EP1323170B1 - X-ray optical system - Google Patents
X-ray optical system Download PDFInfo
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- EP1323170B1 EP1323170B1 EP01943167A EP01943167A EP1323170B1 EP 1323170 B1 EP1323170 B1 EP 1323170B1 EP 01943167 A EP01943167 A EP 01943167A EP 01943167 A EP01943167 A EP 01943167A EP 1323170 B1 EP1323170 B1 EP 1323170B1
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
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- the invention relates to an X-ray optical arrangement according to the preamble of claim 1. It can be special advantageous in X-ray analysis, e.g. in the X-ray diffractometry, reflectometry and / or the fluorescence analysis can be used.
- X-ray analytics are for the most diverse Applications X-rays with high intensity, i.e. especially high photon density required. This can be done by focusing the x-rays be achieved. In many cases, however, it is cheaper X-radiation with very small divergence, in the best case, use as parallel X-rays to be able to.
- the X-rays In X-ray analysis, it is also desired a high surface sensitivity of the X-radiation on surfaces to be analyzed or in fluidic Samples present on substrate slides are to reach.
- the X-rays preferably grazing, i. with relative small angles of incidence up to a few degrees of incidence angles or a few tenths of a degree angle of incidence, i.e. near the critical angle of total reflection, on a sample or a corresponding substrate surface directed and consequently the radiation cross section according to 1 / sin ⁇ projected onto the sample surface becomes. It is desired the photon density ever Increase the area on the projection surface or to focus on a smaller projection screen.
- the surface intensity and consequently also the photon density can be known by strong bundling parallel or nearly parallel X-rays are increased and consequently also the each locally detectable measurement signal of a sample increases become.
- the spatial resolution of Measuring signals i. the most accurate assignment possible Measuring signals to the measuring location make high demands the test setup.
- the X-ray optical arrangement according to the invention uses usual X-ray optical elements, like a suitable X-ray source, X-rays focusing and an X-ray reflecting Element.
- the X-ray radiation of the X-ray source on the focusing element directed, which is a lens effect reaching element, but cheaper to a corresponding shaped reflector can act.
- the of X-ray focused on this element is on directed an X-ray reflecting element, whose reflective surfaces are convex and is formed parabolic.
- the reflective element Due to this surface shape of the reflective element can simultaneously bundling (compression) X-radiation and its parallel alignment be obtained with negligible divergence, the on a suitably arranged and aligned Surface of a sample or a substrate directed can be.
- the convergent X-ray radiation with punctiform, elliptical or line-shaped cross section are, of course, the surface contour of the X-ray reflecting Element is adapted to this geometry.
- linear Beam cross sections can be focused and the reflective element have cylinder symmetry.
- At least the surface of the reflective element can be a single reflective layer, in In many cases, however, cheaper, a multilayer system exhibit.
- the X-ray radiation from the focusing element can be directed onto the reflective element at an angle ⁇ the critical angle ⁇ c of the total reflection and the desired effect can be achieved.
- the individual layers of the multilayer system taking into account the different angles of incidence of the x-rays, have a correspondingly adapted thickness distribution with which the respective angles of incidence ⁇ i and Bragg's for a predeterminable x-ray wavelength Satisfy equation on each surface element of the reflective element.
- the gradient layers have a double-layer thickness that changes over the length.
- the adjacent ones Single layers of a multilayer system point different X-ray optical refractive indices on.
- the largest possible compression of the X-ray radiation can be obtained when focusing points F of focusing and reflective element with each other match, but at least in the immediate Are arranged close to each other.
- the focusing element forms the X-ray source in a line focus, it is also advantageous the parabolic shape of the reflective element cylindrically symmetric to choose a linear To receive parallel radiation.
- the signal-to-noise ratio be improved because with the reflective Element an additional monochromator is arranged in the beam path.
- the dynamic Range of measurement can be increased, which is e.g. the information content of a measured reflectogram rises, possibly due to background signals covered diffraction orders are detected can.
- the invention is based on an exemplary embodiment be explained.
- Figure 1 becomes divergent X-radiation of an X-ray source 1 on a concave, elliptical or parabolic shape Surface, with for the X-ray radiation used reflective surface, in this case a Multilayer system, directed.
- the x-ray radiation is reflected from there and at the same time on the convex, parabolic reflective surface of the directed to the reflective element, the from the reflective element 3 reflected x-ray radiation simultaneously compressed and aligned in parallel becomes.
- the bundled parallel X-radiation can then for the different X-ray analysis techniques be used, wherein X-ray cross-sections in the range of less than 200 microns easily accessible are.
- the reflective surface of the reflective Element 3 can also be a multilayer system, in which the layer thicknesses of the individual layers locally, according to the different angles of incidence the incident X-ray considered are, be present.
- the parallel, reflected x-rays not only have a higher intensity, but they will also monochromatized.
- the focused X-radiation predetermines different angles of incidence ⁇ i on the reflecting surface of the reflecting element 3, it is accordingly also necessary to use a corresponding gradient multilayer system which has a different period thickness d i at the corresponding X-ray wavelength corresponding to the respective angles of incidence.
- the reflective Surface of the focusing element 2 a parabolic shape ( Figure 2), but it can also an elliptical contour ( Figure 1) are used.
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Abstract
Description
Die Erfindung betrifft eine röntgenoptische Anordnung
nach dem Oberbegriff des Anspruchs 1. Sie kann besonders
vorteilhaft in der Röntgenanalytik, z.B. bei der
Röntgendiffraktometrie, der Reflektometrie und/oder
der Fluoreszenzanalyse eingesetzt werden.The invention relates to an X-ray optical arrangement
according to the preamble of
In der Röntgenanalytik werden für die verschiedensten Applikationen Röntgenstrahlung mit hoher Intensität, d.h. insbesondere hoher Photonendichte gefordert. Dies kann durch eine Fokussierung der Röntgenstrahlen erreicht werden. In vielen Fällen ist es jedoch günstiger, Röntgenstrahlung mit sehr kleiner Divergenz, im besten Fall, als parallele Röntgenstrahlung einsetzen zu können.In the X-ray analytics are for the most diverse Applications X-rays with high intensity, i.e. especially high photon density required. This can be done by focusing the x-rays be achieved. In many cases, however, it is cheaper X-radiation with very small divergence, in the best case, use as parallel X-rays to be able to.
In der Röntgenanalytik kann es aber auch erforderlich sein, die Röntgenstrahlung zu monochromatisieren, um bestimmte Analysen durchführen zu können.It may also be necessary in X-ray analysis be to monochromatize the x-rays to to carry out certain analyzes.
In der Röntgenanalytik ist es außerdem gewünscht, eine hohe Oberflächensensitivität der Röntgenstrahlung auf zu analysierenden Oberflächen oder in fluidischen Proben, die auf Substratträgern vorhanden sind, zu erreichen. In diesen Fällen wird die Röntgenstrahlung bevorzugt streifend, d.h. mit relativ kleinen Einfallswinkeln bis maximal wenigen Grad Einfallswinkeln bzw. wenigen zehntel Grad Einfallswinkel, d.h. nahe dem Grenzwinkel der Totalreflexion, auf eine Proben- bzw. eine entsprechende Substratoberfläche gerichtet und demzufolge der Strahlungsquerschnitt gemäß 1/sin auf die Probenfläche projiziert wird. Es ist erwünscht, die Photonendichte je Fläche auf der Projektionsfläche weiter zu erhöhen bzw. auf eine kleinere Projektionsfläche zu konzentrieren. Die Oberflächenintensität und demzufolge auch die Photonendichte kann bekanntermaßen durch starke Bündelung paralleler bzw. annähernd paralleler Röntgenstrahlen erhöht werden und demzufolge auch das jeweils lokal erfassbare Messsignal einer Probe vergrößert werden. Insbesondere die Ortsauflösung der Messsignale, d.h. die möglichst genaue Zuordnung der Messsignale zum Messort stellt hohe Anforderungen an den Messaufbau.In X-ray analysis, it is also desired a high surface sensitivity of the X-radiation on surfaces to be analyzed or in fluidic Samples present on substrate slides are to reach. In these cases, the X-rays preferably grazing, i. with relative small angles of incidence up to a few degrees of incidence angles or a few tenths of a degree angle of incidence, i.e. near the critical angle of total reflection, on a sample or a corresponding substrate surface directed and consequently the radiation cross section according to 1 / sin projected onto the sample surface becomes. It is desired the photon density ever Increase the area on the projection surface or to focus on a smaller projection screen. The surface intensity and consequently also the photon density can be known by strong bundling parallel or nearly parallel X-rays are increased and consequently also the each locally detectable measurement signal of a sample increases become. In particular, the spatial resolution of Measuring signals, i. the most accurate assignment possible Measuring signals to the measuring location make high demands the test setup.
Üblicherweise werden entsprechend klein dimensionierte Blenden in den Strahlengang der Röntgenstrahlung angeordnet, so dass nur ein Teil der Röntgenstrahlung durch die Blendenöffnung zum Messort gelangen kann und so eine lokal definierte Zuordnung des Messsignals zum Messort erreicht wird. Selbstverständlich bedingt der Einsatz solcher Blenden Intensitätsverluste der Röntgenstrahlung, die zur Messung nicht ausgenutzt werden können. Darunter leidet die Messgenauigkeit bzw. es muss eine Erhöhung der erforderlichen Messzeit in Kauf genommen werden, was für viele Anwendungsfälle nicht gewünscht ist bzw. auch Messungen unmöglich macht.Usually, correspondingly small-sized Apertures in the beam path of the X-ray radiation arranged so that only part of the X-rays through the aperture to reach the site and so a locally defined assignment of the measurement signal is reached to the measuring location. Of course requires the use of such screens intensity losses the X-rays that are not for measurement can be exploited. This suffers the accuracy of measurement or it must be an increase in the required Measuring time can be accepted, which for many Use cases is not desired or even measurements impossible.
Die genannten Nachteile konnten auch mit röntgenoptischen Aufbauten, bei denen Multischichtsysteme mit an konkave Krümmungen angepassten Periodendicken, die beispielsweise in DE 44 43 853 A1 beschrieben sind, nicht vollständig beseitigt werden und es ist nicht gelungen, den Strahlquerschnitt der Röntgenstrahlung soweit zu reduzieren, daß die in Folge der erforderlichen Blenden auftretenden Intensitätsverluste, nach wie vor, zwar in verringerter Form auftreten.The mentioned disadvantages could also with X-ray optical Constructions in which multilayer systems with concave curvatures adapted period thicknesses, the are described for example in DE 44 43 853 A1, not completely eliminated and it is not succeeded, the beam cross section of the X-ray radiation reduce so much that in consequence of the required Iris occurring intensity losses, after as before, although occur in a reduced form.
Insbesondere in der Halbleitertechnik schreitet die Miniaturisierung stark voran und der Schritt aus dem Micro- und den Nanobereich erfordert von der Analytik Möglichkeiten, um bestimmte Elemente und Verbindungen mit hoher Messgenauigkeit, bei gleichzeitig hoher Ortsauflösung in kurzer Zeit analysieren zu können.In particular, in semiconductor technology the Miniaturization is progressing strongly and the step out of the Micro- and nanoscale requires analytics Ways to make certain elements and connections with high measuring accuracy, at the same time high To analyze spatial resolution in a short time.
Es ist daher Aufgabe der Erfindung eine röntgenoptische Anordnung zur Verfügung zu stellen, mit der parallele, zumindest jedoch annähernd parallele Röntgenstrahlung mit kleinem Strahlquerschnitt und entsprechend hoher Photonendichte zur Verfügung gestellt werden kann.It is therefore an object of the invention an X-ray optical To provide arrangement with the parallel, but at least approximately parallel X-rays with small beam cross section and accordingly high photon density provided can be.
Erfindungsgemäß wird diese Aufgabe mit den Merkmalen
des Anspruchs 1 gelöst. Vorteilhafte Ausgestaltungsformen
und Weiterbildungen der Erfindung, können mit
den in den untergeordneten Ansprüchen genannten Merkmalen
erreicht werden.According to the invention, this object is achieved with the features
of
Die erfindungsgemäße röntgenoptische Anordnung verwendet übliche röntgenoptische Elemente, wie eine geeignete Röntgenstrahlquelle, ein Röntgenstrahlen fokussierendes und ein Röntgenstrahlen reflektierendes Element. Dabei wird die Röntgenstrahlung der Röntgenstrahlquelle auf das fokussierende Element gerichtet, wobei es sich um ein einen Linseneffekt erreichendes Element, günstiger jedoch um einen entsprechend geformten Reflektor handeln kann. Die von diesem Element fokussierte Röntgenstrahlung ist auf ein Röntgenstrahlung reflektierendes Element gerichtet, dessen reflektierende Oberflächen konvex und parabelförmig ausgebildet ist.The X-ray optical arrangement according to the invention uses usual X-ray optical elements, like a suitable X-ray source, X-rays focusing and an X-ray reflecting Element. The X-ray radiation of the X-ray source on the focusing element directed, which is a lens effect reaching element, but cheaper to a corresponding shaped reflector can act. The of X-ray focused on this element is on directed an X-ray reflecting element, whose reflective surfaces are convex and is formed parabolic.
Durch diese Oberflächenform des reflektierenden Elementes kann gleichzeitig eine Bündelung (Kompression) der Röntgenstrahlung und deren parallele Ausrichtung mit vernachlässigbarer Divergenz erhalten werden, die auf eine entsprechend angeordnete und ausgerichtete Oberfläche einer Probe bzw. eines Substrates gerichtet werden kann.Due to this surface shape of the reflective element can simultaneously bundling (compression) X-radiation and its parallel alignment be obtained with negligible divergence, the on a suitably arranged and aligned Surface of a sample or a substrate directed can be.
Je nach Form des fokussierenden Elementes kann die konvergente Röntgenstrahlung mit punktförmigem, elliptischem oder linienförmigem Querschnitt erzeugt werden, wobei selbstverständlich auch die Oberflächenkontur des die Röntgenstrahlung reflektierenden Elementes dieser Geometrie angepasst ist. Für linienförmige Strahlquerschnitte können das fokussierende und das reflektierende Element Zylindersymmetrie besitzen.Depending on the shape of the focusing element, the convergent X-ray radiation with punctiform, elliptical or line-shaped cross section are, of course, the surface contour of the X-ray reflecting Element is adapted to this geometry. For linear Beam cross sections can be focused and the reflective element have cylinder symmetry.
Für viele Einsatzfälle ändert sich die Funktion der eingesetzten Blende und sie dient zur Streulichtunterdrückung. Sind jedoch im Einzelfall nach wie vor Blenden erforderlich, um die Ortsauflösung zu erhöhen, wird ein wesentlich geringerer Teil der Röntgenintensität von den Blenden ausgeblendet, da die Photonendichte in der entsprechend komprimierten Röntgenstrahlung erheblich höher ist, als dies bei bekannten Lösungen der Fall ist. So kann ein Intensitätsgewinn größer 2 erreicht werden. For many applications, the function of the used aperture and it is used for stray light suppression. However, in individual cases are still Apertures required to increase the spatial resolution, becomes a much smaller part of the X-ray intensity hidden from the aperture, because the photon density in the correspondingly compressed X-radiation is considerably higher than that of known Solutions is the case. So can an increase in intensity greater than 2 can be achieved.
Zumindest die Oberfläche des reflektierenden Elementes kann eine einzelne reflektierende Schicht, in vielen Fällen jedoch günstiger, ein Multischichtsystem aufweisen.At least the surface of the reflective element can be a single reflective layer, in In many cases, however, cheaper, a multilayer system exhibit.
Wird lediglich eine einzelne reflektierende Schicht oder ein reflektierendes Element, das aus einem entsprechend geeigneten Material besteht, verwendet, kann die Röntgenstrahlung vom fokussierenden Element mit einem Winkel ≤ dem Grenzwinkel c der Totalreflexion auf das reflektierende Element gerichtet und der gewünschte Effekt erreicht werden.If only a single reflective layer or a reflective element made of a suitably suitable material is used, the X-ray radiation from the focusing element can be directed onto the reflective element at an angle ≦ the critical angle c of the total reflection and the desired effect can be achieved.
In vielen Fällen ist es jedoch günstiger, ein Gradienten-Multischichtsystem zu verwenden, bei dem die einzelnen Schichten des Multischichtsystems, die unterschiedlichen Einfallswinkel der Röntgenstrahlen berücksichtigend, eine entsprechend angepasste Dikkenverteilung aufweisen, mit denen die jeweiligen Einfallswinkel i, bei einer vorgebbaren Röntgenstrahlungswellenlänge die Braggsche Gleichung auf jedem Flächenelement des reflektierenden Elementes erfüllen. Die Gradientenschichten weisen eine sich über die Länge verändernde Doppelschichtdicke auf.In many cases, however, it is more favorable to use a gradient multilayer system in which the individual layers of the multilayer system, taking into account the different angles of incidence of the x-rays, have a correspondingly adapted thickness distribution with which the respective angles of incidence i and Bragg's for a predeterminable x-ray wavelength Satisfy equation on each surface element of the reflective element. The gradient layers have a double-layer thickness that changes over the length.
Dadurch kann eine weitere Erhöhung der Photonendichte und auch eine verbesserte Monochromatisierung der Röntgenstrahlung erreicht werden. Die jeweils benachbarten Einzelschichten eines Multischichtsystems weisen unterschiedliche röntgenoptische Brechungsindizes auf.This can further increase the photon density and also an improved monochromatization of X-radiation can be achieved. The adjacent ones Single layers of a multilayer system point different X-ray optical refractive indices on.
Eine möglichst große Kompression der Röntgenstrahlung kann erreicht werden, wenn die Fokuspunkte F von fokussierendem und reflektierendem Element miteinander übereinstimmen, zumindest jedoch in unmittelbarer Nähe zueinander angeordnet sind.The largest possible compression of the X-ray radiation can be obtained when focusing points F of focusing and reflective element with each other match, but at least in the immediate Are arranged close to each other.
Bildet das fokussierende Element die Röntgenstrahlquelle in einem Linienfokus ab, ist es weiterhin vorteilhaft, die Parabelform des reflektierenden Elementes zylindersymmetrisch zu wählen, um eine linienförmige Parallelstrahlung zu erhalten.The focusing element forms the X-ray source in a line focus, it is also advantageous the parabolic shape of the reflective element cylindrically symmetric to choose a linear To receive parallel radiation.
Neben den bereits erwähnten Vorteilen, kann mit der erfindungsgemäßen röntgenoptischen Anordnung auch bei kleinen Einfallswinkeln der Röntgenstrahlung auf die Proben eine höhere Ortsauflösung der Messsignale erreicht werden, da bei annähernd gleicher Photonenzahl die projizierte Fläche auf der Probe verkleinert wird.In addition to the already mentioned advantages, can with the X-ray optical arrangement according to the invention also at small angles of incidence of X-rays on the Samples achieved a higher spatial resolution of the measurement signals be, because at approximately the same number of photons reduces the projected area on the sample becomes.
Generell kann mit der Erfindung auch das Signal-Rauschverhältnis verbessert werden, da mit dem reflektierenden Element ein zusätzlicher Monochromator im Strahlengang angeordnet ist.In general, with the invention, the signal-to-noise ratio be improved because with the reflective Element an additional monochromator is arranged in the beam path.
Neben der Verkürzung der Messzeit kann auch der dynamische Bereich der Messung erhöht werden, was z.B. den Informationsgehalt eines gemessenen Reflektogramms ansteigen lässt, da eventuell durch Untergrundsignale verdeckte Beugungsordnungen erfasst werden können.In addition to shortening the measurement time can also be the dynamic Range of measurement can be increased, which is e.g. the information content of a measured reflectogram rises, possibly due to background signals covered diffraction orders are detected can.
Durch translatorische Bewegung und/oder Verschwenkung um bestimmte Wegstrecken und Winkel des fokussierenden und/oder reflektierenden Elementes kann die Röntgenstrahlung auf bestimmte kleine Messorte/-flächen gerichtet werden. By translational movement and / or pivoting around certain distances and angles of the focusing and / or reflective element, the X-radiation on certain small measuring locations / areas be directed.
Nachfolgend soll die Erfindung anhand eines Ausführungsbeispieles erläutert werden.The invention is based on an exemplary embodiment be explained.
- Figur 1:FIG. 1:
- schematisch ein Beispiel einer röntgenoptischen Anordnung nach der Erfindung bei der divergente Röntgenstrahlung einer Röntgenstrahlungsquelle auf ein fokussierendes Element gerichtet und in Parallelstrahlung mit kleinerem Strahlquerschnitt umgewandelt wird undschematically an example of an X-ray optical Arrangement according to the invention in the divergent X-radiation of an X-ray source on a focusing Element directed and in parallel radiation converted with smaller beam cross section will and
- Figur 2:FIG. 2:
- in schematischer Form ein Beispiel einer Anordnung, bei der parallele Röntgenstrahlung auf ein fokussierendes Element gerichtet und in Parallelstrahlung mit deutlich kleinerem Strahlquerschnitt umgewandelt wird.in schematic form an example of a Arrangement, in the case of the parallel X-ray radiation directed to a focusing element and in parallel with clearly converted smaller beam cross section becomes.
Bei dem in Figur 1 gezeigten Beispiel wird divergente
Röntgenstrahlung einer Röntgenstrahlungsquelle 1 auf
eine konkave, in Ellipsen- oder Parabelform ausgebildete
Oberfläche, mit für die verwendete Röntgenstrahlung
reflektierender Oberfläche, in diesem Fall ein
Multischichtsystem, gerichtet. Die Röntgenstrahlung
wird von dort reflektiert und gleichzeitig auf die
konvexe, parabelförmige reflektierende Oberfläche des
reflektierenden Elementes gerichtet, wobei die vom
reflektierenden Element 3 reflektierte Röntgenstrahlung
gleichzeitig verdichtet und parallel ausgerichtet
wird. Die so gebündelte parallele Röntgenstrahlung
kann dann für die verschiedenen Röntgenanalysetechniken
eingesetzt werden, wobei Röntgenstrahlquerschnitte
im Bereich kleiner 200 µm ohne weiteres erreichbar
sind.In the example shown in Figure 1 becomes divergent
X-radiation of an
Auf die reflektierende Oberfläche des reflektierenden
Elementes 3 kann ebenfalls ein Multischichtsystem,
bei dem die Schichtdicken der einzelnen Schichten
lokal, entsprechend den unterschiedlichen Einfallswinkeln
der einfallenden Röntgenstrahlung berücksichtigt
sind, vorhanden sein. In diesem Fall kann die
parallele, reflektierte Röntgenstrahlung nicht nur
eine höhere Intensität aufweisen, sondern sie wird
außerdem monochromatisiert.On the reflective surface of the
Bei dem in Figur 2 gezeigten Beispiel einer erfindungsgemäßen
Anordnung wird Röntgenstrahlung mit geringer
bzw. keiner Divergenz in paralleler Form auf
die konkave, parabelförmige reflektierende Oberfläche
eines fokussierenden Elementes 2 gerichtet. Von dieser
Oberfläche wird die Röntgenstrahlung entsprechend
reflektiert und gleichzeitig fokussiert und auf die
Oberfläche des reflektierenden Elementes 3 gerichtet.
Aus der Darstellung ist eindeutig erkennbar, dass der
Strahlquerschnitt b', der vom reflektierenden Element
3 parallel reflektierten Röntgenstrahlung wesentlich
kleiner als der Strahlquerschnitt b, der ursprünglich
eingesetzten parallelen Röntgenstrahlung ist. Daraus
folgt, dass bei hinreichend hoher Reflektivität von
(2) und (3) die Photonendichte in der vom reflektierenden
Element 3 reflektierten Röntgenstrahlung gegenüber
der ursprünglichen Parallelstrahlung vergrößert
worden ist.In the example shown in Figure 2 of an inventive
Arrangement becomes X-ray with less
or no divergence in parallel form
the concave, parabolic reflective surface
a focusing
Vorteilhafterweise ist das reflektierende Element wieder mit einem Multischichtsystem an der reflektierenden Oberfläche versehen, wobei die Periodendicke d der Einzelschichten die Braggsche Gleichung λ = 2deff sin erfüllen (deff = die die Dispersion berücksichtigende effektive Periodendicke).Advantageously, the reflective element is again provided with a multilayer system on the reflective surface, wherein the period thickness d of the individual layers satisfy the Bragg equation λ = 2d eff sin (d eff = the effective period thickness taking into account the dispersion).
Da die fokussierte Röntgenstrahlung unterschiedliche
Einfallswinkel i auf die reflektierende Oberfläche
des reflektierenden Elementes 3 vorgibt, ist es demzufolge
auch erforderlich, ein entsprechendes
Gradienten-Multischichtsystem einzusetzen, das bei
der entsprechenden Röntgenstrahlungswellenlänge den
jeweiligen Einfallswinkeln entsprechend, eine unterschiedliche
Periodendicke di aufweist.Since the focused X-radiation predetermines different angles of incidence i on the reflecting surface of the reflecting
Möglichkeiten zur Ausbildung eines solchen Multischichtsystems sind in der unveröffentlichten DE 199 32 275 genannt, auf deren diesbezüglichen Offenbarungsgehalt voll umfänglich zurückgegriffen werden soll.Possibilities for the formation of such a multilayer system are in the unpublished DE 199 32 275, on their relevant disclosure be fully used should.
Sowohl in Figur 1, wie auch in Figur 2 ist dargestellt,
dass die entsprechenden reflektierenden Oberflächen
des fokussierenden Elementes 2 und des
reflektierenden Elementes 3 so ausgebildet und die
beiden Elemente 2 und 3 so zueinander angeordnet
sind, dass deren Fokuspunkte F miteinander übereinstimmen.Both in Figure 1, as well as in Figure 2 is shown
that the corresponding reflective surfaces
the focusing
Bei den Beispielen nach Figur 1 und 2 weist die reflektierende Oberfläche des fokussierenden Elementes 2 eine Parabelform (Figur 2) auf, es kann jedoch auch eine elliptische Kontur (Figur 1) eingesetzt werden.In the examples of Figures 1 and 2, the reflective Surface of the focusing element 2 a parabolic shape (Figure 2), but it can also an elliptical contour (Figure 1) are used.
Bei dem Beispiel nach Figur 2, bei der parallele bzw.
nahezu parallele Ausgangsröntgenstrahlung verwendet
wird, gilt unter der Voraussetzung xA, xE p/2 insbesondere
die Gleichung
bzw.In the example according to FIG. 2, in which parallel or nearly parallel output X-ray radiation is used, assuming x A , x E p / 2 in particular the equation
respectively.
Unter Verwendung von Strahlensatz und Parabelgleichung
kann diese zu
vereinfacht werden, wobei p und p' die jeweiligen
Parabelparameter von fokussierendem Element 2 und
reflektierendem Element 3 sind.be simplified, where p and p 'the respective
Parabola parameter of focusing
Daraus folgt, dass eine Erhöhung der Photonenflussdichte immer dann erreicht werden kann, wenn das mit dem Produkt der mittleren Reflektivitäten von fokussierendem Element 2 R(2) und reflektierendem Element 3 R(3) multiplizierte Verhältnis der Strahlquerschnitte R(2) * R(3) *b/b' > 1 wird.It follows that an increase in the photon flux density can always be achieved if that with the product of the center reflectivities of focusing Element 2 R (2) and reflective element 3 R (3) multiplied ratio of beam cross sections R (2) * R (3) * b / b '> 1 becomes.
Claims (10)
- X-ray optical arrangement having an x-ray source, an x-ray focusing element and an x-ray reflecting element for the purpose of producing parallel x-radiation with a small beam cross section and of high photon density, characterized in that the x-radiation of the x-ray source (1) is directed with the aid of the focusing element (2) onto the convex, parabolic and reflecting surface of the reflecting element (3).
- X-ray optical arrangement according to Claim 1,
characterized in that a reflecting layer or a multilayer system is present on the surface of the reflecting element (3). - X-ray optical arrangement according to Claim 1 or 2, characterized in that the individual layers of the multilayer system are gradient layers.
- X-ray optical arrangement according to Claim 1 or 2, characterized in that the x-radiation is directed onto the reflecting element (3) at an angle ≤ critical angle c of total reflection.
- X-ray optical arrangement according to one of Claims 1 to 3, characterized in that the x-radiation is directed onto the multilayer system with gradient layers at incidence angles i such that the Bragg equation is satisfied on each surface element of the reflecting element (3) for a prescribable x-radiation wavelength.
- X-ray optical arrangement according to one of Claims 1 to 5, characterized in that the focal points F of the focusing element (2) and of the reflecting element (3) correspond.
- X-ray optical arrangement according to one of Claims 1 to 6, characterized in that the focusing element (2) has a concave, parabolic or elliptical surface.
- X-ray optical arrangement according to one of Claims 1 to 7, characterized in that the parabolic shape of the reflecting element (3) is cylindrically symmetrical.
- X-ray optical arrangement according to one of Claims 1 to 8, characterized in that in each case, neighbouring individual layers of the multilayer system have different x-ray optical refractive indices.
- Use of an x-ray optical arrangement according to one of Claims 1 to 9 in x-ray diffractometry, reflectometry and/or x-ray fluorescence analysis.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10028970A DE10028970C1 (en) | 2000-06-05 | 2000-06-05 | X-ray optical arrangement for generating parallel X-rays |
DE10028970 | 2000-06-05 | ||
PCT/DE2001/002043 WO2001094987A2 (en) | 2000-06-05 | 2001-05-18 | X-ray optical system |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1323170A2 EP1323170A2 (en) | 2003-07-02 |
EP1323170B1 true EP1323170B1 (en) | 2005-08-03 |
Family
ID=7645490
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01943167A Expired - Lifetime EP1323170B1 (en) | 2000-06-05 | 2001-05-18 | X-ray optical system |
Country Status (6)
Country | Link |
---|---|
US (1) | US6724858B2 (en) |
EP (1) | EP1323170B1 (en) |
JP (1) | JP2003536081A (en) |
AT (1) | ATE301328T1 (en) |
DE (2) | DE10028970C1 (en) |
WO (1) | WO2001094987A2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7403593B1 (en) * | 2004-09-28 | 2008-07-22 | Bruker Axs, Inc. | Hybrid x-ray mirrors |
US7991116B2 (en) * | 2005-08-04 | 2011-08-02 | X-Ray Optical Systems, Inc. | Monochromatic x-ray micro beam for trace element mapping |
JP2023510321A (en) * | 2020-01-10 | 2023-03-13 | アイピージー フォトニクス コーポレーション | X-ray machine |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4684565A (en) * | 1984-11-20 | 1987-08-04 | Exxon Research And Engineering Company | X-ray mirrors made from multi-layered material |
FR2630832B1 (en) * | 1988-04-29 | 1995-06-02 | Thomson Csf | MIRROR SYSTEM FOR GUIDING AN ELECTROMAGNETIC WAVE |
JP3060624B2 (en) * | 1991-08-09 | 2000-07-10 | 株式会社ニコン | Multilayer reflector |
JPH0720293A (en) * | 1993-06-30 | 1995-01-24 | Canon Inc | X-ray mirror, x-ray aligner employing it and fabrication of device |
BE1007607A3 (en) * | 1993-10-08 | 1995-08-22 | Philips Electronics Nv | MULTI-LAYER MIRROR Graded Index. |
US5646976A (en) * | 1994-08-01 | 1997-07-08 | Osmic, Inc. | Optical element of multilayered thin film for X-rays and neutrons |
JPH08146199A (en) * | 1994-11-18 | 1996-06-07 | Nikon Corp | Parallel x-ray irradiation device |
DE4443853A1 (en) * | 1994-12-09 | 1996-06-13 | Geesthacht Gkss Forschung | X=ray source arrangement enabling parallelisation and monochromatisation |
US5911858A (en) * | 1997-02-18 | 1999-06-15 | Sandia Corporation | Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors |
US6049588A (en) * | 1997-07-10 | 2000-04-11 | Focused X-Rays | X-ray collimator for lithography |
JPH1138192A (en) * | 1997-07-17 | 1999-02-12 | Nikon Corp | Multiple layer film reflection mirror |
US6041099A (en) * | 1998-02-19 | 2000-03-21 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
US6295164B1 (en) * | 1998-09-08 | 2001-09-25 | Nikon Corporation | Multi-layered mirror |
-
2000
- 2000-06-05 DE DE10028970A patent/DE10028970C1/en not_active Expired - Fee Related
-
2001
- 2001-05-18 AT AT01943167T patent/ATE301328T1/en not_active IP Right Cessation
- 2001-05-18 WO PCT/DE2001/002043 patent/WO2001094987A2/en active IP Right Grant
- 2001-05-18 DE DE50106990T patent/DE50106990D1/en not_active Expired - Lifetime
- 2001-05-18 US US10/048,873 patent/US6724858B2/en not_active Expired - Lifetime
- 2001-05-18 EP EP01943167A patent/EP1323170B1/en not_active Expired - Lifetime
- 2001-05-18 JP JP2002502480A patent/JP2003536081A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
DE10028970C1 (en) | 2002-01-24 |
WO2001094987A3 (en) | 2003-04-03 |
EP1323170A2 (en) | 2003-07-02 |
US6724858B2 (en) | 2004-04-20 |
US20020159562A1 (en) | 2002-10-31 |
DE50106990D1 (en) | 2005-09-08 |
WO2001094987A2 (en) | 2001-12-13 |
ATE301328T1 (en) | 2005-08-15 |
JP2003536081A (en) | 2003-12-02 |
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