EP2222401A2 - Katalysator und verfahren zur dismutierung von wasserstoff enthaltenden halogensilanen - Google Patents
Katalysator und verfahren zur dismutierung von wasserstoff enthaltenden halogensilanenInfo
- Publication number
- EP2222401A2 EP2222401A2 EP08856913A EP08856913A EP2222401A2 EP 2222401 A2 EP2222401 A2 EP 2222401A2 EP 08856913 A EP08856913 A EP 08856913A EP 08856913 A EP08856913 A EP 08856913A EP 2222401 A2 EP2222401 A2 EP 2222401A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- catalyst
- iso
- propyl
- butyl
- column
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000003054 catalyst Substances 0.000 title claims abstract description 85
- 238000000034 method Methods 0.000 title claims abstract description 30
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 25
- 239000001257 hydrogen Substances 0.000 title claims abstract description 25
- 238000007323 disproportionation reaction Methods 0.000 title claims abstract description 23
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 16
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 10
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 9
- -1 aminoalkyl radical Chemical class 0.000 claims description 44
- 150000003377 silicon compounds Chemical class 0.000 claims description 29
- 238000006243 chemical reaction Methods 0.000 claims description 25
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 20
- 239000012876 carrier material Substances 0.000 claims description 19
- 238000004821 distillation Methods 0.000 claims description 19
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 18
- 239000005052 trichlorosilane Substances 0.000 claims description 18
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 17
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 16
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 15
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 15
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 14
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 14
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 11
- 229910052736 halogen Inorganic materials 0.000 claims description 10
- 150000002367 halogens Chemical class 0.000 claims description 10
- 239000011541 reaction mixture Substances 0.000 claims description 10
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 8
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 229910052740 iodine Inorganic materials 0.000 claims description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052794 bromium Inorganic materials 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 239000011630 iodine Substances 0.000 claims description 4
- 150000007522 mineralic acids Chemical class 0.000 claims description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 3
- 230000007062 hydrolysis Effects 0.000 claims description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 239000012071 phase Substances 0.000 claims description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 claims description 2
- 150000007942 carboxylates Chemical class 0.000 claims description 2
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 claims description 2
- 239000007791 liquid phase Substances 0.000 claims description 2
- DLAUQJZKDAKQGO-UHFFFAOYSA-N n-butyl-n-(3-triethoxysilylpropyl)butan-1-amine Chemical compound CCCCN(CCCC)CCC[Si](OCC)(OCC)OCC DLAUQJZKDAKQGO-UHFFFAOYSA-N 0.000 claims description 2
- BBTZRQRXVWJQOS-UHFFFAOYSA-N n-tert-butyl-2-methyl-n-(3-triethoxysilylpropyl)propan-2-amine Chemical compound CCO[Si](OCC)(OCC)CCCN(C(C)(C)C)C(C)(C)C BBTZRQRXVWJQOS-UHFFFAOYSA-N 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 230000007704 transition Effects 0.000 claims description 2
- 239000010457 zeolite Substances 0.000 claims description 2
- JWZZKOKVBUJMES-UHFFFAOYSA-N (+-)-Isoprenaline Chemical compound CC(C)NCC(O)C1=CC=C(O)C(O)=C1 JWZZKOKVBUJMES-UHFFFAOYSA-N 0.000 claims 1
- AXAGGZTXBNEEDX-UHFFFAOYSA-N 2-methyl-n-(2-methylpropyl)-n-(3-triethoxysilylpropyl)propan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCN(CC(C)C)CC(C)C AXAGGZTXBNEEDX-UHFFFAOYSA-N 0.000 claims 1
- 229910021536 Zeolite Inorganic materials 0.000 claims 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims 1
- 150000004820 halides Chemical class 0.000 claims 1
- LLDDDOVMHJTYCS-UHFFFAOYSA-N n-tert-butyl-2-methyl-n-(3-trimethoxysilylpropyl)propan-2-amine Chemical compound CO[Si](OC)(OC)CCCN(C(C)(C)C)C(C)(C)C LLDDDOVMHJTYCS-UHFFFAOYSA-N 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000005046 Chlorosilane Substances 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- 238000002360 preparation method Methods 0.000 description 8
- 238000001816 cooling Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 150000004756 silanes Chemical class 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 238000012856 packing Methods 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 150000004819 silanols Chemical class 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 239000006228 supernatant Substances 0.000 description 5
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 4
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 4
- 239000011324 bead Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000005049 silicon tetrachloride Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- ZLDHYRXZZNDOKU-UHFFFAOYSA-N n,n-diethyl-3-trimethoxysilylpropan-1-amine Chemical compound CCN(CC)CCC[Si](OC)(OC)OC ZLDHYRXZZNDOKU-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 2
- SCHSRPRSHJKBMZ-UHFFFAOYSA-N 2-methyl-n-(2-methylpropyl)-n-(3-trimethoxysilylpropyl)propan-1-amine Chemical compound CO[Si](OC)(OC)CCCN(CC(C)C)CC(C)C SCHSRPRSHJKBMZ-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910003849 O-Si Inorganic materials 0.000 description 1
- 229910003872 O—Si Inorganic materials 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000005902 aminomethylation reaction Methods 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229940083124 ganglion-blocking antiadrenergic secondary and tertiary amines Drugs 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000001036 glow-discharge mass spectrometry Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000012229 microporous material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- SFMJNHNUOVADRW-UHFFFAOYSA-N n-[5-[9-[4-(methanesulfonamido)phenyl]-2-oxobenzo[h][1,6]naphthyridin-1-yl]-2-methylphenyl]prop-2-enamide Chemical compound C1=C(NC(=O)C=C)C(C)=CC=C1N1C(=O)C=CC2=C1C1=CC(C=3C=CC(NS(C)(=O)=O)=CC=3)=CC=C1N=C2 SFMJNHNUOVADRW-UHFFFAOYSA-N 0.000 description 1
- YGYLBNUUMURMPO-UHFFFAOYSA-N n-butyl-n-(3-trimethoxysilylpropyl)butan-1-amine Chemical compound CCCCN(CCCC)CCC[Si](OC)(OC)OC YGYLBNUUMURMPO-UHFFFAOYSA-N 0.000 description 1
- SSROBHHOWHPCHF-UHFFFAOYSA-N n-octyl-n-(3-trimethoxysilylpropyl)octan-1-amine Chemical compound CCCCCCCCN(CCC[Si](OC)(OC)OC)CCCCCCCC SSROBHHOWHPCHF-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000000066 reactive distillation Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000006318 tert-butyl amino group Chemical group [H]N(*)C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical group 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/12—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing organo-metallic compounds or metal hydrides
- B01J31/123—Organometallic polymers, e.g. comprising C-Si bonds in the main chain or in subunits grafted to the main chain
- B01J31/124—Silicones or siloxanes or comprising such units
- B01J31/127—Silicones or siloxanes or comprising such units the siloxane units, e.g. silsesquioxane units, being grafted onto other polymers or inorganic supports, e.g. via an organic linker
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
- B01J31/0235—Nitrogen containing compounds
- B01J31/0254—Nitrogen containing compounds on mineral substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0272—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing elements other than those covered by B01J31/0201 - B01J31/0255
- B01J31/0274—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing elements other than those covered by B01J31/0201 - B01J31/0255 containing silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10773—Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
Definitions
- the invention relates to a catalyst, its use as well as a process for the dismutation of hydrogen-containing halosilanes, in particular hydrogen-containing chlorosilanes.
- the dismutation reaction is used, for example, to prepare monosilane (SiH 4 ), monochlorosilane (CISiH 3 ) and also dichlorosilane (DCS, H 2 SiCl 2 ) from trichlorosilane (TCS, HSiCb) to form the coupling product silicon tetrachloride (STC, SiCl 4 ).
- the dismutation reaction to produce low chlorinated silanes such as monosilane, monochlorosilane or dichlorosilane, from higher chlorinated silanes, generally trichlorosilane, is performed to more rapidly adjust the chemical balance in the presence of catalysts.
- an exchange of hydrogen and chlorine atoms between two silane molecules is generally carried out according to the general reaction equation (1) in a so-called dismutation or disproportionation reaction.
- x can assume the values 1 to 3.
- the majority of the catalysts used are secondary and tertiary amines or quaternary ammonium salts (cf DE-AS 21 62 537). Thereby, to the
- reaction according to equation (1) is the preparation of dichlorosilane from trichlorosilane according to EP 0 285 937 A1.
- a process for the preparation of dichlorosilane by disproportionation of trichlorosilane is disclosed on a fixed catalyst bed in which gaseous dichlorosilane is removed and recovered under pressures between 0.8 and 1.2 bar and reactor temperatures between 10 0 C and the boiling point of the resulting reaction mixture; Portions of trichlorosilane are condensed and recycled to the reactor, the liquid reaction phase is partially withdrawn from the reactor and separated into tetrachlorosilane and trichlorosilane to be recycled to the reactor.
- catalysts for dismutation also usually ion exchangers are used, for.
- divinylbenzene crosslinked polystyrene resin having tertiary amine groups which is prepared by direct aminomethylation of a styrene-divinylbenzene copolymer (DE 100 57 521 A1), on solids which are attached to a scaffold made of polystyrene, crosslinked with divinylbenzene, amino or Alkylenamino groups, for example, dimethylamino groups (DE 100 61 680 A1, DE 100 17 168 A1), on anion-exchange resins based catalysts with tertiary amino groups or quaternary ammonium groups (DE 33 11 650 A1 ), amine-functionalized inorganic supports (DE 37 11 444) or according to DE 39 25 357 organopolysiloxane catalysts, such as N [(CH 2 ) 3Si ⁇ 3 / 2].
- the catalyst in the catalyst bed may correspond to a structured fabric packing or packing of tissue, alternatively, the catalyst bed may also contain packing or internals of catalytically active material.
- reaction and material separation offer the reactive rectification, because the dismutation reaction is a reaction limited by the chemical equilibrium in the conversion. This fact necessitates the separation of reaction products from the unreacted starting materials in order ultimately to complete the conversion in the overall process.
- the energetically ideal apparatus would be an infinitely high distillation column, in which on each tray or on each theoretical stage by a suitable catalyst or any length of time
- Apparatus would have the lowest possible energy consumption and thus the lowest possible operating costs [cf. Figure 6 and Sundmacher &
- Catalysts on inorganic supports for the production of dichlorosilane (DCS) from trichlorosilane by dismutation The listed catalysts (CH 3 CH 2 O) 3 Si (CH 2 ) 3 N (octyl) 2 and (CH 3 O) 3 Si (CH 2 ) SN (C 2 Hs) 2 have no high activity, so that the catalyst is used in relatively high amounts got to.
- the object of the present invention is to provide a catalyst system for dismutating hydrogen halosilanes which does not have the mentioned disadvantages and enables a more economical process for the preparation of higher hydrogenated hydrogen halosilanes.
- a catalyst according to the invention for the dismutation of hydrogen and halogen-containing silicon compounds comprising a support material and at least one linear, cyclic, branched and / or crosslinked aminoalkyl-functional siloxane and / or silanol, wherein at least one siloxane or silanol in an idealized form corresponds to general formula II,
- A is an aminoalkyl radical - (CH 2 ) 3 -N (R 1 ) 2
- R 1 is the same or different and iso-butyl, n-butyl, tert-butyl and / or a cyclohexyl group
- R 2 independently of one another hydrogen, a methyl, ethyl, n-propyl, iso-propyl
- the catalyst according to the invention has at least one siloxane or silanol with an aminoalkyl radical selected from 3- (N, N-di-n-butylamino), and a> 1 for a silanol ) propyl, 3- (N 1 N-di-tert-butylamino) propyl and / or 3- (N, N-di-iso-butylamino) propyl radical on.
- siloxane bonds (-O-Si-O-), for example, have been formed by condensation of at least two of the original groups -OR 2 , R 3 and / or R 4 .
- these catalysts allow a considerably faster adjustment of the equilibrium position in the dismutation reactions.
- a catalyst In order to produce and recover high purity or ultrahigh purity silicon compounds, a catalyst must be completely anhydrous and / or free of alcohols. High-purity silicon compounds are those whose degree of contamination in the ppb
- Ultrapure purity means impurities in the ppt range and below.
- Metal compounds should be at most in the ppb range up to the ppt range, preferably in the ppt range.
- the required purity can be determined by means of GC, IR, NMR,
- any porous or microporous material is suitable as the carrier material (Y), preferably silicon dioxide (SiO 2 ) or else zeolites, which are used may additionally contain aluminum, iron, titanium, potassium, sodium, calcium and / or magnesium.
- the silica may have an acidic, neutral or basic character.
- the carrier material is particulate and can be used, for example, in the form of shaped articles, such as spheres, pellets, rings, extruded rod-shaped bodies, trilopes, tubes, honeycomb, etc. or in the form of granules, granules or powders, spheres or pellets being preferred.
- the supported catalyst is preferably based on a microporous support having a pore volume of 100 to 1,000 mm 3 / g and a BET surface area of 10 to 500 nrvVg, preferably 50 to 400 nrvVg, particularly preferably 100 to 200 nrvVg.
- the expert can determine the pore volume and the BET surface area by means of methods known per se.
- the support material preferably has a geometric surface area of 100 to 2,000 m 2 / m 3 or a bulk volume of 0.1 to 2 kg / l, preferably of 0.2 to 1 kg / l, particularly preferably 0.4 to 0.9 kg / l, up.
- the ready-to-use, supported catalyst should be absolutely free of water, solvents, and oxygen, and should not release these materials on heating.
- the content of aminoalkylalkoxysilane compound used for modifying or impregnating the support material in the preparation of the catalyst is preferably from 0.1 to 40% by weight, based on the amount of support. Levels of from 1 to 25% by weight, more preferably from 10 to 20% by weight, based on the support material, are preferred.
- aminoalkyl-functional siloxane or silanol of the general formula (II) deposited on the carrier or condensed with the carrier material and advantageously covalently bound thereto via Y-O-Si
- the aminoalkyl-functional siloxane or silanol may also be deposited as an ammonium salt from a solvent, for example as a hydrohalide such as hydrochloride. In another alternative, it may also be deposited with a carboxylate or sulfate as the counterion.
- the invention furthermore relates to a process for the preparation of the catalysts according to the invention and to catalysts obtainable by the process in which a support material and at least one alkoxysilane of the general formula I
- A is an aminoalkyl radical - (CH 2 ) 3 -N (R 1 ) 2 and R 1 is identical or different and iso-butyl, n-butyl, tert-butyl and / or cyclohexyl group
- R 2 is hydrogen, methyl, ethyl, n-propyl or iso-propyl group
- R 3 and R 4 are independently a hydroxy, methoxy, ethoxy, n-propoxy, iso-propoxy , Methyl, ethyl, n-propyl and / or iso-propyl group
- aqueous alcohols for hydrolysis these are, for example, methanol, ethanol, isopropanol with a water content which is in particular in the range from 0.5 to 30% by weight, preferably from 0.5 to 10% by weight. %, more preferably between 1 to 5 wt .-%, is located.
- 0.5 to 50 mol of water in particular 1 to 20 mol of water, are advantageously used, ie added during the hydrolysis.
- all solvents are suitable in which the compound of formula I and / or the process product are soluble.
- Particular preference is given to hydrolyzing and / or condensing in aqueous ethanolic solution.
- the reaction may be carried out at temperatures between 0 and 150 0 C, under atmospheric pressure or reduced pressure, preferably at 1 to 1 000 mbar, more preferably at 50 to 800 mbar, in particular at 100 to 500 mbar, wherein the reaction is preferably in the boiling heat he follows.
- At least one alkoxysilane is selected from the group 3- (N, N-di-n-butylamino) propyltrimethoxysilane, 3- (N, N-di-n-butylamino) propyltriethoxysilane, 3- (N, N-di-) tert-butylamino) propylthmethoxysilan, 3- (N, N-di-tert-butylamino) - propyltriethoxysilane, 3- (N, N-di-iso-butylamino) propylthmethoxysilan or 3- (N 1 N-di- iso-butylamino ) Propyltriethoxysilane reacted in the presence of a carrier material, wherein the carrier material is preferably based on silica particles.
- alkoxysilanes of the general formula (I) may have the following substituents, where R 1 is an isobutyl, n-butyl or tert-butyl group, R 2 is a methyl, ethyl, n-propyl or isobutyl Propyl group and R 4 and R 3 of a methoxy, ethoxy, n-propoxy and / or iso-propoxy group correspond.
- the ready-to-use catalyst according to the invention for the production of highly pure or ultrahigh-purity silicon compounds must be absolutely anhydrous and / or free of alcohols.
- the coated catalyst support is advantageously dried to constant weight.
- the catalyst according to the invention is used in the dismutation of hydrogen and halogen-containing silicon compounds, in particular of 10
- Halosilanes such as trichlorosilane, which can react to dichlorosilane, monosilane, monochlorosilane and tetrachlorosilane.
- the invention also provides a process for the dismutation of hydrogen and halogen-containing silicon compounds on the aminoalkyl-functional catalyst according to the invention, which is located in a reactor, wherein the
- Halogen-containing silicon compound is brought into contact, wherein at least one siloxane or silanol in an idealized form of the general formula II,
- A is an aminoalkyl radical - (CH 2 ) 3 -N (R 1 ) 2
- R 1 is identical or different and iso-butyl, n-butyl, tert-butyl and / or cyclohexyl
- R 2 and R 4 independently of one another are hydroxyl, methoxy, ethoxy, n-propoxy, R 2 and R 4 are each independently of the other hydrogen, a methyl, ethyl, n-propyl, isopropyl group or Y; iso-propoxy, methyl, ethyl, n-propyl, iso-propyl and / or -OY, where Y is the support, HW is an acid, where W is an inorganic or organic acid radical, with a> 1 for the silanol, a> 2 for the siloxane and w> 0, and wherein at least a portion of the resulting reaction mixture is worked up.
- a preferred catalyst comprises siloxanes and / or silanols having at least one of the following aminoalkyl radicals A, 3- (N, N-di-n-butylamino) propyl, 3- (N, N-di-tert-butylamino) propyl -, and / or 3- (N, N-di-iso-butylamino) propyl groups, wherein the siloxanes and / or silanols in the presence of a carrier material, which is preferably based on the silica described above, were prepared. Depending on the reaction procedure and reactor, the most favorable form of carrier material can be selected. 1 1
- the catalyst is continuously flown in a reactor with at least one silicon compound of the general formula III H n Si m X (2m + 2-n) to be disiloxane, where X independently of one another corresponds to fluorine, chlorine, bromine and / or iodine and 1 ⁇ n ⁇ (2m + 2) and 1 ⁇ m ⁇ 12, preferably 1 ⁇ m ⁇ 6, more preferably trichlorosilane is converted to dichlorosilane, monochlorosilane and monosilane, which are subsequently separated.
- the silicon tetrachloride also formed is withdrawn from the chemical equilibrium discontinuously or continuously and can be purified separately.
- the catalyst is preferably in a catalyst bed.
- the separation of the halosilanes can take place by means of a column assigned to the reactor, which can be connected, for example, directly to the reactor.
- a column assigned to the reactor which can be connected, for example, directly to the reactor.
- higher hydrogenated silicon compounds can be recovered as low boilers at the top of the column and higher chlorinated silicon compounds are enriched as high boilers in a collecting vessel, while at least one unreacted silicon compound recovered as medium boilers on the column and again can be supplied to the associated reactor.
- the catalyst in a catalyst bed in a reactor is assigned to a separating tray of a column, for example a rectification column.
- This plant comprises an inventive
- Catalyst comprising a support material with siloxanes and / or silanols based on the reaction of an aminoalkylalkoxysilane of the general formula I, in particular siloxanes and / or silanols according to the general formula II, wherein the system comprises at least one distillation column (1) with a 12
- the starting or filling of the system with higher chlorinated silanes as reactant, in particular with trichlorosilane, and the Eduktzuschreib during operation of the system can be done for example via leads or taps of Eduktaufgabe (1.3) and / or on the column template (1.1).
- a removal of products can be carried out via the top of the column (1.8), the removal point (1.5) and / or the column template (1.4).
- the catalyst may be present in the catalyst bed (3) in the form of packing, which may be present, for example, as a bed or as a compressed mold body.
- the plant can be advantageously equipped with a heated column bottom (1.6, 1.1) and a cryogenic cooling (1.7) in the column head (1.2).
- the column (1) can be equipped with at least one column packing (8) and have at least one additional educt feed (1.3) or product removal (1.5). 13
- the catalyst bed of a side reactor is preferably operated at a temperature from -80 to 120 0 C, with the reactor or catalyst bed temperature regulated advantageously of a cooling or heating jacket of the reactor or controlled (2.1) will can.
- a sufficiently long residence time on the catalyst i. H. a sufficiently low catalyst loading is to ensure the approximate achievement of the chemical equilibrium
- the reactor as conventional reactors for comparable product flows.
- the usable reactors (2) should be dimensioned so that 80 to 98% of the equilibrium conversion can be achieved.
- the silicon compounds dichlorosilane, monochlorosilane and / or monosilane prepared by the process according to the invention are highly pure to ultra-high purity and are especially suitable as precursors for the production of silicon nitride, silicon oxynitride, silicon carbide, silicon oxycarbide or silicon oxide and as precursors for generating epitaxial layers.
- the SiO 2 balls were predried for one hour at a pressure of 300 to 30 mbar and a bath temperature of 110 to 120 0 C and then dried for 9.5 hours at ⁇ 1 mbar.
- reaction mixture 150 m 2 / g, bulk density: 0.55 g / cm 3 ). The reaction mixture was
- the comparative examples clearly demonstrate that the catalyst of the invention is able to adjust the desired short residence times of trichlorosilane on the catalyst. Short residence times are particularly desirable in continuous process control.
- the catalyst prepared according to Example 3 was subjected to continuous operation over several months and checked its activity. In addition, the continuous operation was interrupted, the catalyst bed drained and put back into operation. The determination of the rates of dissolution showed a constant activity of the catalyst.
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13154517.0A EP2591856A1 (de) | 2007-12-06 | 2008-10-08 | Anlage mit Katalysator zur Dismutierung von Wasserstoff enthaltenden Halogensilanen |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007059170A DE102007059170A1 (de) | 2007-12-06 | 2007-12-06 | Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen |
| PCT/EP2008/063461 WO2009071358A2 (de) | 2007-12-06 | 2008-10-08 | Katalysator und verfahren zur dismutierung von wasserstoff enthaltenden halogensilanen |
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| EP08856913A Withdrawn EP2222401A2 (de) | 2007-12-06 | 2008-10-08 | Katalysator und verfahren zur dismutierung von wasserstoff enthaltenden halogensilanen |
| EP13154517.0A Withdrawn EP2591856A1 (de) | 2007-12-06 | 2008-10-08 | Anlage mit Katalysator zur Dismutierung von Wasserstoff enthaltenden Halogensilanen |
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| US (1) | US20100296994A1 (enExample) |
| EP (2) | EP2222401A2 (enExample) |
| JP (1) | JP2011505246A (enExample) |
| KR (1) | KR20100092478A (enExample) |
| CN (1) | CN101450323A (enExample) |
| BR (1) | BRPI0821154A2 (enExample) |
| CA (1) | CA2706418A1 (enExample) |
| DE (1) | DE102007059170A1 (enExample) |
| RU (1) | RU2492924C9 (enExample) |
| UA (1) | UA104851C2 (enExample) |
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| DE102005041137A1 (de) | 2005-08-30 | 2007-03-01 | Degussa Ag | Reaktor, Anlage und großtechnisches Verfahren zur kontinuierlichen Herstellung von hochreinem Siliciumtetrachlorid oder hochreinem Germaniumtetrachlorid |
| DE102006003464A1 (de) * | 2006-01-25 | 2007-07-26 | Degussa Gmbh | Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung |
| DE102007007874A1 (de) | 2007-02-14 | 2008-08-21 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Silane |
| DE102007014107A1 (de) | 2007-03-21 | 2008-09-25 | Evonik Degussa Gmbh | Aufarbeitung borhaltiger Chlorsilanströme |
| DE102007048937A1 (de) * | 2007-10-12 | 2009-04-16 | Evonik Degussa Gmbh | Entfernung von polaren organischen Verbindungen und Fremdmetallen aus Organosilanen |
| DE102007050199A1 (de) * | 2007-10-20 | 2009-04-23 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus anorganischen Silanen |
| DE102007050573A1 (de) * | 2007-10-23 | 2009-04-30 | Evonik Degussa Gmbh | Großgebinde zur Handhabung und für den Transport von hochreinen und ultra hochreinen Chemikalien |
| DE102008002537A1 (de) * | 2008-06-19 | 2009-12-24 | Evonik Degussa Gmbh | Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens |
| DE102008054537A1 (de) * | 2008-12-11 | 2010-06-17 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration |
| DE102009027728A1 (de) * | 2009-07-15 | 2011-01-20 | Evonik Degussa Gmbh | Verfahren zur Behandlung von Katalysator-Präkursoren |
| DE102009027730A1 (de) * | 2009-07-15 | 2011-01-27 | Evonik Degussa Gmbh | Verahren und Verwendung von aminofunktionellen Harzen zur Dismutierung von Halogensilanen und zur Entfernung von Fremdmetallen |
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| DE102010002342A1 (de) | 2010-02-25 | 2011-08-25 | Evonik Degussa GmbH, 45128 | Verwendung der spezifischen Widerstandsmessung zur indirekten Bestimmung der Reinheit von Silanen und Germanen und ein entsprechendes Verfahren |
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| EP1661628A1 (en) * | 2004-11-25 | 2006-05-31 | Total Petrochemicals Research Feluy | Process for dispersing functional molecules on the surface of a support and support made by this process |
| RU2279403C1 (ru) * | 2004-12-27 | 2006-07-10 | Федеральное государственное унитарное предприятие "Государственный научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП ГНИИХТЭОС) | Способ получения моносилана высокой чистоты |
| DE102005041137A1 (de) * | 2005-08-30 | 2007-03-01 | Degussa Ag | Reaktor, Anlage und großtechnisches Verfahren zur kontinuierlichen Herstellung von hochreinem Siliciumtetrachlorid oder hochreinem Germaniumtetrachlorid |
| UA13211U (en) * | 2005-10-10 | 2006-03-15 | Yurii Oleksandrovych Kasatkin | A method for producing monosilane |
| DE102006003464A1 (de) * | 2006-01-25 | 2007-07-26 | Degussa Gmbh | Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung |
| DE102007023759A1 (de) * | 2006-08-10 | 2008-02-14 | Evonik Degussa Gmbh | Anlage und Verfahren zur kontinuierlichen industriellen Herstellung von Fluoralkylchlorsilan |
| DE102007007874A1 (de) * | 2007-02-14 | 2008-08-21 | Evonik Degussa Gmbh | Verfahren zur Herstellung höherer Silane |
| DE102007014107A1 (de) * | 2007-03-21 | 2008-09-25 | Evonik Degussa Gmbh | Aufarbeitung borhaltiger Chlorsilanströme |
| DE102007048937A1 (de) * | 2007-10-12 | 2009-04-16 | Evonik Degussa Gmbh | Entfernung von polaren organischen Verbindungen und Fremdmetallen aus Organosilanen |
| DE102007050199A1 (de) * | 2007-10-20 | 2009-04-23 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus anorganischen Silanen |
| DE102007050573A1 (de) * | 2007-10-23 | 2009-04-30 | Evonik Degussa Gmbh | Großgebinde zur Handhabung und für den Transport von hochreinen und ultra hochreinen Chemikalien |
| DE102008004397A1 (de) * | 2008-01-14 | 2009-07-16 | Evonik Degussa Gmbh | Verfahren zur Verminderung des Gehaltes von Elementen, wie Bor, in Halogensilanen sowie Anlage zur Durchführung des Verfahrens |
| US20090197014A1 (en) * | 2008-02-04 | 2009-08-06 | Atomic Energy Council - Institute Of Nuclear Energy Research | Apparatus and method for coating diamond on work pieces via hot filament chemical vapor deposition |
| DE102009053804B3 (de) * | 2009-11-18 | 2011-03-17 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hydridosilanen |
-
2007
- 2007-12-06 DE DE102007059170A patent/DE102007059170A1/de not_active Withdrawn
-
2008
- 2008-10-08 EP EP08856913A patent/EP2222401A2/de not_active Withdrawn
- 2008-10-08 JP JP2010536387A patent/JP2011505246A/ja active Pending
- 2008-10-08 EP EP13154517.0A patent/EP2591856A1/de not_active Withdrawn
- 2008-10-08 CA CA2706418A patent/CA2706418A1/en not_active Abandoned
- 2008-10-08 US US12/744,204 patent/US20100296994A1/en not_active Abandoned
- 2008-10-08 KR KR1020107012312A patent/KR20100092478A/ko not_active Ceased
- 2008-10-08 RU RU2010127424/04A patent/RU2492924C9/ru not_active IP Right Cessation
- 2008-10-08 UA UAA201008397A patent/UA104851C2/uk unknown
- 2008-10-08 WO PCT/EP2008/063461 patent/WO2009071358A2/de not_active Ceased
- 2008-10-08 BR BRPI0821154-0A patent/BRPI0821154A2/pt not_active IP Right Cessation
- 2008-12-05 CN CNA2008101798085A patent/CN101450323A/zh active Pending
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2009071358A2 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20100296994A1 (en) | 2010-11-25 |
| RU2492924C2 (ru) | 2013-09-20 |
| KR20100092478A (ko) | 2010-08-20 |
| WO2009071358A2 (de) | 2009-06-11 |
| CA2706418A1 (en) | 2009-06-11 |
| EP2591856A1 (de) | 2013-05-15 |
| WO2009071358A3 (de) | 2009-08-13 |
| DE102007059170A1 (de) | 2009-06-10 |
| CN101450323A (zh) | 2009-06-10 |
| JP2011505246A (ja) | 2011-02-24 |
| BRPI0821154A2 (pt) | 2015-06-16 |
| RU2010127424A (ru) | 2012-01-20 |
| UA104851C2 (uk) | 2014-03-25 |
| RU2492924C9 (ru) | 2014-03-27 |
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