ES2142506T3 - Fotoiniciadores funcionalizados, derivados y macromeros de los mismos y su uso. - Google Patents
Fotoiniciadores funcionalizados, derivados y macromeros de los mismos y su uso.Info
- Publication number
- ES2142506T3 ES2142506T3 ES95942692T ES95942692T ES2142506T3 ES 2142506 T3 ES2142506 T3 ES 2142506T3 ES 95942692 T ES95942692 T ES 95942692T ES 95942692 T ES95942692 T ES 95942692T ES 2142506 T3 ES2142506 T3 ES 2142506T3
- Authority
- ES
- Spain
- Prior art keywords
- functionalized
- aminoacetophenones
- macromeros
- derivatives
- photoinitiators
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003999 initiator Substances 0.000 title 1
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical class NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 abstract 4
- 125000005442 diisocyanate group Chemical group 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/20—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by nitrogen atoms not being part of nitro or nitroso groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/24—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a ring other than a six-membered aromatic ring
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
- C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
- C08F283/124—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes on to polysiloxanes having carbon-to-carbon double bonds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/04—Polymers provided for in subclasses C08C or C08F
- C08F290/042—Polymers of hydrocarbons as defined in group C08F10/00
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
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- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/50—Polyethers having heteroatoms other than oxygen
- C08G18/5003—Polyethers having heteroatoms other than oxygen having halogens
- C08G18/5015—Polyethers having heteroatoms other than oxygen having halogens having fluorine atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
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- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/50—Polyethers having heteroatoms other than oxygen
- C08G18/5021—Polyethers having heteroatoms other than oxygen having nitrogen
- C08G18/5024—Polyethers having heteroatoms other than oxygen having nitrogen containing primary and/or secondary amino groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/61—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/64—Macromolecular compounds not provided for by groups C08G18/42 - C08G18/63
- C08G18/6415—Macromolecular compounds not provided for by groups C08G18/42 - C08G18/63 having nitrogen
- C08G18/6446—Proteins and derivatives thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
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- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/80—Masked polyisocyanates
- C08G18/8061—Masked polyisocyanates masked with compounds having only one group containing active hydrogen
- C08G18/807—Masked polyisocyanates masked with compounds having only one group containing active hydrogen with nitrogen containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
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- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8166—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with unsaturated monofunctional alcohols or amines
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/041—Lenses
- G02B1/043—Contact lenses
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
Abstract
LA PRESENTE INVENCION SE REFIERE A AL - AMINOACETOFENONAS FUNCIONALIZADAS CON DIISOCIANATOS ORGANICOS QUE TIENEN LA ESTRUCTURA GENERAL (I) Y QUE PUEDEN SER UTILIZADOS COMO FOTOINICIADORES REACTIVOS; A OLIGOMEROS Y POLIMEROS A LOS CUALES ESTAN UNIDAS DICHAS {AL} - AMINOACETOFENONAS FUNCIONALIZADAS; A {AL} - AMINOACETOFENONAS QUE PRESENTAN UNA CADENA LATERAL INSATURADA POLIMERIZABLE; A FOTOINICIADORES DIMEROS Y TRIMEROS; A LA UTILIZACION DE DICHOS FOTOINICIADORES; A MATERIALES REVESTIDOS CON DICHOS FOTOINICIADORES; Y A LA UTILIZACION DE {AL} - AMINOAETOFENONAS FUNCIONALIZADAS PARA MODIFICAR SUPERFICIES. EN LA CITADA ESTRUCTURA (I) X ES - O - BIVALENTE, - NH -, - S -, ALQUILENO INFERIOR O (A); Y ES UN ENLACE DIRECTO O - O (CH{SUB,2}){SUB,N}, DONDE N ES UN ENTERO ENTRE 1 Y 6 Y CUYO GRUPO TERMINAL CH{SUB,2} ESTA UNIDO AL GRUPO X ADYACENTE EN LA FORMULA (I); R ES H, C{SUB,1} - C{SUB,12} ALQUILO, C{SUB,1} - C{SUB,12} ALCOXI, C{SUB,1} - C{SUB,12} ALQUILNH O - NR{SUB,1A}R{SUB,1B}, DONDE R{SUB,1A} ESALQUILO INFERIOR Y R{SUB,1B} ES H O ALQUILO INFERIOR; R{SUB,1} ES ALQUILO INFERIOR LINEAL O RAMIFICADO, ALQUENILO INFERIOR O ARIL - ALQUILO INFERIOR; R{SUB,2}, INDEPENDIENTEMENTE DE R{SUB,1}, TIENE EL MISMO SIGNIFICADO QUE R{SUB,1} O ES ARILO, O R{SUB,1} Y R{SUB,2} JUNTOS SON (CH{SUB,2}){SUB,M} -, DONDE M ES UN ENTERO ENTRE 2 Y 6; R{SUB,3} Y R{SUB,4} SON, INDEPENDIENTEMENTE, ALQUILO INFERIOR LINEAL O RAMIFICADO QUE PUEDE ESTAR SUSTITUIDO CON C{SUB,1} - C{SUB,4} ALCOXI O ARIL - ALQUILO INFERIOR O ALQUENILO INFERIOR; O R{SUB,3} Y R{SUB,4} JUNTOS SON - (CH{SUB,2}){SUB,Z} - Y{SUB,1} (CH{SUB,2}){SUB,Z} -, DONDE Y{SUB,1} ES UN ENLACE DIRECTO, - O , - S - O - NR{SUB,1B} - Y R{SUB,1B} ES H O ALQUILO INFERIOR Y Z ES, INDEPENDIENTEMENTE, UN ENTERO ENTRE 2 Y 4; R{SUB,5} ES C{SUB,3} - C{SUB,18} ALQUILENO LINEAL O RAMIFICADO, C{SUB,6} C{SUB,10} ARILENO SIN SUSTITUIR O SUSTITUIDO CON C{SUB,1} C{SUB,4} ALQUILO O C{SUB,1} - C{SUB,4} ALCOXI, O C{SUB,7} C{SUB,18} ARALQUILENO SUSTITUIDO CON C{SUB,1} - C{SUB,4} ALQUILO, CON C{SUB,1} - C{SUB,4} ALCOXI O SIN SUSTITUIR, C{SUB,13} C{SUB,24} ARILENALQUILENARILENO SUSTITUIDO CON C{SUB,1} C{SUB,4} ALQUILO, CON C{SUB,1} - C{SUB,4} ALCOXI O SIN SUSTITUIR, C{SUB,3} - C{SUB,8} CICLOALQUILENO SUSTITUIDO CON C{SUB,1} C{SUB,4} ALQUILO, C{SUB,1} - C{SUB,4} ALCOXI O SIN SUSTITUIR, C{SUB,3} - C{SUB,8} CICLOALQUILEN - C{SUB,Y}H{SUB,2Y} SUSTITUIDO CON C{SUB,1} - C{SUB,4} ALQUILO, CON C{SUB,1} C{SUB,4} ALCOXI O SIN SUSTITUIR O -C{SUB,Y}H{SUB,2Y} C{SUB,Y}H{SUB,2Y} - SUSTITUIDO CON C{SUB,1} - C{SUB,4} ALQUILO, CON C{SUB,1} - C{SUB,4} ALCOXI O SIN SUSTITUIR, DONDE Y ES UN ENTERO ENTRE 1 Y 6; Y D ES UN GRUPO ISOCIANATO.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH396894 | 1994-12-30 |
Publications (1)
Publication Number | Publication Date |
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ES2142506T3 true ES2142506T3 (es) | 2000-04-16 |
Family
ID=4267327
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES95942692T Expired - Lifetime ES2142506T3 (es) | 1994-12-30 | 1995-12-18 | Fotoiniciadores funcionalizados, derivados y macromeros de los mismos y su uso. |
Country Status (21)
Country | Link |
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US (1) | US6204306B1 (es) |
EP (1) | EP0800511B1 (es) |
JP (1) | JPH10512856A (es) |
KR (1) | KR980700964A (es) |
CN (1) | CN1174547A (es) |
AT (1) | ATE189210T1 (es) |
AU (1) | AU700575B2 (es) |
BR (1) | BR9510177A (es) |
CA (1) | CA2208664A1 (es) |
DE (1) | DE69514835T2 (es) |
DK (1) | DK0800511T3 (es) |
ES (1) | ES2142506T3 (es) |
FI (1) | FI972698A (es) |
GR (1) | GR3032930T3 (es) |
IL (1) | IL116488A0 (es) |
MX (1) | MX9704918A (es) |
NO (1) | NO973021L (es) |
PT (1) | PT800511E (es) |
TW (1) | TW434456B (es) |
WO (1) | WO1996020919A1 (es) |
ZA (1) | ZA9511002B (es) |
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CN110996848B (zh) | 2017-05-30 | 2023-08-04 | 施菲姆德控股有限责任公司 | 调节性人工晶状体的表面处理以及相关方法和装置 |
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US4234399A (en) * | 1978-10-13 | 1980-11-18 | Lord Corporation | Radiation curable compositions containing acyloin urethane compounds |
EP0088050B1 (de) | 1982-02-26 | 1986-09-03 | Ciba-Geigy Ag | Photohärtbare gefärbte Massen |
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-
1995
- 1995-02-08 TW TW084101034A patent/TW434456B/zh active
- 1995-12-18 DE DE69514835T patent/DE69514835T2/de not_active Expired - Fee Related
- 1995-12-18 CN CN95197513A patent/CN1174547A/zh active Pending
- 1995-12-18 AT AT95942692T patent/ATE189210T1/de not_active IP Right Cessation
- 1995-12-18 DK DK95942692T patent/DK0800511T3/da active
- 1995-12-18 JP JP8520701A patent/JPH10512856A/ja not_active Ceased
- 1995-12-18 BR BR9510177A patent/BR9510177A/pt not_active Application Discontinuation
- 1995-12-18 EP EP95942692A patent/EP0800511B1/en not_active Expired - Lifetime
- 1995-12-18 PT PT95942692T patent/PT800511E/pt unknown
- 1995-12-18 ES ES95942692T patent/ES2142506T3/es not_active Expired - Lifetime
- 1995-12-18 MX MX9704918A patent/MX9704918A/es not_active Application Discontinuation
- 1995-12-18 KR KR1019970704599A patent/KR980700964A/ko not_active Application Discontinuation
- 1995-12-18 AU AU43873/96A patent/AU700575B2/en not_active Ceased
- 1995-12-18 WO PCT/EP1995/005012 patent/WO1996020919A1/en not_active Application Discontinuation
- 1995-12-18 CA CA002208664A patent/CA2208664A1/en not_active Abandoned
- 1995-12-18 US US08/860,131 patent/US6204306B1/en not_active Expired - Lifetime
- 1995-12-21 IL IL11648895A patent/IL116488A0/xx unknown
- 1995-12-28 ZA ZA9511002A patent/ZA9511002B/xx unknown
-
1997
- 1997-06-23 FI FI972698A patent/FI972698A/fi unknown
- 1997-06-27 NO NO973021A patent/NO973021L/no unknown
-
2000
- 2000-03-10 GR GR20000400626T patent/GR3032930T3/el not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW434456B (en) | 2001-05-16 |
NO973021L (no) | 1997-09-01 |
JPH10512856A (ja) | 1998-12-08 |
US6204306B1 (en) | 2001-03-20 |
ZA9511002B (en) | 1996-07-01 |
MX9704918A (es) | 1997-10-31 |
PT800511E (pt) | 2000-07-31 |
DK0800511T3 (da) | 2000-06-19 |
EP0800511A1 (en) | 1997-10-15 |
CA2208664A1 (en) | 1996-07-11 |
GR3032930T3 (en) | 2000-07-31 |
FI972698A (fi) | 1997-08-25 |
BR9510177A (pt) | 1997-12-23 |
FI972698A0 (fi) | 1997-06-23 |
ATE189210T1 (de) | 2000-02-15 |
WO1996020919A1 (en) | 1996-07-11 |
DE69514835D1 (de) | 2000-03-02 |
CN1174547A (zh) | 1998-02-25 |
AU700575B2 (en) | 1999-01-07 |
NO973021D0 (no) | 1997-06-27 |
IL116488A0 (en) | 1996-03-31 |
EP0800511B1 (en) | 2000-01-26 |
DE69514835T2 (de) | 2000-08-17 |
AU4387396A (en) | 1996-07-24 |
KR980700964A (ko) | 1998-04-30 |
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