EP0449018A2 - Dispositif d'irradiation - Google Patents
Dispositif d'irradiation Download PDFInfo
- Publication number
- EP0449018A2 EP0449018A2 EP91103659A EP91103659A EP0449018A2 EP 0449018 A2 EP0449018 A2 EP 0449018A2 EP 91103659 A EP91103659 A EP 91103659A EP 91103659 A EP91103659 A EP 91103659A EP 0449018 A2 EP0449018 A2 EP 0449018A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- discharge space
- electrodes
- radiation
- irradiation device
- discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
Definitions
- the invention relates to an irradiation device for drying and / or curing paints, varnishes and similar coatings. It relates in particular to such a device with at least one UV high-power radiator, preferably an excimer radiator, with a discharge space filled with filling gas, the filling gas emitting radiation, preferably excimer radiation, under the influence of silent electrical discharges, the discharge space being delimited by walls , of which at least one wall consists of dielectric material and for which radiation generated in the discharge space is transparent, with a pair of electrodes, a treatment room directly adjacent to one of the walls of the discharge space, and with an AC power source connected to the two electrodes for supplying the discharge.
- at least one UV high-power radiator preferably an excimer radiator
- the filling gas emitting radiation, preferably excimer radiation, under the influence of silent electrical discharges
- the discharge space being delimited by walls , of which at least one wall consists of dielectric material and for which radiation generated in the discharge space is transparent
- the invention relates to European patent application 87109674.9 dated July 6, 1987 with publication number 0 254 111 or to Swiss patent application 152 / 88-7 dated January 15, 1988 by the applicant.
- UV and VUV high-performance lamps of the type mentioned at the outset were presented for the first time in a lecture by U.Kogelschatz "New UV and VUV excimer lamps" at the 10th lecture conference of the Society of German Chemists, Photochemistry Group, Würzburg, 18th-20th Presented to the public in November 1987.
- a more detailed description of this new radiator type can be found in the article by B.Eliasson and U.Kogelschatz "UV Excimer Radiation from Dielectric-Barrier Discharges" in the journal Appl.Phys.B 46, 299-303 (1988).
- This high-performance radiator can be operated with high electrical power densities and high efficiency. Its geometry is widely adaptable to the process in which it is used. In addition to large, flat spotlights, cylindrical ones that radiate inwards or outwards are also possible.
- the discharges can be operated at high pressure (0.1 - 10 bar). With this design, electrical power densities of 1 - 50 KW / m2 can be realized. Since the electron energy in the discharge can be largely optimized, the efficiency of such radiators is very high, even if one excites resonance lines of suitable atoms.
- the wavelength of the radiation can be set by the type of fill gas, e.g.
- Mercury (185 nm, 254 nm), nitrogen (337 nm-415 nm), selenium (196 nm, 204 nm, 206 nm), arsenic (189 nm, 193 nm), iodine (183 nm), xenon (119 nm, 130 nm, 147 nm), Krypton (124 nm).
- nitrogen (337 nm-415 nm
- selenium 196 nm, 204 nm, 206 nm
- arsenic 189 nm, 193 nm
- iodine 183 nm
- xenon 119 nm, 130 nm, 147 nm
- Krypton 124 nm
- emitters with gases or gas mixtures in which excimer radiation is generated are of particular interest.
- the noble gases and noble gas / halogen mixtures may be mentioned as examples.
- UV high-performance emitters An important field of application for these UV high-performance emitters is the drying and / or curing of lacquers, paints and similar coatings, which contain photoinitors, on tape or foil-like supports made of paper or plastic or on other, more complicated shaped workpieces such as furniture etc.
- lacquers, paints and similar coatings which contain photoinitors, on tape or foil-like supports made of paper or plastic or on other, more complicated shaped workpieces such as furniture etc.
- the supports or workpieces are guided past large-area UV lamps in a kind of treatment chamber at a defined distance. Because the duration of exposure to UV radiation now has a decisive influence on the productivity of such systems, there is a great need for high-performance lamps with short exposure times.
- the invention has for its object to provide an irradiation device with a UV or VUV emitter, which allows very short exposure times and also enables a simple and economical structure.
- the one electrode is spaced apart from the dielectric immediately adjacent to it, in such a way that the coupling of the electrical energy from this one electrode into the discharge space takes place essentially capacitively, so that in addition to the discharges in the actual discharge space, which are responsible for the generation of UV or VUV radiation, also form electrical discharges in the outside space, which in addition to the radiation arising in the discharge space also have a catalytic effect on the coatings mentioned.
- the advantage of the invention can be seen in particular in the fact that the radiation generated in the discharge space can be used almost completely and that compact radiation devices can be built from which no UV radiation emerges.
- Electrodes 4 are arranged in two treatment rooms 6, 7, which are delimited on the outside by walls 8 and 9.
- the electrodes consist in the example of a comparatively wide-mesh wire mesh with a mesh size of 10 x 10 mm2.
- the average distance of the wires 4, 5 from the plates 1, 2 should be greater than half the wire diameter D, typically less than 1 mm or slightly more.
- a wire mesh placed on the dielectric 1 or 2 and clamped on the plate edges fulfills these conditions, for example: the wire mesh only lies locally on the dielectric due to the edge clamping. The resulting inhomogeneities of the "external discharges" are negligible for the process.
- the electrodes 3 and 4 are each connected in parallel with each other - this condition is given automatically in the case of a wire network - and each is connected to the poles of an AC power source 10 with adjustable frequency and amplitude of the output voltage.
- This AC power source 10 basically corresponds to those used for feeding Ozone generators can be used. It typically delivers an adjustable AC voltage in the order of magnitude of several kVolt, preferably ⁇ 10 kVolt, at frequencies up to the MHz range, depending on the electrode geometry, pressure in the discharge space and composition of the filling gas.
- the material to be treated is arranged between the electrodes 4 and 5 and the housing walls 8 and 9, in the example a web-shaped carrier 11 or 12 with a lacquer or color layer 13 or 14, which layers contain UV-curing substances with photoinitiators.
- the discharge space 3 between the plates 1 and 2 is filled with a filling gas which emits radiation under discharge conditions, e.g. Mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally using an additional further noble gas, preferably Ar, He, Ne, Xe as buffer gas.
- a filling gas which emits radiation under discharge conditions, e.g. Mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally using an additional further noble gas, preferably Ar, He, Ne, Xe as buffer gas.
- the electron energy distribution can be optimally adjusted by the thickness of the dielectric plates 1, 2 and their properties, distance of the plates 1 and 2, pressure and / or temperature.
- the discharges emit the UV light, which then penetrates through the transparent plates 1 and 2 into the immediately adjacent treatment rooms 6 and 7 and interacts with the layers 13 and 14.
- silent electrical discharges also form in the treatment rooms 6 and 7 in the distances between the electrodes 4 and plate 1 or electrodes 5 and plate 2.
- These “external discharges” produce reaction products or ions in accordance with the ambient atmosphere - primarily ozone and nitrogen oxides in air, which together with the UV radiation from the discharge space 3 significantly accelerate the hardening of the layers 13 and 14, act as a catalyst.
- FIG. 1 An emitter emitting on both sides, as shown in FIG. 1, it is possible to implement an irradiation device with an UV emitter emitting only on one side and accordingly only a single treatment room.
- This embodiment is shown schematically in Figure 2, for example.
- the discharge space is delimited on the one hand by the dielectric plate 1 and a plate-shaped electrode 5 '.
- the operation of this device corresponds in all essential points to that according to Fig.1.
- the invention is of course not limited to flat radiators. Without leaving the scope of the invention, cylindrical irradiation devices are also possible, as illustrated for example in FIGS. 3 and 4.
- a metal tube 15 which forms the one electrode of the UV radiator, is made of a dielectric tube 16 Surround material concentrically.
- the tube 16 is in turn surrounded by an electrode 17, which consists, for example, of tubular wire mesh, leaving a distance D.
- the outer end is formed by an outer tube 18 spaced apart from the electrode 17.
- Such an irradiation device is suitable, for example, for the treatment of UV-curing layers on the inside of hollow cylindrical objects which are pushed into the treatment space 6.
- the embodiment of the invention according to FIG. 4 is an irradiation device with an internal radiator.
- a quartz tube 16 is arranged in the interior of a metal tube 19, which forms the one electrode of the UV lamp.
- the space between the tubes 16 and 19 forms the discharge space 3.
- the other electrode 17 ' is arranged, which can consist of a tubular wire mesh as shown in FIG.
- the material to be treated is a copper wire 21 provided with a UV-curing lacquer view 20, as is used as a conductor material for the windings of electrical machines and apparatus.
- the discharge space 3 is formed by two coaxial quartz tubes 1r and 2r. Electrodes 4r and 5r are located outside or inside the tubes 1r and 2r and are spaced apart from them as in FIG. 1. A tube 8r forms the outer end. The annular space between the tubes 1r and 8r form one (outer) treatment space 6, the interior of the tube 2r forms the other (inner) treatment space 7r.
- the radiation devices described above are suitable for a wide range of applications: drying and / or curing UV-curing lacquers and paints for protective and decorative purposes, adhesive layers on paper or plastic carriers, coatings of foils or plates for the furniture and packaging industry, polyester foils, e.g. protective foils for keyboards, UV casting compounds, UV clear lacquers and pigmented lacquers for data carriers, eg compact discs, UV lacquers for Paper coatings.
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Drying Of Solid Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4010190 | 1990-03-30 | ||
DE4010190A DE4010190A1 (de) | 1990-03-30 | 1990-03-30 | Bestrahlungseinrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0449018A2 true EP0449018A2 (fr) | 1991-10-02 |
EP0449018A3 EP0449018A3 (fr) | 1991-10-30 |
Family
ID=6403375
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19910103659 Withdrawn EP0449018A3 (fr) | 1990-03-30 | 1991-03-11 | Dispositif d'irradiation |
Country Status (4)
Country | Link |
---|---|
US (1) | US5136170A (fr) |
EP (1) | EP0449018A3 (fr) |
JP (1) | JPH04223039A (fr) |
DE (1) | DE4010190A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2660242A1 (fr) * | 1990-03-30 | 1991-10-04 | Heidelberger Druckmasch Ag | Dispositif emetteur de rayonnement pour secher et/ou durcir des encres et/ou des vernis dans des machines d'impression. |
DE4222130A1 (de) * | 1992-07-06 | 1994-01-13 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
DE19545943C1 (de) * | 1995-12-08 | 1997-05-07 | Steag Hamatech Gmbh Machines | Vorrichtung zum Beschichten von scheibenförmigen Informations-Speichermedien |
DE102004048005A1 (de) * | 2004-10-01 | 2006-04-13 | Dr. Hönle AG | Gasentladungslampe, System und Verfahren zum Härten von durch UV-Licht härtbare Materialien sowie durch UV-Licht gehärtetes Material |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2075238T3 (es) * | 1991-03-20 | 1995-10-01 | Asea Brown Boveri | Procedimiento y dispositivo para la carga de particulas. |
DE4222576A1 (de) * | 1992-07-09 | 1994-01-13 | Heidelberger Druckmasch Ag | Farbe, insbesondere UV-Strahlen härtende Druckfarbe für Offset-Druckprozesse, sowie Einrichtung und Verfahren zum Trocknen der Farbe |
DE4235743A1 (de) * | 1992-10-23 | 1994-04-28 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
DE4238324A1 (de) * | 1992-11-13 | 1994-05-19 | Abb Research Ltd | Verfahren und Einrichtung zur Entgiftung von schadstoffhaltigen Gasen |
DE4238388C2 (de) * | 1992-11-13 | 1997-02-20 | Heidelberger Druckmasch Ag | Elektronische Schaltungsanordnung zur Ansteuerung einer UV-Strahlungsquelle |
DE19503718A1 (de) * | 1995-02-04 | 1996-08-08 | Leybold Ag | UV-Strahler |
US5585641A (en) * | 1995-05-23 | 1996-12-17 | The Regents Of The University Of California | Large area, surface discharge pumped, vacuum ultraviolet light source |
US5763892A (en) * | 1995-06-19 | 1998-06-09 | Dainippon Screen Manufacturing Company, Ltd. | Ultraviolet irradiator for substrate, substrate treatment system, and method of irradiating substrate with ultraviolet light |
US5626768A (en) * | 1995-12-07 | 1997-05-06 | Triton Thalassic Technologies, Inc. | Sterilization of opaque liquids with ultraviolet radiation |
US5834784A (en) * | 1997-05-02 | 1998-11-10 | Triton Thalassic Technologies, Inc. | Lamp for generating high power ultraviolet radiation |
DE19920693C1 (de) * | 1999-05-05 | 2001-04-26 | Inst Oberflaechenmodifizierung | Offener UV/VUV-Excimerstrahler und Verfahren zur Oberflächenmodifizierung von Polymeren |
US6201355B1 (en) | 1999-11-08 | 2001-03-13 | Triton Thalassic Technologies, Inc. | Lamp for generating high power ultraviolet radiation |
US7056476B2 (en) * | 2000-06-15 | 2006-06-06 | Kabushiki Kaisha Toshiba | Refrigerator and deodorizer producing ozone by high-voltage discharge |
US6597003B2 (en) * | 2001-07-12 | 2003-07-22 | Axcelis Technologies, Inc. | Tunable radiation source providing a VUV wavelength planar illumination pattern for processing semiconductor wafers |
DE102004002129A1 (de) * | 2004-01-15 | 2005-08-11 | Arccure Technologies Gmbh | Verfahren und Vorrichtung zur Härtung von radikalisch polymerisierbaren Beschichtungen von Oberflächen |
US20050250346A1 (en) * | 2004-05-06 | 2005-11-10 | Applied Materials, Inc. | Process and apparatus for post deposition treatment of low k dielectric materials |
US20060251827A1 (en) * | 2005-05-09 | 2006-11-09 | Applied Materials, Inc. | Tandem uv chamber for curing dielectric materials |
CH699540B1 (fr) | 2006-07-05 | 2010-03-31 | Solaronix S A | Lampe à plasma. |
DE602007004732D1 (de) * | 2006-07-13 | 2010-03-25 | Philips Intellectual Property | Flüssigkeitsverarbeitungssystem mit einem strahlungsquellenmodul und einem kühlmittel |
FR2936093A1 (fr) * | 2008-09-12 | 2010-03-19 | Saint Gobain | Lampe uv tubulaire a decharge et utilisations |
JP5892754B2 (ja) * | 2011-09-22 | 2016-03-23 | 株式会社オーク製作所 | エキシマランプおよび放電ランプの点灯方法 |
FR2980369B1 (fr) * | 2011-09-27 | 2014-02-14 | Bmes | Procede et dispositif de purification et de desodorisation de l'air |
US9724441B2 (en) | 2012-08-28 | 2017-08-08 | Sensor Electronic Technology, Inc. | Storage device including target UV illumination ranges |
US10646603B2 (en) | 2012-08-28 | 2020-05-12 | Sensor Electronic Technology, Inc. | Multi wave sterilization system |
WO2014036080A1 (fr) | 2012-08-28 | 2014-03-06 | Sensor Electronic Technology, Inc. | Stérilisation, désinfection et système de stockage faisant appel à un gradient ultraviolet |
US10441670B2 (en) | 2012-08-28 | 2019-10-15 | Sensor Electronic Technology, Inc. | Storage device including ultraviolet illumination |
CN104853625A (zh) | 2012-08-28 | 2015-08-19 | 传感器电子技术股份有限公司 | 多波灭菌系统 |
US10688210B2 (en) | 2012-08-28 | 2020-06-23 | Sensor Electronic Technology, Inc. | Storage device including ultraviolet illumination |
US10383964B2 (en) | 2012-08-28 | 2019-08-20 | Sensor Electronic Technology, Inc. | Storage device including ultraviolet illumination |
US9919068B2 (en) | 2012-08-28 | 2018-03-20 | Sensor Electronic Technology, Inc. | Storage device including ultraviolet illumination |
US9878061B2 (en) | 2012-08-28 | 2018-01-30 | Sensor Electronic Technology, Inc. | Ultraviolet system for disinfection |
US9179703B2 (en) | 2012-08-28 | 2015-11-10 | Sensor Electronic Technology, Inc. | Ultraviolet system for disinfection |
CN104736261B (zh) | 2012-08-28 | 2017-06-16 | 传感器电子技术股份有限公司 | 包括紫外线照明的存储系统 |
US9707307B2 (en) | 2012-08-28 | 2017-07-18 | Sensor Electronic Technology, Inc. | Ultraviolet system for disinfection |
JP6694595B2 (ja) * | 2016-08-02 | 2020-05-20 | ウシオ電機株式会社 | オゾン発生装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6463262A (en) * | 1987-09-02 | 1989-03-09 | Hitachi Ltd | Illuminant device |
EP0324953A1 (fr) * | 1988-01-15 | 1989-07-26 | Heraeus Noblelight GmbH | Source de radiation à haute puissance |
DE4022279A1 (de) * | 1989-08-17 | 1991-02-21 | Asea Brown Boveri | Bestrahlungseinrichtung |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4266162A (en) * | 1979-03-16 | 1981-05-05 | Gte Laboratories Incorporated | Electromagnetic discharge apparatus with double-ended power coupling |
US4266167A (en) * | 1979-11-09 | 1981-05-05 | Gte Laboratories Incorporated | Compact fluorescent light source and method of excitation thereof |
US4647821A (en) * | 1984-09-04 | 1987-03-03 | Gte Laboratories Incorporated | Compact mercury-free fluorescent lamp |
US4675577A (en) * | 1985-04-15 | 1987-06-23 | Intent Patents A.G. | Electrodeless fluorescent lighting system |
CH677292A5 (fr) * | 1989-02-27 | 1991-04-30 | Asea Brown Boveri |
-
1990
- 1990-03-30 DE DE4010190A patent/DE4010190A1/de not_active Withdrawn
-
1991
- 1991-03-11 EP EP19910103659 patent/EP0449018A3/fr not_active Withdrawn
- 1991-03-29 US US07/677,340 patent/US5136170A/en not_active Expired - Fee Related
- 1991-03-29 JP JP3066391A patent/JPH04223039A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6463262A (en) * | 1987-09-02 | 1989-03-09 | Hitachi Ltd | Illuminant device |
EP0324953A1 (fr) * | 1988-01-15 | 1989-07-26 | Heraeus Noblelight GmbH | Source de radiation à haute puissance |
DE4022279A1 (de) * | 1989-08-17 | 1991-02-21 | Asea Brown Boveri | Bestrahlungseinrichtung |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 13, no. 272 (E-777)(3620) 22. Juni 1989 & JP-A-1 63 262 (HITACHI ) 9. März 1989 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2660242A1 (fr) * | 1990-03-30 | 1991-10-04 | Heidelberger Druckmasch Ag | Dispositif emetteur de rayonnement pour secher et/ou durcir des encres et/ou des vernis dans des machines d'impression. |
DE4222130A1 (de) * | 1992-07-06 | 1994-01-13 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
US5432398A (en) * | 1992-07-06 | 1995-07-11 | Heraeus Noblelight Gmbh | High-power radiator with local field distortion for reliable ignition |
DE19545943C1 (de) * | 1995-12-08 | 1997-05-07 | Steag Hamatech Gmbh Machines | Vorrichtung zum Beschichten von scheibenförmigen Informations-Speichermedien |
US6074482A (en) * | 1995-12-08 | 2000-06-13 | Steag Hamatech Ag | Device for coating disc-shaped information storage media |
DE102004048005A1 (de) * | 2004-10-01 | 2006-04-13 | Dr. Hönle AG | Gasentladungslampe, System und Verfahren zum Härten von durch UV-Licht härtbare Materialien sowie durch UV-Licht gehärtetes Material |
Also Published As
Publication number | Publication date |
---|---|
EP0449018A3 (fr) | 1991-10-30 |
JPH04223039A (ja) | 1992-08-12 |
DE4010190A1 (de) | 1991-10-02 |
US5136170A (en) | 1992-08-04 |
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