in electrodeposition and electropolishing. The The mixture is composed of vaporized choline and the (hydrated) metal salt in a ratio of ammonium to metal ions between 1:1 and 1:2.5 and is said to be particularly suitable for use on a metal substrate. Depositing chromium, cobalt, zinc or silver.] 33195.doc 1359880 » ,, In addition, pcT/ep/2G()7/()51329 describes a method of electroforming or electropolishing-metal on a substrate, in which An ionic liquid selected from the group consisting of n+RiR2ra χ_ ' or N+R5R6R7Rs γ• as an electrolyte, and adding a metal salt to the ionic liquid as a metal source or using a metal ruthenium as a metal source' Wherein R, to any of - independently represents hydrogen, cyclyl, cycloalkyl, aryl or aralkyl, selected from the group consisting of ruthenium, alpha, alpha, fluoro, fluorene, phenyl, νη2, CN, Ν. 〇2, C00R9, CH〇, c〇Rg or 基R9 is substituted by a group φ group, at least one of R5 to Rs is a fatty alkyl chain, and one or more of the cores may be (poly)oxyalkylene a group wherein the alkyl group is alkyl and the total number of oxygen alkyl units may be from i to 5 units of an oxygen alkyl unit, and at least one of & to Rs is c To C4 alkyl chain, R9 alkyl or cycloalkyl, χ_ has an anion of Ν-mercaptosulfonimide anion (_c〇_N._s〇2_), γ system and N+mRs ammonium cation Compatible anions such as halide anions, carboxylate anions, sulfates (both organic and inorganic sulfates), sulfonates, carbonates, nitrates 'nitrites, thiocyanates, hydroxides or sulfoniums Imino anions. The use of ionic liquids as electrolytes in electrodeposition processes has several advantages. For example, conventional chromic acid plating processes are extremely dangerous because they rely primarily on highly toxic and carcinogenic hexavalent chromium. On the other hand, ionic liquids eliminate the need to use hexavalent chromium and allow the use of trivalent chromium which is considered to be of little risk. In addition, conventional chromium plating baths require the use of strong acids which can cause serious disposal problems, and the use of ionic liquids generally minimizes or even eliminates such handling difficulties. In addition, ionic liquids are non-volatile and therefore do not cause atmospheric pollution. The disadvantages of prior art electrodeposition processes using an ionic liquid as the electrolyte are that it is difficult or even impossible to deposit a metal layer thicker than some of the metals of (10). For some applications, such as decorative plating, thin metal layers are acceptable. For applications where the metal layer needs to provide protection against wear or grind, or to increase hardness (functionalized ore), a metal layer that is much thicker than 200 nm is required. More specifically; in other words, layers of several micrometers or even tens of micrometers are required.
因此’有需要可藉以沈積增加厚度之金屬層之改良的離 子液體基電沈積系統。 【發明内容】 令人驚許地’已發現藉由添加—特^添加物至該等離子 液體基電鍍槽,可沈積較厚金屬^。更詳細言之,本發明 係關於在於_基板上讀或f拋光—金叙製程巾使用非 晶形氧化矽、石墨粉或其混合物作為添加物,《中使用一 離子液體作為電解質以提高金屬層厚度。 基於右干原因,已將添加物添加至包含電解質之離子液 體令。舉例而δ ’ us 7’196’221揭示在金屬電鍍與電拋光 製程期間,且特定言之在鍍鉻製料利用亮光劑來改良於 離子液體溶劑/電解質中獲得之塗層之外觀1等亮光劑 包含硫脈、糖精、香草駿、稀丙基脲、#驗酸、_酸、 明膠、2-巯基苯并μ、二水合氟化四乙基錢或五水合氯 氧化四曱基銨。然@,此等添加物對沈積層之均勾 不利影響,或完全無作用。 W〇 2〇〇6/〇74523係關於-種用於回收翻族金屬之方法, 133195.doc 9880 -、ι括自其中可存在氣化還原試劑、錯合劑、傳導性增 強劑之離子液體電沈積鉑族金屬。 US 6,552,843係有關用於控制電磁輻射之反射率及/或透 射之裝置,例如可調節的鏡子、智慧窗、光學衰減器及顯 不器,其揭示一種利用一離子液體電解質之可逆性電沈積 光學調變裝置《該離子液體電解質係由一離子有機化合物 與一可電沈積金屬之鹽之混合物組成。該離子有機化合物 包括一雜環陽離子,例如N_烷基吡咯錠、吡咯錠、卜烷 基-3-甲基咪唑鏽、N_烷基吡錠、2•烷基吡咯啉鑌、1·烷 基咪唑鏽。該可電沈積金屬係銀、銅、錫、鋅、鈀、鉍、 鎘、汞、銦、鉛、銻、鉈及其合金。其提及該離子液體電 解質可藉由添加有機或無機膠凝劑而成為更具黏性、半固 態或固態。可將包括懸浮碳與溶解染料之無機或有機物質 添加至該電解質以賦予所需顏色或降低背景反射。 此等文件皆未教授如何在利用包含電解質之離子液體之 電沈積製程甲獲得較厚金屬層。 本申凊案中之術語電沈積應被理解為包含電鍍與電拋光 兩者。所謂電鍍係指利用電流將一導電物體塗布一金屬層 之製程較佳結果係金屬在該物體上之一薄、平滑且均勻 的塗層電鍍之主要應用係沈積一具有一些所需特性(例 如抗磨蝕與磨損性、防腐蝕性、潤滑性、美觀品質之提高 等)之金屬層於一缺乏該特性之表面上。另一應用係利用 電鍍在尺寸不足的部件上增加厚度。所謂電拋光係指藉由 將一原先粗糙或不平坦之金屬表面塗布一相對薄的金屬層 133195.doc 1359880 而將其平滑化並増進其外觀β 一根據本發明用以提高沈積金屬層厚度之添加物係非晶形 - 氧化矽、石墨粉、或其混合物。 • 術語非晶形氧切係意指包含任何形式的膠體石夕石微 . 彳’、巾該等膠體石夕石微粒(亦被稱為石夕溶膠)可源、自於(例 如)沉澱矽石、矽膠、熱解矽石(發煙矽石)、微矽石(微矽 粉)或其混合物。根據本發明之膠體矽石可經改質且可包 • 含其他元素諸如胺、铭及/或棚’其可以微粒及/或連續相 存在。 該等膠體咬石微粒可分散於—實質上水性的溶劑中,適 當地在穩定陽離子諸如^^…卵卜有機陽離 子、第一、第二、第三及第四胺、及其混合物之存在下, 卩便形成-水性石夕溶膠'然而,亦可使用包含有機溶劑例 如低碳_、丙酮或其混合物之分散液(亦稱為有機石夕溶 膠)。較佳地,該溶膠中的石夕石含量係約5至約8〇重量%。 • 適合根據本發明使用之水性矽溶膠係,例如,由Akzo 驗1購得。適當的有機矽溶膠係,例如,由Nissan化學工 業購得。 所谓石墨粉係意指細粒碳粉或碳 得。 基於電解質之總重量,添加物較佳係以至少〇別 量使用,更佳至少G.G5 wt%,且最佳至”」糾%。基於 解質之總重量’較佳使用不多於5 wt%之添加物,更佳 多於域,且最佳不多於…%。應注意術語電解質係, 133195.doc 135988〇 表全體電解質混合物,亦gp 4八_ 亦即包含溶解金屬鹽與添加物。 藉由本發明,亦即藉由沐 丨稭由添加所述添加物,當與無該 添加物之電沈積比較時,層厚度可增加至少μ倍更佳至 少20倍,且最佳至少4〇倍。Thus, there is a need for an improved ion-based electrodeposition system for depositing a metal layer of increased thickness. SUMMARY OF THE INVENTION It has been surprisingly found that a thicker metal can be deposited by adding an additive to the plasma liquid based plating bath. More specifically, the present invention relates to the use of an amorphous cerium oxide, graphite powder or a mixture thereof as an additive for reading or f-polishing on a substrate, and using an ionic liquid as an electrolyte to increase the thickness of the metal layer. . For the right stem cause, the additive has been added to the ionic liquid containing the electrolyte. For example, δ 'us 7'196'221 discloses a brightener during the metal plating and electropolishing process, and in particular, the chrome-plated material is improved by the use of a brightener to improve the appearance of the coating obtained in the ionic liquid solvent/electrolyte. Contains sulfur veins, saccharin, vanillin, propyl urea, #acid, _acid, gelatin, 2-mercaptobenzopyrene, tetraethylammonium fluoride dihydrate or tetradecylammonium chloride pentoxide. However, @, these additives have an adverse effect on the deposition of the deposited layer, or have no effect at all. W〇2〇〇6/〇74523 relates to a method for recovering a family of metals, 133195.doc 9880 -, including ionic liquid electricity from which a gasification reducing agent, a binder, a conductivity enhancer may be present A platinum group metal is deposited. US 6,552,843 relates to a device for controlling the reflectivity and/or transmission of electromagnetic radiation, such as an adjustable mirror, a smart window, an optical attenuator and a display, which discloses a reversible electrodeposition optics using an ionic liquid electrolyte Modulation device "The ionic liquid electrolyte is composed of a mixture of an ionic organic compound and an electrode of an electrodepositable metal. The ionic organic compound comprises a heterocyclic cation such as N-alkylpyrrole, pyrrole ingot, b-alkyl-3-methylimidazole rust, N-alkylpyridinium, 2·alkylpyrroline quinone, 1·alkane Imidazole rust. The electrodepositable metal is silver, copper, tin, zinc, palladium, iridium, cadmium, mercury, indium, lead, antimony, bismuth and alloys thereof. It is mentioned that the ionic liquid electrolyte can be made more viscous, semi-solid or solid by the addition of an organic or inorganic gelling agent. An inorganic or organic substance including suspended carbon and a dissolved dye may be added to the electrolyte to impart a desired color or to reduce background reflection. None of these documents teaches how to obtain a thicker metal layer in an electrodeposition process using an ionic liquid containing an electrolyte. The term electrodeposition in this application is to be understood to include both electroplating and electropolishing. The so-called electroplating refers to a process of applying a metal layer to a conductive object by using a current. The preferred result is that a thin, smooth and uniform coating of the metal on the object is mainly applied to deposit a certain desired property (for example, anti- The metal layer of abrasion and abrasion, corrosion resistance, lubricity, aesthetic quality, etc.) is on a surface lacking such characteristics. Another application uses electroplating to increase the thickness on undersized components. By electropolishing is meant that a previously rough or uneven metal surface is coated with a relatively thin metal layer 133195.doc 1359880 to smooth it and into its appearance β. According to the invention, the thickness of the deposited metal layer is increased. The additive is amorphous - cerium oxide, graphite powder, or a mixture thereof. • The term amorphous oxygen cut means that it contains any form of colloidal stone. 彳', towel, such colloidal stone particles (also known as Shixi sol) can be sourced from, for example, precipitated vermiculite , tannin extract, pyrolysis vermiculite (smoke vermiculite), micro vermiculite (micro-powder powder) or a mixture thereof. The colloidal vermiculite according to the present invention may be modified and may contain other elements such as amines, imitations and/or sheds which may be present in particulate and/or continuous phases. The colloidal stone particles can be dispersed in a substantially aqueous solvent, suitably in the presence of a stable cation such as an organic cation, first, second, third and fourth amines, and mixtures thereof The sputum forms a water-based sol sol. However, a dispersion containing an organic solvent such as low carbon _, acetone or a mixture thereof (also referred to as an organic sol sol) may also be used. Preferably, the content of the Shishi stone in the sol is from about 5 to about 8 weight percent. • Aqueous sol-gel systems suitable for use in accordance with the present invention, for example, are commercially available from Akzo. Suitable organic sol-gel systems are commercially available, for example, from Nissan Chemical Industries. The term "graphite powder" means fine-grained carbon powder or carbon. The additive is preferably used in at least the amount based on the total weight of the electrolyte, more preferably at least G.G5 wt%, and optimally up to "%". It is preferred to use no more than 5 wt% of the additive based on the total weight of the detoxification, more preferably more than the domain, and most preferably no more than ...%. It should be noted that the term electrolyte system, 133195.doc 135988, refers to the entire electrolyte mixture, and also contains dissolved metal salts and additives. By the present invention, that is, by adding the additive by the mash, the layer thickness can be increased by at least μ times, preferably at least 20 times, and optimally at least 4 times, when compared with electrodeposition without the additive. .
用作電解質之離子液體較佳係選自由N+RiR2r3R4 χ-、 N+R5R6R7R8Y_及其混合物組成之群,其中之任一者 獨立地表示氬、院基、環院基、芳基或芳院基,其可峻選 自 OH'CM'Br'F、!、苯基、NH2、cn N〇2、c〇〇R9、 CHO、CORA〇R9之基團取代,其中至少一者9係 視情況分支的脂肪烷基鏈,其中I可為π”。烷 基)-N+R,6R17R,8(其中〜〜係分別類似於汉丨: 尺3、R4),或CjC4烷基鏈,且其中&至之一或多者可 為(聚)氧伸烷基,其中該伸烷基係。丨至。4伸烷基且氧伸烷 基單元之總數可為1至50個氧伸烷基單元,且其中&至心 之至少-者係C,至Μ基鏈,其中R9㈣基或環燒基,其8 中X·係與N+RlR2R3R4錄陽離子相容之陰離子,例如函化物 陰離子、m酸根陰離子、硫酸根(有機與無機硫酸根兩 者)、磧酸根、碳酸根、硝酸根、亞硝酸根、硫氰酸根、 氫氧根、糖精酸根陰離子或磺醯亞胺陰離子,且其中丫_係 具有磺醯亞胺陰離子或沁醯基磺醯亞胺陰離子(_c〇_n__ s〇2_)官能性之陰離子。 在一實施例_,X·係選自F-、C1-、Br-、j-之基團; R〗〇coo·陰離子之基團,其中Ri0可為氫、^至匕〗烷基、 烯基或芳基;RnS〇4·陰離子之基團,其中R|1可不存在(在 133195.doc 此情況下該陽離子為二價)、為氫、心至匕〗烷基、烯基或 芳基,R^SO3陰離子之基團,其中Riz可不存在(在此情況 下該陽離子為二價)、為氫、(:1至(:22烷基、烯基或芳基;The ionic liquid used as the electrolyte is preferably selected from the group consisting of N+RiR2r3R4 χ-, N+R5R6R7R8Y_, and mixtures thereof, each of which independently represents an argon, a hospital, a ring-based, an aryl or a Fangyuan. Base, which can be selected from OH'CM'Br'F,! a group substituted with a group of phenyl, NH2, cn N〇2, c〇〇R9, CHO, CORA〇R9, at least one of which is a fatty alkyl chain branched as appropriate, wherein I may be π". )-N+R,6R17R,8 (wherein ~~ are respectively similar to Hangu: Ruler 3, R4), or CjC4 alkyl chain, and wherein & one or more can be (poly)oxyalkylene a group, wherein the alkyl group is 丨. 4 alkyl and the number of oxygen alkyl units can be from 1 to 50 oxygen alkyl units, and wherein & a fluorenyl chain, wherein R9(tetra)yl or cycloalkyl, wherein X is an anion compatible with N+RlR2R3R4, such as a complex anion, a m-acid anion, a sulfate (both organic and inorganic sulfate), a citrate, a carbonate, a nitrate, a nitrite, a thiocyanate, a hydroxide, a saccharinate anion or a sulfonium imine anion, and wherein the oxime has an sulfonimide anion or a sulfonium sulfoximine An anion (_c〇_n__ s〇2_) functional anion. In an embodiment _, X · is selected from the group of F-, C1-, Br-, j-; R 〇 coo · anion group , Wherein Ri0 may be a hydrogen, a hydrazine, an alkenyl or an aryl group; a group of an RnS〇4. anion, wherein R|1 may be absent (in the 133195.doc, the cation is divalent), A group of R^SO3 anions, wherein Riz may be absent (in this case, the cation is divalent), hydrogen, (:1 to (:22 alkane). Base, alkenyl or aryl;
RuC〇3陰離子之基團,其中可不存在(在此情況下該陽 離子為二價)、為氫、4至(:22烷基、烯基或芳基;及Rl4_ N -SCVR〗5陰離子之基團,其中及/或Ri5可獨立地為 氫、C|至C22烷基、烯基或芳基,且Rm可藉由一羰基鏈結 至該氮原子。 脂肪烷基鏈係意指包含飽和及/或不飽和鏈且包含8至22 個碳原子;較佳地,其包含1〇至22個碳原子,最佳12至2〇 個碳原子。 在另一實施例中,使用化學式N + 之離子液 體,其中R,、R3及&係如上所述且I係(C2至C6烷基)· n+r16r17r〗a。較佳地,Rl6、Ri7及Ri8係分別於R|、^及 R4相同,其中其等之至少一者係視情況分支的脂肪烷基 鏈’而導致一雙子星型結構(亦即一對稱二-第四銨化合 物)。 在另一實施例中’ γ係基於一種已知為甜味劑之化合 物。在另一實施例中’ N+mi^係胺,其中該等基團尺5 至I係氫或視情況經0H或C1取代之烷基或環烷基;更佳 地,其中至少三個係烷基’更佳係c 1至c4烷基。 在一較佳實施例中,離子液體係選自以下任一者:膽驗 糖精酸鹽、膽鹼乙醯磺胺酸鹽、氣化十六烷基三甲基 敍、氣化十八烷基三曱基銨、氣化椰子三甲基銨、氣化牛 133195.doc 12 1359880 脂三甲基銨、氯化氫化牛脂三甲基銨、氯化氫化棕櫚三甲 基敍、氣化油稀三甲基銨、氣化黃豆三甲基録、氯化挪子 苄基一甲基知、氯化C12-16-焼基苄基二甲基録、氣化氫 化牛脂苄基二曱基銨、氯化二辛基二甲基銨、氯化二癸基 二甲基銨、亞硝酸二椰子二甲基銨、氯化二椰子二曱基 銨、氣化二(氫化牛脂)二曱基銨、氯化二(氫化牛脂)节基 曱基銨、氯化二牛脂二曱基銨、氯化二_十八烷基二甲基 銨、氣化氫化牛脂(2-乙基己基)二甲基銨、曱基硫酸氫化 牛月曰(2·乙基己基)二甲基銨、氣化三_十六烷基甲基銨、氯 化十八烧基f基一(2-經乙基)敍、硝酸椰子二(2_經乙基)甲 基銨、氣化椰子二(2-羥乙基)甲基銨、氣化椰子二(2·羥乙 基)苄基銨、氣化油烯基二(2_羥乙基)甲基銨、氣化椰子 [聚氧伸乙基(1 5)]- f基銨、甲基硫酸椰子[聚氧伸乙基 (15)]甲基銨、氯化椰子[聚氧伸乙基(17)]甲基銨、氯化十 八烷基[聚氧伸乙基(15)]甲基銨、氣化氫化牛脂[聚氧伸乙 基(15)]曱基銨、醋酸三(2_羥乙基)牛脂銨、二氣化牛脂_ 1,3 -丙烧五甲基二錢。 以上指示之適合根據本發明使用之許多離子液體可藉由 一簡單鹽反應而製備,舉例而言,藉由氯化膽鹼與糖精酸 (乙醯磺胺酸)鈉之複分解反應以形成一糖精酸(乙醯磺胺 酸)膽驗離子液體,或藉由相應胺之第四銨化作用。 離子液體之銨陽離子與來自溶解鹽或來自金屬陽極之金 屬鹽之金屬陽離子的莫耳比較佳係介於1,〇〇〇:1與之 間。更佳係離子液體之銨陽離子與金屬鹽之金屬陽離子之 133195.doc 13 1359880 莫耳比介於500:1與5··〗之間,最佳係莫耳比介於1〇〇·ι與 7:1之間,此提供良好品質的金屬層,金屬於離子液體中 之優良溶解及製程成本與電鍍基板產品之外觀之間的良好 平衡。 較佳係沈積金屬鉻、鋁、鈦、辞或銅、或其合金之一 者。更佳係沈積鉻或鋁,最佳係鉻。此金屬沈積可自溶解 ' 於電解質中的金屬鹽進行,其例如為金屬卣化物,較佳為 Φ (仁不限於)金屬氯化物。其亦可使用經應用作為陽極之純 金屬(即鉻、:ig、鈦、鋅或銅陽極)進行。在使用金屬陽極 之實施例中,該陽極可呈金屬板、金屬塊、金屬片之形式 或熟習此項技術者已知之任何其他適當的形式。 可根據本發明經電鍍或電拋光之基板可為任何導電物 體較佳地,其係一固體金屬物體,例如一碳鋼物體,或 • 其包括導電元件例如一複合材料物體。 本發明it-步關於-種在一金屬&板上電鍍或電拋光一 • 金屬之方法,其中離子液體係選自由N+R^m x-、 N+Rshl^R8 Υ·及其混合物組成之群,其中Ri至以之任一者 • 獨立地表示氫、烷基、環烷基、芳基或芳烷基,其可經選 自 OH、C卜 Br ' F、I、苯基、Nh2、CN、N〇2、c〇()R9、 CHO、COR9或OR9之基團取代,其中至心之至少一者係 視情況分支的脂肪烷基鏈,其中I可為(C2至烷基卜 N+R16R17R18(其中r16、Rl7、Ri8係分別類似於汉丨、I、 R〇,或(:丨至(:4烷基鏈,且其中心至尺8之一或多者可為(聚) 氧伸烷基,其中該伸烷基係(^至匕伸烷基且氧伸烷基單元 133195.doc • 14- 之總數可為丨至”個氧伸烷基單元’且其中1至以之至少 -者係C丨至c4烷基鏈’其中尺9係烷基或環烷基,其中χ-係 與N+mt銨陽離子相容之陰離子,例如齒化物陰離 子、羧酸根陰離子、硫酸根(有機與無機硫酸根兩者)、磺 醆根、碳酸根、硝酸根、亞硝酸根、硫氰酸根、氫氧根、 糖精酸根陰離子或磺醯亞胺陰離子,且其中γ_係具有磺醯 亞胺陰離子或Ν-醯基磺醯亞胺陰離子(_c〇_N-_s〇2_)官能性 之陰離子, 其中使用添加至該離子液體之金屬鹽或金屬陽極作為金 屬源,及 其中基於電解質之總重量,該離子液體包括至少〇〇1a RuC〇3 anion group in which the anion may be absent (in this case, the cation is divalent), hydrogen, 4 to (:22 alkyl, alkenyl or aryl; and Rl4_N-SCVR5 anion a group, wherein and/or Ri5 may independently be hydrogen, C| to C22 alkyl, alkenyl or aryl, and Rm may be bonded to the nitrogen atom by a carbonyl group. The fatty alkyl chain means saturated and Or unsaturated chain and comprising from 8 to 22 carbon atoms; preferably, it contains from 1 to 22 carbon atoms, most preferably from 12 to 2 carbon atoms. In another embodiment, the chemical formula N + is used An ionic liquid, wherein R, R3 and & are as described above and I is (C2 to C6 alkyl) n + r16r17r a. Preferably, R16, Ri7 and Ri8 are respectively at R|, ^ and R4 The same, wherein at least one of them depends on the fatty alkyl chain of the branch, resulting in a double sub-star structure (ie, a symmetric di-tetraammonium compound). In another embodiment, the 'gamma system is based on A compound known as a sweetener. In another embodiment, 'N+mi^-amine, wherein the group 5 to I is hydrogen or an alkyl or ring optionally substituted with 0H or C1 More preferably, at least three of the alkyl groups are more preferably c 1 to c 4 alkyl groups. In a preferred embodiment, the ionic liquid system is selected from any of the following: biliary saccharate, gall Alkali acesulfonamide, gasified cetyl trimethyl sulphate, gasified octadecyltrimethylammonium, gasified coconut trimethylammonium, gasified cow 133195.doc 12 1359880 lipid trimethylammonium , Hydrogenated hydrogenated tallow trimethyl ammonium, hydrogenated palmitized palm trimethyl sulphate, gasified oil diluted trimethyl ammonium, gasified soybean trimethyl record, chlorinated benzyl monomethyl, chlorinated C12-16 - mercaptobenzyl dimethyl record, gasified hydrogenated tallow benzyl decyl ammonium, dioctyl dimethyl ammonium chloride, dimercaptodimethylammonium chloride, dicocodimethylammonium nitrite, Dicobalt diammonium chloride, gasified di(hydrogenated tallow) decyl ammonium, chlorinated di(hydrogenated tallow) benzyl ammonium, chlorinated ditallow diammonium chloride, di-octadecyl chloride Dimethylammonium chloride, gasified hydrogenated tallow (2-ethylhexyl) dimethyl ammonium, hydrogenated hydrogenated oxol (2·ethylhexyl) dimethyl ammonium, gasified tris-hexadecyl base , octadecyl chloride, f-based (2-ethyl), dinitromethane di(2-ethyl)methylammonium, gasified coconut bis(2-hydroxyethyl)methylammonium, gasification Coconut bis(2.hydroxyethyl)benzylammonium, gasified oleyl bis(2-hydroxyethyl)methylammonium, gasified coconut [polyoxy-extended ethyl (1 5)]-f-ammonium, A Sulfate-based coconut [polyoxy-extended ethyl (15)] methyl ammonium, chlorinated coconut [polyoxy-extended ethyl (17)] methyl ammonium, octadecyl chloride [polyoxy-extended ethyl (15)] Methylammonium, gasified hydrogenated tallow [polyoxy-extended ethyl (15)] decyl ammonium, tris(2-hydroxyethyl) ammonium taurate, di-gasified tallow _ 1, 3-propanol pentamethyl dim . Many of the ionic liquids suitable for use in accordance with the present invention as described above may be prepared by a simple salt reaction, for example, by metathesis of choline chloride with sodium saccharinate (ethionine) to form a saccharin acid. (Ethyl sulfonamide) biliary ionic liquid, or by the fourth ammoniumation of the corresponding amine. The ammonium cation of the ionic liquid is preferably between 1, 〇〇〇:1 and the molar of the metal cation derived from the dissolved salt or the metal salt from the metal anode. More preferably, the ammonium cation of the ionic liquid and the metal cation of the metal salt are 133195.doc 13 1359880 The molar ratio is between 500:1 and 5··, and the optimal molar ratio is between 1〇〇·ι and Between 7:1, this provides a good quality metal layer, a good balance between the excellent dissolution of the metal in the ionic liquid and the cost of the process and the appearance of the plated substrate product. Preferably, one of the metals chromium, aluminum, titanium, rhodium or copper, or an alloy thereof is deposited. More preferred is the deposition of chromium or aluminum, the best chromium. This metal deposition can be carried out from a metal salt dissolved in the electrolyte, which is, for example, a metal halide, preferably Φ (non-limiting) metal chloride. It can also be carried out using a pure metal (i.e., chromium, ig, titanium, zinc or copper anode) applied as an anode. In embodiments in which a metal anode is used, the anode can be in the form of a metal plate, a metal block, a metal sheet, or any other suitable form known to those skilled in the art. The substrate which may be electroplated or electropolished according to the present invention may be any electrically conductive object, preferably a solid metal object, such as a carbon steel object, or • it comprises a conductive element such as a composite object. The invention relates to a method for electroplating or electropolishing a metal on a metal & plate, wherein the ionic liquid system is selected from the group consisting of N+R^m x-, N+Rshl^R8 Υ· and mixtures thereof a group, wherein Ri to any of them, independently represents hydrogen, alkyl, cycloalkyl, aryl or aralkyl, which may be selected from the group consisting of OH, Cb Br 'F, I, phenyl, Nh2 Substituting a group of CN, N〇2, c〇()R9, CHO, COR9 or OR9, wherein at least one of the centroids is a fatty alkyl chain branched as appropriate, wherein I can be (C2 to alkyl b) N+R16R17R18 (wherein r16, Rl7, and Ri8 are respectively similar to samarium, I, R〇, or (: 丨 to (: 4 alkyl chain, and one or more of the centers to the size 8 may be (poly)) Oxyalkylene, wherein the alkyl group (to the alkyl group and the oxygen alkyl unit 133195.doc • 14- may be a total of 丨 to "oxyalkylene units" and wherein 1 At least one is a C 丨 to c 4 alkyl chain ' wherein 尺 9 is an alkyl or cycloalkyl group, wherein the oxime is an anion compatible with the N + mt ammonium cation, such as a toothing anion, a carboxylate anion, a sulfate ( Organic and none Both sulfates), sulfonate, carbonate, nitrate, nitrite, thiocyanate, hydroxide, saccharinate anion or sulfonium imine anion, and wherein γ_ has sulfonimide anion or An anion of a Ν-mercaptosulfonimide anion (_c〇_N-_s〇2_), wherein a metal salt or a metal anode added to the ionic liquid is used as a metal source, and the total weight based on the electrolyte Ionic liquids include at least 〇〇1
Wt〇/Q之選自由非晶形氧化矽、石墨粉及其混合物組成之群 之添加物。 該添加物較佳係以如上描述之量使用。 電沈積較佳係在低於90。(:之溫度下,且更佳係在室溫 下’在敞開的電沈積容器中實施,但電沈積並不受限於此 等條件。 【實施方式】 根據本發明之方法藉由以下實例進一步闡明。 實例 比較實例1-在不具有添加物的氯化椰子烷基甲基丨聚氧伸 乙基(15)】銨t自CrCl3六水合鹽將鉻電鍍於碳鋼上 將氣化鉻(III)六水合鹽添加至包含0.2 wt%水之氣化椰子 烷基曱基[聚氧伸乙基(15)]銨離子液體中,且在約50°C之 133195.doc -15· 1359880 溫度下攪動該混合物直至該固態鹽溶解。在製備得的溶液 中,六水合氣化鉻(III)之濃度係75 g/kge 將約250毫升之該溶液傾倒至設有一電加熱元件之薄膜 電池(Hull cell)中’其在陽極側具有65毫米長度且在陰極 側具有102毫米長度,陽極-陰極最短距離為48毫米,陽極_ 陰極最長距離為127毫米,且深度為65毫米。加熱該電池 且將溫度維持在約80°C ^該液體係利用一設置於中央的頂 伸式葉輪攪動。 應用鍍翻鈦板作為陽極且連接至一 DC電源之正極端 子’同時使用碳鋼板作為陰極(基板)且連接至負極端子。 在引入至槽中之前,該基板片先利用一商業擦洗粉清潔, 在去礦質水中、在丙酮中且之後在乙醇中、及最終在4 Μ·Ηα 水溶液中清洗。當兩板皆經連接並引入至電池中時,將電 壓差設定至30V。在一串聯連接之儀表上監控電流。 電鍍數小時後,將陰極與電源分離且從電池中取出。將 該板於水及丙酮中清洗然後乾燥。藉由結合χ_射線散射之 掃描電子顯微術(SEM/EDX)對該基板實施化學分析。其確 認鉻沈積於碳鋼上。利用自德國Fischer獲得之厚度測量裝 置測量沈積層厚度。經測得厚度低於〇5 μπι。 實例2-在添加〇·2 Wt%非晶形氧化矽之氣化椰子烷基甲基 [聚氧伸乙基(15)】銨中自〇〇:丨3六水合鹽將鉻電鍍於碳鋼上 於如實例1中所述而製備得之氯化鉻(ΠΙ)六水合鹽溶於 氣化椰子烧基甲基[聚氧伸乙基(15)]敍離子液體中之溶液 中添加包含8 Wt%活性化合物之非晶形氧化石夕含水膠體溶 133195.doc 16 1359880 液:該製備溶液中該非晶形氧化矽之濃度,以活性化合物 之量表示,為1.6 g/kg。 將約250毫升之該溶液傾倒至實例】中描述之該薄膜電池 中。將該電池加熱至約8〇°c之溫度。 實施如實例!中該碳鋼基板(陰極)之相同的前處理,且 再次應用鍍銘鈦板作為陽極。將電位差設定至3〇 v。該液 體係利用-設置於中央的頂伸式葉輪_。在—串聯連接 之儀表上監控電極之間的電流。 電流流通數小時後’將陰極與電源分離且從電池中取 出。將該板於水及丙嗣中清洗然後乾燥。藉由結合χ•射線 散射之掃描電子顯微術(SEM/EDX)對該基板實施的化學分 析確認鉻沈積於該碳鋼板上。經測得利用一厚度測量裝置 (德國Fischer)測量之沈積層厚度在基板之特定區域高達 μιη其顯著地比未使用添加物時厚。如同薄膜電池實驗 的典型情況,層厚度隨基板上之位置而變化—在此情況 係1 μΓη至8 _。為確認'此等測量,亦進行橫切金相學分 析°將基板之樣品嵌入環氧樹脂中並在顯微鏡下評估沈積 物。以此方式測得的層厚度與厚度測量裝置之結果一致。 實例3_於添加0.4 wt〇/〇非晶形氧化發之氣化挪子烧基甲基 [聚氧伸乙基(15)】錄中自Cra3六水合鹽將鉻電鍵於碳鋼上 於如實m中所述而製備得之氣化鉻⑽六水合鹽溶於 氣化椰子烷基曱基[聚氧伸乙基(15)]銨離子液體中的溶液 中添加包含8 Wt〇/0活性化合物之非晶形氧化石夕含水膠體溶 液。該製備得溶液中該非晶形氧化石夕之濃度,以活性化合 133195.doc •17- 1359880 物之量表示,係4 g/kg » 將約250毫升之該溶液傾倒至實例i中描述之該薄膜電池 _。將該電池加熱至約80°C之溫度。 實施如實例1甲該碳鋼基板(陰極)之相同的前處理且 再次應用鍍鉑鈦板作為陽極。將電位差設定至3〇 V。該液 體係利用-設置於中央的頂伸式葉㈣動。在—串聯連接 之儀表上監控電極之間的電流。 在電流流通數小時後,將陰極與電源分離且從t池中取 出。將該板於水及丙酮中清洗然後乾燥。藉由該基板之結 合X-射線散射之掃描電子顯微術(SEM/EDX)的化學分析確 涊鉻沈積於該碳鋼板上。經測得利用厚度測量裝置(德國 Fischer)及藉由橫切金相學分析所測量之沈積層厚度在1至 9 μπι之範圍内。 實例4-於添加1 wt%碳黑之氣化椰子烷基甲基丨聚氧伸乙基 (15)1銨中自CrCh六水合II將鉻電鍍於碳鋼上 於如實例1中所述而製備得之氣化鉻(III)六水合鹽溶於 氯化椰子烷基曱基[聚氧伸乙基(15)]銨離子液體中的溶液 中添加碳黑。該製備得混合物中碳黑之濃度係1 0 g/kg。 將約2 5 0毫升之該混合物傾倒至實例〗中描述之該薄膜電 池中。將該電池加熱至約7〇。〇之溫度。 貫施如實例1十該碳鋼基板(陰極)之相同的前處理,且 再次應用锻始鈦板作為陽極,將電位差設定至3 〇 V。該液 體係利用一設置於中央的頂伸式葉輪攪動。在一串聯連接 之儀表上監控電極之間的電流。 133195.doc •18· 1359880 在電流流通數小時後’將陰極與電源分離且從該電 取出。將該板於水及丙m中清洗然後乾燥。藉由該基板之 結合X-射線散射之掃描電子顯微術(SEM/EDx)的化學分析 確認鉻沈積於該碳鋼板上。極 SFischer).,_ 板上a測付利用厚度測量裝置(德 ® F1SCher)測i之沈積層厚度 卜 等基板樣品之_ '、 至7 範圍内。由該 ”刀金相學分析測得相同的厚度值。The Wt〇/Q is selected from the group consisting of amorphous cerium oxide, graphite powder, and mixtures thereof. The additive is preferably used in the amounts described above. Electrodeposition is preferably below 90. (At the temperature, and more preferably at room temperature 'implemented in an open electrodeposition vessel, but electrodeposition is not limited to such conditions. [Embodiment] The method according to the present invention is further exemplified by the following examples Clarification. Example Comparison Example 1 - Chlorinated Coconut Alkylmethylhydrazine without Additives Polyoxyethyl Ethyl Ethyl (15) Ammonium t From CrCl3 Hexahydrate Salt Electroplating Chromium on Carbon Steel to Calcine Chromium (III The hexahydrate salt is added to a vaporized coconut alkyl fluorenyl [polyoxyethyl (15)] ammonium ionic liquid containing 0.2 wt% water at a temperature of about 133195.doc -15·1359880 at about 50 °C. The mixture is agitated until the solid salt is dissolved. In the prepared solution, the concentration of chromium (III) hexahydrate vaporized is 75 g/kge. About 250 ml of the solution is poured into a thin film battery provided with an electric heating element (Hull In the cell, it has a length of 65 mm on the anode side and a length of 102 mm on the cathode side, a shortest distance of the anode-cathode of 48 mm, an anode-cathode maximum distance of 127 mm, and a depth of 65 mm. The battery is heated and will The temperature is maintained at about 80 ° C ^ The top-extending impeller is stirred in the center. The plated titanium plate is used as the anode and is connected to the positive terminal of a DC power source. At the same time, a carbon steel plate is used as a cathode (substrate) and connected to the negative terminal. The substrate is introduced before being introduced into the groove. The film is first cleaned with a commercial scouring powder, washed in demineralized water, in acetone and then in ethanol, and finally in an aqueous solution of 4 Μ·Ηα. When both plates are connected and introduced into the battery, the voltage difference Set to 30 V. Monitor the current on a series connected meter. After plating for a few hours, separate the cathode from the power supply and remove it from the battery. Wash the plate in water and acetone and then dry. By combining χ-ray scattering Scanning electron microscopy (SEM/EDX) performed chemical analysis on the substrate, which confirmed the deposition of chromium on carbon steel. The thickness of the deposited layer was measured using a thickness measuring device obtained from Fischer, Germany. The thickness was determined to be less than 〇5 μm. Example 2 - Adding 〇·2 Wt% Amorphous Cerium Oxide to Gasified Coconut Methyl Methyl [Polyoxyethyl (15)] Ammonium: 丨3 hexahydrate salt to chrome on carbon steelThe chromium chloride (ruthenium) hexahydrate salt prepared as described in Example 1 is dissolved in a solution of gasified coconut alkylmethyl [polyoxyethyl (15)] ionic liquid to contain 8 Wt % of the active compound of the amorphous oxidized rock hydrate aqueous colloid 133195.doc 16 1359880 liquid: the concentration of the amorphous cerium oxide in the preparation solution, expressed as the amount of the active compound, is 1.6 g / kg. About 250 ml of the solution Pour into the thin film battery described in the example. The battery was heated to a temperature of about 8 ° C. The same pretreatment of the carbon steel substrate (cathode) was carried out as in the example, and the plated titanium plate was again applied. As an anode. Set the potential difference to 3〇 v. The liquid system utilizes a top-mounted impeller _ disposed in the center. The current between the electrodes is monitored on a meter connected in series. After the current has flowed for several hours, the cathode is separated from the power source and taken out of the battery. The plate was washed in water and acetonitrile and then dried. Chemical analysis of the substrate by scanning electron microscopy (SEM/EDX) combined with X-ray scattering confirmed that chromium was deposited on the carbon steel sheet. It has been determined that the thickness of the deposited layer measured by a thickness measuring device (Fischer, Germany) is as high as μηη in a specific region of the substrate, which is significantly thicker than when no additive is used. As is typical for thin-film battery experiments, the layer thickness varies with the position on the substrate—in this case, 1 μΓη to 8 _. To confirm 'these measurements, cross-section metallographic analysis was also performed. A sample of the substrate was embedded in the epoxy resin and the deposit was evaluated under a microscope. The layer thickness measured in this way is consistent with the results of the thickness measuring device. Example 3_ Gasification of a 0.4 〇/〇 amorphous oxidized gas by gasification of a methylene group [polyoxy-extension ethyl (15)] recorded from Cra3 hexahydrate salt chrome on a carbon steel in a solid m The gasified chromium (10) hexahydrate salt prepared in the above is dissolved in a solution of a gasified coconut alkyl sulfhydryl [polyoxyethyl (15)] ammonium ionic liquid, and the active compound containing 8 Wt 〇 / 0 is added. Amorphous oxidized oxide aqueous colloidal solution. The concentration of the amorphous oxidized oxide in the prepared solution is expressed as the amount of active compound 133195.doc • 17-1359880, which is 4 g/kg » about 250 ml of the solution is poured into the film described in Example i battery_. The battery was heated to a temperature of about 80 °C. The same pretreatment as in Example 1 A carbon steel substrate (cathode) was carried out and a platinized titanium plate was again applied as an anode. Set the potential difference to 3 〇 V. The liquid system utilizes a top-extending leaf (four) that is placed in the center. The current between the electrodes is monitored on a meter connected in series. After a few hours of current flow, the cathode was separated from the power source and removed from the t-cell. The plate was washed in water and acetone and then dried. Chemical analysis of the electron microscopy (SEM/EDX) of the substrate by X-ray scattering confirmed that chromium was deposited on the carbon steel sheet. The thickness of the deposited layer measured by the thickness measuring device (Fischer, Germany) and by cross-section metallographic analysis was measured to be in the range of 1 to 9 μm. Example 4 - Electroplating of chromium onto carbon steel from CrCh hexahydrate II in a gasified coconut alkylmethyl hydrazine polyoxyethylidene (15) 1 ammonium with 1 wt% carbon black added as described in Example 1. The prepared vaporized chromium (III) hexahydrate salt is dissolved in a solution of chlorinated coconut alkyl sulfonyl [polyoxyethyl (15)] ammonium ionic liquid to add carbon black. The concentration of carbon black in the prepared mixture was 10 g/kg. About 250 ml of this mixture was poured into the film cell described in the example. The battery was heated to about 7 Torr. The temperature of 〇. The same pretreatment as in the carbon steel substrate (cathode) of Example 10 was carried out, and the forging titanium plate was again applied as an anode, and the potential difference was set to 3 〇 V. The liquid system is agitated using a top-mounted impeller disposed in the center. The current between the electrodes is monitored on a serially connected meter. 133195.doc •18· 1359880 After the current has flowed for several hours, the cathode is separated from the power source and taken out from the electricity. The plate was washed in water and propylene and then dried. Chemical analysis of the combined X-ray scattering by scanning electron microscopy (SEM/EDx) of the substrate confirmed that chromium was deposited on the carbon steel sheet. Extreme SFischer)., _ On-board measurement using a thickness measuring device (German® F1SCher) to measure the thickness of the deposited layer, such as _ ', to 7 in the substrate sample. The same thickness value was measured by the "knife metallographic analysis."
133I95.doc 19·133I95.doc 19·
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US20120189778A1 (en) * | 2011-01-26 | 2012-07-26 | Riewe Curtis H | Coating method using ionic liquid |
CN102888630B (en) * | 2011-07-20 | 2015-11-18 | 中国科学院过程工程研究所 | A kind of ionic liquid/additive system Low-temperature electro-deposition prepares the method for nano aluminum or nano aluminum coating |
US9758884B2 (en) * | 2012-02-16 | 2017-09-12 | Stacey Hingley | Color control of trivalent chromium deposits |
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US10669851B2 (en) | 2013-12-10 | 2020-06-02 | Raytheon Technologies Corporation | Nickel-chromium-aluminum composite by electrodeposition |
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DE602008004255D1 (en) | 2011-02-10 |
CA2695488A1 (en) | 2009-02-05 |
EP2171131B1 (en) | 2010-12-29 |
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