EP1644554A1 - PROCEDE DE DEPOT D’OXYDE DE TITANE PAR SOURCE PLASMA - Google Patents

PROCEDE DE DEPOT D’OXYDE DE TITANE PAR SOURCE PLASMA

Info

Publication number
EP1644554A1
EP1644554A1 EP04767517A EP04767517A EP1644554A1 EP 1644554 A1 EP1644554 A1 EP 1644554A1 EP 04767517 A EP04767517 A EP 04767517A EP 04767517 A EP04767517 A EP 04767517A EP 1644554 A1 EP1644554 A1 EP 1644554A1
Authority
EP
European Patent Office
Prior art keywords
coating
oxide
substrate
photocatalytic
substrate according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04767517A
Other languages
German (de)
English (en)
French (fr)
Inventor
Anne Durandeau
Maxime Duran
Corinne Victor
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Publication of EP1644554A1 publication Critical patent/EP1644554A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Catalysts (AREA)
  • Surface Treatment Of Glass (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Chemical Vapour Deposition (AREA)
EP04767517A 2003-07-01 2004-06-30 PROCEDE DE DEPOT D’OXYDE DE TITANE PAR SOURCE PLASMA Withdrawn EP1644554A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0307948A FR2857030B1 (fr) 2003-07-01 2003-07-01 Procede de depot d'oxyde de titane par source plasma
PCT/FR2004/001673 WO2005012593A1 (fr) 2003-07-01 2004-06-30 Procede de depot d’oxyde de titane par source plasma

Publications (1)

Publication Number Publication Date
EP1644554A1 true EP1644554A1 (fr) 2006-04-12

Family

ID=33522639

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04767517A Withdrawn EP1644554A1 (fr) 2003-07-01 2004-06-30 PROCEDE DE DEPOT D’OXYDE DE TITANE PAR SOURCE PLASMA

Country Status (7)

Country Link
US (1) US7976909B2 (zh)
EP (1) EP1644554A1 (zh)
JP (1) JP2007516343A (zh)
KR (1) KR20060121660A (zh)
CN (1) CN1816645B (zh)
FR (1) FR2857030B1 (zh)
WO (1) WO2005012593A1 (zh)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006017311A1 (en) 2004-07-12 2006-02-16 Cardinal Cg Company Low-maintenance coatings
DE602004012585T2 (de) * 2004-12-20 2009-04-16 Rolex Sa Uhrzifferblatt und Herstellungsverfahren dieses Zifferblattes
KR100620076B1 (ko) * 2005-04-27 2006-09-06 한국과학기술연구원 Ｃ와 ｎ으로 도핑된 박막형 이산화티탄계 광촉매 및 자성물질과 그 제조 방법
US20070212486A1 (en) * 2005-05-20 2007-09-13 Dinega Dmitry P Plasma Enhanced Chemical Vapor Deposition of Metal Oxide
EP2013150B1 (en) 2006-04-11 2018-02-28 Cardinal CG Company Photocatalytic coatings having improved low-maintenance properties
JP2009534563A (ja) 2006-04-19 2009-09-24 日本板硝子株式会社 同等の単独の表面反射率を有する対向機能コーティング
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US20080115444A1 (en) 2006-09-01 2008-05-22 Kalkanoglu Husnu M Roofing shingles with enhanced granule adhesion and method for producing same
FR2908137A1 (fr) * 2006-11-02 2008-05-09 Lapeyre Sa Procede de depot de couche mince et produit obtenu
US8349435B2 (en) 2007-04-04 2013-01-08 Certainteed Corporation Mineral surfaced asphalt-based roofing products with encapsulated healing agents and methods of producing the same
CN100551450C (zh) * 2007-05-29 2009-10-21 中国科学院上海硅酸盐研究所 一种抗菌型生物活性钛涂层的制备方法
WO2009036284A1 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
JP5452900B2 (ja) * 2007-09-21 2014-03-26 株式会社半導体エネルギー研究所 半導体膜付き基板の作製方法
JP2009094488A (ja) * 2007-09-21 2009-04-30 Semiconductor Energy Lab Co Ltd 半導体膜付き基板の作製方法
FR2950878B1 (fr) 2009-10-01 2011-10-21 Saint Gobain Procede de depot de couche mince
JP2011176285A (ja) * 2010-02-01 2011-09-08 Fujifilm Corp 光電変換素子、薄膜太陽電池および光電変換素子の製造方法
JP2011176287A (ja) * 2010-02-01 2011-09-08 Fujifilm Corp 光電変換素子、薄膜太陽電池および光電変換素子の製造方法
US8791044B2 (en) * 2010-04-30 2014-07-29 The United States Of America As Represented By The Administrator Of The U.S. Environmental Protection Agency Doped titanium dioxide as a visible and sun light photo catalyst
US20130177760A1 (en) * 2011-07-11 2013-07-11 Lotus Applied Technology, Llc Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films
CN103000702A (zh) * 2011-09-14 2013-03-27 吉富新能源科技(上海)有限公司 防尘抗污型太阳电池技术
CN102989456A (zh) * 2011-09-14 2013-03-27 大汉光电股份有限公司 双掺杂的光触媒材料
CN102717560B (zh) * 2012-06-13 2015-02-18 南京工业大学 太阳光引发的有机-无机复合自清洁涂层及制备方法
US10060019B2 (en) * 2012-11-16 2018-08-28 The Boeing Company Thermal spray coated reinforced polymer composites
US20140153122A1 (en) * 2012-11-30 2014-06-05 Guardian Industries Corp. Concentrating solar power apparatus having mirror coating and anti-soiling coating
WO2014183097A1 (en) * 2013-05-09 2014-11-13 Massachusetts Institute Of Technology Anti-fingerprint photocatalytic nanostructure for transparent surfaces
JP2016530344A (ja) * 2013-06-06 2016-09-29 ハネウェル・インターナショナル・インコーポレーテッド 液体酸化チタン組成物、それを形成するための方法、およびそれを用いて基材の、または基材を被覆する物質層をエッチングするための方法
DE102014111935A1 (de) * 2014-08-20 2016-02-25 Heraeus Deutschland GmbH & Co. KG Zweilagiges Schichtsystem mit teilabsorbierender Schicht sowie Verfahren und Sputtertarget zur Herstellung dieser Schicht
US10508551B2 (en) 2016-08-16 2019-12-17 General Electric Company Engine component with porous trench
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
US10730799B2 (en) 2016-12-31 2020-08-04 Certainteed Corporation Solar reflective composite granules and method of making solar reflective composite granules
GB201702168D0 (en) * 2017-02-09 2017-03-29 Pilkington Group Ltd Coated glazing
US10427650B2 (en) * 2017-02-16 2019-10-01 Ford Global Technologies, Llc Self-cleaning system for interior of a motor vehicle
KR101979494B1 (ko) * 2017-03-20 2019-05-16 고려대학교 산학협력단 광촉매 항균 구조물 및 그 제조방법
EP3704194A1 (en) * 2017-11-02 2020-09-09 Universiteit Antwerpen Self-cleaning coating
CN109261143B (zh) * 2018-10-23 2021-04-09 江西科技师范大学 一种表面掺杂稀土元素的二氧化钛颗粒制备方法
US11473193B2 (en) * 2019-04-30 2022-10-18 King Fahd University Of Petroleum And Minerals Fabrication, characterization and photoelectrochemical properties of CeO2-TiO2 thin film electrodes
US11081343B2 (en) * 2019-07-19 2021-08-03 International Business Machines Corporation Sub-stoichiometric metal-oxide thin films
CN112387264B (zh) * 2020-11-16 2022-02-08 西南石油大学 一种基于等离子体处理TiO2的方法、改性TiO2光催化剂及应用
CN113136601B (zh) * 2021-04-14 2022-05-10 山东省科学院能源研究所 二氧化钛半导体薄膜及制备方法与其在光电催化中的应用
KR102374092B1 (ko) * 2021-10-14 2022-03-14 이세창 웨이퍼 코팅장치

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08253322A (ja) * 1995-03-10 1996-10-01 Res Dev Corp Of Japan 酸化チタン薄膜の製造方法
JPH08313705A (ja) * 1995-05-22 1996-11-29 Seiko Epson Corp 防曇性物品及びその製造方法
FR2738813B1 (fr) * 1995-09-15 1997-10-17 Saint Gobain Vitrage Substrat a revetement photo-catalytique
US6027766A (en) * 1997-03-14 2000-02-22 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
JPH11133205A (ja) * 1997-04-21 1999-05-21 Sekisui Chem Co Ltd 反射防止膜の製造方法
JP2000147209A (ja) * 1998-09-09 2000-05-26 Sekisui Chem Co Ltd 反射防止フィルム及びその製造方法
GB9913315D0 (en) * 1999-06-08 1999-08-11 Pilkington Plc Improved process for coating glass
JP2001046884A (ja) * 1999-08-12 2001-02-20 Nagasaki Prefecture 光触媒酸化チタン膜の製造方法
US6290180B1 (en) * 1999-09-09 2001-09-18 Lockheed Martin Corporation Photocatalytic coatings on optical solar reflectors to decompose organic contaminants
JP2001335343A (ja) * 2000-05-23 2001-12-04 Central Glass Co Ltd 光触媒膜付きガラスおよびその製造方法
JP2002105641A (ja) * 2000-10-03 2002-04-10 Murakami Corp 複合材およびその製造方法
JP2002119864A (ja) * 2000-10-18 2002-04-23 Matsushita Electric Ind Co Ltd 光触媒薄膜の製造方法
JP5050299B2 (ja) * 2001-05-17 2012-10-17 コニカミノルタホールディングス株式会社 長尺基材の表面処理方法及びその方法により製造された光学フィルム
JP2003096569A (ja) * 2001-09-25 2003-04-03 Konica Corp 薄膜形成方法、基材、及び薄膜形成装置
EP1546431B1 (de) * 2002-09-30 2010-02-10 Incoat GmbH Verbundwerkstoff
US6890656B2 (en) * 2002-12-20 2005-05-10 General Electric Company High rate deposition of titanium dioxide
US20040202890A1 (en) * 2003-04-08 2004-10-14 Kutilek Luke A. Methods of making crystalline titania coatings

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2005012593A1 *

Also Published As

Publication number Publication date
CN1816645B (zh) 2010-04-28
WO2005012593A1 (fr) 2005-02-10
CN1816645A (zh) 2006-08-09
FR2857030A1 (fr) 2005-01-07
KR20060121660A (ko) 2006-11-29
JP2007516343A (ja) 2007-06-21
FR2857030B1 (fr) 2006-10-27
US7976909B2 (en) 2011-07-12
US20070092734A1 (en) 2007-04-26

Similar Documents

Publication Publication Date Title
WO2005012593A1 (fr) Procede de depot d’oxyde de titane par source plasma
EP0850204B1 (fr) Substrat a revetement photocatalytique
EP0850203B1 (fr) Substrat a revetement photocatalytique a base de dioxyde de titane et dispersions organiques a base de dioxyde de titane
WO2003087005A1 (fr) Substrat a revetement auto-nettoyant
EP1654201B1 (fr) Procede de preparation d'un revetement photocatalytique integre dans le traitement thermique d'un vitrage
EP1737801A2 (fr) Substrat photocatalytique actif sous lumiere visible
EP2523919B1 (fr) Materiau photocatalytique et vitrage ou cellule photovoltaique comprenant ce materiau
FR2738812A1 (fr) Substrat a revetement photocatalytique
EP3655370B1 (fr) Verre anti-condensation à entretien facilité

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20060201

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

DAX Request for extension of the european patent (deleted)
17Q First examination report despatched

Effective date: 20061012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN

18W Application withdrawn

Effective date: 20070404