EP1323170B1 - Dispositif optique a rayons x - Google Patents

Dispositif optique a rayons x Download PDF

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Publication number
EP1323170B1
EP1323170B1 EP01943167A EP01943167A EP1323170B1 EP 1323170 B1 EP1323170 B1 EP 1323170B1 EP 01943167 A EP01943167 A EP 01943167A EP 01943167 A EP01943167 A EP 01943167A EP 1323170 B1 EP1323170 B1 EP 1323170B1
Authority
EP
European Patent Office
Prior art keywords
ray
radiation
optical arrangement
arrangement according
ray optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP01943167A
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German (de)
English (en)
Other versions
EP1323170A2 (fr
Inventor
Thomas Holz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Publication of EP1323170A2 publication Critical patent/EP1323170A2/fr
Application granted granted Critical
Publication of EP1323170B1 publication Critical patent/EP1323170B1/fr
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Definitions

  • the invention relates to an X-ray optical arrangement according to the preamble of claim 1. It can be special advantageous in X-ray analysis, e.g. in the X-ray diffractometry, reflectometry and / or the fluorescence analysis can be used.
  • X-ray analytics are for the most diverse Applications X-rays with high intensity, i.e. especially high photon density required. This can be done by focusing the x-rays be achieved. In many cases, however, it is cheaper X-radiation with very small divergence, in the best case, use as parallel X-rays to be able to.
  • the X-rays In X-ray analysis, it is also desired a high surface sensitivity of the X-radiation on surfaces to be analyzed or in fluidic Samples present on substrate slides are to reach.
  • the X-rays preferably grazing, i. with relative small angles of incidence up to a few degrees of incidence angles or a few tenths of a degree angle of incidence, i.e. near the critical angle of total reflection, on a sample or a corresponding substrate surface directed and consequently the radiation cross section according to 1 / sin ⁇ projected onto the sample surface becomes. It is desired the photon density ever Increase the area on the projection surface or to focus on a smaller projection screen.
  • the surface intensity and consequently also the photon density can be known by strong bundling parallel or nearly parallel X-rays are increased and consequently also the each locally detectable measurement signal of a sample increases become.
  • the spatial resolution of Measuring signals i. the most accurate assignment possible Measuring signals to the measuring location make high demands the test setup.
  • the X-ray optical arrangement according to the invention uses usual X-ray optical elements, like a suitable X-ray source, X-rays focusing and an X-ray reflecting Element.
  • the X-ray radiation of the X-ray source on the focusing element directed, which is a lens effect reaching element, but cheaper to a corresponding shaped reflector can act.
  • the of X-ray focused on this element is on directed an X-ray reflecting element, whose reflective surfaces are convex and is formed parabolic.
  • the reflective element Due to this surface shape of the reflective element can simultaneously bundling (compression) X-radiation and its parallel alignment be obtained with negligible divergence, the on a suitably arranged and aligned Surface of a sample or a substrate directed can be.
  • the convergent X-ray radiation with punctiform, elliptical or line-shaped cross section are, of course, the surface contour of the X-ray reflecting Element is adapted to this geometry.
  • linear Beam cross sections can be focused and the reflective element have cylinder symmetry.
  • At least the surface of the reflective element can be a single reflective layer, in In many cases, however, cheaper, a multilayer system exhibit.
  • the X-ray radiation from the focusing element can be directed onto the reflective element at an angle ⁇ the critical angle ⁇ c of the total reflection and the desired effect can be achieved.
  • the individual layers of the multilayer system taking into account the different angles of incidence of the x-rays, have a correspondingly adapted thickness distribution with which the respective angles of incidence ⁇ i and Bragg's for a predeterminable x-ray wavelength Satisfy equation on each surface element of the reflective element.
  • the gradient layers have a double-layer thickness that changes over the length.
  • the adjacent ones Single layers of a multilayer system point different X-ray optical refractive indices on.
  • the largest possible compression of the X-ray radiation can be obtained when focusing points F of focusing and reflective element with each other match, but at least in the immediate Are arranged close to each other.
  • the focusing element forms the X-ray source in a line focus, it is also advantageous the parabolic shape of the reflective element cylindrically symmetric to choose a linear To receive parallel radiation.
  • the signal-to-noise ratio be improved because with the reflective Element an additional monochromator is arranged in the beam path.
  • the dynamic Range of measurement can be increased, which is e.g. the information content of a measured reflectogram rises, possibly due to background signals covered diffraction orders are detected can.
  • the invention is based on an exemplary embodiment be explained.
  • Figure 1 becomes divergent X-radiation of an X-ray source 1 on a concave, elliptical or parabolic shape Surface, with for the X-ray radiation used reflective surface, in this case a Multilayer system, directed.
  • the x-ray radiation is reflected from there and at the same time on the convex, parabolic reflective surface of the directed to the reflective element, the from the reflective element 3 reflected x-ray radiation simultaneously compressed and aligned in parallel becomes.
  • the bundled parallel X-radiation can then for the different X-ray analysis techniques be used, wherein X-ray cross-sections in the range of less than 200 microns easily accessible are.
  • the reflective surface of the reflective Element 3 can also be a multilayer system, in which the layer thicknesses of the individual layers locally, according to the different angles of incidence the incident X-ray considered are, be present.
  • the parallel, reflected x-rays not only have a higher intensity, but they will also monochromatized.
  • the focused X-radiation predetermines different angles of incidence ⁇ i on the reflecting surface of the reflecting element 3, it is accordingly also necessary to use a corresponding gradient multilayer system which has a different period thickness d i at the corresponding X-ray wavelength corresponding to the respective angles of incidence.
  • the reflective Surface of the focusing element 2 a parabolic shape ( Figure 2), but it can also an elliptical contour ( Figure 1) are used.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Apparatus For Radiation Diagnosis (AREA)

Claims (10)

  1. Dispositif optique à rayons X comportant une source de rayons X, un élément focalisateur de rayons X et un élément réflecteur de rayons X, afin de générer un rayonnement X parallèle, ayant une petite section et une densité photonique élevée,
       caractérisé en ce que le rayonnement X de la source de rayons X (1) comportant l'élément focalisateur (2) est orienté vers la surface convexe, parabolique, et réfléchissante de l'élément réfléchissant (3).
  2. Dispositif optique à rayons X selon la revendication 1, caractérisé en ce que, sur la surface de l'élément réfléchissant (3), il existe une couche réfléchissante ou un système multicouche.
  3. Dispositif optique à rayons X selon l'une quelconque des revendications 1 ou 2, caractérisé en ce que les différentes couches du système multicouche sont des couches à gradients d'indice.
  4. Dispositif optique à rayons X selon l'une quelconque des revendications 1 ou 2, caractérisé en ce que le rayonnement X est orienté selon un angle ≤ à l'angle limite c de la réflexion totale par rapport à l'élément réfléchissant (3).
  5. Dispositif optique à rayons X selon l'une quelconque des revendications 1 à 3, caractérisé en ce que le rayonnement X est orienté selon un angle d'incidence 1 par rapport au système multicouche comportant les couches à gradients d'indice, de telle sorte que, pour une longueur d'onde de rayonnement X pouvant être prédéfinie, la condition de réflexion de Bragg, sur chaque élément superficiel de l'élément réfléchissant (3), est remplie.
  6. Dispositif optique à rayons X selon l'une quelconque des revendications 1 à 5, caractérisé en ce que les points focaux F de l'élément focalisateur (2) et de l'élément réfléchissant (3) concordent.
  7. Dispositif à rayons X selon l'une quelconque des revendications 1 à 6, caractérisé en ce que l'élément focalisateur (2) présente une surface concave, parabolique ou elliptique.
  8. Dispositif optique à rayons X selon l'une quelconque des revendications 1 à 7, caractérisé en ce que la forme parabolique de l'élément réfléchissant (3) présente une symétrie cylindrique.
  9. Dispositif à rayons X selon l'une quelconque des revendications 1 à 8, caractérisé en ce que les différentes couches respectivement adjacentes du système multicouche présentent différents indices de réfraction en termes d'optique de rayons X.
  10. Utilisation d'un dispositif optique selon l'une quelconque des revendications 1 à 9, dans la diffractométrie par rayons X, la réflectométrie par rayons X et/ou l'analyse par fluorescence par rayons X.
EP01943167A 2000-06-05 2001-05-18 Dispositif optique a rayons x Expired - Lifetime EP1323170B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10028970A DE10028970C1 (de) 2000-06-05 2000-06-05 Röntgenoptische Anordnung zur Erzeugung einer parallelen Röntgenstrahlung
DE10028970 2000-06-05
PCT/DE2001/002043 WO2001094987A2 (fr) 2000-06-05 2001-05-18 Dispositif optique a rayons x

Publications (2)

Publication Number Publication Date
EP1323170A2 EP1323170A2 (fr) 2003-07-02
EP1323170B1 true EP1323170B1 (fr) 2005-08-03

Family

ID=7645490

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01943167A Expired - Lifetime EP1323170B1 (fr) 2000-06-05 2001-05-18 Dispositif optique a rayons x

Country Status (6)

Country Link
US (1) US6724858B2 (fr)
EP (1) EP1323170B1 (fr)
JP (1) JP2003536081A (fr)
AT (1) ATE301328T1 (fr)
DE (2) DE10028970C1 (fr)
WO (1) WO2001094987A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7403593B1 (en) * 2004-09-28 2008-07-22 Bruker Axs, Inc. Hybrid x-ray mirrors
CN101278360B (zh) * 2005-08-04 2011-07-27 X射线光学系统公司 用于痕量元素制图的单色x射线微束
EP4070342A4 (fr) * 2020-01-10 2024-01-03 Ipg Photonics Corp Appareil à rayons x

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4684565A (en) * 1984-11-20 1987-08-04 Exxon Research And Engineering Company X-ray mirrors made from multi-layered material
FR2630832B1 (fr) * 1988-04-29 1995-06-02 Thomson Csf Systeme de miroirs pour le guidage d'une onde electromagnetique
JP3060624B2 (ja) * 1991-08-09 2000-07-10 株式会社ニコン 多層膜反射鏡
JPH0720293A (ja) * 1993-06-30 1995-01-24 Canon Inc Ｘ線ミラー及びこれを用いたｘ線露光装置とデバイス製造方法
BE1007607A3 (nl) * 1993-10-08 1995-08-22 Philips Electronics Nv Multilaagspiegel met verlopende brekingsindex.
US5646976A (en) * 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons
JPH08146199A (ja) * 1994-11-18 1996-06-07 Nikon Corp 平行ｘ線照射装置
DE4443853A1 (de) * 1994-12-09 1996-06-13 Geesthacht Gkss Forschung Vorrichtung mit einer Röntgenstrahlungsquelle
US5911858A (en) * 1997-02-18 1999-06-15 Sandia Corporation Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors
US6049588A (en) * 1997-07-10 2000-04-11 Focused X-Rays X-ray collimator for lithography
JPH1138192A (ja) * 1997-07-17 1999-02-12 Nikon Corp 多層膜反射鏡
US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
US6295164B1 (en) * 1998-09-08 2001-09-25 Nikon Corporation Multi-layered mirror

Also Published As

Publication number Publication date
US20020159562A1 (en) 2002-10-31
WO2001094987A2 (fr) 2001-12-13
ATE301328T1 (de) 2005-08-15
JP2003536081A (ja) 2003-12-02
US6724858B2 (en) 2004-04-20
WO2001094987A3 (fr) 2003-04-03
EP1323170A2 (fr) 2003-07-02
DE10028970C1 (de) 2002-01-24
DE50106990D1 (de) 2005-09-08

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