EP0324953A1 - Source de radiation à haute puissance - Google Patents
Source de radiation à haute puissance Download PDFInfo
- Publication number
- EP0324953A1 EP0324953A1 EP88121055A EP88121055A EP0324953A1 EP 0324953 A1 EP0324953 A1 EP 0324953A1 EP 88121055 A EP88121055 A EP 88121055A EP 88121055 A EP88121055 A EP 88121055A EP 0324953 A1 EP0324953 A1 EP 0324953A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- dielectric
- radiator according
- electrode
- power radiator
- discharge space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 title abstract description 19
- 239000000203 mixture Substances 0.000 claims abstract description 12
- 239000003989 dielectric material Substances 0.000 claims abstract 6
- 239000010410 layer Substances 0.000 claims description 33
- 239000007789 gas Substances 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical group [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 10
- 229910052753 mercury Inorganic materials 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 4
- 239000011241 protective layer Substances 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 4
- 239000011669 selenium Substances 0.000 claims description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052793 cadmium Inorganic materials 0.000 claims description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052740 iodine Inorganic materials 0.000 claims description 3
- 239000011630 iodine Substances 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 2
- 229910052785 arsenic Inorganic materials 0.000 claims description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052805 deuterium Inorganic materials 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 125000006850 spacer group Chemical group 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- 229910052756 noble gas Inorganic materials 0.000 abstract description 7
- 229910052724 xenon Inorganic materials 0.000 description 5
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052743 krypton Inorganic materials 0.000 description 3
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002835 noble gases Chemical class 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052754 neon Inorganic materials 0.000 description 2
- 238000006862 quantum yield reaction Methods 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
Definitions
- the invention relates to a high-power radiator with a discharge space filled under discharge conditions forming excimers, the one wall of which is formed by a first dielectric, which is provided on its surface facing away from the discharge space with a first electrode, at least this electrode and / or the dielectric is radiolucent, with an alternating current source connected to the first and second electrodes for feeding the discharge.
- the invention relates to a state of the art, such as that from the lecture by U. Kogelschatz "New UV and VUV excimer emitters" at the 10th lecture conference of the Society of German Chemists, Photochemistry Group, Würzburg, 18-20. November 1987.
- This high-performance radiator can be operated with high electrical power densities and high efficiency. Its geometry is widely adaptable to the process in which it is used. In addition to large, flat spotlights, cylindrical ones that radiate inwards or outwards are also possible.
- the discharges can be operated at high pressure (0.1 - 10 bar). With this design, electrical power densities of 1 - 50 KW / m2 can be realized. Since the electron energy in the discharge can be largely optimized, the efficiency of such radiators is very high, even if one excites resonance lines of suitable atoms.
- the wavelength of the radiation can be set by the type of fill gas, e.g.
- Mercury (185 nm, 254 nm), nitrogen (337-415 nm), selenium (196, 204.206 nm), arsenic (189, 193 nm), iodine (183 nm), xenon (119, 130, 147 nm), krypton (142 nm). As with other gas discharges, it is also advisable to mix different types of gas.
- the advantage of these emitters is the areal radiation of large radiation outputs with high efficiency. Almost all of the radiation is concentrated in one or a few wavelength ranges. It is important in all cases that the radiation can escape through one of the electrodes.
- This problem can be solved with transparent, electrically conductive layers or else by using a fine-mesh wire network or applied conductor tracks as electrodes, which on the one hand ensure the current supply to the dielectric, but on the other hand are largely transparent to the radiation.
- a transparent electrolyte for example H2O, can be used as a further electrode, which is particularly advantageous for the irradiation of water / waste water, since in this way the radiation generated passes directly into the liquid to be irradiated and this liquid also serves as a coolant.
- the object of the present invention is to modify the generic high-power radiator in such a way that it preferably emits light in the wavelength range from 400 nm to 800 nm, i.e. in the range of visible light, emits.
- the dielectric is provided with a luminescent layer.
- the invention is based on the same discharge geometry as that of the UV high-power lamp described in the patent applications mentioned.
- the UV photons generated by excimer radiation in the discharge space cause the layer to fluoresce or phosphoresce upon impact and thus generate visible radiation. With modern phosphors, this conversion process into visible light can be very efficient (quantum yield up to 95%).
- the layer is advantageously applied to the inside of the dielectric, because this means that the dielectric itself can only consist of ordinary glass. All difficulties that arise in connection with a UV source with UV-transparent materials do not arise.
- the luminescent layer may have to be protected against the attack of the discharge with a thin UV-transparent layer.
- the desired UV wavelength can be selected with the gas filling.
- excimers can be used as radiating molecules (noble gases, mixtures of noble gases and halogens, mercury, cadmium or zinc) or mixtures of metals with strong resonance lines (mercury, selenium etc.) in very small quantities and noble gases, the mercury-free filling gases being the Preference should be given since this does not create any disposal problems.
- a mercury lamp can be built with properties similar to those on which the conventional fluorescent tube and the new gas discharge lamps are based.
- a quartz or sapphire plate 1 consists essentially of a quartz or sapphire plate 1 and a metal plate 2, which are separated from one another by spacers 3 made of insulating material, and delimit a discharge space 4 with a typical gap width between 1 and 10 mm.
- the outer surface of the quartz plate 1 is covered with a luminescent layer 5, which is followed by a relatively wide-mesh wire mesh 6, of which only the warp or weft threads are visible.
- This wire mesh 6 and the metal plate 2 form the two electrodes of the radiator.
- the electrical feed is provided by an alternating current source 7 connected to these electrodes.
- those which have long been used in connection with ozone generators can be used as the current source.
- the discharge space 5 is laterally closed in the usual way, was evacuated before closing and was filled with an inert gas or a substance that forms excimers under discharge conditions, e.g. Mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, filled, optionally using an additional further noble gas (Ar, He, Ne) as a buffer gas.
- an inert gas or a substance that forms excimers under discharge conditions e.g. Mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, filled, optionally using an additional further noble gas (Ar, He, Ne) as a buffer gas.
- a substance according to the following table can be used: FILLING GAS RADIATION helium 60-100 nm neon 80 - 90 nm argon 107 - 165 nm xenon 160-190 nm nitrogen 337 - 415 nm krypton 124 nm, 140-160 nm Krypton + fluorine 240 - 255 nm Mercury + argon 235 nm deuterium 150-250 nm Xenon + fluorine 400 - 550 nm Xenon + chlorine 300-320 nm Xenon + iodine 240-260 nm
- noble gas-metal mixtures are also possible, with metals with strong resonance lines being preferred: zinc 213 nm cadmium 228.8 nm mercury 185 nm, 254 nm
- the amount of metal in the gas mixture is very small in relation to the amount of rare gas, so that as little self-absorption as possible occurs.
- the following relationship can serve as a guideline for the upper limit dx P M ⁇ 10 Torr mm where d is the gap width of the discharge space in millimeters (typically 1 - 10 mm), P M is the metal vapor pressure.
- the upper limit for the metal vapor is the excimer formation such as HgXe, HgAr, HgKr, for which 1 - 20 Torr Hg in e.g. 300 Torr of noble gas are sufficient. These excimers radiate at 140 220 nm and are also very efficient UV lamps. At higher mercury pressure, the Hg2 excimer forms, which radiates at 235 nm.
- the lower limit is around 10 ⁇ 2 Torr mm.
- the electron energy distribution can be optimally adjusted by varying the gap width of the discharge space, pressure and / or temperature.
- plate materials such as magnesium fluoride and calcium fluoride can also be used.
- a wire mesh there can also be a transparent, electrically conductive layer, the layer of indium or tin oxide being used for visible light, and a 50-100 angstroms gold layer for visible and UV light.
- the luminescent layer 5 preferably consists of modern phosphors, i.e. phosphor doped with rare earths, which enable a quantum yield of up to 95% (cf. E. Kauer and E. Schnedler “Possibilities and Limits of Light Generation” in "Phys. Bl. 42 (1986), No. 5, p. 128 - 133, especially p. 132).
- the metal electrode 2 itself can be made of UV-reflecting material, e.g. Aluminum or be provided with a UV-reflective layer 8.
- the embodiment according to FIG. 2 differs from that according to FIG. 1 only in the sequence of the layers.
- the luminescent layer 5 is on the surface of the plate 1 facing the discharge space 4 and is preferably protected against the discharge attack by a protective layer 9. It must be UV-transparent and e.g. made of magnesium fluoride (MgF2) or A12O3. Such layers are applied in a known manner by "sputtering" (ion sputtering).
- the UV-visible light is converted before it passes through the dielectric (plate 1), it can be made of a "normal" translucent material, e.g. GlaS, exist.
- the discharge space 4 is delimited on both sides by plates 4, 10 made of UV-transparent material, for example quartz or sapphire glass. Both outer surfaces are covered with a luminescent layer 5 or 11.
- the electrodes are formed by wire networks 6 and 12, each of which is connected to the AC power source 7. Analogous to the embodiments according to FIGS. 1 and 2, the wire networks 6, 12 can also be formed by transparent electrically conductive layers, for example made of indium or tin oxide, for visible light and UV a 50 - 100 angstroms thick gold layer can be replaced.
- the dielectric i.e. the plates 1, 10 consist of glass.
- FIG. 5 cylindrical high power radiator is shown schematically in cross section.
- a metal tube 14 (inner electrode) is surrounded at a distance (1-10 mm) concentrically by a dielectric tube 15; the outer surface of the tube 15 is provided with a luminescent layer 16. This is followed by an outer electrode in the form of a wire mesh 17.
- the AC power source 7 is connected to both electrodes 14, 17.
- the metal tube 14 is made of aluminum or is provided with an aluminum layer 18 which reflects UV light.
- the luminescent layer 16 is provided on the inner wall of the tube 15 and covered against the discharge space 4 with a protective layer 19 made of MgF2 or Al2O3.
- a cooling medium can be passed through the interior of the tube 14.
- the type and composition of filling gas and luminescent layer correspond to those of the previous exemplary embodiments.
- the invention is particularly suitable for generating visible light.
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Discharge Lamp (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH152/88A CH675504A5 (fr) | 1988-01-15 | 1988-01-15 | |
CH152/88 | 1988-01-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0324953A1 true EP0324953A1 (fr) | 1989-07-26 |
EP0324953B1 EP0324953B1 (fr) | 1996-03-06 |
Family
ID=4180433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP88121055A Expired - Lifetime EP0324953B1 (fr) | 1988-01-15 | 1988-12-16 | Source de radiation à haute puissance |
Country Status (6)
Country | Link |
---|---|
US (1) | US4983881A (fr) |
EP (1) | EP0324953B1 (fr) |
JP (1) | JPH0787093B2 (fr) |
CA (1) | CA1310686C (fr) |
CH (1) | CH675504A5 (fr) |
DE (1) | DE3855074D1 (fr) |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0449018A2 (fr) * | 1990-03-30 | 1991-10-02 | Asea Brown Boveri Ag | Dispositif d'irradiation |
FR2660242A1 (fr) * | 1990-03-30 | 1991-10-04 | Heidelberger Druckmasch Ag | Dispositif emetteur de rayonnement pour secher et/ou durcir des encres et/ou des vernis dans des machines d'impression. |
EP0457745A2 (fr) * | 1990-05-17 | 1991-11-21 | Potomac Photonics, Inc. | Appareil de décharge à haute fréquence compatible avec un halogène |
EP0458140A1 (fr) * | 1990-05-22 | 1991-11-27 | Heraeus Noblelight GmbH | Radiateur à haute puissance |
EP0489184A1 (fr) * | 1990-12-03 | 1992-06-10 | Heraeus Noblelight GmbH | Dispositif de rayonnement à haute puissance |
EP0550047A2 (fr) * | 1991-12-30 | 1993-07-07 | Mark D. Winsor | Lampe fluorescente et électroluminescente plane ayant une ou plusieurs chambres |
DE4208376A1 (de) * | 1992-03-16 | 1993-09-23 | Asea Brown Boveri | Hochleistungsstrahler |
DE4235743A1 (de) * | 1992-10-23 | 1994-04-28 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
EP0831517A2 (fr) * | 1996-09-20 | 1998-03-25 | Ushiodenki Kabushiki Kaisha | Dispositif à décharge à barrière diélectrique |
DE19817480A1 (de) * | 1998-03-20 | 1999-09-23 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Flachstrahlerlampe fpr dielektrisch behinderte Entladungen mit Abstandshaltern |
WO1999054913A1 (fr) * | 1998-04-20 | 1999-10-28 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Lampe a decharge plate et son procede de production |
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JP2001015287A (ja) | 1999-04-30 | 2001-01-19 | Ushio Inc | 誘電体バリア放電ランプ光源装置 |
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DE69938465T2 (de) | 1999-10-18 | 2009-06-04 | Ushio Denki K.K. | Dielektrisch behinderte entladungslampe und lichtquelle |
WO2001082331A1 (fr) | 2000-04-19 | 2001-11-01 | Koninklijke Philips Electronics N.V. | Lampe a decharge haute pression |
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- 1988-12-16 DE DE3855074T patent/DE3855074D1/de not_active Expired - Fee Related
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1989
- 1989-01-10 CA CA000587880A patent/CA1310686C/fr not_active Expired - Lifetime
- 1989-01-11 US US07/295,743 patent/US4983881A/en not_active Expired - Fee Related
- 1989-01-17 JP JP1006069A patent/JPH0787093B2/ja not_active Expired - Fee Related
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EP0449018A2 (fr) * | 1990-03-30 | 1991-10-02 | Asea Brown Boveri Ag | Dispositif d'irradiation |
FR2660242A1 (fr) * | 1990-03-30 | 1991-10-04 | Heidelberger Druckmasch Ag | Dispositif emetteur de rayonnement pour secher et/ou durcir des encres et/ou des vernis dans des machines d'impression. |
EP0449018A3 (fr) * | 1990-03-30 | 1991-10-30 | Asea Brown Boveri Ag | Dispositif d'irradiation |
EP0457745A2 (fr) * | 1990-05-17 | 1991-11-21 | Potomac Photonics, Inc. | Appareil de décharge à haute fréquence compatible avec un halogène |
EP0457745A3 (en) * | 1990-05-17 | 1992-09-02 | Potomac Photonics, Inc. | Halogen-compatible high-frequency discharge apparatus |
EP0458140A1 (fr) * | 1990-05-22 | 1991-11-27 | Heraeus Noblelight GmbH | Radiateur à haute puissance |
EP0489184A1 (fr) * | 1990-12-03 | 1992-06-10 | Heraeus Noblelight GmbH | Dispositif de rayonnement à haute puissance |
US5198717A (en) * | 1990-12-03 | 1993-03-30 | Asea Brown Boveri Ltd. | High-power radiator |
EP0550047A2 (fr) * | 1991-12-30 | 1993-07-07 | Mark D. Winsor | Lampe fluorescente et électroluminescente plane ayant une ou plusieurs chambres |
EP0550047A3 (fr) * | 1991-12-30 | 1994-12-14 | Mark D Winsor | |
DE4208376A1 (de) * | 1992-03-16 | 1993-09-23 | Asea Brown Boveri | Hochleistungsstrahler |
DE4235743A1 (de) * | 1992-10-23 | 1994-04-28 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
US5936358A (en) * | 1996-09-20 | 1999-08-10 | Ushiodenki Kabushiki Kaisha | Dielectric barrier discharge device |
EP0831517A2 (fr) * | 1996-09-20 | 1998-03-25 | Ushiodenki Kabushiki Kaisha | Dispositif à décharge à barrière diélectrique |
EP0831517A3 (fr) * | 1996-09-20 | 1998-08-26 | Ushiodenki Kabushiki Kaisha | Dispositif à décharge à barrière diélectrique |
DE19817480A1 (de) * | 1998-03-20 | 1999-09-23 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Flachstrahlerlampe fpr dielektrisch behinderte Entladungen mit Abstandshaltern |
DE19817480B4 (de) * | 1998-03-20 | 2004-03-25 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Flachstrahlerlampe für dielektrisch behinderte Entladungen mit Abstandshaltern |
US6659828B1 (en) | 1998-04-20 | 2003-12-09 | Patent-Treuhand-Gesellshaft Fuer Elektrische Gluehlampen Mbh | Flat discharge lamp and method for the production thereof |
WO1999054913A1 (fr) * | 1998-04-20 | 1999-10-28 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Lampe a decharge plate et son procede de production |
US6693377B1 (en) | 1998-06-16 | 2004-02-17 | Patent-Treuhand-Gesellschaft Fuer Elektrische Gluehlampen Mbh | Dielectric layer for discharge lamps and corresponding production method |
DE19826809A1 (de) * | 1998-06-16 | 1999-12-23 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Dielektrische Schicht für Entladungslampen und zugehöriges Herstellungsverfahren |
SG83205A1 (en) * | 1999-04-28 | 2001-09-18 | Koninkl Philips Electronics Nv | Device for disinfecting water comprising a uv-c gas discharge lamp |
DE19919363A1 (de) * | 1999-04-28 | 2000-11-09 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe mit Abstandshalter |
US6879108B1 (en) | 1999-04-28 | 2005-04-12 | Patent-Treuhand-Gesellschaft Fuer Elektrische Gluehlampen Mbh | Dielectrically impeded discharge lamp with a spacer |
DE10048187A1 (de) * | 2000-09-28 | 2002-04-11 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Entladungslampe für dielektrisch behinderte Entladungen mit Stützelementen zwischen einer Bodenplatte und einer Deckenplatte |
DE10235036A1 (de) * | 2002-07-31 | 2004-02-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | UV-Lichtquelle |
EP1769522B1 (fr) * | 2004-07-09 | 2016-11-23 | Philips Lighting Holding B.V. | Lampe a decharge a barriere dielectrique comprenant un reflecteur |
WO2010145739A1 (fr) * | 2009-06-17 | 2010-12-23 | Heraeus Noblelight Gmbh | Ensemble de lampe |
Also Published As
Publication number | Publication date |
---|---|
JPH0787093B2 (ja) | 1995-09-20 |
CH675504A5 (fr) | 1990-09-28 |
EP0324953B1 (fr) | 1996-03-06 |
JPH027353A (ja) | 1990-01-11 |
US4983881A (en) | 1991-01-08 |
CA1310686C (fr) | 1992-11-24 |
DE3855074D1 (de) | 1996-04-11 |
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