EP0363832B1 - Hochleistungsstrahler - Google Patents

Hochleistungsstrahler Download PDF

Info

Publication number
EP0363832B1
EP0363832B1 EP89118546A EP89118546A EP0363832B1 EP 0363832 B1 EP0363832 B1 EP 0363832B1 EP 89118546 A EP89118546 A EP 89118546A EP 89118546 A EP89118546 A EP 89118546A EP 0363832 B1 EP0363832 B1 EP 0363832B1
Authority
EP
European Patent Office
Prior art keywords
electrodes
dielectric
radiator according
power radiator
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP89118546A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0363832A1 (de
Inventor
Bernd Dr. Gellert
Ulrich Dr. Kogelschatz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Noblelight GmbH
Original Assignee
ABB Asea Brown Boveri Ltd
Heraeus Noblelight GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ABB Asea Brown Boveri Ltd, Heraeus Noblelight GmbH filed Critical ABB Asea Brown Boveri Ltd
Publication of EP0363832A1 publication Critical patent/EP0363832A1/de
Application granted granted Critical
Publication of EP0363832B1 publication Critical patent/EP0363832B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel

Definitions

  • the invention relates to a state of the art, such as results from EP application 87109674.9 (publication number 257111).
  • UV sources The industrial use of photochemical processes depends heavily on the availability of suitable UV sources.
  • the classic UV lamps deliver low to medium UV intensities at some discrete wavelengths, e.g. the mercury low-pressure lamps at 185 nm and especially at 254 nm. Really high UV power can only be obtained from high-pressure lamps (Xe, Hg), which then distribute their radiation over a larger wavelength range.
  • high-pressure lamps Xe, Hg
  • the new excimer lasers have provided some new wavelengths for basic photochemical experiments. currently for cost reasons for an industrial process probably only suitable in exceptional cases.
  • the invention has for its object to provide a high-performance radiator, in particular for UV or VUV light, which is characterized in particular by higher efficiency, is economical to manufacture and also enables the construction of very large area radiators.
  • the high-power radiator according to the invention permits radiator geometries of almost any shape.
  • cylindrical or elliptical emitters can be created.
  • the radiators do not necessarily have to be flat or elongated, but can be curved or curved in one or more dimensions.
  • the invention allows the walls delimiting the discharge space to be provided with a luminescence layer either on the wall facing the discharge space or on the outer wall for converting the UV light into visible light.
  • the wall no longer has to be UV-permeable because it only has to let visible light through.
  • Dielectrics which are not necessarily transparent to UV light can be used in the arrangement according to the invention, which means that particularly high efficiencies can be expected for special applications.
  • UV light can be used directly for some applications without having to leave the discharge space. This applies in particular to those applications that can be carried out in the discharge space.
  • Such applications with growing economic importance include e.g. use as a strong UV lamp for pre-ionization purposes of other discharges, e.g. Lasers, treatment of surfaces with UV exposure, chemical processes such as preparation of new chemicals or surfaces and coating processes such as plasma CVD (Chemical Vapor Deposition), Photo CVD, in which a substrate to be treated is brought as close as possible to the UV light source with a suitable filling gas becomes.
  • plasma CVD Chemical Vapor Deposition
  • Photo CVD Photo CVD
  • 1 and 2 consists of two spaced UV-transparent plates 1, 2 made of quartz glass, between which a further plate 3 made of dielectric material, e.g. Glass or ceramic or a plastic dielectric is arranged. Spacers 4, 5 distributed over the surface secure the spacing of the plates 1, 2 and 3 and at the same time serve to hold them together.
  • an adjustable AC voltage in the order of magnitude of several 100 volts to 20,000 volts at frequencies in the range of technical alternating current up to a few kHz - depending on the electrode geometry, pressure in the discharge space and composition of the filling gas.
  • the discharge spaces 8 and 9 between the plates 1 and 3 or 3 and 2 are filled with a filling gas which emits radiation under discharge conditions, e.g. Mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally using an additional further noble gas, preferably Ar, He, Ne, as a buffer gas.
  • a filling gas which emits radiation under discharge conditions, e.g. Mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally using an additional further noble gas, preferably Ar, He, Ne, as a buffer gas.
  • a plurality of discharge channels 10 form from one electrode 6' through the dielectric 3 along the surface of the dielectric 3 and back into the dielectric 3 to the adjacent electrode 6".
  • These sliding discharges 10 running along the surface emit the UV light, which then penetrates through the transparent plates 1, 2 in the example. If different filling gases are used in rooms 8 and 9, two different radiations can be generated with one and the same radiator if the electrode arrangement and distribution are selected accordingly.
  • a coating 11, 12 By applying a coating 11, 12 to the two surfaces of the dielectric 3, lower ignition voltages for the discharge can be achieved, so that the costs for the supply can be reduced.
  • the oxides of magnesium, ytterbium, lanthanum and cerium are primarily suitable as coating material.
  • the UV light can also be used directly for some applications without it having to penetrate through the cover plates 1, 2. This applies to those applications that can be carried out in the discharge spaces 8, 9 themselves.
  • Such applications with growing economic importance include e.g. the treatment of surfaces with UV exposure, chemical processes such as the preparation of new chemicals or surface coating such as plasma CVD, photo CVD, i.e. processes in which a substrate to be treated with a suitable filler gas is as close as possible to the dielectric surface, i.e. where the Radiation is created, brought up.
  • FIG. 6 a tube 21 made of dielectric material is arranged coaxially between two quartz tubes 19, 20. Spacers, not shown, secure the mutual position of the three tubes.
  • metal electrodes 22 ′, 22 ′′ are embedded in the dielectric tube 21, which analogously to FIG. 2 are alternately connected to one and the other pole of an AC power source (not shown).
  • the cylinder emitter according to FIG. 6 emits both inwards (into the interior of the tube 20) and outwards. If different filling gases are used in rooms 8 and 9, two different radiations can be generated with one and the same radiator if the electrode arrangement and distribution are selected accordingly. Of course, this also applies to a radiator according to Fig. 4.
  • the desired reactions can also take place in the discharge space (s) 8 or 9 itself in the case of cylindrical radiators according to FIG. 6.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
EP89118546A 1988-10-10 1989-10-06 Hochleistungsstrahler Expired - Lifetime EP0363832B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH3778/88 1988-10-10
CH3778/88A CH676168A5 (enrdf_load_stackoverflow) 1988-10-10 1988-10-10

Publications (2)

Publication Number Publication Date
EP0363832A1 EP0363832A1 (de) 1990-04-18
EP0363832B1 true EP0363832B1 (de) 1993-06-16

Family

ID=4263286

Family Applications (1)

Application Number Title Priority Date Filing Date
EP89118546A Expired - Lifetime EP0363832B1 (de) 1988-10-10 1989-10-06 Hochleistungsstrahler

Country Status (5)

Country Link
US (1) US5006758A (enrdf_load_stackoverflow)
EP (1) EP0363832B1 (enrdf_load_stackoverflow)
JP (1) JP2812736B2 (enrdf_load_stackoverflow)
CH (1) CH676168A5 (enrdf_load_stackoverflow)
DE (1) DE58904712D1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19922566B4 (de) * 1998-12-16 2004-11-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Erzeugung von Ultraviolettstrahlung

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19922566B4 (de) * 1998-12-16 2004-11-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Erzeugung von Ultraviolettstrahlung

Also Published As

Publication number Publication date
JP2812736B2 (ja) 1998-10-22
EP0363832A1 (de) 1990-04-18
DE58904712D1 (de) 1993-07-22
CH676168A5 (enrdf_load_stackoverflow) 1990-12-14
US5006758A (en) 1991-04-09
JPH02158049A (ja) 1990-06-18

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