ES2056552T3 - Calentamiento de substratos con descarga de arco de baja tension y campo magnetico variable. - Google Patents

Calentamiento de substratos con descarga de arco de baja tension y campo magnetico variable.

Info

Publication number
ES2056552T3
ES2056552T3 ES91117606T ES91117606T ES2056552T3 ES 2056552 T3 ES2056552 T3 ES 2056552T3 ES 91117606 T ES91117606 T ES 91117606T ES 91117606 T ES91117606 T ES 91117606T ES 2056552 T3 ES2056552 T3 ES 2056552T3
Authority
ES
Spain
Prior art keywords
magnetic field
arc discharge
voltage arc
low voltage
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91117606T
Other languages
English (en)
Inventor
Helmut Dr Kaufmann
Roland Dr Schmid
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Application granted granted Critical
Publication of ES2056552T3 publication Critical patent/ES2056552T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B7/00—Heating by electric discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Discharge Heating (AREA)
  • Plasma Technology (AREA)

Abstract

PARA CALENTAR UN SUSTRATO DE CALOR (3) RESP. UNIFORMEMENTE DE UN SUSTRATO RECUBIERTO EN UNA CAMARA DE VACIO (1) EN UN RECIPIENTE MEDIANTE DESCARGA ELECTRICA RESP. DE ALTO VACIO O DESCARGA POR ARCO DE BAJA TENSION, SE PROPONE QUE EN LA CAMARA DE VACIO, RESP. EN EL RECIPIENTE SE MANTENGA AL MENOS DURANTE EL CALENTAMIENTO UN CAMPO MAGNETICO LOCAL VARIABLE Y/O DESPLAZABLE. PREFERENTEMENTE SE MANTIENEN AL MENOS EN PARTE, DOS CAMPOS MAGNETICOS SOLAPADOS, QUE ALTERNANDO, SON ACTIVADOS DE FORMA FUERTE O DEBIL, PARA DE ESTA FORMA QUE LA DENSIDAD DE CORRIENTE EN LA CAMARA DE VACIO RESP. EN EL RECIPIENTE SEA LOCALMENTE AFECTADA, Y POR ELLO, A LO LARGO DEL SUSTRATO, SE PRODUCE EN LA CARGA DE CALOR DE FORMA ALTERNANDO UN CALENTAMIENTO FUERTE O DEBIL.
ES91117606T 1990-11-05 1991-10-16 Calentamiento de substratos con descarga de arco de baja tension y campo magnetico variable. Expired - Lifetime ES2056552T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4035131A DE4035131C2 (de) 1990-11-05 1990-11-05 Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer

Publications (1)

Publication Number Publication Date
ES2056552T3 true ES2056552T3 (es) 1994-10-01

Family

ID=6417661

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91117606T Expired - Lifetime ES2056552T3 (es) 1990-11-05 1991-10-16 Calentamiento de substratos con descarga de arco de baja tension y campo magnetico variable.

Country Status (6)

Country Link
EP (1) EP0484704B1 (es)
JP (1) JP3302710B2 (es)
KR (1) KR100246490B1 (es)
AT (1) ATE108836T1 (es)
DE (2) DE4035131C2 (es)
ES (1) ES2056552T3 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
DE4437269C1 (de) * 1994-10-18 1996-02-22 Balzers Hochvakuum Verfahren zum Reinigen einer Werkstückoberfläche und seine Verwendung
DE19500262C1 (de) * 1995-01-06 1995-09-28 Metaplas Oberflaechenveredelun Verfahren zur Plasmabehandlung von Werkstücken
DE19521548A1 (de) * 1995-06-13 1996-12-19 Ipsen Ind Int Gmbh Verfahren und Vorrichtung zur Steuerung der elektrischen Stromdichte über einem Werkstück bei der Wärmebehandlung im Plasma
DE19725930C2 (de) * 1997-06-16 2002-07-18 Eberhard Moll Gmbh Dr Verfahren und Anlage zum Behandeln von Substraten mittels Ionen aus einer Niedervoltbogenentladung
DE10018143C5 (de) * 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1175374B (de) * 1960-01-04 1964-08-06 Nat Res Dev Lichtbogenbrenner
US3210454A (en) * 1962-05-17 1965-10-05 Alloyd Electronics Corp High temperature apparatus
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
CH645137A5 (de) * 1981-03-13 1984-09-14 Balzers Hochvakuum Verfahren und vorrichtung zum verdampfen von material unter vakuum.
CH658545A5 (de) * 1982-09-10 1986-11-14 Balzers Hochvakuum Verfahren zum gleichmaessigen erwaermen von heizgut in einem vakuumrezipienten.
DE3829260A1 (de) * 1988-08-29 1990-03-01 Multi Arc Gmbh Plasmabeschichtungskammer mit entfernbarem schutzschirm

Also Published As

Publication number Publication date
EP0484704A1 (de) 1992-05-13
ATE108836T1 (de) 1994-08-15
KR920011295A (ko) 1992-06-27
DE59102249D1 (de) 1994-08-25
JP3302710B2 (ja) 2002-07-15
DE4035131C2 (de) 1995-09-21
JPH04289160A (ja) 1992-10-14
DE4035131A1 (de) 1992-05-07
EP0484704B1 (de) 1994-07-20
KR100246490B1 (ko) 2000-04-01

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