EP1934382A1 - Verfahren zur herstellung eines beschichteten substratkörpers, substratkörper mit einer beschichtung und verwendung des beschichteten substratkörpers - Google Patents
Verfahren zur herstellung eines beschichteten substratkörpers, substratkörper mit einer beschichtung und verwendung des beschichteten substratkörpersInfo
- Publication number
- EP1934382A1 EP1934382A1 EP06805375A EP06805375A EP1934382A1 EP 1934382 A1 EP1934382 A1 EP 1934382A1 EP 06805375 A EP06805375 A EP 06805375A EP 06805375 A EP06805375 A EP 06805375A EP 1934382 A1 EP1934382 A1 EP 1934382A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- substrate body
- coating
- layer
- nitrogen
- ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 4
- 238000000576 coating method Methods 0.000 title claims description 26
- 239000011248 coating agent Substances 0.000 title claims description 20
- 238000005520 cutting process Methods 0.000 claims abstract description 19
- -1 monocyclic hydrocarbon Chemical class 0.000 claims abstract description 16
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 15
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 9
- 238000000151 deposition Methods 0.000 claims abstract description 9
- 230000008021 deposition Effects 0.000 claims abstract description 9
- 150000002825 nitriles Chemical class 0.000 claims abstract description 8
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- 230000000737 periodic effect Effects 0.000 claims abstract description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 87
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical group CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 66
- 239000010410 layer Substances 0.000 claims description 45
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 32
- 239000007789 gas Substances 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 17
- 229910052757 nitrogen Inorganic materials 0.000 claims description 16
- 229910052799 carbon Inorganic materials 0.000 claims description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 9
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 8
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 3
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 239000000969 carrier Substances 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- 238000009792 diffusion process Methods 0.000 claims description 3
- 238000003754 machining Methods 0.000 claims description 3
- 125000001477 organic nitrogen group Chemical group 0.000 claims description 3
- 239000002356 single layer Substances 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052582 BN Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- 230000004888 barrier function Effects 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000011195 cermet Substances 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 238000005553 drilling Methods 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 238000003801 milling Methods 0.000 claims description 2
- 150000003852 triazoles Chemical class 0.000 claims description 2
- 238000007514 turning Methods 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 2
- 229910000997 High-speed steel Inorganic materials 0.000 claims 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 claims 1
- 150000004656 dimethylamines Chemical class 0.000 claims 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 4
- 238000002474 experimental method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- 238000007792 addition Methods 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910010165 TiCu Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000013074 reference sample Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical class O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- CKUAXEQHGKSLHN-UHFFFAOYSA-N [C].[N] Chemical compound [C].[N] CKUAXEQHGKSLHN-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000004966 cyanoalkyl group Chemical group 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 235000019256 formaldehyde Nutrition 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 239000002347 wear-protection layer Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T407/00—Cutters, for shaping
- Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition
Definitions
- the invention relates to a method for producing a coated substrate body by CVD deposition of at least one layer of a carbonitride of a metal of the IVa-Vla group of the periodic table.
- the invention further relates to a coated substrate body and its use.
- Hard coatings have long been known and serve to increase the wear resistance of a body to the surface.
- a single-layer or multi-layer surface coating has been used successfully for years.
- the best-known wear protection coatings include TiCN and TiC.
- inorganic substrates with carbides, nitrides and / or carbonitrides of iron, boron, silicon or the transition metals of the IVa-Vla group of the Periodic Table or derivatives thereof with carbon or nitrogen-supplying organic substances , optionally in the presence of other additives, can be deposited.
- organic carbon and nitrogen suppliers a variety of substances, including cyanoalkyl called.
- Derivatives of said metals are said to be used in the form of hydrides, carbonyls, carbonyl hydrides, organometallic compounds and halides.
- the chemical deposition (CVD) should run between 500 0 C and 800 0 C.
- EP 0440167 B1 where a method is described, to be applied in which a Cermetsubstrat Stress at least carbonitride a T ⁇ tan- by CVD at temperatures between 700 ° to 900 0 C, wherein in the used CVD method, a Acetonitrile-containing reaction gas to be used in addition to titanium tetrachloride and hydrogen.
- a CermetsubstratSh at least carbonitride a T ⁇ tan- by CVD at temperatures between 700 ° to 900 0 C
- a Acetonitrile-containing reaction gas to be used in addition to titanium tetrachloride and hydrogen.
- TiC is deposited in the prior art mostly by using CH 4 by CVD.
- DD 276 603 A3 proposes the use of a gas mixture containing C 6 H 6 for the deposition of TiC.
- Benzene as a carbon carrier can also be used in conjunction with nitrogen or nitrogen derivatives for the deposition of TiCN.
- substrate bodies with TiCN layers which have a high C content In the machining of cast iron, it is preferable to use substrate bodies with TiCN layers which have a high C content.
- TiCN coated substrate bodies are to be used for steel cutting, a prior art TiCN having an increased nitrogen content is selected.
- the C / N ratio in TiCN layers can be controlled by varying the gas amounts of N 2 (as the sole nitrogen donor) and CH 4 (as the sole carbon donor) in the gas phase, however here a TiCN layer with isotropic properties, which have a worse wear resistance than TiCN layers with anisotropic properties.
- the object of the invention is to specify a method with which a layer or a layer system with high wear resistance is to be produced. It should also be an object to provide a corresponding coated substrate body and its use.
- organic nitrogen carrier preferably a nitrile
- organic carbon support preferably a monocyclic hydrocarbon
- the organic carbon-nitrogen carriers namely, on the one hand, for example, a nitrile, especially acetonitrile or an amine, for example ethylamine and / or dimethylamine or nitrogen-containing heterocyclic hydrocarbons, for example pyridines or pyrimidines or triazoles as nitrogen donors, and a monocyclic hydrocarbon,
- a nitrile especially acetonitrile or an amine, for example ethylamine and / or dimethylamine or nitrogen-containing heterocyclic hydrocarbons, for example pyridines or pyrimidines or triazoles as nitrogen donors
- a monocyclic hydrocarbon for example, benzene, toluene, cyclohexane, styrene as a carbon donor, the C / N ratio in the Carbinitrid harsh can be set specifically (shifting), wherein the deposited layer is anisotropic, ie textured.
- the substrate body produced by this process has in particular a microhardness HV 0.05 of> 2,500.
- machining in particular turning, milling or drilling with high cutting speeds over 250 m / min.
- acetonitrile is used as the nitrile in the gas phase.
- Benzene or cyclohexane are particularly preferred as the monocyclic hydrocarbon, but toluene, xylene, styrene and / or mixtures of the abovementioned monocyclic hydrocarbons can also be used.
- the gas phase in addition to the organic nitrogen carrier and the monocyclic hydrocarbon free nitrogen in the form of N 2 gas and / or carbon monoxide CO gas and / or NH 3 is added.
- these additions can further refine the grain size and alter the textures and C / N ratio in the TiCN layer.
- the coating at temperatures of 88O 0 C to 97O 0 C, in particular at 94O 0 C to 970 0 C applied.
- a gas atmosphere pressure during the coating between 5kPa and 5OkPa, preferably 1OkPa is selected.
- the substrate body may be made of a metal, a cermet, a cemented carbide, a ceramic or a cubic boron nitride (CBN) and steel.
- the deposited layer it is possible both for the deposited layer to be the only layer on the substrate body, the cover layer for multiple layers or an intermediate layer, in particular a diffusion barrier.
- the individual layers may have the same or different composition and / or structure.
- the thickness of a single layer or one of several deposited layers is preferably between 0.1 ⁇ m and 15 ⁇ m.
- the total thickness of a multilayer coating is according to the invention a maximum of 25 microns, especially a maximum of 10 microns.
- the deposited layer or layers preferably consist of a carbonitride of titanium, zirconium, hafnium, vanadium or chromium or mixture crystals thereof.
- the ratio of the nitrile (AN) to the monocyclic hydrocarbon (BZ) is between 1: 0 and 1: 1, preferably between 2: 1 and 1:16 and in particular between 1: 3 and 1:10 in the gas phase during the coating chosen.
- the substrate body produced according to the preceding method features according to the invention preferably has a coating with a microhardness HV 0.05 of> 2.500.
- the cutting insert is particularly suitable for cutting work with high cutting speeds.
- the coated substrate body according to the present invention can also be used as a wear-resistant structural component, wherein the wear-resistant layers can be additionally combined with other wear-resistant layers known from the prior art.
- the coated body can be aftertreated, in particular by blasting or brushing.
- 1a, 2a and 3a are respectively plan views of TiCN grain structures obtained in different experiments.
- Fig.1b, 2b and 3b respectively REM-Bruchge Stahln corresponding
- TiCN variants as a function of the proportion of benzene in an acetonitrile / benzene mixture.
- a substrate body which consisted of a cemented carbide of composition 85.3 mass% WC, 2.7 mass% mixed carbides (ie tantalum, titanium and niobium carbides) and 12 mass% cobalt.
- This body was subjected to a CVD process in a coating reactor at temperatures between 940 0 C and 970 0 C and a pressure of 8kPa (80 mbar), in which the ratio of acetonitrile (AN) to the benzene (BZ) in different series of experiments between 1: 0 and 0: 1 has been varied.
- TiCU and H 2 as the carrier gas in the gas atmosphere were included.
- the hardness of the deposited TiCN layer can be significantly increased, as evidenced by the diagram in FIG.
- a significant increase in hardness could be achieved, with the hardness curve going through a maximum which is approximately in the range in which the ratio between acetonitrile and benzene is between 1 : 3 and 1:10 is.
- nitrogen and carbon a further increase in hardness could be achieved at this maximum, with the greatest hardness being obtained if acetonitrile, benzene and nitrogen gas are present in the atmosphere in addition to the metal chloride and hydrogen.
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Drilling Tools (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005049393.9A DE102005049393B4 (de) | 2005-10-15 | 2005-10-15 | Verfahren zur Herstellung eines beschichteten Substratkörpers, Substratkörper mit einer Beschichtung und Verwendung des beschichteten Substratkörpers |
| PCT/DE2006/001755 WO2007045209A1 (de) | 2005-10-15 | 2006-10-07 | Verfahren zur herstellung eines beschichteten substratkörpers, substratkörper mit einer beschichtung und verwendung des beschichteten substratkörpers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1934382A1 true EP1934382A1 (de) | 2008-06-25 |
Family
ID=37800013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP06805375A Withdrawn EP1934382A1 (de) | 2005-10-15 | 2006-10-07 | Verfahren zur herstellung eines beschichteten substratkörpers, substratkörper mit einer beschichtung und verwendung des beschichteten substratkörpers |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8012535B2 (enExample) |
| EP (1) | EP1934382A1 (enExample) |
| JP (1) | JP5184364B2 (enExample) |
| CN (1) | CN101305112B (enExample) |
| DE (1) | DE102005049393B4 (enExample) |
| WO (1) | WO2007045209A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1897970B2 (en) * | 2006-09-05 | 2016-06-15 | Tungaloy Corporation | Coated cutting tool and method for producing the same |
| CN103108716B (zh) * | 2010-09-07 | 2015-07-01 | 住友电工硬质合金株式会社 | 表面被覆切削工具 |
| CN102847962B (zh) * | 2011-06-29 | 2016-05-04 | 三菱综合材料株式会社 | 硬质包覆层发挥优异的耐崩刀性的表面包覆切削工具 |
| DE102011087715A1 (de) | 2011-12-05 | 2013-07-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hartstoffbeschichtete körper aus metall, hartmetall, cermet oder keramik sowie verfahren zur herstellung derartiger körper |
| EP3000913B1 (en) | 2014-09-26 | 2020-07-29 | Walter Ag | Coated cutting tool insert with MT-CVD TiCN on TiAI(C,N) |
| WO2016114157A1 (ja) * | 2015-01-14 | 2016-07-21 | 宇部興産株式会社 | 金属炭窒化膜又は半金属炭窒化膜の製造方法、金属炭窒化膜又は半金属炭窒化膜及び金属炭窒化膜又は半金属炭窒化膜の製造装置 |
| JP2016130337A (ja) * | 2015-01-14 | 2016-07-21 | 宇部興産株式会社 | 金属又は半金属炭窒化膜の製造方法 |
| JP2016138325A (ja) * | 2015-01-29 | 2016-08-04 | 宇部興産株式会社 | 金属又は半金属炭窒化膜の製造方法 |
| US11939670B2 (en) | 2018-09-28 | 2024-03-26 | Corning Incorporated | Low temperature methods for depositing inorganic particles on a metal substrate and articles produced by the same |
| JP7141601B2 (ja) * | 2019-12-19 | 2022-09-26 | 株式会社タンガロイ | 被覆切削工具 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020086147A1 (en) * | 2000-05-31 | 2002-07-04 | Mitsubishi Materials Corporation | Coated cemented carbide cutting tool member and process for producing the same |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3846162A (en) * | 1968-10-21 | 1974-11-05 | Texas Instruments Inc | Metal carbonitride coatings |
| US3771976A (en) | 1971-01-08 | 1973-11-13 | Texas Instruments Inc | Metal carbonitride-coated article and method of producing same |
| FR2216276B1 (enExample) * | 1973-02-06 | 1976-11-05 | Roussel Uclaf | |
| FR2216273B1 (enExample) * | 1973-02-06 | 1977-07-22 | Roussel Uclaf | |
| CH590339A5 (enExample) | 1974-02-07 | 1977-08-15 | Ciba Geigy Ag | |
| CA1047899A (en) * | 1974-02-07 | 1979-02-06 | Diethelm Bitzer | Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides |
| US4196233A (en) * | 1974-02-07 | 1980-04-01 | Ciba-Geigy Corporation | Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides |
| DD276603A3 (de) * | 1984-12-03 | 1990-03-07 | Akad Wissenschaften Ddr | Verschleissfester ueberzug, insbesondere fuer werkzeuge, und verfahren zu seiner herstellung |
| DD279603A1 (de) | 1985-12-06 | 1990-06-13 | Inst F Pflanzenschutzforsch Kl | Mittel zur larvenschlupfinduktion bei zystenbildenden nematoden |
| US5223337A (en) * | 1988-12-10 | 1993-06-29 | Fried. Krupp Gmbh | Tool produced by a plasma-activated CVD process |
| US5436071A (en) | 1990-01-31 | 1995-07-25 | Mitsubishi Materials Corporation | Cermet cutting tool and process for producing the same |
| US5223945A (en) * | 1990-01-31 | 1993-06-29 | Sony Corporation | Recording mode discrimination circuit |
| JP2775955B2 (ja) | 1990-01-31 | 1998-07-16 | 三菱マテリアル株式会社 | 耐摩耗性に優れたコーティングサーメットの製造法 |
| DE19530518A1 (de) * | 1995-08-19 | 1997-02-20 | Widia Gmbh | Verfahren zur Herstellung von Multikomponenten-Carbonitrid-Hartstoffschichten und Verbundkörper |
| DE19722728A1 (de) * | 1996-12-24 | 1998-06-25 | Widia Gmbh | Verbundkörper, bestehend aus einem Hartmetall-, Cermet-, oder Keramiksubstratkörper und Verfahren zu seiner Herstellung |
| US6472060B1 (en) | 2000-01-19 | 2002-10-29 | Seco Tools Ab | Coated body with nanocrystalline CVD coating for enhanced edge toughness and reduced friction |
| JP4437353B2 (ja) | 2000-03-30 | 2010-03-24 | 株式会社タンガロイ | 被覆切削工具およびその製造方法 |
| US6650498B1 (en) * | 2000-09-12 | 2003-11-18 | Hitachi Global Storage Technologies Netherlands B.V. | Actuator retract circuit for dual speed hard disk drive |
| DE10258282A1 (de) * | 2002-12-13 | 2004-07-08 | Walter Ag | CVD-Beschichtungsverfarhen für ZrBx CyNz-Schichten (x+y+z = 1) sowie beschichtetes Schneidwerkzeug |
| SE527346C2 (sv) | 2003-04-24 | 2006-02-14 | Seco Tools Ab | Skär med beläggning av skikt av MTCVD-Ti (C,N) med styrd kornstorlek och morfologi och metod för att belägga skäret |
| SE527349C2 (sv) | 2003-04-24 | 2006-02-14 | Seco Tools Ab | Skär med beläggning av skikt av MTCVD-Ti (C,N) med styrd kornstorlek och morfologi och metod för att belägga skäret |
| DE10320652A1 (de) * | 2003-05-07 | 2004-12-02 | Kennametal Widia Gmbh & Co.Kg | Werkzeug, insbesondere Schneidwerkzeug und Verfahren zur CVD-Abscheidung einer zweiphasigen Schicht auf einem Substratkörper |
-
2005
- 2005-10-15 DE DE102005049393.9A patent/DE102005049393B4/de not_active Expired - Lifetime
-
2006
- 2006-10-07 CN CN2006800345265A patent/CN101305112B/zh active Active
- 2006-10-07 EP EP06805375A patent/EP1934382A1/de not_active Withdrawn
- 2006-10-07 US US12/067,897 patent/US8012535B2/en active Active
- 2006-10-07 WO PCT/DE2006/001755 patent/WO2007045209A1/de not_active Ceased
- 2006-10-07 JP JP2008534863A patent/JP5184364B2/ja not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020086147A1 (en) * | 2000-05-31 | 2002-07-04 | Mitsubishi Materials Corporation | Coated cemented carbide cutting tool member and process for producing the same |
Non-Patent Citations (1)
| Title |
|---|
| See also references of WO2007045209A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090042059A1 (en) | 2009-02-12 |
| WO2007045209A1 (de) | 2007-04-26 |
| DE102005049393A1 (de) | 2007-04-19 |
| JP5184364B2 (ja) | 2013-04-17 |
| US8012535B2 (en) | 2011-09-06 |
| CN101305112A (zh) | 2008-11-12 |
| CN101305112B (zh) | 2010-11-10 |
| DE102005049393B4 (de) | 2019-08-08 |
| JP2009511283A (ja) | 2009-03-19 |
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