EP0363832A1 - Dispositif de rayonnement à haute puissance - Google Patents
Dispositif de rayonnement à haute puissance Download PDFInfo
- Publication number
- EP0363832A1 EP0363832A1 EP89118546A EP89118546A EP0363832A1 EP 0363832 A1 EP0363832 A1 EP 0363832A1 EP 89118546 A EP89118546 A EP 89118546A EP 89118546 A EP89118546 A EP 89118546A EP 0363832 A1 EP0363832 A1 EP 0363832A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- electrodes
- dielectric
- radiator according
- discharge
- power radiator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
Definitions
- the invention relates to a high-power radiator, in particular for ultraviolet light, with a discharge space filled with filling gas emitting radiation under discharge conditions, with pairs of electrodes which are connected in pairs to the two poles of a high-voltage source, with at least one dielectric material lying between two electrodes at different potentials that is adjacent to the discharge space.
- the invention relates to a state of the art, such as results from EP application 87109674.9 or US application 07/076926.
- UV sources The industrial use of photochemical processes depends heavily on the availability of suitable UV sources.
- the classic UV lamps deliver low to medium UV intensities at some discrete wavelengths, such as the low-pressure mercury lamps at 185 nm and especially at 254 nm.
- Really high UV powers can only be obtained from high-pressure lamps (Xe, Hg), which then but distribute their radiation over a larger wavelength range.
- the new excimer lasers have some new wavelengths for basic photochemical experiments are provided. currently for cost reasons for an industrial process probably only suitable in exceptional cases.
- the invention has for its object to provide a high-performance radiator, in particular for UV or VUV light, which is characterized in particular by higher efficiency, is economical to manufacture and also enables the construction of very large area radiators.
- the electrode pairs mentioned, separated by dielectric material are arranged directly next to one another in such a way that the silent electrical discharge is formed in the discharge space in the region of the dielectric surface.
- the manufacture of the high-power radiator according to the invention is simplified and less expensive than in the known radiators. You can use materials that are easy to cast so that the electrodes can be cast in. This reduces problems when complying with tolerances (eg thickness of the dielectric or the distances). Also for the limiting glass / quartz material there are no very high demands, since the limiting walls only have to be transparent and are not stressed by the discharge. This leads to a longer lamp life.
- the gap width and its tolerances are also far less critical. In particular, because of the lower requirements with regard to tolerances, very large area radiators can be realized, which can be made very thin.
- the UV yield is very high. There are no transmission losses from an electrode grid or a partially permeable layer.
- the high-power radiator according to the invention permits radiator geometries of almost any shape.
- cylindrical or elliptical emitters can be created.
- the emitters do not necessarily have to be flat or elongated, but have to be curved or curved in one or more dimensions.
- the invention allows the applicant to provide the walls delimiting the discharge space with a luminescent layer either on the discharge space facing or on the outer wall in order to convert the UV -Light in visible light.
- the wall no longer has to be UV-permeable because it only has to let visible light through.
- Dielectrics which are not necessarily transparent to UV light can be used in the arrangement according to the invention, which means that particularly high efficiencies can be expected for special applications.
- UV light can be used directly for some applications without having to leave the discharge space. This applies in particular to those applications that can be carried out in the discharge space.
- Such applications with growing economic importance include, for example, use as a strong UV lamp for pre-ionization purposes of other discharges, for example lasers, and treatment of surfaces with UV exposure, chemical processes such as the preparation of new chemicals or surfaces and coating processes such as plasma CVD (Chemical Vapor Deposition), Photo-CVD, in which a substrate to be treated is brought as close as possible to the UV light source with a suitable filling gas.
- plasma CVD Chemical Vapor Deposition
- Photo-CVD Photo-CVD
- 1 and 2 consists of two spaced UV-transparent plates 1, 2 made of quartz glass, between which a further plate 3 made of dielectric material, e.g. Glass or ceramic or a plastic dielectric is arranged. Spacers 4, 5 distributed over the surface secure the spacing of the plates 1, 2 and 3 and at the same time serve to hold them together.
- metal electrodes, 6 ', 6' are embedded at regular intervals and spaced apart. As can be seen in Fig.2, the electrodes 6'6 ⁇ are alternately connected to one and the other pole of an alternating current source 7.
- the alternating current source 7 basically corresponds to those used for supplying ozone generators.
- an adjustable AC voltage in the order of magnitude of several 100 volts to 20,000 volts at frequencies in the range of technical alternating current up to a few kHz - depending on the electrode geometry, pressure in the discharge space and composition of the filling gas.
- the discharge spaces 8 and 9 between the plates 1 and 3 or 3 and 2 are filled with a filling gas which emits radiation under discharge conditions, for example mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally using an additional further noble gas , preferably Ar, He, Ne, as a buffer gas.
- a filling gas which emits radiation under discharge conditions, for example mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally using an additional further noble gas , preferably Ar, He, Ne, as a buffer gas.
- a substance / substance mixture according to the following table can be used: Filling gas radiation helium 60-100 nm neon 80 - 90 nm argon 107 - 165 nm Argon + fluorine 180-200 nm Argon + chlorine 165-190 nm Argon + krypton + chlorine 165-190, 200-240 nm xenon 160-190 nm nitrogen 337 - 415 nm krypton 124, 140-160 nm Krypton + fluorine 240 - 255 nm Krypton + chlorine 200-240 nm mercury 185.254, 320-360, 390-420 nm selenium 196, 204, 206 nm deuterium 150-250 nm Xenon + fluorine 400 - 550 nm Xenon + chlorine 300-320 nm
- an inert gas Ar, He, Kr, Ne, Xe
- Hg An inert gas or Hg with a gas or vapor from F2, J2, Br2, Cl2 or a compound that splits off one or more atoms F, J, Br or Cl in the discharge
- - A noble gas Ar, He, Kr, Ne, Xe
- Hg with O2 or a compound that releases one or more O atoms in the discharge
- an inert gas Ar, He, Kr, Ne, Xe
- the electron energy distribution can be optimally adjusted by the thickness of the dielectric plate 3 and its properties, distance between the electrodes 6 ', 6 ⁇ , pressure and / or temperature.
- a plurality of discharge channels 10 form from one electrode 6' through the dielectric 3 along the surface of the dielectric 3 and back into the dielectric 3 into the adjacent electrode 6 ⁇ .
- These sliding discharges 10 running along the surface emit the UV light, which then penetrates through the transparent plates 1, 2 in the example. If different filling gases are used in rooms 8 and 9, two different radiations can be generated with one and the same radiator if the electrode arrangement and distribution are selected accordingly.
- a coating 11, 12 to the two surfaces of the dielectric 3, lower ignition voltages for the discharge can be achieved, so that the costs for the supply can be reduced.
- the primary coating materials are the oxides of magnesium, ytterbium, lanthanum and cerium (MgO, Yb2O3, La2O3, CeO2).
- the UV light can also be used directly for some applications without it having to penetrate through the cover plates 1, 2. This applies to those applications that can be carried out in the discharge spaces 8, 9 themselves.
- Such applications with growing economic importance include, for example, the treatment of surfaces with UV exposure, chemical processes such as the preparation of new chemicals or surface coating such as plasma CVD, photo CVD, that is to say processes in which a treatment is carried out
- the substrate With a suitable filling gas, the substrate is brought as close as possible to the dielectric surface, i.e. where the radiation is generated.
- the production of the dielectric 3 together with the electrodes 6 ', 6' embedded in it is simplified compared to the known high-power radiators and thus less expensive. You can use materials that can be cast relatively easily, so that the electrodes 6 ', 6 ⁇ can be cast in at the same time. This eliminates problems with compliance with tolerances, e.g. the thickness of the dielectric 3 or the distances between the plates 1 and 3 or 3 and 2 is reduced. Also for the material of the UV-permeable plates - if they have to be UV-permeable at all - there are no very high demands, since they are not stressed by the discharge. This in turn leads to an increase in the total life of the lamp.
- the electrodes 6, 6 ⁇ embedded in the dielectric 3 For an inexpensive production of the electrodes 6, 6 ⁇ embedded in the dielectric 3, techniques can also be used which are used in the production of plasma display cells (cf. "AC Plasma Display” by TNCriscimagna & P.Pleshko in “Display Devices”", JIPamkove (Ed.), Springer-Verlag Berlin, Heidelberg, New York 1980, pp. 92-150).
- the electrodes according to FIG. 3 are applied as discrete conductor tracks 6a, 6b to a substrate 13 made of glass, quartz or ceramic using thin-film or thick-film techniques.
- vaporization and sputtering processes are used for metallization on the one hand, and conductive pastes on the other.
- Fine conductor tracks can be produced by photo-lithographic processes, wider ones (> 25 micrometers) can be created by metal deposition through a mask.
- the conductor tracks (electrodes) thus applied are then covered by a dielectric layer 14.
- layers of lead oxide glass can be applied as a spray or paste and then heated, forming a continuous layer of glass.
- Layers of borosilicate glass can be made using evaporation techniques. It is also possible to deposit other dielectric layers using methods that are common in semiconductor technology, for example by means of plasma CVD or photo CVD.
- electrodes with an almost constant cross section can also be used.
- the electrodes also do not have to run in a straight line, but can also be arranged, for example, in a meandering shape or in a zigzag pattern next to one another.
- the electrodes 6 ′, 6 ⁇ as hollow electrodes, or in the dielectric 3 in FIG. 1 or in the substrate 13 in FIG. 3, additional channels running in the longitudinal direction of the electrode (item 15 in FIG. 3) to provide through which channels a liquid or gaseous coolant is passed.
- FIG. 6 a tube 21 made of dielectric material is arranged coaxially between two quartz tubes 19, 20. Spacers, not shown, secure the mutual position of the three tubes.
- metal electrodes 22 ′, 22 ⁇ are embedded in the dielectric tube 21, which are alternately connected to one and the other pole of an AC power source (not shown) analogously to FIG.
- the cylinder emitter according to FIG. 6 emits both inwards (into the interior of the tube 20) and outwards. If different filling gases are used in rooms 8 and 9, two different radiations can be generated with the same radiator if the electrode arrangement and distribution are selected accordingly. Of course, this also applies to a radiator according to Fig. 4.
- the desired reactions can also take place in the discharge space (s) 8 or 9 itself in the case of cylindrical radiators according to FIG. 6.
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH3778/88A CH676168A5 (fr) | 1988-10-10 | 1988-10-10 | |
CH3778/88 | 1988-10-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0363832A1 true EP0363832A1 (fr) | 1990-04-18 |
EP0363832B1 EP0363832B1 (fr) | 1993-06-16 |
Family
ID=4263286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP89118546A Expired - Lifetime EP0363832B1 (fr) | 1988-10-10 | 1989-10-06 | Dispositif de rayonnement à haute puissance |
Country Status (5)
Country | Link |
---|---|
US (1) | US5006758A (fr) |
EP (1) | EP0363832B1 (fr) |
JP (1) | JP2812736B2 (fr) |
CH (1) | CH676168A5 (fr) |
DE (1) | DE58904712D1 (fr) |
Cited By (28)
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EP0482230A1 (fr) * | 1990-10-22 | 1992-04-29 | Heraeus Noblelight GmbH | Dispositif de rayonnement à haute puissance |
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US5198717A (en) * | 1990-12-03 | 1993-03-30 | Asea Brown Boveri Ltd. | High-power radiator |
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JP4424394B2 (ja) * | 2007-08-31 | 2010-03-03 | ウシオ電機株式会社 | エキシマランプ |
DE102012017779A1 (de) * | 2012-09-07 | 2014-03-13 | Karlsruher Institut für Technologie | Dielektrisch behinderte Entladungs-Lampe |
DE102021108009B4 (de) | 2021-03-30 | 2023-02-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Multi-Wellenlängen UV-Strahlungsquelle sowie UV-Sonde, insbesondere für die Fluoreszenzanalyse |
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EP0254111B1 (fr) * | 1986-07-22 | 1992-01-02 | BBC Brown Boveri AG | Dispositif de rayonnement ultraviolet |
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CH152887A (de) * | 1930-02-04 | 1932-02-29 | Ig Farbenindustrie Ag | Verfahren zur Herstellung eines stickstoffhaltigen Küpenfarbstoffes. |
JPS599849A (ja) * | 1982-07-09 | 1984-01-19 | Okaya Denki Sangyo Kk | 高周波放電ランプ |
JPS60172135A (ja) * | 1984-02-15 | 1985-09-05 | Mitsubishi Electric Corp | 平板状光源 |
CH675178A5 (fr) * | 1987-10-23 | 1990-08-31 | Bbc Brown Boveri & Cie |
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1988
- 1988-10-10 CH CH3778/88A patent/CH676168A5/de not_active IP Right Cessation
-
1989
- 1989-10-05 US US07/417,473 patent/US5006758A/en not_active Expired - Lifetime
- 1989-10-06 DE DE8989118546T patent/DE58904712D1/de not_active Expired - Fee Related
- 1989-10-06 EP EP89118546A patent/EP0363832B1/fr not_active Expired - Lifetime
- 1989-10-11 JP JP1263157A patent/JP2812736B2/ja not_active Expired - Fee Related
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EP0254111B1 (fr) * | 1986-07-22 | 1992-01-02 | BBC Brown Boveri AG | Dispositif de rayonnement ultraviolet |
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DISPLAY DEVICES, 1980, Seiten 91-150, Springer-Verlag, Berlin, DE; T.N. CRISCIMAGNA et al.: "AC plasma display" * |
PATENT ABSTRACTS OF JAPAN, Band 10, Nr. 8 (E-373)[2065], 14. Januar 1986; & JP-A-60 172 135 (MITSUBISHI DENKI K.K.) 05-09-1985 * |
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Also Published As
Publication number | Publication date |
---|---|
EP0363832B1 (fr) | 1993-06-16 |
JPH02158049A (ja) | 1990-06-18 |
DE58904712D1 (de) | 1993-07-22 |
CH676168A5 (fr) | 1990-12-14 |
JP2812736B2 (ja) | 1998-10-22 |
US5006758A (en) | 1991-04-09 |
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