EP3891317A1 - Verfahren zur herstellung eines metall-keramik-substrats, lötsystem und metall-keramik-substrat, hergestellt mit einem solchen verfahren - Google Patents

Verfahren zur herstellung eines metall-keramik-substrats, lötsystem und metall-keramik-substrat, hergestellt mit einem solchen verfahren

Info

Publication number
EP3891317A1
EP3891317A1 EP20789875.0A EP20789875A EP3891317A1 EP 3891317 A1 EP3891317 A1 EP 3891317A1 EP 20789875 A EP20789875 A EP 20789875A EP 3891317 A1 EP3891317 A1 EP 3891317A1
Authority
EP
European Patent Office
Prior art keywords
layer
soldering
metal layer
solder
ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20789875.0A
Other languages
German (de)
English (en)
French (fr)
Inventor
Karsten Schmidt
Andreas Meyer
Stefan Britting
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rogers Germany GmbH
Original Assignee
Rogers Germany GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rogers Germany GmbH filed Critical Rogers Germany GmbH
Publication of EP3891317A1 publication Critical patent/EP3891317A1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24—Selection of soldering or welding materials proper
    • B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
    • B23K35/302—Cu as the principal constituent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
    • B23K1/0016—Brazing of electronic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24—Selection of soldering or welding materials proper
    • B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
    • B23K35/3006—Ag as the principal constituent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/34—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material comprising compounds which yield metals when heated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C04B37/023—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C04B37/023—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used
    • C04B37/026—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used consisting of metals or metal salts
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/06—Alloys based on silver
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/06—Alloys based on silver
    • C22C5/08—Alloys based on silver with copper as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • C22C9/02—Alloys based on copper with tin as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54—Contact plating, i.e. electroless electrochemical plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/11—Printed elements for providing electric connections to or between printed circuits
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/38—Conductors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/08—Non-ferrous metals or alloys
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/16—Composite materials, e.g. fibre reinforced
    • B23K2103/166—Multilayered materials
    • B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/18—Dissimilar materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/52—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658—Atmosphere during thermal treatment
    • C04B2235/6581—Total pressure below 1 atmosphere, e.g. vacuum
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    • C04B2237/066—Oxidic interlayers based on rare earth oxides
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    • C04B2237/404—Manganese or rhenium
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/40—Metallic
    • C04B2237/407—Copper
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/52—Pre-treatment of the joining surfaces, e.g. cleaning, machining
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/55—Pre-treatments of a coated or not coated substrate other than oxidation treatment in order to form an active joining layer
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/70—Forming laminates or joined articles comprising layers of a specific, unusual thickness
    • C04B2237/706—Forming laminates or joined articles comprising layers of a specific, unusual thickness of one or more of the metallic layers or articles
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/70—Forming laminates or joined articles comprising layers of a specific, unusual thickness
    • C04B2237/708—Forming laminates or joined articles comprising layers of a specific, unusual thickness of one or more of the interlayers
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/72—Forming laminates or joined articles comprising at least two interlayers directly next to each other

Definitions

  • the present invention relates to a method for producing a metal-ceramic substrate, a soldering system for such a method and a metal-ceramic substrate produced using such a method.
  • Metal-ceramic substrates are, for example, sufficiently known as printed circuit boards or circuit boards from the prior art, for example from DE 102013 104739 A1, DE 19927046 B4 and DE 102009033029 A1.
  • connection surfaces for electrical components and conductor tracks are arranged on one component side of the metal-ceramic substrate, wherein the electrical components and the conductor tracks can be interconnected to form electrical circuits.
  • Essential components of the metal-ceramic substrates are an insulation layer, which is preferably made of a ceramic, and at least one metal layer attached to the insulation layer. Because of their comparatively high insulation strengths, insulation layers made of ceramics have proven to be particularly advantageous in power electronics. By structuring the metal layer, conductor tracks and / or connection surfaces for the electrical components can then be implemented.
  • a prerequisite for providing such a metal-ceramic substrate is a permanent connection of the metal layer to the ceramic layer.
  • a so-called direct connection process ie DCB or DAB process
  • This active metal which is for example at least one element from the group Hf, Ti, Zr, Nb, Ce, creates a connection between the solder and the ceramic by chemical reaction, while the connection between the solder and the metal is a metallic brazed connection .
  • EP 3 041 042 A1 and WO 2017/126653 A1 disclose, for example, methods for producing a power module substrate using an active solder material.
  • a connection of a copper foil to a ceramic layer takes place via a multilayer soldering system.
  • This multilayer system consists of a layer made of a titanium foil and a layer made of a phosphorus-containing solder filler material.
  • the present invention makes the task of connecting the metal layer to the ceramic layer using a soldering system that is improved over the prior art, in particular with regard to the metal layer and the ceramic
  • the soldering layer connecting the micro-layer and the connection process during active soldering.
  • a method for producing a metal-ceramic substrate comprising:
  • a multilayer soldering system of at least one soldering layer, preferably free of schmelzablyrniedri lowing elements, and at least one active metal layer is provided according to the invention.
  • the separation of the at least one active metal layer and the at least one solder layer proves to be particularly advantageous because it enables comparatively thin solder layers to be realized, especially when the solder layer is a foil. Otherwise, for soldering materials containing active metals, comparatively large soldering layer thicknesses have to be used because of the brittle intermetallic phases that hinder the deformation of the soldering paste or soldering layer.
  • the minimum layer thickness is limited by the manufacturing properties of the active metal-containing soldering material. Accordingly, for active metal-containing solder layers, it is not the minimum thickness required for the joining process, the minimum solder layer thickness of the solder layer, but the minimum solder layer thickness of the solder layer that determines the minimum solder layer thickness for the technically feasible minimum layer thickness of the solder layer. As a result, this thicker, active metal-containing solder layer is more expensive than thin layers.
  • the soldering layer thickness of the at least one soldering layer can advantageously be reduced.
  • material for the soldering system or for the at least one soldering layer can be saved.
  • active metal-free solder layers can also be rolled down to thicknesses less than 10 ⁇ m, preferably less than 7 ⁇ m.
  • Another advantage is that the etching of the structuring on the manufactured metal-ceramic substrate is simplified, in particular because a second thickness of the soldering system or the at least one soldering layer is reduced.
  • the connection of the metal layer to the ceramic layer can be accelerated in the manufacturing process.
  • soldering layer that is free of elements with a lower melting point
  • a layer that contains less than 3% by weight, preferably less than 2% by weight and particularly preferably less than 1% by weight of this melting point lower has lowing elements.
  • these elements that lower the melting point are phosphorus and zinc.
  • the use of phosphorus-free soldering materials allows, for example, the advantageous separation of the active metal layer and soldering layers, even for those soldering layers that are free of phosphorus, but contain a melting point lowering material, the integration of which in the soldering layer in turn leads to a lowering of the melting point that is not as significant as it is known for phosphorus.
  • it is a material which lowers the melting point and lowers the melting point of the solder layer by less than 100.degree. C., preferably less than 80.degree. C. and particularly preferably less than 50.degree.
  • the at least one solder layer is free of an active metal.
  • the person skilled in the art understands, free of active metal, that the solder layer has less than 5% by weight, preferably less than 3% by weight and particularly preferably less than 1.5% by weight of active metal.
  • an active metal are titanium (Ti), zirconium (Zr), hafnium (Hf), chromium (Cr), niobium (Nb), cerium (Ce) and vanadium (V).
  • the at least one solder layer is provided as a film. This allows the foil to be handled as simply as possible when it is arranged between the at least one ceramic layer and the at least one metal layer, in particular in the series production of metal-ceramic substrates.
  • the at least one solder layer is already provided with a metal layer or the at least one metal layer.
  • the at least one solder layer is attached to one side of the at least one metal layer that is used for producing the metal-ceramic substrate.
  • the at least one metal layer serves as a carrier for the at least one solder layer.
  • the at least one soldering layer is provided on a film, for example on a plastic film, which forms the carrier.
  • the at least one solder layer is provided on the at least one metal layer and the at least one further metal layer, preferably with a different grain size distribution or a different average grain size, is applied to the side of the at least one metal layer facing away from the solder layer, which preferably carries the at least one solder layer.
  • the grain sizes, in particular their average grain sizes, of the at least one metal layer and the at least one further metal layer differ from one another, so that a two-layer metallization layer is formed on the top of the ceramic in the course of the connection process.
  • the metal layer with the smaller average grain size is on the outside and the metal layer with the comparatively larger grain size on average faces the soldering system or the ceramic layer.
  • the at least one active metal layer can optionally be applied to the at least one ceramic layer and / or the at least one metal layer and / or the at least one soldering layer.
  • the at least one active metal layer is preferably applied to at least two of the layers mentioned.
  • the at least one active metal layer is preferably arranged on the at least one ceramic layer or on at least one metal layer on that side which, in the angeord Neten state or in the metal-ceramic substrate, faces the at least one soldering layer. It is particularly preferred if the at least one active metal layer is applied to the at least one soldering layer.
  • a soldering system can be provided from the at least one solder layer with the at least one active metal layer, which can be easily arranged between the at least one ceramic layer and the at least one metal layer for the active soldering process.
  • the connection process is an active soldering process that is carried out at a process temperature between 600 ° C and 1000 ° C, preferably between 700 ° C and 950 ° C.
  • the solder material of the at least one solder layer is preferably a silver-based or a copper-based solder material. In a silver-based solder material, silver is the main component, ie the component with the highest percentage in terms of weight, while copper is the main component in a copper-based solder material.
  • Examples of a silver-based solder material are AgCu, in particular AgCu28, AgCuln, AgCuSn and AgCuGa.
  • Examples of a copper-based solder material are copper CuSn, Culn, CuGa, CulnSn, Culn Mn, CuGaSn. It is also conceivable to use NiCrMn as the soldering material.
  • the solder layer is silver-free, ie the solder layer comprises less than 3% by weight of silver, preferably less than 2% by weight of silver and particularly preferably less than 1% by weight of silver.
  • the soldering layer or the soldering material of the soldering layer comprises several components and / or is silver-free.
  • the brazing material does not consist of a single chemical element.
  • the solder layer is not exclusively made of silver.
  • the solder layer comprises at least two different components or constituents. This advantageously makes it possible to further optimize the connection behavior, for example with regard to adhesive strength and resistance to temperature changes. For example, you are not bound to the use of a pure silver layer, the silver migration and etching behavior of which have a detrimental effect on the manufactured metal-ceramic substrate.
  • Further examples of materials that form the solder layer as soldering material are: CuNi and CuNiMn, in particular up to a working temperature of the solder 1050 ° C. Pure silver is also conceivable.
  • Conceivable materials for the at least one metal layer are copper, aluminum, molybdenum and / or their alloys, as well as laminates and powder metallurgical compound materials such as CuW, CuMo, CuAI, AICu and / or CuCu, in particular a copper sandwich structure with a first copper layer and a second copper layer, a grain size in the first copper layer differing from a second copper layer. Furthermore, it is preferably provided that the at least one metal layer is surface-modified. Sealing with a precious metal, in particular silver and / or gold, or ENIG (“electroless nicket immersion gold”) or edge potting on the first or second metallization layer to suppress cracking or widening is conceivable as a surface modification.
  • ENIG electroless nicket immersion gold
  • SiC SiC
  • BeO MgO
  • MgO high-density MgO (> 90% of the theoretical density)
  • TSZ tetragonally stabilized zirconium oxide
  • the insulation layer is designed as a composite or hybrid ceramic, in which several ceramic layers, each of which differ in terms of their material composition, are arranged on top of one another and joined together to form an insulation layer in order to combine various desired properties.
  • a highly thermally conductive ceramic is preferably used for the lowest possible heat resistance.
  • the at least one active metal layer is applied by means of a gas phase deposition method, in particular a physical gas phase deposition method (PVD), or by means of chemical gas phase deposition (CVD).
  • a gas phase deposition method in particular a physical gas phase deposition method (PVD), or by means of chemical gas phase deposition (CVD).
  • PVD physical gas phase deposition method
  • CVD chemical gas phase deposition
  • a first thickness of the at least one active metal layer advantageously has a value between 100 nm and 1000 nm, preferably between 150 nm and 750 nm and particularly preferably between 200 nm and 500 nm.
  • Such thin active metal layers advantageously prevent the reduction in thermal conductivity and the reduction in mechanical strength of the metal-ceramic substrate, in particular at the interface between the at least one ceramic layer and the at least one metal layer.
  • the layer thickness is particularly preferably coordinated with the expected storage time. For example, for long storage times, for example of more than 10 days, in particular for titanium as the active metal layer, it has proven advantageous to use a layer thickness between 750 and 1000 nm. For shorter storage times it is possible to use a first thickness of 150 nm to 350 nm.
  • the active soldering process is carried out at a pressure of less than 10 -2 mbar, preferably less than 10 -3 and particularly preferably less than 10 4 and / or using process gas.
  • the active soldering process is carried out in a high vacuum or in a medium vacuum with very low oxygen and argon partial pressure of less than 1 mbar.
  • a second thickness of the at least one solder layer has a value between 1 and 100 ⁇ m, preferably between 1.5 and 50 ⁇ m and particularly preferably between 2 and 20 ⁇ m or even less than 10 ⁇ m. In particular, this is the second thickness before Connection process, ie the active soldering process. It is particularly preferred that the at least one solder layer is further reduced before the connection process, for example by rolling to a thickness of less than 10 ⁇ m, preferably to a thickness of less than 7 ⁇ m and particularly preferably to a thickness of less than 5 pm. As a result, a layer thickness of the soldering material or of the at least one soldering layer can advantageously be further reduced.
  • the at least one soldering layer is reduced in terms of its layer thickness by means of roll cladding before being arranged between the at least one ceramic layer and the at least one metal layer.
  • a thinner at least one solder layer can be implemented in advance before it is reduced in a further solder layer step to the final layer thickness intended for the connection process - for example by means of rollers.
  • a ratio of a first thickness of the active metal layer to a second thickness of the soldering layer assumes a value between 0.003 and 0.5, preferably between 0.015 and 0.2 and particularly preferably between 0.03 and 0.14.
  • the second thickness of the solder layer is significantly greater than the first thickness of the active metal layer.
  • the at least one active metal layer is covered by at least one protective layer.
  • this at least one protective layer it is advantageously possible to prevent oxidation of the at least one active metal layer.
  • copper (Cu), nickel (Ni), indium (In), silver (Ag), chromium (Cr) or titanium nitride (TiN) can be used as the protective layer for the at least one active metal layer.
  • the thickness of the at least one protective layer has a value of at least 100 nm.
  • the thickness of the at least one protective layer is adapted to the storage time, ie the time that elapses between the application of the at least one active metal layer and the actual bonding process as part of the active soldering process.
  • This allows the permanent storage of with in an advantageous manner at least one active metal layer covered components (be it the at least one metal layer and / or the at least one active metal layer and / or the at least one soldering layer), without the at least one active metal layer already oxidizing in advance of the bonding process.
  • the layer thickness of the at least one protective layer is between 100 nm or 50 nm and 1000 nm, preferably between 150 nm and 750 nm and particularly preferably between 250 nm and 500 nm thick.
  • a ratio of the third thickness of the at least one protective layer to the first thickness of the at least one active metal layer, measured in the stacking direction has a value between 0.5 and 1, preferably between 0.7 and 0.9 and particularly preferably assumes between 0.75 and 0.85.
  • the at least one active metal layer changes its composition in the stacking direction. This also advantageously prevents premature oxidation of the active metal layer, in particular by increasing the distance from the surface to which the active metal has been applied (be it the at least one metal layer, the at least one ceramic layer or the at least one solder layer) , a part of deposit elements, such as nitrogen, oxygen or carbon, increases. It is also conceivable that to extend the storage times of the component provided with the at least one active metal layer or the component provided with the at least one active metal layer, be it the at least one metal layer, the at least one ceramic layer and / or the at least one solder layer, the at least one active metal layer is covered with at least one further solder layer.
  • a thickness of the at least one further solder layer is at least a factor of 0.1, preferably 0.05 and particularly preferably 0.01 thinner than the second thickness of the at least one solder layer.
  • the soldering system advantageously forms a sandwich structure in which the at least one active metal layer is sheathed or surrounded by the at least one solder layer and the at least one further solder layer. It is preferably provided that the at least one solder layer and / or the at least one active metal layer is rolled, preferably in such a way that a first thickness of the active metal layer after rolling and / or pressing has a value of less than 1000 nm, preferably less than 750 nm and particularly preferably has less than 500 nm.
  • a first thickness of the active metal layer which is in particular less than 1000 nm if the solder layer and the active metal layer are rolled together.
  • the layer thicknesses of the soldering layer and the active metal layer ie the first thickness and the second thickness, are rolled down and / or pressed together.
  • a soldering layer for example in the form of a thick soldering foil, and an active metal layer are first joined together, for example by means of an upstream rolling or a first rolling to reduce the layer thickness.
  • a starting layer thickness of the active metal layer and a starting layer thickness of the soldering foil are in the same ratio as the first thickness and the second thickness in the ge manufactured soldering system that has the active metal layer with the first thickness and the soldering layer with the second thickness includes.
  • the active metal layer and the solder layer are rolled down in their respective thicknesses by each rolling in order to obtain a comparatively thin solder layer on which an even thinner active metal layer is arranged.
  • This soldering system can then be used to connect the metal layer to the ceramic layer in the context of an active soldering process.
  • the soldering layer being arranged between the active metal layer and the wider active metal layer.
  • the interface between the solder layer and the at least one metal layer can also be influenced by the active metal of the active metal layer.
  • the ceramic layer is coated with the active metal layer and the at least one metal layer is coated with the solder layer.
  • the at least one metal layer has a layer thickness that is greater than 1 mm, preferably greater than 1.3 mm and particularly preferably greater than 1.5 mm. As a result, a comparatively thick at least one metal layer is implemented, which supports the rapid dissipation of heat and enables heat to be spread on the component side.
  • Another object of the present invention is a soldering system for a method according to the invention, the soldering system comprising at least one soldering layer, in particular in the form of a soldering foil, and at least one active metal layer. All of the advantages and features described for the method for producing the metal-ceramic substrate apply analogously to the soldering system.
  • Another item is a metal-ceramic substrate made by a method comprising:
  • Fig. 1 schematically a process for the production of a metal-ceramic
  • Figure 2 schematically a method for producing a metal-ceramic
  • Fig. 5 schematically a process for the production of a metal-ceramic
  • FIG. 1 a method for producing a metal-ceramic substrate 1 according to a first preferred embodiment of the present invention is shown schematically.
  • a metal-ceramic substrate 1 is preferably used as a carrier for electronic or electrical components that can be connected to the metal-ceramic substrate 1.
  • An example of a fabricated metal-ceramic substrate 1 is illustrated schematically in the upper left corner.
  • Essential components of such a metal-ceramic substrate 1 are at least one ceramic layer 10 extending along a main extension plane HSE and an at least one metal layer 20 attached to the at least one ceramic layer 10.
  • the at least one ceramic layer 10 is made of at least one material comprising a ceramic .
  • the at least one metal layer 20 and the at least one ceramic layer 10 are arranged one above the other along a stacking direction S running perpendicular to the main extension plane HSE and, in a manufactured state, are at least partially connected to one another by a soldering system 35.
  • the min least one metal layer 20 in the manufactured metal-ceramic substrate 1 is then structured to form conductor tracks or connection points for the electrical components. For example, this structuring is etched into the at least one metal layer 20.
  • a permanent bond in particular a material bond, must be formed between the at least one metal layer 20 and the at least one ceramic layer 10.
  • soldering system 35 is arranged between the at least one ceramic layer 10 and the at least one metal layer 20, via which the material connection between the ceramic layer 10 and the metal layer 20 is ensured in the finished metal-ceramic substrate 1. It is provided in particular that the soldering system 35 has a multilayer design. In addition to at least one soldering layer 30, the soldering system 35 comprises at least one active metal layer 40. In particular, it is provided that the at least one soldering layer 30 is exposed is of an active metal, ie has no active metal. Instead, the active metal is provided with a separate layer in the soldering system 35 as an active metal layer 40.
  • solder layers 30 that ensure that the at least one solder layer 30, in particular in the form of the solder foil, can be rolled to a thickness of less than 10 ⁇ m, preferably less than 8 and particularly preferably less than 6 ⁇ m .
  • the at least one active metal layer 40 is applied to the at least one ceramic layer 10, for example by means of sputtering or CVD, and has a first thickness D1 that has a value between 100 nm and 1000 nm, preferably between 150 nm and 750 nm and particularly preferably between 200 nm and 500 nm.
  • Such thin active metal layers 40 make it possible to prevent a reduction in the thermal conductivity and mechanical strength, which would otherwise be expected in the case of thicker active metal layers 40. This is particularly true for a layer thickness or first thickness D1 between 200 nm and 500 nm. It is provided that the at least one soldering layer 30, in particular as at least one soldering foil, as a separate layer between the at least an active metal layer 40 and the at least one metal layer 20 is arranged before the active soldering process is carried out.
  • the at least one soldering foil is applied to the at least one active metal layer 40 and is plated by a rolling step to a second thickness of less than 10 ⁇ m, preferably less than 7 ⁇ m, in order to ensure that at least one solder layer 30 is as thin as possible .
  • the use of a comparatively thin at least one soldering layer 30 accelerates the connection process and also advantageously reduces the material requirement when producing the connection between the at least one ceramic layer 10 and the at least one metal layer 20 10 and the at least one metal layer 20 arranged one above the other in the stacking direction S, the soldering system 35 with the at least one soldering layer 30 and the at least one active metal layer 40 being arranged in the stacking direction S between the at least one metal layer 20 and the at least one ceramic layer 10.
  • the at least one solder layer 30 is not only free of active metal, but also free of elements that lower the melting point, such as phosphorus or zinc.
  • the person skilled in the art understands essentially “free of elements with lower melting points” to mean that their proportion in the solder layer is less than 3% by weight, preferably less than 2% by weight and particularly preferably less than 1% by weight.
  • the at least one soldering layer 30 dispenses with the use of a soldering material that contains phosphorus or zinc in order to prevent the melting temperature from being lowered. It has surprisingly been found that a connection via the separate at least one active metal layer 40 is also possible for those soldering materials in which no melting point-lowering elements are used. This makes it possible to use comparatively thin at least one soldering layers 30 for those soldering materials that are used at the usual process temperatures of an active soldering process.
  • FIG. 2 a method for producing a metal-ceramic substrate 1 according to a second exemplary embodiment of the present invention is shown schematically.
  • the exemplary embodiment in FIG. 2 essentially only differs from the exemplary embodiment in FIG. 1 in that at least one protective layer 41 is provided in addition to the at least one active metal layer 40.
  • the at least one protective layer 41 extending in the main plane of extent HSE covers in particular the active metal layer 40.
  • such at least one protective layer 41 By using such at least one protective layer 41, it is advantageously possible to prevent the at least one active metal layer 40 or the outside the at least one active metal layer 40, an oxidation takes place before the actual bonding process, ie the active soldering process, takes place.
  • such at least one protective layer 41 has a third thickness D3, which has a minimum thickness of at least 100 nm.
  • the third thickness D3 of at least one of the protective layers is preferably 100 nm to 1000 nm, preferably 150 nm to 750 nm and particularly preferably between 200 nm and 500 nm.
  • the at least one protective layer 41 partially or preferably completely covers the at least one active element layer 40 and, viewed in the stacking direction S, is arranged between the at least one active metal layer 40 and the at least one soldering layer 30.
  • the third thickness D3 is preferably adapted to the expected duration, from the deposition of the active metal layer (40) and the protective layer (41) to the connection using the active soldering process.
  • the envisaged storage time can be set in an advantageous manner, in particular through the third thickness D3 of the protective layer 41, in order to ensure that the at least one active metal layer 40 does not undergo oxidation before it is bonded.
  • the third thickness D3 of the at least one protective layer 41 corresponds essentially to the first thickness D1 of the active metal layer 40.
  • the at least one solder layer 30 has a second thickness D2, which has a value between 0.1 and 100 ⁇ m, preferably between 0.5 and 50 ⁇ m and particularly preferably 0.2 and 20 ⁇ m. This is in particular the second thickness D2 before the application of the at least one soldering layer 30 or the arrangement on the at least one metal layer 20 or on the at least one active metal layer 40 A metal layer 20 is further reduced by further rolling the second thickness D2 of the at least one solder layer 30.
  • a connection is made using a temperature between 700 ° C. and 900 ° C.
  • the soldering process is preferably carried out at a pressure that is less than 10 mbar. It is also conceivable that the connection process, ie the active soldering process, is carried out using a process gas, or in a working atmosphere that comprises, for example, argon or generally one or more noble gases.
  • FIG. 3 a method for producing a metal-ceramic substrate 1 according to a third exemplary embodiment of the present invention is shown schematically.
  • the exemplary embodiment essentially differs from that from FIG. 2 in that the at least one active metal layer 40 is attached to the at least one solder layer 30 before being arranged between the at least one metal layer 20 and the at least one ceramic layer 10.
  • the connection of the at least one active metal layer 40 to the at least one soldering layer 30 takes place by means of sputtering prior to the arrangement between the at least one ceramic layer 10 and the at least one metal layer 20.
  • At least one protective layer 41 the at least one active metal layer 40 is partially or preferably completely covered, in particular on one side, in order to avoid premature oxidation of the at least one active metal layer 40.
  • Figure 4 a method for producing a metal-ceramic substrate 1 according to a fourth embodiment of the present invention is shown schematically.
  • the exemplary embodiment in FIG. 4 provides that the at least one active metal layer 40 is connected to the at least one metal layer 20 before the active soldering process.
  • the at least one active metal layer 40 is arranged in particular on the side of the at least one metal layer 20 facing the soldering layer 30 in the connection process.
  • the at least one active metal layer 40 can be applied over the area to the at least one metal layer 20 by means of a CVD method or by sputtering, ie generally by means of a gas phase deposition method.
  • the connection process is carried out by means of an active soldering process.
  • Figure 5 a method for producing a metal-ceramic substrate 1 according to a fifth preferred embodiment of the present invention is shown schematically.
  • the embodiment of Figure 5 differs from that of Figure 2 only in that both the front and the back of the at least one ceramic layer 10 are each connected to at least one metal layer 20 via respective soldering systems 35, the soldering system 35 preferably the at least one soldering layer 30, the at least one active metal layer 40 and the at least one protective layer 41.

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  • Ceramic Products (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Laminated Bodies (AREA)
EP20789875.0A 2019-10-08 2020-10-02 Verfahren zur herstellung eines metall-keramik-substrats, lötsystem und metall-keramik-substrat, hergestellt mit einem solchen verfahren Pending EP3891317A1 (de)

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DE102019126954.7A DE102019126954A1 (de) 2019-10-08 2019-10-08 Verfahren zur Herstellung eines Metall-Keramik-Substrats, Lötsystem und Metall-Keramik-Substrat, hergestellt mit einem solchen Verfahren
PCT/EP2020/077636 WO2021069320A1 (de) 2019-10-08 2020-10-02 Verfahren zur herstellung eines metall-keramik-substrats, lötsystem und metall-keramik-substrat, hergestellt mit einem solchen verfahren

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EP (1) EP3891317A1 (zh)
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CN (1) CN114557144A (zh)
DE (2) DE102019126954A1 (zh)
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JP2024045136A (ja) 2024-04-02
WO2021069320A1 (de) 2021-04-15
CN114557144A (zh) 2022-05-27
JP2023500204A (ja) 2023-01-05
DE102019126954A1 (de) 2021-04-08
KR20220062339A (ko) 2022-05-16
US20220362891A1 (en) 2022-11-17
DE202020005466U1 (de) 2021-06-09

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