EP0540178A2 - Röntgenbelichtungsvorrichtung - Google Patents
Röntgenbelichtungsvorrichtung Download PDFInfo
- Publication number
- EP0540178A2 EP0540178A2 EP92308909A EP92308909A EP0540178A2 EP 0540178 A2 EP0540178 A2 EP 0540178A2 EP 92308909 A EP92308909 A EP 92308909A EP 92308909 A EP92308909 A EP 92308909A EP 0540178 A2 EP0540178 A2 EP 0540178A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- mirror
- ray beam
- reflection surface
- ray
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
Applications Claiming Priority (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03278373A JP3135315B2 (ja) | 1991-09-30 | 1991-09-30 | Sr−x線ミラーの位置決め装置 |
JP278373/91 | 1991-09-30 | ||
JP28362791A JP3441742B2 (ja) | 1991-10-03 | 1991-10-03 | Sr−x線ミラーユニット |
JP283627/91 | 1991-10-03 | ||
JP289171/91 | 1991-10-08 | ||
JP289283/91 | 1991-10-08 | ||
JP28928391A JP3167155B2 (ja) | 1991-10-08 | 1991-10-08 | X線ミラー支持装置 |
JP289274/91 | 1991-10-08 | ||
JP3289274A JPH05100094A (ja) | 1991-10-08 | 1991-10-08 | Sr−x線ミラーユニツト |
JP03289171A JP3138027B2 (ja) | 1991-10-08 | 1991-10-08 | Sr−x線ミラーの位置決め装置 |
JP03311836A JP3143505B2 (ja) | 1991-10-30 | 1991-10-30 | X線露光装置 |
JP311836/91 | 1991-10-30 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0540178A2 true EP0540178A2 (de) | 1993-05-05 |
EP0540178A3 EP0540178A3 (en) | 1993-06-30 |
EP0540178B1 EP0540178B1 (de) | 1998-05-06 |
Family
ID=27554397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP92308909A Expired - Lifetime EP0540178B1 (de) | 1991-09-30 | 1992-09-30 | Röntgenbelichtungsvorrichtung und Verfahren |
Country Status (4)
Country | Link |
---|---|
US (1) | US5448612A (de) |
EP (1) | EP0540178B1 (de) |
CA (1) | CA2079562C (de) |
DE (1) | DE69225378T2 (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004001821A1 (ja) * | 2002-06-25 | 2003-12-31 | Nikon Corporation | 光学ユニット及びx線露光装置 |
CN106970096A (zh) * | 2017-05-22 | 2017-07-21 | 上海电气核电设备有限公司 | 接管内壁偏心曝光支撑架 |
DE102014116476B4 (de) | 2014-11-11 | 2023-02-16 | Deutsches Elektronen-Synchrotron Desy | Vorrichtung mit beweglicher Aufnahme für Vakuumkammern |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3200282B2 (ja) * | 1993-07-21 | 2001-08-20 | キヤノン株式会社 | 処理システム及びこれを用いたデバイス製造方法 |
JP3138253B2 (ja) * | 1997-03-27 | 2001-02-26 | キヤノン株式会社 | X線装置およびこれを用いたx線露光装置ならびにデバイス製造方法 |
JP3679549B2 (ja) * | 1997-04-11 | 2005-08-03 | キヤノン株式会社 | シンクロトロン放射光強度測定器および該強度測定器を備えたx線露光装置 |
JPH113858A (ja) | 1997-04-17 | 1999-01-06 | Canon Inc | X線光学装置、x線露光装置および半導体デバイス製造方法 |
US6167111A (en) * | 1997-07-02 | 2000-12-26 | Canon Kabushiki Kaisha | Exposure apparatus for synchrotron radiation lithography |
JPH1184098A (ja) * | 1997-07-11 | 1999-03-26 | Canon Inc | X線照明装置およびx線照明方法、x線露光装置ならびにデバイス製造方法 |
JPH11233436A (ja) | 1997-12-10 | 1999-08-27 | Canon Inc | X線照明装置及び方法、並びにこれを用いたx線露光装置やデバイス製造方法 |
US6665371B1 (en) | 1999-06-03 | 2003-12-16 | Canon Kabushiki Kaisha | Synchrotron radiation measurement apparatus, X-ray exposure apparatus, and device manufacturing method |
EP1107068B1 (de) * | 1999-11-30 | 2007-07-18 | ASML Netherlands B.V. | Lithographischer Projektionsapparat mit System zur Positionierung eines Reflektors |
TW490598B (en) * | 1999-11-30 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus |
US6445769B1 (en) * | 2000-10-25 | 2002-09-03 | Koninklijke Philips Electronics N.V. | Internal bearing cooling using forced air |
JP4006251B2 (ja) * | 2002-03-20 | 2007-11-14 | キヤノン株式会社 | ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法 |
JP3710443B2 (ja) * | 2002-09-11 | 2005-10-26 | キヤノン株式会社 | ミラー保持装置及び方法、並びに、ミラー交換方法 |
US7028356B2 (en) * | 2002-11-26 | 2006-04-18 | Ge Medical Systems Global Technology Company, Llc | Multiconfiguration braking system |
US7125167B2 (en) * | 2003-03-04 | 2006-10-24 | Ge Medical Systems Global Technology Company, Llc | Method and apparatus for tilting in a patient positioning system |
JP4497831B2 (ja) * | 2003-04-15 | 2010-07-07 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
US6992306B2 (en) * | 2003-04-15 | 2006-01-31 | Canon Kabushiki Kaisha | Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method |
JP4943121B2 (ja) | 2006-11-07 | 2012-05-30 | 株式会社小松製作所 | 極端紫外光源装置及びコレクタミラー交換方法 |
US8439649B2 (en) | 2009-11-02 | 2013-05-14 | Duniway Stockroom Corp. | Sputter ion pump with enhanced anode |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0421746A2 (de) * | 1989-10-03 | 1991-04-10 | Canon Kabushiki Kaisha | Belichtungsvorrichtung |
JPH03155100A (ja) * | 1989-11-14 | 1991-07-03 | Sorutetsuku:Kk | 放射光反射ミラー制御装置 |
JPH0445417A (ja) * | 1990-06-13 | 1992-02-14 | Fujitsu Ltd | 光線反射鏡 |
JPH0480700A (ja) * | 1990-07-20 | 1992-03-13 | Fujitsu Ltd | シンクロトロン放射光発生装置 |
JPH04169900A (ja) * | 1990-11-02 | 1992-06-17 | Fujitsu Ltd | X線装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03288422A (ja) * | 1990-04-04 | 1991-12-18 | Fujitsu Ltd | シンクロトロン放射光発生装置 |
JPH04363700A (ja) * | 1990-08-01 | 1992-12-16 | Canon Inc | X線透過窓およびその取付け方法 |
US5195113A (en) * | 1990-09-28 | 1993-03-16 | Kabushiki Kaisha Toshiba | X-ray exposure apparatus and method of positioning the same |
-
1992
- 1992-09-30 DE DE69225378T patent/DE69225378T2/de not_active Expired - Fee Related
- 1992-09-30 EP EP92308909A patent/EP0540178B1/de not_active Expired - Lifetime
- 1992-09-30 CA CA002079562A patent/CA2079562C/en not_active Expired - Fee Related
-
1994
- 1994-07-15 US US08/275,661 patent/US5448612A/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0421746A2 (de) * | 1989-10-03 | 1991-04-10 | Canon Kabushiki Kaisha | Belichtungsvorrichtung |
JPH03155100A (ja) * | 1989-11-14 | 1991-07-03 | Sorutetsuku:Kk | 放射光反射ミラー制御装置 |
JPH0445417A (ja) * | 1990-06-13 | 1992-02-14 | Fujitsu Ltd | 光線反射鏡 |
JPH0480700A (ja) * | 1990-07-20 | 1992-03-13 | Fujitsu Ltd | シンクロトロン放射光発生装置 |
JPH04169900A (ja) * | 1990-11-02 | 1992-06-17 | Fujitsu Ltd | X線装置 |
Non-Patent Citations (4)
Title |
---|
DATABASE WPIL Section EI, Week 9231, Derwent Publications Ltd., London, GB; Class U11, AN 92-253610 & JP-A-04 169 900 (F U J I T S U L T D) 17 June 1992 * |
PATENT ABSTRACTS OF JAPAN vol. 15, no. 387 (E-1117)30 September 1991 & JP-A-03 155 100 ( SORUTETSUKU : K K ) 3 July 1991 * |
PATENT ABSTRACTS OF JAPAN vol. 16, no. 222 (P-1359)25 May 1992 & JP-A-04 045 417 ( F U J I T S U LTD ) 14 February 1992 * |
PATENT ABSTRACTS OF JAPAN vol. 16, no. 296 (P-1378)30 June 1992 & JP-A-04 080 700 ( F U J I T S U LTD ) 13 March 1992 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004001821A1 (ja) * | 2002-06-25 | 2003-12-31 | Nikon Corporation | 光学ユニット及びx線露光装置 |
DE102014116476B4 (de) | 2014-11-11 | 2023-02-16 | Deutsches Elektronen-Synchrotron Desy | Vorrichtung mit beweglicher Aufnahme für Vakuumkammern |
CN106970096A (zh) * | 2017-05-22 | 2017-07-21 | 上海电气核电设备有限公司 | 接管内壁偏心曝光支撑架 |
CN106970096B (zh) * | 2017-05-22 | 2023-12-01 | 上海电气核电设备有限公司 | 接管内壁偏心曝光支撑架 |
Also Published As
Publication number | Publication date |
---|---|
US5448612A (en) | 1995-09-05 |
DE69225378D1 (de) | 1998-06-10 |
DE69225378T2 (de) | 1998-09-24 |
EP0540178B1 (de) | 1998-05-06 |
EP0540178A3 (en) | 1993-06-30 |
CA2079562C (en) | 1997-01-07 |
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