EP1798313B1 - Verfahren zur Abscheidung rissfreier, korrosionsbeständiger und harter Chrom- und Chromlegierungsschichten - Google Patents
Verfahren zur Abscheidung rissfreier, korrosionsbeständiger und harter Chrom- und Chromlegierungsschichten Download PDFInfo
- Publication number
- EP1798313B1 EP1798313B1 EP06004787.5A EP06004787A EP1798313B1 EP 1798313 B1 EP1798313 B1 EP 1798313B1 EP 06004787 A EP06004787 A EP 06004787A EP 1798313 B1 EP1798313 B1 EP 1798313B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- chromium
- mol
- acid
- depositing
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 43
- 229910052804 chromium Inorganic materials 0.000 title claims description 34
- 239000011651 chromium Substances 0.000 title claims description 34
- 238000000034 method Methods 0.000 title claims description 24
- 229910000599 Cr alloy Inorganic materials 0.000 title claims description 11
- 239000000788 chromium alloy Substances 0.000 title claims description 11
- 238000000151 deposition Methods 0.000 title description 28
- 238000005260 corrosion Methods 0.000 title description 14
- 230000007797 corrosion Effects 0.000 title description 14
- 239000000203 mixture Substances 0.000 claims description 29
- 230000008021 deposition Effects 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 13
- 239000002253 acid Substances 0.000 claims description 9
- 150000003839 salts Chemical class 0.000 claims description 9
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 8
- AGGIJOLULBJGTQ-UHFFFAOYSA-N sulfoacetic acid Chemical compound OC(=O)CS(O)(=O)=O AGGIJOLULBJGTQ-UHFFFAOYSA-N 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 150000001845 chromium compounds Chemical class 0.000 claims description 6
- 239000000376 reactant Substances 0.000 claims description 6
- JLKDVMWYMMLWTI-UHFFFAOYSA-M potassium iodate Chemical compound [K+].[O-]I(=O)=O JLKDVMWYMMLWTI-UHFFFAOYSA-M 0.000 claims description 3
- 239000001230 potassium iodate Substances 0.000 claims description 3
- 229940093930 potassium iodate Drugs 0.000 claims description 3
- 235000006666 potassium iodate Nutrition 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 2
- 239000003792 electrolyte Substances 0.000 description 29
- 229910052500 inorganic mineral Inorganic materials 0.000 description 5
- 239000011707 mineral Substances 0.000 description 5
- 235000010755 mineral Nutrition 0.000 description 5
- -1 fluoride ions Chemical class 0.000 description 4
- 239000002585 base Substances 0.000 description 3
- 150000002927 oxygen compounds Chemical class 0.000 description 3
- DETXZQGDWUJKMO-UHFFFAOYSA-N 2-hydroxymethanesulfonic acid Chemical compound OCS(O)(=O)=O DETXZQGDWUJKMO-UHFFFAOYSA-N 0.000 description 2
- WQPMYSHJKXVTME-UHFFFAOYSA-N 3-hydroxypropane-1-sulfonic acid Chemical compound OCCCS(O)(=O)=O WQPMYSHJKXVTME-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical group CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 229940117975 chromium trioxide Drugs 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- OPUAWDUYWRUIIL-UHFFFAOYSA-N methanedisulfonic acid Chemical compound OS(=O)(=O)CS(O)(=O)=O OPUAWDUYWRUIIL-UHFFFAOYSA-N 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
Definitions
- the present patent application relates to a method for depositing a crack-free, corrosion-resistant and hard chromium or chromium alloy layer and to an electrolyte for depositing such.
- the coating of surfaces by means of electroplating processes has for decades occupied a leading position in the field of surface refinement.
- the reasons for coating substrate surfaces may be an improvement in surface property in terms of hardness, abrasiveness, or corrosion resistance, or may be purely aesthetic, to make the decorative appearance of substrates more pleasing.
- the properties of the deposited chromium layers are dependent in particular on the deposition rate, the current density used and the temperature at which deposition takes place.
- the individual parameters influence each other. So it is z. B. known at 30 ° C in a current density range between 2 and 8 A / dm 2 shiny chrome layers of sulfate-containing electrolyte, wherein at 40 ° C in comparable electrolytes at current densities of 3 to 18 A / dm 2 , and even at 50 ° C. between 6 and 28 A / dm 2 shiny layers are obtained.
- the deposition of matt chromium layers at temperatures around 30 ° C in a range below 2 A / dm 2 is possible.
- Hot-chromium processes known from the prior art such as, for example, ANKOR® 1141 from Enthone Inc., allow at 70 ° C. only a current efficiency of 10% with a hardness of the deposited layer of 700 HV 0.1. An increase in the current efficiency in this process leads to cracking, as well as the mechanical post-processing of these layers.
- the object of the present invention to provide a suitable method for depositing corrosion-resistant, crack-free and hard chromium and chromium alloy layers with high current efficiency. Moreover, it is the object of the present invention to provide a corresponding chromium-containing electrolyte composition for depositing crack-free, corrosion-resistant and hard chromium and chromium alloy layers on substrates, which enables the deposition of crack-free hard chrome layers at high current yields, in particular greater than 30% and high deposition rates.
- the object is achieved by the features of claim 1 (electrolyte composition) and the features of claim 5 (method for depositing a chromium or chromium alloy layer.
- an electrical voltage is applied between the substrate to be coated and a counterelectrode.
- a current density between approximately 20 A / dm 2 and approximately 150 A / dm 2 can be set.
- the process of the invention is operated at a temperature between about 20 ° C and about 90 ° C.
- the current efficiency achieved by the method according to the invention is 30%.
- the deposition rate of the process according to the invention is greater than 1.3 ⁇ m / min at a current density of 50 A / dm 2 .
- the chromium layers deposited from the electrolyte according to the invention by means of the method according to the invention are hard and have a hardness greater than 800 HV 0.1.
- the chromium layers deposited according to the invention are extremely corrosion-resistant and have a corrosion resistance in accordance with DIN 50021 SS at 25 ⁇ m of more than 200 hours.
- matt, gray chromium layers are deposited from the electrolyte according to the invention, which can be converted into lustrous chrome layers by means of suitable mechanical processing methods such as, for example, grinding or lapping. Even after such a mechanical corrosion-resistant, crack-free and hard chrome and chromium alloy layers with high current efficiency to provide. Moreover, it is the object of the present invention to provide a corresponding chromium-containing electrolyte composition for depositing crack-free, corrosion-resistant and hard chromium and chromium alloy layers on substrates, which enables the deposition of crack-free hard chrome layers at high current yields, in particular greater than 30% and high deposition rates.
- the object is achieved as regards the method by a method for the deposition of chromium or chromium alloy layers on substrates, in which the deposition, the substrate with the electrolyte composition is contacted, comprising at least one mineral acid or a mineral acid salt, a chromium compound, a halogen-oxygen compound, a sulfonic acid, as well as Sulfoacetic acid and / or a salt thereof and / or a reactant from which sulfoacetic acid forms.
- an electrical voltage is applied between the substrate to be coated and a counterelectrode.
- a current density between approximately 20 A / dm 2 and approximately 150 A / dm 2 can be set.
- the process of the invention is operated at a temperature between about 20 ° C and about 90 ° C.
- the current efficiency achieved by the method according to the invention is 3 30%.
- the deposition rate of the process according to the invention is greater than 1.3 ⁇ m / min at a current density of 50 A / dm 2 .
- the chromium layers deposited from the electrolyte according to the invention by means of the method according to the invention are hard and have a hardness greater than 800 HV 0.1.
- the chromium layers deposited according to the invention are extremely corrosion resistant and have a corrosion resistance according to DIN 50021 SS at 25 ⁇ m of more than 200 hours.
- matt, gray chromium layers are deposited from the electrolyte according to the invention, which can be converted into lustrous chrome layers by means of suitable mechanical processing methods such as, for example, grinding or lapping. Even after such mechanical processing, the layers deposited according to the invention have a high corrosion resistance and hardness.
- a chromium-containing electrolyte composition for depositing a functional chromium or chromium alloy layer on substrates comprising at least one mineral acid or a mineral acid salt, a chromium compound, a halo oxygen compound, a sulfonic acid and sulfoacetic acid and / or a salt thereof and / or a Reactants, from which sulfoacetic acid forms having.
- Reactants may be, for example, 3-hydroxypropane-1-sulfonic acid, hydroxymethanesulfonic acid or aldehydomethanesulfonic acid.
- the electrolyte composition according to the invention contains the sulfoacetic acid or a salt thereof or a reactant from which it is formed in a concentration of between about 0.03 and about 0.3 mol / l, preferably between 0.05 and 0.15 mol / l , and more preferably between about 0.06 and about 0.12 mol / l.
- alkali metal and / or alkaline earth halide oxygen compounds have proved to be suitable halogenated oxygen compounds in the electrolyte composition according to the invention.
- the composition may contain the alkali or alkaline earth halide oxygen compound in a concentration between about 0.001 and about 0.1 mol / l, preferably between about 0.005 and about 0.08 mol / l, and more preferably between about 0.007 and 0.03 mol / l.
- a particularly suitable halogenated oxygen compound has proved to be potassium iodate in the electrolyte composition according to the invention.
- halogenated oxygen compounds increases the current efficiency and leads to improved layer properties.
- the electrolyte composition advantageously comprises sulfuric acid as the mineral acid.
- the pH of the electrolyte composition according to the invention is in a range of pH ⁇ 1.
- the electrolyte composition for depositing functional chromium layers contains the chromium compound in a concentration between about 0.5 mol / l and about 5 mol / l, preferably between about 1 mol / l and about 4 mol / l, more preferably between about 2 mol / l and about 3 mol / l.
- chromium trioxide has proven to be a suitable chromium compound in the electrolyte compositions of the invention.
- the electrolyte composition contains at least one mono- or disulfonic acid as sulfonic acids.
- Particularly suitable is methanesulfonic acid or methanedisulfonic acid.
- the sulfonic acid may be present in the electrolyte composition of the invention at a concentration between about 0.01 mol / l and about 0.1 mol / l, preferably between about 0.015 mol / l and about 0.06 mol / l, more preferably between about 0.02 be contained mol / l and about 0.04 mol / l.
- the base electrolyte has 280 g / l of chromium trioxide and 2.8 g of sulfuric acid.
- All deposited layers have a hardness greater than 800 HV 0.1 and a corrosion resistance according to DIN 5002165 of more than 200 hours.
- the base material is inductively hardened CK45 steel. No. Concentration of 3-hydroxypropane-1-sulfonic acid in ml / l Concentration of halogen-oxygen compound in g / l Concentration of additional sulfonic acid in g / l Current in A Current density in A / dm 2 Current efficiency in% Separation rate in ⁇ m / min. Exposure time in min.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005059367.4A DE102005059367B4 (de) | 2005-12-13 | 2005-12-13 | Elektrolytzusammensetzung und Verfahren zur Abscheidung rissfreier, korrosionsbeständiger und harter Chrom- und Chromlegierungsschichten |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP1798313A2 EP1798313A2 (de) | 2007-06-20 |
| EP1798313A3 EP1798313A3 (de) | 2008-06-18 |
| EP1798313B1 true EP1798313B1 (de) | 2017-12-13 |
Family
ID=37847008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP06004787.5A Active EP1798313B1 (de) | 2005-12-13 | 2006-03-09 | Verfahren zur Abscheidung rissfreier, korrosionsbeständiger und harter Chrom- und Chromlegierungsschichten |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20070131558A1 (ja) |
| EP (1) | EP1798313B1 (ja) |
| JP (1) | JP2007162123A (ja) |
| KR (1) | KR20070062898A (ja) |
| CN (1) | CN1982507A (ja) |
| DE (1) | DE102005059367B4 (ja) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10255853A1 (de) | 2002-11-29 | 2004-06-17 | Federal-Mogul Burscheid Gmbh | Herstellung strukturierter Hartchromschichten |
| DE102004019370B3 (de) | 2004-04-21 | 2005-09-01 | Federal-Mogul Burscheid Gmbh | Herstellung einer strukturierten Hartchromschicht und Herstellung einer Beschichtung |
| DE102006022722B4 (de) * | 2006-05-12 | 2010-06-17 | Hueck Engraving Gmbh & Co. Kg | Verfahren und Vorrichtung zur Oberflächenstrukturierung eines Pressbleches oder eines Endlosbandes |
| DE102008017270B3 (de) | 2008-04-04 | 2009-06-04 | Federal-Mogul Burscheid Gmbh | Strukturierte Chrom-Feststoffpartikel-Schicht und Verfahren zu deren Herstellung sowie beschichtetes Maschinenelement |
| ES2766775T3 (es) * | 2013-09-05 | 2020-06-15 | Macdermid Enthone Inc | Composición acuosa de electrolito que tiene una emisión aérea reducida |
| DE102014116717A1 (de) * | 2014-11-14 | 2016-05-19 | Maschinenfabrik Kaspar Walter Gmbh & Co Kg | Elektrolyt und Verfahren zur Herstellung von Chromschichten |
| CN104476939B (zh) * | 2014-12-25 | 2017-07-14 | 东莞运城制版有限公司 | 一种版辊的镀铬方法及保管方法 |
| KR101646160B1 (ko) | 2015-11-13 | 2016-08-08 | (주)에스에이치팩 | 내식성이 우수한 크롬도금액 |
| DE102018133532A1 (de) * | 2018-12-21 | 2020-06-25 | Maschinenfabrik Kaspar Walter Gmbh & Co Kg | Elektrolyt und Verfahren zur Herstellung von Chromschichten |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3758390A (en) * | 1971-06-18 | 1973-09-11 | M & T Chemicals Inc | Novel cromium plating compositions |
| US4472249A (en) * | 1981-08-24 | 1984-09-18 | M&T Chemicals Inc. | Bright chromium plating baths and process |
| US4588481A (en) * | 1985-03-26 | 1986-05-13 | M&T Chemicals Inc. | Chromium plating bath for producing non-iridescent, adherent, bright chromium deposits at high efficiencies and substantially free of cathodic low current density etching |
| US4828656A (en) * | 1987-02-09 | 1989-05-09 | M&T Chemicals Inc. | High performance electrodeposited chromium layers |
| US4810336A (en) * | 1988-06-21 | 1989-03-07 | M&T Chemicals Inc. | Electroplating bath and process for depositing functional, at high efficiencies, chromium which is bright and smooth |
| JPH0379786A (ja) * | 1989-09-01 | 1991-04-04 | M & T Chem Inc | クロムメツキ浴 |
| DE4011201C1 (en) * | 1990-04-06 | 1991-08-22 | Lpw-Chemie Gmbh, 4040 Neuss, De | Coating workpiece with chromium for improved corrosion resistance - comprises using aq. electrolyte soln. contg. chromic acid sulphate ions, and fluoro:complexes to increase deposition |
| DE4302564C2 (de) * | 1993-01-29 | 2003-05-15 | Hans Hoellmueller Maschb Gmbh | Vorrichtung zum Ätzen, Beizen oder Entwickeln plattenförmiger Gegenstände, insbesondere von elektrischen Leiterplatten |
| US6251253B1 (en) * | 1999-03-19 | 2001-06-26 | Technic, Inc. | Metal alloy sulfate electroplating baths |
-
2005
- 2005-12-13 DE DE102005059367.4A patent/DE102005059367B4/de active Active
-
2006
- 2006-03-09 EP EP06004787.5A patent/EP1798313B1/de active Active
- 2006-04-05 JP JP2006103884A patent/JP2007162123A/ja active Pending
- 2006-04-13 CN CNA2006100735893A patent/CN1982507A/zh active Pending
- 2006-06-30 KR KR1020060060625A patent/KR20070062898A/ko not_active Application Discontinuation
- 2006-12-12 US US11/609,672 patent/US20070131558A1/en not_active Abandoned
Non-Patent Citations (1)
| Title |
|---|
| None * |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070062898A (ko) | 2007-06-18 |
| JP2007162123A (ja) | 2007-06-28 |
| DE102005059367B4 (de) | 2014-04-03 |
| EP1798313A3 (de) | 2008-06-18 |
| DE102005059367A1 (de) | 2007-06-14 |
| EP1798313A2 (de) | 2007-06-20 |
| CN1982507A (zh) | 2007-06-20 |
| US20070131558A1 (en) | 2007-06-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1798313B1 (de) | Verfahren zur Abscheidung rissfreier, korrosionsbeständiger und harter Chrom- und Chromlegierungsschichten | |
| DE102006035871B3 (de) | Verfahren zur Abscheidung von Chromschichten als Hartverchromung, Galvanisierungsbad sowie hartverchromte Oberflächen und deren Verwendung | |
| DE2555834C2 (de) | Verfahren zur elektrolytischen Abscheidung von Chrom | |
| AT514818B1 (de) | Abscheidung von Cu, Sn, Zn-Beschichtungen auf metallischen Substraten | |
| DE102010055968A1 (de) | Substrat mit korrosionsbeständigem Überzug und Verfahren zu dessen Herstellung | |
| EP2192210B1 (de) | Edelmetallhaltige Schichtfolge für dekorative Artikel | |
| EP2937450A1 (de) | Galvanisches bad oder mischung zur verwendung in einem galvanischen bad zur abscheidung einer glanznickelschicht sowie verfahren zur herstellung eines artikels mit einer glanznickelschicht | |
| DE102011105207B4 (de) | Elektrolyt und seine Verwendung zur Abscheidung von Schwarz-Ruthenium-Überzügen und so erhaltene Überzüge und Artikel | |
| DE10255853A1 (de) | Herstellung strukturierter Hartchromschichten | |
| AT514427B1 (de) | Elektrolytbad sowie damit erhältliche Objekte bzw. Artikel | |
| EP3067444B1 (de) | Abscheidung von dekorativen palladium-eisen-legierungsbeschichtungen auf metallischen substanzen | |
| EP3259383B1 (de) | Zinn-nickel-schicht mit hoher härte | |
| EP2635724B1 (de) | Verfahren zur abscheidung von hartchrom aus cr(vi)-freien elektrolyten | |
| EP3964610A1 (de) | Galvanikbad für palladium-ruthenium-beschichtungen | |
| EP3415665B1 (de) | Verfahren zur galvanischen abscheidung von zink-nickel-legierungsüberzügen aus einem alkalischen zink-nickel-legierungsbad mit reduziertem abbau von additiven | |
| DE102007048043A1 (de) | Galvanische Abscheidung von Metallschichten auf Magnesium- oder Magnesiumlegierungsoberflächen | |
| WO2004027120A1 (de) | Dunkle schichten | |
| DE19509713C1 (de) | Lösung zum elektrolytischen Abscheiden von Zink- oder Zinklegierungsüberzügen | |
| EP2878711A1 (de) | Verfahren zur galvanischen Abscheidung von Nickel und entsprechender Elektrolyt | |
| DE102005040964A1 (de) | Matte Zinkbeschichtung und Verfahren zur Abscheidung matter Zinkschichten | |
| DE102020131371A1 (de) | Rutheniumlegierungsschicht und deren Schichtkombinationen | |
| DE2439656A1 (de) | Zinnlegierung, verfahren zu ihrer herstellung durch galvanische abscheidung aus einem waessrigen elektrolytbad, waessriges, galvanisches bad zur durchfuehrung des verfahrens und verwendung der zinnlegierung zum plattieren metallischer substrate | |
| DE10060127B4 (de) | Elektrolytisches Eisenabscheidungsbad und Verfahren zum elektrolytischen Abscheiden von Eisen und Anwendungen des Verfahrens | |
| DE3347594A1 (de) | Bad zur galvanischen abscheidung einer verschleissfesten goldlegierung und verfahren zur abscheidung einer verschleissfesten goldlegierung unter verwendung dieses bades | |
| DE19532831C2 (de) | Verfahren zum elektrolytischen Abscheiden von Chrom/Phosphor-Legierungen |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR |
|
| AX | Request for extension of the european patent |
Extension state: AL BA HR MK YU |
|
| PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
| AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR |
|
| AX | Request for extension of the european patent |
Extension state: AL BA HR MK YU |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: C25D 3/10 20060101AFI20080513BHEP |
|
| 17P | Request for examination filed |
Effective date: 20081010 |
|
| AKX | Designation fees paid |
Designated state(s): DE FR GB IT NL |
|
| 17Q | First examination report despatched |
Effective date: 20140213 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: EXAMINATION IS IN PROGRESS |
|
| GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: GRANT OF PATENT IS INTENDED |
|
| INTG | Intention to grant announced |
Effective date: 20170719 |
|
| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: MACDERMID ENTHONE INC. |
|
| RBV | Designated contracting states (corrected) |
Designated state(s): FR GB IT NL |
|
| REG | Reference to a national code |
Ref country code: DE Ref legal event code: R108 |
|
| GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
| GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE PATENT HAS BEEN GRANTED |
|
| AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): FR GB IT NL |
|
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
| REG | Reference to a national code |
Ref country code: NL Ref legal event code: FP |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 13 |
|
| PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
| 26N | No opposition filed |
Effective date: 20180914 |
|
| P01 | Opt-out of the competence of the unified patent court (upc) registered |
Effective date: 20230524 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20240220 Year of fee payment: 19 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20240220 Year of fee payment: 19 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IT Payment date: 20240220 Year of fee payment: 19 Ref country code: FR Payment date: 20240220 Year of fee payment: 19 |