TW200702498A - Method for electrodeposition of bronzes - Google Patents

Method for electrodeposition of bronzes

Info

Publication number
TW200702498A
TW200702498A TW095113445A TW95113445A TW200702498A TW 200702498 A TW200702498 A TW 200702498A TW 095113445 A TW095113445 A TW 095113445A TW 95113445 A TW95113445 A TW 95113445A TW 200702498 A TW200702498 A TW 200702498A
Authority
TW
Taiwan
Prior art keywords
bronzes
electrodeposition
electrolyte
acid
plated
Prior art date
Application number
TW095113445A
Other languages
Chinese (zh)
Other versions
TWI391534B (en
Inventor
Katrin Zschintzsch
Joachim Heyer
Marlies Kleinfeld
Stefan Schafer
Ortrud Steinius
Original Assignee
Enthone
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enthone filed Critical Enthone
Publication of TW200702498A publication Critical patent/TW200702498A/en
Application granted granted Critical
Publication of TWI391534B publication Critical patent/TWI391534B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin

Abstract

A method for electrodeposition of bronzes, with which the substrate to be coated is plated in an acid electrolyte that contains at least tin and copper ions, an alkylsulfonic acid and a wetting agent, and the preparation of such an electrolyte.
TW095113445A 2005-04-14 2006-04-14 Method for electrodeposition of bronzes TWI391534B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/105,947 US20060260948A2 (en) 2005-04-14 2005-04-14 Method for electrodeposition of bronzes

Publications (2)

Publication Number Publication Date
TW200702498A true TW200702498A (en) 2007-01-16
TWI391534B TWI391534B (en) 2013-04-01

Family

ID=37115474

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095113445A TWI391534B (en) 2005-04-14 2006-04-14 Method for electrodeposition of bronzes

Country Status (7)

Country Link
US (1) US20060260948A2 (en)
EP (1) EP1874982B1 (en)
JP (1) JP2008537017A (en)
KR (1) KR101361431B1 (en)
CN (1) CN101194049B (en)
TW (1) TWI391534B (en)
WO (1) WO2006113473A1 (en)

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ES2531163T3 (en) * 2002-10-11 2015-03-11 Enthone Procedure and electrolyte for galvanic deposition of bronzes
DE102004041701A1 (en) * 2004-08-28 2006-03-02 Enthone Inc., West Haven Process for the electrolytic deposition of metals
US7296370B2 (en) * 2004-09-24 2007-11-20 Jarden Zinc Products, Inc. Electroplated metals with silvery-white appearance and method of making
US9263609B2 (en) * 2006-05-24 2016-02-16 Atotech Deutschland Gmbh Metal plating composition and method for the deposition of copper—zinc—tin suitable for manufacturing thin film solar cell
DE102011008836B4 (en) * 2010-08-17 2013-01-10 Umicore Galvanotechnik Gmbh Electrolyte and method for depositing copper-tin alloy layers
US8426241B2 (en) 2010-09-09 2013-04-23 International Business Machines Corporation Structure and method of fabricating a CZTS photovoltaic device by electrodeposition
CN102605394B (en) * 2012-03-07 2015-02-18 深圳市华傲创表面技术有限公司 Cyanogen-free acidic cupronickel-tin plating solution
JP6101510B2 (en) * 2013-02-18 2017-03-22 株式会社シミズ Non-cyanide copper-tin alloy plating bath
US8945978B2 (en) * 2013-06-28 2015-02-03 Sunpower Corporation Formation of metal structures in solar cells
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US20160298249A1 (en) * 2014-09-30 2016-10-13 Rohm And Haas Electronic Materials Llc Cyanide-free electroplating baths for white bronze based on copper (i) ions
ES2886846T3 (en) 2014-12-05 2021-12-21 Honeywell Int Inc High performance thermal interface materials with low thermal impedance
KR102426521B1 (en) * 2015-04-20 2022-07-27 아토테크 도이칠란트 게엠베하 운트 콤파니 카게 Electrolytic copper plating bath compositions and a method for their use
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KR102554661B1 (en) 2016-03-08 2023-07-13 허니웰 인터내셔널 인코포레이티드 phase change material
US10501671B2 (en) 2016-07-26 2019-12-10 Honeywell International Inc. Gel-type thermal interface material
US11041103B2 (en) 2017-09-08 2021-06-22 Honeywell International Inc. Silicone-free thermal gel
US10428256B2 (en) 2017-10-23 2019-10-01 Honeywell International Inc. Releasable thermal gel
CN108103540B (en) * 2018-01-24 2020-01-07 永星化工(上海)有限公司 Tin alloy electroplating solution
US11072706B2 (en) 2018-02-15 2021-07-27 Honeywell International Inc. Gel-type thermal interface material
WO2020021965A1 (en) * 2018-07-27 2020-01-30 三菱マテリアル株式会社 Tin alloy plating solution
JP6645609B2 (en) 2018-07-27 2020-02-14 三菱マテリアル株式会社 Tin alloy plating solution
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Also Published As

Publication number Publication date
EP1874982A1 (en) 2008-01-09
KR20070120600A (en) 2007-12-24
JP2008537017A (en) 2008-09-11
EP1874982A4 (en) 2011-07-27
KR101361431B1 (en) 2014-02-10
US20060260948A2 (en) 2006-11-23
TWI391534B (en) 2013-04-01
CN101194049A (en) 2008-06-04
WO2006113473A1 (en) 2006-10-26
CN101194049B (en) 2011-12-07
EP1874982B1 (en) 2014-05-07
US20050263403A1 (en) 2005-12-01

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