EP2561613B1 - Wide-band acoustically coupled thin-film baw filter - Google Patents

Wide-band acoustically coupled thin-film baw filter Download PDF

Info

Publication number
EP2561613B1
EP2561613B1 EP11771646.4A EP11771646A EP2561613B1 EP 2561613 B1 EP2561613 B1 EP 2561613B1 EP 11771646 A EP11771646 A EP 11771646A EP 2561613 B1 EP2561613 B1 EP 2561613B1
Authority
EP
European Patent Office
Prior art keywords
acoustic
wave
modes
piezoelectric layer
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP11771646.4A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2561613A4 (en
EP2561613A1 (en
Inventor
Johanna Meltaus
Tuomas Pensala
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Valtion Teknillinen Tutkimuskeskus
Original Assignee
Valtion Teknillinen Tutkimuskeskus
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Valtion Teknillinen Tutkimuskeskus filed Critical Valtion Teknillinen Tutkimuskeskus
Publication of EP2561613A1 publication Critical patent/EP2561613A1/en
Publication of EP2561613A4 publication Critical patent/EP2561613A4/en
Application granted granted Critical
Publication of EP2561613B1 publication Critical patent/EP2561613B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02228—Guided bulk acoustic wave devices or Lamb wave devices having interdigital transducers situated in parallel planes on either side of a piezoelectric layer
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/0004—Impedance-matching networks
    • H03H9/0014—Impedance-matching networks using bulk acoustic wave devices
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/0023—Balance-unbalance or balance-balance networks
    • H03H9/0095—Balance-unbalance or balance-balance networks using bulk acoustic wave devices
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02015—Characteristics of piezoelectric layers, e.g. cutting angles
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02125—Means for compensation or elimination of undesirable effects of parasitic elements
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
    • H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H03H9/175—Acoustic mirrors
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/177—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator of the energy-trap type
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/205—Constructional features of resonators consisting of piezoelectric or electrostrictive material having multiple resonators
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/56—Monolithic crystal filters
    • H03H9/564—Monolithic crystal filters implemented with thin-film techniques
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/58—Multiple crystal filters
    • H03H9/582—Multiple crystal filters implemented with thin-film techniques
    • H03H9/583—Multiple crystal filters implemented with thin-film techniques comprising a plurality of piezoelectric layers acoustically coupled
    • H03H9/584—Coupled Resonator Filters [CFR]
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H03H2003/0414—Resonance frequency
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making

Definitions

  • the present invention relates generally to bulk acoustic wave (BAW) filters. More specifically, to wide-band acoustically coupled bulk acoustic wave filters. In particular, to those operating at GHz frequencies and based on thin-film technology and piezoelectric thin films.
  • BAW bulk acoustic wave
  • Bulk acoustic thickness vibration arising in a piezoelectric plate can propagate laterally (in the horizontal direction) in the plate.
  • Such laterally propagating wave modes are called plate wave modes or Lamb wave modes [1].
  • the term plate wave mode will be used here.
  • the wave propagates with a lateral wavelength ⁇ x and has a lateral wave number k x .
  • TE thickness-extensional
  • TS thickness-shear vibration
  • Fig. 1 the particle displacement is in the thickness direction of the piezoelectric plate (z-axis in Fig. 1 ), and in the latter, it is perpendicular to the thickness direction.
  • N 1 and there is one half-wavelength accommodated within the thickness t .
  • Fig. 1 some plate wave types are depicted. From top to bottom: the first-order thickness-extensional mode TE1, the second-order thickness-shear mode TS2, the first-order thickness-shear mode TS1, flexural mode. Propagation is in the lateral direction with lateral wavelength ⁇ x .
  • the integer N implies the order of the resonance. In the first order resonance, there is one half-wavelength within the lateral length of the structure.
  • Lateral standing wave resonances can arise for any thickness vibration mode (e.g., TE mode or TS mode).
  • TE mode e.g., TE mode or TS mode.
  • Fig. 2 the first two lateral standing wave resonances in a laterally finite plate with width Wand thickness t are shown for the TE1 and the TS2 thickness vibration modes (plate wave modes).
  • dispersion of the plate wave Relation between the lateral wave number k x of a laterally propagating plate wave and the frequency f is called the dispersion of the plate wave and is presented as a dispersion diagram.
  • negative x-axis often corresponds to imaginary wave number (evanescent wave), whereas positive x-axis corresponds to real wave number (propagating wave).
  • TS2 Second-order thickness shear
  • TE1 first-order thickness extensional
  • Mechanical vibration can couple mechanically from one resonator structure to another. Mechanical coupling can happen via an evanescent wave or via a propagating wave.
  • Radio-frequency (RF) components such as resonators and filters, based on microacoustics and thin-film technology are currently widely used in radio applications, such as mobile phones, wireless networks, satellite positioning, etc. Their advantages over their lumped-element counterparts include small size and mass-producibility.
  • Two principal microacoustic technologies used for RF devices are surface acoustic wave (SAW) and bulk acoustic wave (BAW) technologies.
  • Interdigital transducers IDTs
  • a piezoelectric substrate e.g., quartz, LiNbO 3 or LiTaO 3 .
  • the IDTs are used to transform the electric input signal V in into a surface-propagating acoustic wave via the piezoelectric effect, as well as to pick up the acoustic signal at the output port and transform it back to electrical form.
  • acoustic vibration inside a piezoelectric wafer or a thin film is used to process the electrical input signal.
  • an acoustic reflector composed of alternating high and low acoustic impedance (Z) material layers serves to isolate the vibration in the piezoelectric thin film from the substrate and to prevent acoustic leakage.
  • Z acoustic impedance
  • thickness vibration modes such as longitudinal (also called thickness-extensional, vibration is in the thickness direction, parallel to z-axis) and shear (vibration perpendicular to z-axis) vibration, arise as the excitation frequency f is swept.
  • thickness vibration can propagate in the lateral direction as a plate wave.
  • Acoustic properties of the plate waves can be described with dispersion curves, in which the lateral (perpendicular to z-axis) wave number k x of the plate wave is presented as a function of frequency f .
  • Fig. 3 shows calculated dispersion diagram for the thin-film layer stack given in Table 1.
  • the dispersion curves of the laterally-propagating plate waves for the first-order longitudinal (thickness extensional, TE1) vibration mode, in which the thickness of the piezoelectric layer contains approximately half a wavelength ⁇ z of the thickness vibration, and for the second-order thickness shear (TS2) mode, in which the particle displacement is perpendicular to the thickness direction and one acoustic wavelength ⁇ z is contained in the piezoelectric layer thickness, are denoted in the figure.
  • This type of dispersion in which the onset frequency of the TE1 plate mode is higher than the onset frequency of the TS2 plate mode, is called Type 1 [2].
  • Type 1 materials include, e.g., ZnO.
  • Aluminum nitride is inherently Type 2 (TS2 is higher in frequency than TE1).
  • dispersion properties can be tailored and the dispersion type changed.
  • Table 1 is the film thicknesses used in the calculation of the dispersion curves in Fig. 3 .
  • positive values of k x denote a real wave number (propagating wave) and negative values correspond to imaginary wave number (evanescent wave).
  • the acoustic energy must be trapped inside the resonator structure, both in the thickness direction and in the lateral direction.
  • isolation from the substrate ensures the energy trapping.
  • a filter can be made by electrically connecting one-port resonators to form a ladder or a lattice filter. Another possibility is to arrange mechanical (acoustic) coupling between resonators by placing them spatially close enough to each other for the acoustic wave to couple from one resonator to another. Such devices are called coupled resonator filters (CRF).
  • CRF coupled resonator filters
  • stacked crystal filters SCF
  • vertically coupled CRFs In BAW devices, vertical acoustic coupling between stacked piezoelectric layers is used in stacked crystal filters (SCF) and vertically coupled CRFs.
  • SCF stacked crystal filters
  • CRF vertically coupled CRF
  • two piezoelectric layers are separated by an intermediate electrode.
  • coupling layers are used to modify the coupling strength between the piezoelectric layers.
  • the CRF can be fabricated either using the SMR or the membrane technology.
  • a thin-film vertically coupled CRF has been shown to give a relatively wide-band frequency response (80 MHz at 1850 MHz center frequency, or 4.3% of center frequency). They also enable unbalanced-to-balanced (balun) conversion.
  • the disadvantage of the vertically coupled CRFs is the need for a large number of layers and the sensitivity of the response to the thickness of the piezolayers. This makes the fabrication process difficult and consequently expensive.
  • Lateral acoustical coupling in BAW devices can be realized with 2 or more narrow electrodes placed close to each other on the piezoelectric layer. Electrical input signal into a first port formed by one or more electrodes is transformed into mechanical vibration via the piezoelectric effect. This vibration couples mechanically across the gap to a second port formed by one or more electrodes and creates an output electrical signal. Electrodes in this example are interdigital (comb-like), but other shapes are possible as well. Coupling strength is determined by the acoustic properties of the structure and by the gap between the electrodes.
  • Bandpass frequency response in an LCRF is typically formed by two lateral standing wave resonances arising in the structure.
  • the second resonance is the one for which every electrode is in the opposite phase with its neighbours (odd resonance mode) (see Fig. 7 ).
  • the frequency difference between the lateral standing wave resonances determines the achievable bandwidth of the filter, and depends on the acoustic properties of the structure and on the electrode dimensions and the acoustical coupling strength between the electrodes.
  • the main advantage of the LCRF over the vertical CRF is the simple fabrication technology, as only one piezoelectric layer and no coupling layers are required, as opposed to the vertical CRF. Operation at high frequencies is easier than for SAW components, as the operation frequency is mainly determined by the layer thicknesses, not the electrode dimensions, relaxing requirements for very narrow dimensions.
  • the present invention concerns a wide-band acoustically coupled bulk acoustic wave (BAW) filter at GHz frequencies, based on thin-film technology and piezoelectric thin films.
  • BAW bulk acoustic wave
  • At least two distinct plate wave modes are used instead of just one to create two or more lateral standing wave resonances which form the filter passband.
  • Each plate wave mode contributes at least one lateral standing wave resonance.
  • An aspect of the present invention is to use two different laterally propagating thickness vibration modes (plate wave modes), e.g., shear and longitudinal vibration, together to produce a bandpass response. It is preferable that the acoustical properties of the structure are designed such that the two plate modes are at a desired frequency distance from each other. It is also preferable that electrical coupling to both can be provided.
  • plate wave modes laterally propagating thickness vibration modes
  • electrical coupling to both can be provided.
  • the electrodes on only one side of the piezoelectric layer are separated to form at least two resonator regions and the continuous electrode is provided on the other side of the piezoelectric layer.
  • the acoustic filter comprises
  • At least two of the electrodes are electrically connected to provide a balanced electrical port.
  • the at least two distinct acoustic plate wave modes comprise at least one longitudinal mode and at least one shear mode.
  • At least two lateral resonance modes arise for one of the two distinct acoustic plate wave modes, and at least one lateral standing wave resonance arises for the other of the two distinct acoustic plate wave modes, yielding at least three lateral standing wave resonances.
  • At least two standing wave resonances arise for both of the said plate wave modes, yielding at least four lateral resonances.
  • a TS2 plate wave branch is brought close enough in frequency to a TE1 branch, so that resonance modes arising within that branch for the filter passband can be used together with TE1 modes.
  • BAW resonator there is virtually no coupling to the shear wave modes.
  • this coupling exists because of the lateral electric fields arising between the narrow electrodes.
  • the shear mode may show up in the electrical response as the spurious band.
  • this response is used together with the TE1 mode response to constitute a very wide passband, that would be made up of four resonance modes instead of two (even and odd mode of TS2 branch and even and odd mode of TE1 branch), as described in more detail later.
  • the method of manufacturing an acoustic wide-band filter according to the invention comprises performing the method of claim 15.
  • An advantage to using the present invention over the existing art is that by using, in even the simplest cases, i.e. three or four lateral standing wave resonances instead of only two, there is a significantly wider electrical frequency bandwidth (BW).
  • Another advantage to using the design of the present invention is that there are less stringent requirements for acoustic and electromechanical coupling and layer thicknesses as compared to vertical BAW CRF and for lateral dimensions as compared to SAW, which leads to relaxed fabrication tolerances and costs.
  • Third advantage is that one can eliminate an unwanted spurious response. When two plate wave modes are close to each other in frequency, and only one of them is used for the lateral standing wave resonances that form the bandpass response, the other plate wave mode may still produce lateral standing wave resonances which appear as unwanted spurious response. In the current invention, these resonances, previously regarded as unwanted, are used to create a wider passband.
  • Electrodes in this example are interdigital (comb-like) as shown in Fig. 5 , but other geometries (such as circular) are possible as well.
  • Figure 4 shows a schematic of a two-electrode SMR LCRF structure 40 stacked in the Z dimension. At the top of the structure there are two ports 41 and 42. The ports are fixed to piezo 43. Below the piezo is the electrode 44, the acoustic reflector 45 and the substrate 46. The electrode in the interdigital embodiment is shown as 50 in Fig. 5 , with a period, p , shown by 52.
  • Electrode width and gap width can vary within an electrode structure and material(s) are not limited to A1N and W/SiO2.
  • ZnO, PZT of some other suitable piezoelectric could be used as the piezoelectric material and also the materials for the reflector and electrodes are not limited to those considered here.
  • the bottom electrode 44 can be divided into separate electrodes 44a and 44b (not shown in Fig 4 ) corresponding to electrodes 41 and 42.
  • the width of the said separate electrodes need not be the same as their corresponding electrodes, neither does the gap between them need to be the same as the gap between the corresponding electrodes.
  • FIG. 6 shows membrane structure with two ports 61 and 62 fixed to a piezo 63 atop an electrode 64. Opposed to the SMR, below the electrode 64 there is an air gap 65.
  • the width of the air-gap is at least as large as the common width of the resonators 61, 62, as shown in Fig. 6 .
  • both TE1 and TS2 bulk vibration modes are used to form the passband response. This is made possible due to the lateral topology of the structure.
  • the TS2 passband previously considered a spurious response, is merged into the TE1 passband, leading to at least 2 times as wide passband as obtained with TE1 mode alone.
  • 4 lateral standing wave resonances (even and odd resonances of both the TE1 and TS2 plate modes) can now be used to form the passband (a 4-pole filter response).
  • Two close-by (in frequency) acoustic plate wave modes are utilized instead of just one, so that 4 lateral standing wave resonances instead of only 2 form the passband (even and odd resonances in both acoustic plate mode branches).
  • This allows for a wider band and relaxed fabrication tolerances.
  • This is made possible by designing the dimensions of the resonators and choosing the materials of the device as a whole in such a way that the plate wave modes attain dispersion characteristics supporting the desired lateral standing wave resonances at suitable frequencies to form a single wide band response.
  • the device geometry is designed to use for example narrow repeated finger like features so that the electromechanical coupling to all of the desired lateral standing wave resonances is high.
  • Electrical coupling to the shear vibration can be achieved with a material of different piezoelectric symmetry.
  • the electric field should couple to both shear and longitudinal vibration.
  • a material with a strong thickness-directional electromechanical coupling is used with lateral device geometry.
  • Another possibility is a material with strong coupling in both lateral and thickness directions, or a material with strong coupling to lateral direction and vertical excitation geometry.
  • Fig. 7 illustrates the operation principle of the present invention. Simulated dispersion curves from Fig. 3 are shown for the TE1 and TS2 plate wave modes, propagating wave regime. When moving along the dispersion curves, lateral standing wave resonances arise as explained in the previous section.
  • the electrode structure in the example of Fig. 7 is designed so that even and odd lateral standing wave resonances for the two electrodes are trapped for both plate wave modes and they are used to form the passband response.
  • the wavelength increases as frequency increases. Therefore, odd resonance arises at a lower frequency than the even resonance.
  • the order of the even and odd resonances is inverted, as wavelength decreases with increasing frequency.
  • the mass load induced by the top electrode should be small enough to allow the used resonance modes to be included within the frequency trapping range of the laterally propagating plate waves, or to allow the frequency trapping range determined by the evanescent portion of the outside region dispersion curve to enclose the used resonance modes. Therefore, the top electrode should be of a low-density metal, for example Al, and/or thin thickness ⁇ ⁇ z /4, where ⁇ z is the wavelength of the longitudinal acoustic wave in the thickness (z) direction.
  • the bottom electrode also affects the above-mentioned frequency difference.
  • the bottom electrode should be designed so that the frequency difference
  • Layer thicknesses in the mirror stack usually has to be ⁇ z /4, where ⁇ z is the wavelength of the longitudinal acoustic wave in the thickness direction, for it to be required that the shear wave is also reflected.
  • Electrode width is preferably such that one half-wavelength ⁇ x of the lateral acoustic plate wave fits into the electrode at the odd resonance frequency.
  • Gap width is preferably such that the lateral wavelength ⁇ x of the even lateral resonances due to both TE1 and TS2 plate wave modes are maximized.
  • the number of electrodes is selected such that the desired frequency bandwidth is reached, and the structure is matched to the system impedance, i.e., its static capacitance is as required for the matching while the length of the electrodes can be kept such that resistive losses are minimized.
  • TE1 and TS2 thickness vibration modes
  • the requirement is that the modes be appropriately spaced in frequency and that suitable lateral standing wave resonances can be created.
  • the TE1 and TS2 modes could be in other order in frequency.
  • An interdigital electrode structure was used which had 11 fingers.
  • the width of the electrode was 10 ⁇ m and the gap between the electrodes was 2 ⁇ m.
  • the electrodes were connected alternating to a first and second port.
  • the thicknesses of the thin film layers are shown in Table 2.
  • Table 2 Layer SiO2 W SiO2 W SiO2 Mo A1N Al Thickness (nm) 790 505 621 507 950 360 1750 220
  • the obtained 10dB bandwidth, using both TE1 and TS2 plate wave modes was approximately 220 MHz, which is 12% of the center frequency of 1850 MHZ, a significant improvement over the current technology.
  • the desired center frequency should be between the onset frequencies of the TE1 and TS2 modes. Additionally, the frequency difference between TE1 and TS2 modes should be appropriate so that they are trapped in the same structure. The Q value should also be high enough that there is low loss for both TE1 and TS2 modes.
  • the frequency difference between the even and odd standing wave resonances should be appropriate to give the desired bandwidth.
  • the fabrication tolerances are not critical, that the gaps are sufficiently wide, that there is not too much resistance due to electrode length and that the component size is sufficiently small for its intended use. It is also important to ensure that there are no intermediate lateral standing wave resonances that produce notches in the passband.
  • the filter of the present invention can also be understood through the method of its design and manufacture.
  • a structure and associated materials are chosen such that the electromechanical coupling of two different thickness vibration modes (plate wave modes) is achieved.
  • the two thickness vibration modes (plate wave modes) are TE1 and TS2, although other vibration modes can be chosen without departing from the scope of the present invention.
  • parallel or series resonators can be designed to make skirts steeper and the design can be checked for if matching is needed.
  • the shape of the passband can be modified, for example, adding a tuning inductor, if necessary. Afterwards, a wide-band acoustically coupled BAW filter is ready to be manufactured.
  • the resonances two of the resonances may arise for one plate wave mode and one of the resonances arise for another plate wave mode.
  • the piezoelectric layer is selected from symmetry group 6mm, with their c-axis in vertical direction.
  • the piezoelectric layer is selected from symmetry group 6mm, with its c-axis in tilted orientation with respect to vertical direction.
  • a vertical electric field is coupled to both longitudinal acoustic wave (e.g. TE1) and shear wave (e.g. TS2).
  • the symmetry group and crystal orientation of the piezoactive layer may also be selected so as to form an intrinsic coupling with vertical electric field in both longitudinal (e.g. TE1) and transverse acoustic modes (e.g. TS2).
  • longitudinal e.g. TE1
  • transverse acoustic modes e.g. TS2
  • the acoustic filter may also comprise two or more piezoactive layers in stacked configuration. In that case the standing wave modes occur along the stack, i.e. in the vertical direction.
  • Alternative materials solutions can be used to provide the coupling to the shear vibration.
  • 6mm material such as A1N or ZnO, deposited such that the c-axis is inclined from the vertical direction, and coupling of vertical electric field to vertically propagating shear acoustic vibration is provided.
  • thin-film form of piezoelectric materials such as LiNbO3, LiTaO3.
  • Another example is using a material that provides intrinsically the coupling of vertical electric field to vertically propagating shear acoustic vibration.

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
EP11771646.4A 2010-04-23 2011-04-21 Wide-band acoustically coupled thin-film baw filter Active EP2561613B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20105443A FI123640B (fi) 2010-04-23 2010-04-23 Laajakaistainen akustisesti kytketty ohutkalvo-BAW-suodin
PCT/FI2011/050368 WO2011131844A1 (en) 2010-04-23 2011-04-21 Wide-band acoustically coupled thin-film baw filter

Publications (3)

Publication Number Publication Date
EP2561613A1 EP2561613A1 (en) 2013-02-27
EP2561613A4 EP2561613A4 (en) 2013-11-27
EP2561613B1 true EP2561613B1 (en) 2016-01-13

Family

ID=42133284

Family Applications (1)

Application Number Title Priority Date Filing Date
EP11771646.4A Active EP2561613B1 (en) 2010-04-23 2011-04-21 Wide-band acoustically coupled thin-film baw filter

Country Status (7)

Country Link
US (2) US9294069B2 (zh)
EP (1) EP2561613B1 (zh)
JP (1) JP5709226B2 (zh)
KR (1) KR101764787B1 (zh)
CN (1) CN102870325B (zh)
FI (1) FI123640B (zh)
WO (1) WO2011131844A1 (zh)

Families Citing this family (164)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI123640B (fi) * 2010-04-23 2013-08-30 Teknologian Tutkimuskeskus Vtt Laajakaistainen akustisesti kytketty ohutkalvo-BAW-suodin
FI124732B (en) * 2011-11-11 2014-12-31 Teknologian Tutkimuskeskus Vtt Laterally connected bulk wave filter with improved passband characteristics
US9093979B2 (en) 2012-06-05 2015-07-28 Avago Technologies General Ip (Singapore) Pte. Ltd. Laterally-coupled acoustic resonators
DE102012111889B9 (de) * 2012-12-06 2014-09-04 Epcos Ag Elektroakustischer Wandler
WO2016047255A1 (ja) * 2014-09-26 2016-03-31 国立大学法人東北大学 弾性波装置
KR102062088B1 (ko) * 2015-09-09 2020-02-11 가부시키가이샤 무라타 세이사쿠쇼 탄성파 장치
WO2017070177A1 (en) * 2015-10-21 2017-04-27 Qorvo Us, Inc. Resonator structure with enhanced reflection of shear and longitudinal modes of acoustic vibrations
US11039814B2 (en) * 2016-12-04 2021-06-22 Exo Imaging, Inc. Imaging devices having piezoelectric transducers
US10756697B2 (en) 2018-06-15 2020-08-25 Resonant Inc. Transversely-excited film bulk acoustic resonator
US11206009B2 (en) 2019-08-28 2021-12-21 Resonant Inc. Transversely-excited film bulk acoustic resonator with interdigital transducer with varied mark and pitch
US11936358B2 (en) 2020-11-11 2024-03-19 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with low thermal impedance
US12088281B2 (en) 2021-02-03 2024-09-10 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with multi-mark interdigital transducer
US10601392B2 (en) 2018-06-15 2020-03-24 Resonant Inc. Solidly-mounted transversely-excited film bulk acoustic resonator
US11323090B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Transversely-excited film bulk acoustic resonator using Y-X-cut lithium niobate for high power applications
US12040779B2 (en) 2020-04-20 2024-07-16 Murata Manufacturing Co., Ltd. Small transversely-excited film bulk acoustic resonators with enhanced Q-factor
US11929731B2 (en) 2018-02-18 2024-03-12 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with optimized electrode mark, and pitch
US20220116015A1 (en) 2018-06-15 2022-04-14 Resonant Inc. Transversely-excited film bulk acoustic resonator with optimized electrode thickness, mark, and pitch
US11323089B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Filter using piezoelectric film bonded to high resistivity silicon substrate with trap-rich layer
US10637438B2 (en) 2018-06-15 2020-04-28 Resonant Inc. Transversely-excited film bulk acoustic resonators for high power applications
US10911023B2 (en) 2018-06-15 2021-02-02 Resonant Inc. Transversely-excited film bulk acoustic resonator with etch-stop layer
US10790802B2 (en) 2018-06-15 2020-09-29 Resonant Inc. Transversely excited film bulk acoustic resonator using rotated Y-X cut lithium niobate
US11146232B2 (en) 2018-06-15 2021-10-12 Resonant Inc. Transversely-excited film bulk acoustic resonator with reduced spurious modes
US11323096B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Transversely-excited film bulk acoustic resonator with periodic etched holes
US10491192B1 (en) * 2018-06-15 2019-11-26 Resonant Inc. Transversely-excited film bulk acoustic resonator
US11996827B2 (en) 2018-06-15 2024-05-28 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with periodic etched holes
US11509279B2 (en) 2020-07-18 2022-11-22 Resonant Inc. Acoustic resonators and filters with reduced temperature coefficient of frequency
US10868513B2 (en) 2018-06-15 2020-12-15 Resonant Inc. Transversely-excited film bulk acoustic filters with symmetric layout
US10992283B2 (en) 2018-06-15 2021-04-27 Resonant Inc. High power transversely-excited film bulk acoustic resonators on rotated Z-cut lithium niobate
US11201601B2 (en) 2018-06-15 2021-12-14 Resonant Inc. Transversely-excited film bulk acoustic resonator with multiple diaphragm thicknesses and fabrication method
US11996822B2 (en) 2018-06-15 2024-05-28 Murata Manufacturing Co., Ltd. Wide bandwidth time division duplex transceiver
US11876498B2 (en) 2018-06-15 2024-01-16 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with multiple diaphragm thicknesses and fabrication method
US11323095B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Rotation in XY plane to suppress spurious modes in XBAR devices
US11901878B2 (en) 2018-06-15 2024-02-13 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with two-layer electrodes with a wider top layer
US10992284B2 (en) 2018-06-15 2021-04-27 Resonant Inc. Filter using transversely-excited film bulk acoustic resonators with multiple frequency setting layers
US11228296B2 (en) 2018-06-15 2022-01-18 Resonant Inc. Transversely-excited film bulk acoustic resonator with a cavity having a curved perimeter
US12009798B2 (en) 2018-06-15 2024-06-11 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with electrodes having irregular hexagon cross-sectional shapes
US11916539B2 (en) 2020-02-28 2024-02-27 Murata Manufacturing Co., Ltd. Split-ladder band N77 filter using transversely-excited film bulk acoustic resonators
US11264966B2 (en) 2018-06-15 2022-03-01 Resonant Inc. Solidly-mounted transversely-excited film bulk acoustic resonator with diamond layers in Bragg reflector stack
US12040781B2 (en) 2018-06-15 2024-07-16 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator package
US11374549B2 (en) 2018-06-15 2022-06-28 Resonant Inc. Filter using transversely-excited film bulk acoustic resonators with divided frequency-setting dielectric layers
US11329628B2 (en) 2020-06-17 2022-05-10 Resonant Inc. Filter using lithium niobate and lithium tantalate transversely-excited film bulk acoustic resonators
US11888463B2 (en) 2018-06-15 2024-01-30 Murata Manufacturing Co., Ltd. Multi-port filter using transversely-excited film bulk acoustic resonators
US12095446B2 (en) 2018-06-15 2024-09-17 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with optimized electrode thickness, mark, and pitch
US11728785B2 (en) 2018-06-15 2023-08-15 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator using pre-formed cavities
US12119805B2 (en) 2018-06-15 2024-10-15 Murata Manufacturing Co., Ltd. Substrate processing and membrane release of transversely-excited film bulk acoustic resonator using a sacrificial tub
US12113512B2 (en) 2021-03-29 2024-10-08 Murata Manufacturing Co., Ltd. Layout of XBARs with multiple sub-resonators in parallel
US11171629B2 (en) 2018-06-15 2021-11-09 Resonant Inc. Transversely-excited film bulk acoustic resonator using pre-formed cavities
US11146238B2 (en) 2018-06-15 2021-10-12 Resonant Inc. Film bulk acoustic resonator fabrication method
US10826462B2 (en) 2018-06-15 2020-11-03 Resonant Inc. Transversely-excited film bulk acoustic resonators with molybdenum conductors
US10998877B2 (en) 2018-06-15 2021-05-04 Resonant Inc. Film bulk acoustic resonator fabrication method with frequency trimming based on electric measurements prior to cavity etch
US12119808B2 (en) 2018-06-15 2024-10-15 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator package
US11996825B2 (en) 2020-06-17 2024-05-28 Murata Manufacturing Co., Ltd. Filter using lithium niobate and rotated lithium tantalate transversely-excited film bulk acoustic resonators
US12081187B2 (en) 2018-06-15 2024-09-03 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator
US10985728B2 (en) 2018-06-15 2021-04-20 Resonant Inc. Transversely-excited film bulk acoustic resonator and filter with a uniform-thickness dielectric overlayer
US11349452B2 (en) 2018-06-15 2022-05-31 Resonant Inc. Transversely-excited film bulk acoustic filters with symmetric layout
US11323091B2 (en) 2018-06-15 2022-05-03 Resonant Inc. Transversely-excited film bulk acoustic resonator with diaphragm support pedestals
US11967945B2 (en) 2018-06-15 2024-04-23 Murata Manufacturing Co., Ltd. Transversly-excited film bulk acoustic resonators and filters
US10917072B2 (en) 2019-06-24 2021-02-09 Resonant Inc. Split ladder acoustic wave filters
US10797675B2 (en) 2018-06-15 2020-10-06 Resonant Inc. Transversely excited film bulk acoustic resonator using rotated z-cut lithium niobate
US11909381B2 (en) 2018-06-15 2024-02-20 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with two-layer electrodes having a narrower top layer
US11349450B2 (en) 2018-06-15 2022-05-31 Resonant Inc. Symmetric transversely-excited film bulk acoustic resonators with reduced spurious modes
US11949402B2 (en) 2020-08-31 2024-04-02 Murata Manufacturing Co., Ltd. Resonators with different membrane thicknesses on the same die
US11870423B2 (en) 2018-06-15 2024-01-09 Murata Manufacturing Co., Ltd. Wide bandwidth temperature-compensated transversely-excited film bulk acoustic resonator
US10998882B2 (en) 2018-06-15 2021-05-04 Resonant Inc. XBAR resonators with non-rectangular diaphragms
US12021496B2 (en) 2020-08-31 2024-06-25 Murata Manufacturing Co., Ltd. Resonators with different membrane thicknesses on the same die
DE102019115589B4 (de) * 2018-07-17 2024-06-13 Ii-Vi Delaware, Inc. Elektrodenbegrenzter resonator
US12076973B2 (en) 2018-07-17 2024-09-03 Ii-Vi Delaware, Inc. Bonded substrate including polycrystalline diamond film
US11738539B2 (en) 2018-07-17 2023-08-29 II-VI Delaware, Inc Bonded substrate including polycrystalline diamond film
US11121696B2 (en) 2018-07-17 2021-09-14 Ii-Vi Delaware, Inc. Electrode defined resonator
US11750169B2 (en) 2018-07-17 2023-09-05 Ii-Vi Delaware, Inc. Electrode-defined unsuspended acoustic resonator
US10790801B2 (en) * 2018-09-07 2020-09-29 Vtt Technical Research Centre Of Finland Ltd Loaded resonators for adjusting frequency response of acoustic wave resonators
US10630256B2 (en) 2018-09-07 2020-04-21 Vtt Technical Research Centre Of Finland Ltd Two-stage lateral bulk acoustic wave filter
US10756696B2 (en) * 2018-09-10 2020-08-25 Vtt Technical Research Centre Of Finland Ltd Lateral bulk acoustic wave filter
EP3857308A4 (en) 2018-09-25 2022-06-08 Exo Imaging Inc. IMAGING DEVICES WITH SELECTIVELY VARIABLE PROPERTIES
CN118523746A (zh) * 2018-10-31 2024-08-20 株式会社村田制作所 固态装配型横向激励的薄膜体声波谐振器
CN113543717B (zh) 2018-12-27 2024-09-17 艾科索成像公司 以降低的成本、尺寸和功率来保持超声成像中图像质量的方法
WO2020186261A1 (en) 2019-03-14 2020-09-17 Resonant Inc. Transversely-excited film bulk acoustic resonator with half-lambda dielectric layer
US11901873B2 (en) 2019-03-14 2024-02-13 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with partial BRAGG reflectors
CN118316415A (zh) 2019-04-05 2024-07-09 株式会社村田制作所 横向激励薄膜体声波谐振器封装和方法
TWI810698B (zh) * 2019-06-12 2023-08-01 美商特拉華公司 電極界定未懸掛之聲波共振器
US12034423B2 (en) 2019-06-27 2024-07-09 Murata Manufacturing Co., Ltd XBAR frontside etch process using polysilicon sacrificial layer
US10911021B2 (en) 2019-06-27 2021-02-02 Resonant Inc. Transversely-excited film bulk acoustic resonator with lateral etch stop
US10862454B1 (en) 2019-07-18 2020-12-08 Resonant Inc. Film bulk acoustic resonators in thin LN-LT layers
US11329625B2 (en) 2019-07-18 2022-05-10 Resonant Inc. Film bulk acoustic sensors using thin LN-LT layer
JP7527604B2 (ja) 2019-08-08 2024-08-05 国立大学法人東北大学 弾性波デバイス
US11088670B2 (en) 2019-09-11 2021-08-10 Vtt Technical Research Centre Of Finland Ltd Loaded series resonators for adjusting frequency response of acoustic wave resonators
WO2021060507A1 (ja) * 2019-09-27 2021-04-01 株式会社村田製作所 弾性波装置
CN114467254A (zh) * 2019-09-27 2022-05-10 株式会社村田制作所 弹性波装置
WO2021060509A1 (ja) * 2019-09-27 2021-04-01 株式会社村田製作所 弾性波装置
WO2021060523A1 (ja) * 2019-09-27 2021-04-01 株式会社村田製作所 弾性波装置及びフィルタ装置
WO2021060512A1 (ja) * 2019-09-27 2021-04-01 株式会社村田製作所 弾性波装置
CN114467255A (zh) * 2019-09-27 2022-05-10 株式会社村田制作所 弹性波装置
CN114467256A (zh) * 2019-09-27 2022-05-10 株式会社村田制作所 弹性波装置
WO2021060510A1 (ja) * 2019-09-27 2021-04-01 株式会社村田製作所 弾性波装置
KR102479702B1 (ko) * 2019-09-27 2022-12-21 가부시키가이샤 무라타 세이사쿠쇼 탄성파 장치
US11223341B2 (en) * 2019-10-22 2022-01-11 Vtt Technical Research Centre Of Finland Ltd Suppressing parasitic sidebands in lateral bulk acoustic wave resonators
JP2021078013A (ja) * 2019-11-09 2021-05-20 株式会社弾性波デバイスラボ 弾性波素子およびその製造方法
US20210273629A1 (en) 2020-02-28 2021-09-02 Resonant Inc. Transversely-excited film bulk acoustic resonator with multi-pitch interdigital transducer
US20230361752A1 (en) * 2020-02-28 2023-11-09 Tohoku University Acoustic wave device
IL311310A (en) 2020-03-05 2024-05-01 Exo Imaging Inc An ultrasonic imaging device with programmable anatomy and flow imaging
JP6984800B1 (ja) * 2020-03-16 2021-12-22 株式会社村田製作所 弾性波装置
WO2021187537A1 (ja) * 2020-03-18 2021-09-23 株式会社村田製作所 弾性波装置
JP6947867B2 (ja) * 2020-03-24 2021-10-13 デクセリアルズ株式会社 バルク波共振子および帯域通過フィルタ
WO2021200835A1 (ja) * 2020-03-30 2021-10-07 株式会社村田製作所 弾性波装置
US20220116020A1 (en) 2020-04-20 2022-04-14 Resonant Inc. Low loss transversely-excited film bulk acoustic resonators and filters
WO2021221162A1 (ja) * 2020-04-30 2021-11-04 株式会社村田製作所 弾性波装置
US11811391B2 (en) 2020-05-04 2023-11-07 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with etched conductor patterns
US11469733B2 (en) 2020-05-06 2022-10-11 Resonant Inc. Transversely-excited film bulk acoustic resonators with interdigital transducer configured to reduce diaphragm stress
US12074584B2 (en) 2020-05-28 2024-08-27 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with two-layer electrodes
WO2021246446A1 (ja) * 2020-06-03 2021-12-09 株式会社村田製作所 弾性波装置
US10992282B1 (en) 2020-06-18 2021-04-27 Resonant Inc. Transversely-excited film bulk acoustic resonators with electrodes having a second layer of variable width
US11742828B2 (en) 2020-06-30 2023-08-29 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with symmetric diaphragm
US11482981B2 (en) 2020-07-09 2022-10-25 Resonanat Inc. Transversely-excited film bulk acoustic resonators with piezoelectric diaphragm supported by piezoelectric substrate
WO2022014440A1 (ja) * 2020-07-15 2022-01-20 株式会社村田製作所 弾性波装置
US11264969B1 (en) 2020-08-06 2022-03-01 Resonant Inc. Transversely-excited film bulk acoustic resonator comprising small cells
US11271539B1 (en) 2020-08-19 2022-03-08 Resonant Inc. Transversely-excited film bulk acoustic resonator with tether-supported diaphragm
US11671070B2 (en) 2020-08-19 2023-06-06 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators using multiple dielectric layer thicknesses to suppress spurious modes
CN115997342A (zh) * 2020-08-24 2023-04-21 株式会社村田制作所 弹性波装置
WO2022045086A1 (ja) * 2020-08-24 2022-03-03 株式会社村田製作所 弾性波装置
WO2022045087A1 (ja) * 2020-08-25 2022-03-03 株式会社村田製作所 弾性波装置
WO2022044869A1 (ja) * 2020-08-27 2022-03-03 株式会社村田製作所 弾性波装置
US11894835B2 (en) 2020-09-21 2024-02-06 Murata Manufacturing Co., Ltd. Sandwiched XBAR for third harmonic operation
US11658639B2 (en) 2020-10-05 2023-05-23 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator matrix filters with noncontiguous passband
US11929733B2 (en) 2020-10-05 2024-03-12 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator matrix filters with input and output impedances matched to radio frequency front end elements
US11728784B2 (en) 2020-10-05 2023-08-15 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator matrix filters with split die sub-filters
US11476834B2 (en) 2020-10-05 2022-10-18 Resonant Inc. Transversely-excited film bulk acoustic resonator matrix filters with switches in parallel with sub-filter shunt capacitors
US11405019B2 (en) 2020-10-05 2022-08-02 Resonant Inc. Transversely-excited film bulk acoustic resonator matrix filters
US11405017B2 (en) 2020-10-05 2022-08-02 Resonant Inc. Acoustic matrix filters and radios using acoustic matrix filters
WO2022075415A1 (ja) * 2020-10-08 2022-04-14 株式会社村田製作所 弾性波装置
WO2022080462A1 (ja) * 2020-10-14 2022-04-21 株式会社村田製作所 弾性波装置及び弾性波装置の製造方法
WO2022080433A1 (ja) * 2020-10-14 2022-04-21 株式会社村田製作所 弾性波装置及び弾性波装置の製造方法
US11463066B2 (en) 2020-10-14 2022-10-04 Resonant Inc. Transversely-excited film bulk acoustic resonators with piezoelectric diaphragm supported by piezoelectric substrate
US12119806B2 (en) 2020-10-30 2024-10-15 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with spiral interdigitated transducer fingers
WO2022102619A1 (ja) * 2020-11-11 2022-05-19 株式会社村田製作所 弾性波装置
US12003226B2 (en) 2020-11-11 2024-06-04 Murata Manufacturing Co., Ltd Transversely-excited film bulk acoustic resonator with low thermal impedance
US12028039B2 (en) 2020-11-13 2024-07-02 Murata Manufacturing Co., Ltd. Forming XBAR devices with excess piezoelectric material removed
US11496113B2 (en) 2020-11-13 2022-11-08 Resonant Inc. XBAR devices with excess piezoelectric material removed
US11405020B2 (en) 2020-11-26 2022-08-02 Resonant Inc. Transversely-excited film bulk acoustic resonators with structures to reduce acoustic energy leakage
CN116547910A (zh) * 2020-12-04 2023-08-04 株式会社村田制作所 声波设备
WO2022124391A1 (ja) * 2020-12-11 2022-06-16 株式会社村田製作所 弾性波装置
WO2022131216A1 (ja) * 2020-12-14 2022-06-23 株式会社村田製作所 弾性波装置
WO2022138552A1 (ja) * 2020-12-22 2022-06-30 株式会社村田製作所 弾性波装置
WO2022138328A1 (ja) * 2020-12-23 2022-06-30 株式会社村田製作所 弾性波装置
US11239816B1 (en) 2021-01-15 2022-02-01 Resonant Inc. Decoupled transversely-excited film bulk acoustic resonators
US12113510B2 (en) 2021-02-03 2024-10-08 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonators with multiple piezoelectric membrane thicknesses on the same chip
CN116964934A (zh) * 2021-03-10 2023-10-27 株式会社村田制作所 弹性波装置
WO2022211104A1 (ja) * 2021-03-31 2022-10-06 株式会社村田製作所 弾性波装置
WO2022210687A1 (ja) * 2021-03-31 2022-10-06 株式会社村田製作所 弾性波装置
WO2022211096A1 (ja) * 2021-03-31 2022-10-06 株式会社村田製作所 弾性波装置及び弾性波装置の製造方法
WO2022210923A1 (ja) * 2021-03-31 2022-10-06 株式会社村田製作所 弾性波装置
WO2022211087A1 (ja) * 2021-03-31 2022-10-06 株式会社村田製作所 弾性波装置
WO2022209525A1 (ja) * 2021-03-31 2022-10-06 株式会社村田製作所 弾性波装置
KR20230147700A (ko) * 2021-03-31 2023-10-23 가부시키가이샤 무라타 세이사쿠쇼 탄성파 장치
WO2022210378A1 (ja) * 2021-03-31 2022-10-06 株式会社村田製作所 弾性波装置
CN117136498A (zh) * 2021-03-31 2023-11-28 株式会社村田制作所 弹性波装置以及弹性波装置的制造方法
WO2022209862A1 (ja) * 2021-04-02 2022-10-06 株式会社村田製作所 弾性波装置
US12057823B2 (en) 2021-05-07 2024-08-06 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator with concentric interdigitated transducer fingers
US12075700B2 (en) 2021-05-07 2024-08-27 Murata Manufacturing Co., Ltd. Transversely-excited film bulk acoustic resonator fabrication using polysilicon pillars
US20230006640A1 (en) 2021-06-30 2023-01-05 Resonant Inc. Transversely-excited film bulk acoustic resonator with reduced substrate to contact bump thermal resistance
WO2023058755A1 (ja) * 2021-10-08 2023-04-13 株式会社村田製作所 弾性波装置および弾性波装置の製造方法
WO2023058767A1 (ja) * 2021-10-08 2023-04-13 株式会社村田製作所 弾性波装置
WO2023085364A1 (ja) * 2021-11-11 2023-05-19 株式会社村田製作所 弾性波装置
CN118318392A (zh) * 2021-11-11 2024-07-09 株式会社村田制作所 弹性波装置
WO2023199837A1 (ja) * 2022-04-14 2023-10-19 株式会社村田製作所 弾性波装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000209063A (ja) * 1998-11-12 2000-07-28 Mitsubishi Electric Corp 薄膜圧電素子
GB0014963D0 (en) * 2000-06-20 2000-08-09 Koninkl Philips Electronics Nv A bulk acoustic wave device
DE10149542A1 (de) * 2001-10-08 2003-04-17 Infineon Technologies Ag BAW-Resonator
CN100442660C (zh) * 2002-05-20 2008-12-10 Nxp股份有限公司 多节滤波器结构和包含多节滤波器结构的无线通信装置
DE10319554B4 (de) * 2003-04-30 2018-05-09 Snaptrack, Inc. Mit akustischen Volumenwellen arbeitendes Bauelement mit gekoppelten Resonatoren
WO2005034345A1 (en) * 2003-10-06 2005-04-14 Philips Intellectual Property & Standards Gmbh Resonator structure and method of producing it
FR2864618B1 (fr) * 2003-12-24 2006-03-03 Temex Sa Capteur de temperature ou de temperature et de pression interrogeable a distance
JP4580766B2 (ja) 2005-01-06 2010-11-17 株式会社東芝 薄膜圧電共振器及び薄膜圧電共振器の製造方法
US7323805B2 (en) * 2004-01-28 2008-01-29 Kabushiki Kaisha Toshiba Piezoelectric thin film device and method for manufacturing the same
EP1575165B1 (en) 2004-03-09 2008-05-07 Infineon Technologies AG Bulk acoustic wave filter and method for eliminating unwanted side passands
US7098758B2 (en) * 2004-11-03 2006-08-29 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Acoustically coupled thin-film resonators having an electrode with a tapered edge
US7446455B2 (en) 2004-12-07 2008-11-04 Matsushita Electric Industrial Co., Ltd. Thin film elastic wave resonator
US7138889B2 (en) 2005-03-22 2006-11-21 Triquint Semiconductor, Inc. Single-port multi-resonator acoustic resonator device
JP4513860B2 (ja) 2005-04-13 2010-07-28 株式会社村田製作所 圧電薄膜フィルタ
JP2006311303A (ja) * 2005-04-28 2006-11-09 River Eletec Kk モード結合型圧電振動子
DE102005061344A1 (de) * 2005-12-21 2007-06-28 Epcos Ag Mit akustischen Volumenwellen arbeitender Resonator
US8141992B2 (en) 2006-03-24 2012-03-27 Seiko Epson Corporation Liquid storage container
US7847656B2 (en) 2006-07-27 2010-12-07 Georgia Tech Research Corporation Monolithic thin-film piezoelectric filters
US7625463B2 (en) * 2006-10-02 2009-12-01 Weyerhaeuser Nr Company Methods for the preparation of fibrous superabsorbent composite containing cellulose
JP2008206139A (ja) 2007-01-25 2008-09-04 Matsushita Electric Ind Co Ltd 二重モード圧電フィルタ、その製造方法、およびそれを用いた高周波回路部品および通信機器
EP2299593A1 (en) * 2009-09-18 2011-03-23 Nxp B.V. Laterally coupled bulk acoustic wave device
FI123640B (fi) * 2010-04-23 2013-08-30 Teknologian Tutkimuskeskus Vtt Laajakaistainen akustisesti kytketty ohutkalvo-BAW-suodin
FI124732B (en) * 2011-11-11 2014-12-31 Teknologian Tutkimuskeskus Vtt Laterally connected bulk wave filter with improved passband characteristics

Also Published As

Publication number Publication date
FI20105443A (fi) 2013-06-17
KR101764787B1 (ko) 2017-08-03
CN102870325B (zh) 2015-09-09
US20150333730A1 (en) 2015-11-19
FI20105443A0 (fi) 2010-04-23
WO2011131844A1 (en) 2011-10-27
EP2561613A4 (en) 2013-11-27
US20130057360A1 (en) 2013-03-07
US10320361B2 (en) 2019-06-11
EP2561613A1 (en) 2013-02-27
FI123640B (fi) 2013-08-30
JP2013528996A (ja) 2013-07-11
US9294069B2 (en) 2016-03-22
CN102870325A (zh) 2013-01-09
KR20130091658A (ko) 2013-08-19
JP5709226B2 (ja) 2015-04-30

Similar Documents

Publication Publication Date Title
EP2561613B1 (en) Wide-band acoustically coupled thin-film baw filter
US20220407500A1 (en) Wide-band acoustically coupled thin-film BAW filter
EP2777153B1 (en) Laterally coupled bulk acoustic wave filter with improved passband characteristics
US11290083B2 (en) Loaded resonators for adjusting frequency response of acoustic wave resonators
WO2020053151A1 (en) Lateral bulk acoustic wave filter
US11894827B2 (en) Loaded series resonators for adjusting frequency response of acoustic wave resonators
US11223341B2 (en) Suppressing parasitic sidebands in lateral bulk acoustic wave resonators
JP2021158594A (ja) 圧電薄膜共振器、フィルタおよびマルチプレクサ

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20121019

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20131029

RIC1 Information provided on ipc code assigned before grant

Ipc: H03H 9/00 20060101ALN20131023BHEP

Ipc: H03H 9/56 20060101ALI20131023BHEP

Ipc: H03H 3/04 20060101ALI20131023BHEP

Ipc: H03H 9/58 20060101ALI20131023BHEP

Ipc: H03H 9/17 20060101ALI20131023BHEP

Ipc: H03H 9/205 20060101ALI20131023BHEP

Ipc: H03H 9/02 20060101AFI20131023BHEP

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

RIC1 Information provided on ipc code assigned before grant

Ipc: H03H 9/00 20060101ALN20141208BHEP

Ipc: H03H 9/56 20060101ALI20141208BHEP

Ipc: H03H 3/04 20060101ALI20141208BHEP

Ipc: H03H 9/58 20060101ALI20141208BHEP

Ipc: H03H 9/02 20060101AFI20141208BHEP

Ipc: H03H 9/17 20060101ALI20141208BHEP

Ipc: H03H 9/205 20060101ALI20141208BHEP

INTG Intention to grant announced

Effective date: 20150113

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

RIC1 Information provided on ipc code assigned before grant

Ipc: H03H 9/17 20060101ALI20150612BHEP

Ipc: H03H 9/02 20060101AFI20150612BHEP

Ipc: H03H 9/58 20060101ALI20150612BHEP

Ipc: H03H 9/00 20060101ALN20150612BHEP

Ipc: H03H 3/04 20060101ALI20150612BHEP

Ipc: H03H 9/56 20060101ALI20150612BHEP

Ipc: H03H 9/205 20060101ALI20150612BHEP

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

INTG Intention to grant announced

Effective date: 20150724

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: TEKNOLOGIAN TUTKIMUSKESKUS VTT OY

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 771095

Country of ref document: AT

Kind code of ref document: T

Effective date: 20160215

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602011022680

Country of ref document: DE

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 6

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20160113

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 771095

Country of ref document: AT

Kind code of ref document: T

Effective date: 20160113

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160414

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160413

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160513

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160430

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160513

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602011022680

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

26N No opposition filed

Effective date: 20161014

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: LU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160421

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160430

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160430

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160413

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 7

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160421

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 8

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20110421

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160430

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160113

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230613

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20240419

Year of fee payment: 14

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20240418

Year of fee payment: 14

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20240426

Year of fee payment: 14