EP1699949A2 - Galvanoplastie perfectionnee sur bandes metalliques - Google Patents

Galvanoplastie perfectionnee sur bandes metalliques

Info

Publication number
EP1699949A2
EP1699949A2 EP04804475A EP04804475A EP1699949A2 EP 1699949 A2 EP1699949 A2 EP 1699949A2 EP 04804475 A EP04804475 A EP 04804475A EP 04804475 A EP04804475 A EP 04804475A EP 1699949 A2 EP1699949 A2 EP 1699949A2
Authority
EP
European Patent Office
Prior art keywords
anode
strip
tin
anodes
pellets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP04804475A
Other languages
German (de)
English (en)
Other versions
EP1699949B1 (fr
Inventor
Kokkie Schnetz
Daniël Adriaan DE VREUGD
Eric Bob Wijnbeek
Jacques Hubert Olga Joseph Wijenberg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tata Steel Ijmuiden BV
Original Assignee
Corus Staal BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corus Staal BV filed Critical Corus Staal BV
Priority to EP04804475A priority Critical patent/EP1699949B1/fr
Publication of EP1699949A2 publication Critical patent/EP1699949A2/fr
Application granted granted Critical
Publication of EP1699949B1 publication Critical patent/EP1699949B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils

Definitions

  • the invention relates to a process for high-speed metal strip electrotinning wherein the strip is plated by anodically dissolving tin anodes facing the strip into an electroplating solution.
  • a process for high-speed metal strip electrotinning wherein the strip is plated by anodically dissolving tin anodes facing the strip into an electroplating solution.
  • Such a process is known from practice and is described in detail e.g. in the handbook "The Making, Shaping and Treating of Steel", 10th ed., pp. 1146-1153, where a description of a typical commercial tinplating process called FERROSTAN is given which description is considered to be incorporated herein by reference.
  • FERROSTAN a typical commercial tinplating process
  • the anode bars are to be replaced and the anode bar positions adjusted regularly, which is labour intensive because of the weight of the anode bars of typically 50 kg, potentially hazardous in view of fumes, strong acids and high electrical currents and deteriorates the uniform tin coating thickness over the strip width.
  • the anode bars are spent to an agreed minimum thickness, they are removed from the plating section and recycled in a remelting process for new cast anodes. Since optimal placement of the anodes is important for stable and uniform plating, the anode positions must be adjusted regularly. It is an objective to minimize relatively unhealthy, heavy and uncomfortable work on parts of and above or near plating units used in electrolytic tinplating processes.
  • masking out is held to mean positioning an object between anode and cathode so as to impede plating "in the shadow of the object" if the anode is seen as a light source.
  • anode substance viz. tin is supplied in pellet form and fed to baskets
  • tin bars as described above are no longer used and so there is no need to adjust them anymore.
  • the need to supply heavy anode bars is eliminated.
  • anode substance is supplied in the form of easily handled anode pellets.
  • the invention also avoids removal of spent anode material since the pellets may be completely consumed.
  • pellets shall mean rounds, ovoids, briquets, granules and the like.
  • part of the anode is masked out according to claim 2.
  • the masking means have the features of claim 3.
  • the pellets are electrically contacted via a current collector made of a material with a low electrical resistance allowing for good electrical contact with the tin pellets and being electrochemically inert in the electrolyte.
  • Suitable materials for the current collector include Ti and Zr.
  • an automated supply system is provided to add tin pellets to the anode basket.
  • Fig. 1 shows a cross section of a conventional tinning cell and various elements used in such a cell
  • Fig. 2 shows an example of a screen shot of process control apparatus displaying coating thicknesses at different positions over the strip width in a conventional tinning line
  • Fig. 3 shows a top view of an anode bridge forming part of a conventional tinning cell
  • Fig. 1 shows a cross section of a conventional tinning cell and various elements used in such a cell
  • Fig. 2 shows an example of a screen shot of process control apparatus displaying coating thicknesses at different positions over the strip width in a conventional tinning line
  • Fig. 3 shows a top view of an anode bridge forming part of a conventional tinning cell
  • FIG. 4 schematically indicates the movement of the anode bars along the anode bridge in a conventional tinning process
  • Fig. 5 schematically indicates removing or adding anode bars in a conventional tinning process
  • Fig. 6 schematically indicates placement and appearance of an anode basket for use in the process according to the invention
  • Fig. 7 schematically indicates an anode basket for use in the process according to the invention in more detail
  • Fig. 8 a graph generally indicating i/i aVg as a function of D ES
  • Fig. 9 schematically indicates a shutter placed as a mask in front of an anode basket for use in a process according to the invention.
  • tin is supplied by tin anode 1 which has an anode gap 2 and an anode notch 3.
  • tin anode 1 which has an anode gap 2 and an anode notch 3.
  • Isolated plate 6 separates two tinning sections in one plating cell. Electrical power is supplied to the strip via conductor roll 7. Near the bottom of the plating cell the strip is guided by sink roll 8. Also hold-down roll 9 is shown.
  • Anode bridge 4 comprises an insulated parking space 10 for a fresh tin anode 1.
  • the tin anodes 1 are connected to the anode bridge 4 via contact strip 14.
  • Three different procedures can be distinguished during operation of the soluble anode system.
  • Procedure 1 - Anode spacing During tinplating the anodes have to be properly positioned to obtain a uniform tin coating thickness over the strip width.
  • Fig. 2 an example is given of values of the tin coating thickness over the strip width in a situation in which the anodes were not properly positioned. To prevent the situation described above, the anodes have to be positioned as can be seen in Fig. 3, which gives a top view of anode bridge.
  • the optimal anode positions are given by parameters A-G.
  • the optimal parameters are given for a line speed of 400 m min "1 , a strip width of 732 mm and a tin coating thickness of 2.8 g m "2 on each side of the strip.
  • anode spacing is a regularly recurring operation after replacement of spent anodes (see procedure 2), after a change of strip width, and after a change to differential coating (see procedure 3). Anodes are manually spaced by placing an insulated hook into the anode gap.
  • a first disadvantage is the occurrence of variations of tin coating thickness over the strip width, e.g.
  • the outer anodes may be positioned too close to the strip edge (parameter C), or the anodes may be a non-equidistanced (parameter D), or not evenly consumed over the length of the strip caused by improper anode positioning.
  • a second disadvantage is the labour intensiveness of adjustment, and a third disadvantage is that adjustment is hazardous in view of exposure to electrolyte, fumes and the presence of electrically charged installation parts.
  • Procedure 2 Replacing spent anodes
  • the thickness of the worn anodes is regularly checked with a thickness gauge.
  • the anode thickness in the optimal anode arrangement previously described becomes less than 15 mm
  • the anode is detached from the anode bridge and placed on the nearest insulated parking space, see Fig. 4 where the arrows indicate how the anodes "move" along the anode bridge.
  • a new anode is placed on the insulated parking space and transferred to the anode bridge.
  • anodes need to be repositioned again (see procedure 1).
  • a fresh tin anode is designated with N and a worn one with W.
  • the anodes dissolve which results in a changing anode to strip distance. This causes a non-homogeneous tin coating thickness distribution over the strip width. In practice this is compensated by placing the anode bridge and the strip at a small angle (see procedure 1, parameters A and B).
  • the disadvantages of the soluble anode system due to anode replacement are mainly related to anode spacing (see procedure 1).
  • An additional disadvantage is that the anodes are not constantly positioned according to the optimal anode arrangement during anode replacement. This causes variations in the tin coating thickness over the strip width.
  • Procedure 3 Changing to another strip width or to differential coating
  • parameter C in Fig. 3 no longer has the optimal value.
  • tin edge build-up becomes more severe on the low coating weight side.
  • both situations are compensated by removing (or adding) and/or repositioning the anodes on the anode bridge.
  • Fig. 5 indicating removing or adding anodes after changing to another strip width or to differential coatings. If the strip width changes e.g. from 732 mm to 580 mm in the previously described optimal anode arrangement (see procedure 1) two anodes have to be detached from the anode bridge (see Fig. 5).
  • the remaining anodes need to be repositioned again (see procedure 1).
  • a differential coating is applied of 2.8 / 5.6 g m "2 in the previously described optimal anode arrangement (see procedure 1) one anode has to be added on the anode bridge facing the high coating weight side of the strip.
  • the anodes need to be repositioned again (see procedure 1).
  • the outermost anodes also have to be shifted more inwards (parameter C in Fig. 3) with respect to the strip edge.
  • DISADVANTAGES PRIOR ART AND ADVANTAGES INVENTION The disadvantages of the soluble anode system due to changing to another strip width or to differential coating are mainly related to anode spacing (see procedure 1).
  • An additional disadvantage is that the anodes are not positioned according to the optimal anode arrangement (see procedure 1) during removal or adding of anodes. This causes variations in the tin coating thickness over the strip width.
  • dimension stable anodes DSA
  • This system is less labour intensive and results in less variations of tin coating thickness over the strip width.
  • the main disadvantage of DSA is that an external dissolution reactor is required to replenish tin to the electrolyte.
  • the advantages of an SA and a DSA system are now combined into a system, which is totally new for high-speed strip electrotinning, the new system hereinafter referred to as a DSSA (dimension stable soluble anode) system.
  • a DSSA dimension stable soluble anode
  • the tin stock can be lower and compared to the DSA system no separate dissolution reactor is needed. Also less personnel is needed for anode handling.
  • the cell voltage can be lowered. Probably this is due to the increase of anodic surface. It will be clear that this also opens up routes to increased production speeds and thus potentially higher yield for the electrotinning production line in question.
  • the invention will now be described in more detail by describing an example according to the invention.
  • anode baskets 12 were mounted on the anode bar 4 via contact strip 14.
  • the contact strips 14, made of copper in the experiments according to this example, may be coated on their surface contacting the anode basket 12 with a noble metal like Au or Pt.
  • the contact strips 14 were coated with Pt, which worked well.
  • the anode baskets 12 in Fig. 6 were filled with tin pellets (2-20 mm preferably between 5-9 mm in diameter).
  • tin pellets are supplied regularly, which can be done while the plating line is fully operational.
  • the anode baskets 12 in the experiments according to this example made of titanium, are designed and positioned in such a way that the anode is closer to the strip at the bottom to compensate for holmic losses in the anode and strip, which would otherwise cause unwanted differences in current density over the height of the strip.
  • the anode basket was covered with an anode bag to prevent small tin fines entering the electrolyte. Under normal operating conditions the anode bags may need replacement 1-2 times a year.
  • a normalised current density defined as i aV g, wherein i stands for the local current density and i avg for the average current density (e.g. in A/m ), and therefore the amount of tin build-up at the edge of the strip reaches an unacceptable level, see upper curve in Fig. 8.
  • i stands for the local current density
  • i avg for the average current density (e.g. in A/m )
  • the horizontal axis shows D ES representing the distance in mm from the edge of the strip
  • the lower curve shows the relation i/i avg versus D ES for a strip and anode width of 1020 mm
  • the upper curve shows i/i avg after the strip width has changed to 940 leaving the anode configuration configured for a strip width of 1020 mm.
  • the horizontal axis (the X-axis) represents the distance from the centre of the strip, D CS.
  • the upper curve corresponds to an overlap of 0 mm
  • the next lower curve to 30 mm the next lower curve to 45 mm and the lower curve to 60 mm.
  • an optimum tin layer thickness distribution may be found at an overlap of mask and anode of about 45 mm. It will be clear that the invention involves a great leap forward whereby the features and operation of existing electrotinning lines can be greatly improved by providing a method that can be easily controlled, is less labour intensive, eliminates risks and reduces waste (regeneration) flows.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Supporting Of Heads In Record-Carrier Devices (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)

Abstract

L'invention concerne un procédé d'étamage électrolytique sur bandes métalliques à grande vitesse, selon lequel la bande est plaquée par dissolution anodique d'anodes en étain faisant face à la bande dans une solution de galvanoplastie, et par dépôt de l'étain dissous anodiquement sur au moins une partie de la bande faisant office de cathode. L'étain est ajouté à la solution de galvanoplastie sous forme de granulés conservés dans un panier d'anode.
EP04804475A 2003-12-23 2004-12-23 Galvanoplastie perfectionnee sur bandes metalliques Not-in-force EP1699949B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP04804475A EP1699949B1 (fr) 2003-12-23 2004-12-23 Galvanoplastie perfectionnee sur bandes metalliques

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03078988 2003-12-23
PCT/EP2004/014894 WO2005064043A2 (fr) 2003-12-23 2004-12-23 Galvanoplastie perfectionnee sur bandes metalliques
EP04804475A EP1699949B1 (fr) 2003-12-23 2004-12-23 Galvanoplastie perfectionnee sur bandes metalliques

Publications (2)

Publication Number Publication Date
EP1699949A2 true EP1699949A2 (fr) 2006-09-13
EP1699949B1 EP1699949B1 (fr) 2009-07-08

Family

ID=34717202

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04804475A Not-in-force EP1699949B1 (fr) 2003-12-23 2004-12-23 Galvanoplastie perfectionnee sur bandes metalliques

Country Status (15)

Country Link
US (1) US20070227632A1 (fr)
EP (1) EP1699949B1 (fr)
JP (1) JP2007515557A (fr)
KR (1) KR20060127076A (fr)
CN (1) CN1918328A (fr)
AT (1) ATE435933T1 (fr)
AU (1) AU2004309087B2 (fr)
BR (1) BRPI0418111A (fr)
CA (1) CA2551273A1 (fr)
DE (1) DE602004021961D1 (fr)
ES (1) ES2327239T3 (fr)
MX (1) MXPA06007170A (fr)
PT (1) PT1699949E (fr)
RU (1) RU2374363C2 (fr)
WO (1) WO2005064043A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3763850A1 (fr) 2019-07-10 2021-01-13 Tata Steel IJmuiden B.V. Anode et procédé de dépôt électrolytique d'une couche métallique sur un substrat métallique

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4902346B2 (ja) * 2006-12-28 2012-03-21 Ｊｆｅスチール株式会社 Ｓｎメッキ用電極支持体及びその使用方法
FR2918674B1 (fr) * 2007-07-12 2010-10-01 Siemens Vai Metals Tech Sas Installation et procede pour l'etamage electrolytique de bandes d'acier mettant en oeuvre une anode soluble
JP5884169B2 (ja) * 2012-03-01 2016-03-15 Ｊｆｅスチール株式会社 電気めっき鋼板の製造ラインの自溶性電極の消費量自動監視システム及び方法
JP5900213B2 (ja) * 2012-07-18 2016-04-06 Ｊｆｅスチール株式会社 電気めっき鋼板の製造装置
JP6084112B2 (ja) * 2013-05-09 2017-02-22 株式会社荏原製作所 Ｓｎ合金めっき装置およびＳｎ合金めっき方法
WO2015011130A1 (fr) * 2013-07-26 2015-01-29 Tata Steel Ijmuiden B.V. Système d'anode destiné à être utilisé dans une cellule de dépôt électrolytique pour le revêtement d'une bande métallique mobile et procédé mettant en œuvre ledit système d'anode
JP6233334B2 (ja) 2015-03-04 2017-11-22 Ｊｆｅスチール株式会社 方向性電磁鋼帯の連続電解エッチング方法および方向性電磁鋼帯の連続電解エッチング装置
CN105696059B (zh) * 2016-02-02 2018-03-06 上海大学 磁场下高强高导铜‑纳米碳管复合材料的制备方法及装置
CN107740173B (zh) * 2017-09-15 2020-12-15 首钢京唐钢铁联合有限责任公司 一种高锡量镀锡板的边部质量控制方法
EP3540098A3 (fr) 2018-03-16 2019-11-06 Airbus Defence and Space GmbH Appareil et procédé de métallisation continue d'un objet
CN214612819U (zh) * 2021-03-25 2021-11-05 宁德时代新能源科技股份有限公司 一种过滤机构及用于生产导电材料的设备
CN116516445A (zh) * 2022-11-28 2023-08-01 粤海中粤(中山)马口铁工业有限公司 可溶性阳极的边部屏蔽装置及方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE20788E (en) * 1930-02-04 1938-07-12 Method of plating steel
US2690424A (en) * 1950-11-20 1954-09-28 Nat Steel Corp Apparatus for reduction of heavy edge coating in electroplating
US2719820A (en) * 1951-01-26 1955-10-04 United States Steel Corp Method for coating steel strip
US3300396A (en) * 1965-11-24 1967-01-24 Charles T Walker Electroplating techniques and anode assemblies therefor
US4164454A (en) * 1977-11-01 1979-08-14 Borg-Warner Corporation Continuous line for plating on metal strip material
US4367125A (en) * 1979-03-21 1983-01-04 Republic Steel Corporation Apparatus and method for plating metallic strip
JPS62151593A (ja) * 1985-12-25 1987-07-06 Nippon Kokan Kk <Nkk> 金属ストリツプの連続電気メツキ装置
JPH01159400A (ja) * 1987-12-16 1989-06-22 Kawasaki Steel Corp 電気錫めっき装置
NL8801511A (nl) * 1988-06-14 1990-01-02 Hoogovens Groep Bv Werkwijze voor het elektrolytisch bekleden van een metalen substraat met een metalen bekledingslaag.
JPH0459997A (ja) * 1990-06-27 1992-02-26 Kawasaki Steel Corp 金属ストリップの電解処理装置および電解処理方法
US5454929A (en) * 1994-06-16 1995-10-03 National Semiconductor Corporation Process for preparing solderable integrated circuit lead frames by plating with tin and palladium
FR2725215B1 (fr) * 1994-09-29 1996-11-22 Lorraine Laminage Cellule d'electrodeposition en continu d'alliages metalliques
JPH08313223A (ja) * 1995-05-16 1996-11-29 Ls Electro Galvanizing Co 移動ストリップを監視する方法と装置
US6280596B1 (en) * 1995-05-23 2001-08-28 Weirton Steel Corporation Electrolytic tinplating of steel substrate and apparatus
JPH0971894A (ja) * 1995-09-01 1997-03-18 Kawasaki Steel Corp 鋼帯の電気メッキ方法
JP3103753B2 (ja) * 1995-10-13 2000-10-30 株式会社イデヤ 帯状部材のめっき装置
US5804053A (en) * 1995-12-07 1998-09-08 Eltech Systems Corporation Continuously electroplated foam of improved weight distribution
JP3528453B2 (ja) * 1996-08-23 2004-05-17 Ｊｆｅスチール株式会社 金属ストリップの片面連続電気めっき装置
US5776327A (en) * 1996-10-16 1998-07-07 Mitsubishi Semiconuctor Americe, Inc. Method and apparatus using an anode basket for electroplating a workpiece

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2005064043A2 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3763850A1 (fr) 2019-07-10 2021-01-13 Tata Steel IJmuiden B.V. Anode et procédé de dépôt électrolytique d'une couche métallique sur un substrat métallique

Also Published As

Publication number Publication date
WO2005064043A2 (fr) 2005-07-14
BRPI0418111A (pt) 2007-04-17
DE602004021961D1 (de) 2009-08-20
PT1699949E (pt) 2009-08-03
ES2327239T3 (es) 2009-10-27
AU2004309087B2 (en) 2009-10-22
WO2005064043A3 (fr) 2005-09-09
CN1918328A (zh) 2007-02-21
KR20060127076A (ko) 2006-12-11
MXPA06007170A (es) 2006-09-04
JP2007515557A (ja) 2007-06-14
CA2551273A1 (fr) 2005-07-14
US20070227632A1 (en) 2007-10-04
ATE435933T1 (de) 2009-07-15
RU2006126703A (ru) 2008-01-27
AU2004309087A1 (en) 2005-07-14
EP1699949B1 (fr) 2009-07-08
RU2374363C2 (ru) 2009-11-27

Similar Documents

Publication Publication Date Title
EP1699949B1 (fr) Galvanoplastie perfectionnee sur bandes metalliques
JP2007515557A5 (fr)
US20040163966A1 (en) Coated stainless-steel/copper weld for electroplating cathode
JP5212225B2 (ja) 銅箔のめっき方法及びそのめっき装置
CN1780939B (zh) 用于制造阴极板的方法和装置
WO2015011130A1 (fr) Système d&#39;anode destiné à être utilisé dans une cellule de dépôt électrolytique pour le revêtement d&#39;une bande métallique mobile et procédé mettant en œuvre ledit système d&#39;anode
EP0335989B1 (fr) Anode insoluble en alliage de plomb
US4490223A (en) Electrode for electrometallurgical processes
CA1061115A (fr) Machine a fabriquer un article en verre
JP4710619B2 (ja) 錫めっき鋼帯の製造方法および錫めっきセル
EP3763850A1 (fr) Anode et procédé de dépôt électrolytique d&#39;une couche métallique sur un substrat métallique
KR100297636B1 (ko) 전기도금장치의가용성양극
JP4797635B2 (ja) 錫めっき鋼帯の製造方法と錫めっきセル
JP2546032B2 (ja) 溶接缶用ｔｆｓの竪形電気めっき槽
AU610759B2 (en) Apparatus for the continuous electrolytic treatment of wire-shaped objects
JP2551092B2 (ja) 電気鍍金ラインにおける金属帯の端部過鍍金防止方法及び装置
EP0134347B1 (fr) Support d&#39;électrode pour le dépôt électrolytique en continu
JPS63293200A (ja) 電気メッキ装置
JPH01208499A (ja) 電気メッキ用電極
JPS6033917B2 (ja) ラジアルセル型電解槽における極間調整装置
JPH01287295A (ja) 水平型電気鍍金金属帯の形状位置制御方法
CN117947366A (zh) 一种热基连续酸洗镀锌花纹板的生产方法
JPH03193891A (ja) 亜鉛メッキ鋼板の錫メッキ方法
KR20010063655A (ko) 불용성 양극을 사용하여 금속대에 주석을 연속적으로전기도금하는 방법
JPH0125839B2 (fr)

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20060724

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

DAX Request for extension of the european patent (deleted)
RIC1 Information provided on ipc code assigned before grant

Ipc: C25D 17/10 20060101ALN20081127BHEP

Ipc: C25D 19/00 20060101ALI20081127BHEP

Ipc: C25D 5/02 20060101ALI20081127BHEP

Ipc: C25D 7/06 20060101AFI20081127BHEP

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: PT

Ref legal event code: SC4A

Free format text: AVAILABILITY OF NATIONAL TRANSLATION

Effective date: 20090728

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REF Corresponds to:

Ref document number: 602004021961

Country of ref document: DE

Date of ref document: 20090820

Kind code of ref document: P

REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2327239

Country of ref document: ES

Kind code of ref document: T3

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

NLV1 Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act
REG Reference to a national code

Ref country code: SK

Ref legal event code: T3

Ref document number: E 6136

Country of ref document: SK

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091108

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091008

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20100409

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100701

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20091223

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20091223

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20091231

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20091009

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20091231

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20091223

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20110107

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: PT

Payment date: 20101214

Year of fee payment: 7

Ref country code: SK

Payment date: 20101202

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20101222

Year of fee payment: 7

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20091223

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20101229

Year of fee payment: 7

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20100109

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: ES

Payment date: 20101227

Year of fee payment: 7

Ref country code: BE

Payment date: 20101224

Year of fee payment: 7

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

BERE Be: lapsed

Owner name: CORUS STAAL BV

Effective date: 20111231

REG Reference to a national code

Ref country code: PT

Ref legal event code: MM4A

Free format text: LAPSE DUE TO NON-PAYMENT OF FEES

Effective date: 20120625

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20120625

REG Reference to a national code

Ref country code: SK

Ref legal event code: MM4A

Ref document number: E 6136

Country of ref document: SK

Effective date: 20111223

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20120831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20090708

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 602004021961

Country of ref document: DE

Effective date: 20120703

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20111231

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20120703

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SK

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20111223

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20111223

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20120102

REG Reference to a national code

Ref country code: ES

Ref legal event code: FD2A

Effective date: 20130703

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20111224