EP0250721A3 - Integrated circuit comprising bipolar and complementary mos transistors on a common substrate, and production method - Google Patents

Integrated circuit comprising bipolar and complementary mos transistors on a common substrate, and production method Download PDF

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Publication number
EP0250721A3
EP0250721A3 EP87104507A EP87104507A EP0250721A3 EP 0250721 A3 EP0250721 A3 EP 0250721A3 EP 87104507 A EP87104507 A EP 87104507A EP 87104507 A EP87104507 A EP 87104507A EP 0250721 A3 EP0250721 A3 EP 0250721A3
Authority
EP
European Patent Office
Prior art keywords
mos transistors
emitter
silicide
base
bipolar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP87104507A
Other languages
English (en)
Other versions
EP0250721B1 (de
EP0250721A2 (de
Inventor
Josef Dr. Winnerl
Franz Dr. Neppl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to AT87104507T priority Critical patent/ATE94688T1/de
Publication of EP0250721A2 publication Critical patent/EP0250721A2/de
Publication of EP0250721A3 publication Critical patent/EP0250721A3/de
Application granted granted Critical
Publication of EP0250721B1 publication Critical patent/EP0250721B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234—Bipolar junction transistors [BJT]
    • H01L29/66272—Silicon vertical transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251—Diffusion into or out of group IV semiconductors
    • H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
    • H01L21/2257—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer being silicon or silicide or SIPOS, e.g. polysilicon, porous silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8248—Combination of bipolar and field-effect technology
    • H01L21/8249—Bipolar and MOS technology
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
    • H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
    • H01L27/0623—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
EP87104507A 1986-07-04 1987-03-26 Integrierte Bipolar- und komplementäre MOS-Transistoren auf einem gemeinsamen Substrat enthaltende Schaltung und Verfahren zu ihrer Herstellung Expired - Lifetime EP0250721B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT87104507T ATE94688T1 (de) 1986-07-04 1987-03-26 Integrierte bipolar- und komplementaere mostransistoren auf einem gemeinsamen substrat enthaltende schaltung und verfahren zu ihrer herstellung.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3622525 1986-07-04
DE3622525 1986-07-04

Publications (3)

Publication Number Publication Date
EP0250721A2 EP0250721A2 (de) 1988-01-07
EP0250721A3 true EP0250721A3 (en) 1990-05-23
EP0250721B1 EP0250721B1 (de) 1993-09-15

Family

ID=6304409

Family Applications (1)

Application Number Title Priority Date Filing Date
EP87104507A Expired - Lifetime EP0250721B1 (de) 1986-07-04 1987-03-26 Integrierte Bipolar- und komplementäre MOS-Transistoren auf einem gemeinsamen Substrat enthaltende Schaltung und Verfahren zu ihrer Herstellung

Country Status (7)

Country Link
US (1) US5100811A (de)
EP (1) EP0250721B1 (de)
JP (1) JP2807677B2 (de)
KR (1) KR950006984B1 (de)
AT (1) ATE94688T1 (de)
CA (1) CA1310763C (de)
DE (1) DE3787407D1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01202856A (ja) * 1988-02-09 1989-08-15 Matsushita Electron Corp 半導体集積回路の製造方法
US5336911A (en) * 1988-05-10 1994-08-09 Seiko Epson Corporation Semiconductor device
US4943536A (en) * 1988-05-31 1990-07-24 Texas Instruments, Incorporated Transistor isolation
JPH025463A (ja) * 1988-06-24 1990-01-10 Hitachi Ltd 半導体集積回路装置及びその製造方法
US5318917A (en) * 1988-11-04 1994-06-07 Matsushita Electric Industrial Co., Ltd. Method of fabricating semiconductor device
US5256582A (en) * 1989-02-10 1993-10-26 Texas Instruments Incorporated Method of forming complementary bipolar and MOS transistor having power and logic structures on the same integrated circuit substrate
GB2233492A (en) * 1989-06-16 1991-01-09 Philips Nv A method of manufacturing a semiconductor bimos device
US5288651A (en) * 1989-11-09 1994-02-22 Kabushiki Kaisha Toshiba Method of making semiconductor integrated circuit device including bipolar transistors, MOS FETs and CCD
JPH03152939A (ja) * 1989-11-09 1991-06-28 Toshiba Corp 半導体集積回路装置
JPH03198371A (ja) * 1989-12-27 1991-08-29 Oki Electric Ind Co Ltd 半導体装置の製造方法
US5290714A (en) * 1990-01-12 1994-03-01 Hitachi, Ltd. Method of forming semiconductor device including a CMOS structure having double-doped channel regions
KR930008018B1 (ko) * 1991-06-27 1993-08-25 삼성전자 주식회사 바이씨모스장치 및 그 제조방법
US6249030B1 (en) * 1992-12-07 2001-06-19 Hyundai Electronics Industries Co., Ltd. BI-CMOS integrated circuit
DE4308958A1 (de) * 1993-03-21 1994-09-22 Prema Paezisionselektronik Gmb Verfahren zur Herstellung von Bipolartransistoren
US5652183A (en) * 1994-01-18 1997-07-29 Matsushita Electric Industrial Co., Ltd. Method for fabricating semiconductor device containing excessive silicon in metal silicide film
US5455189A (en) * 1994-02-28 1995-10-03 National Semiconductor Corporation Method of forming BICMOS structures
US5439833A (en) * 1994-03-15 1995-08-08 National Semiconductor Corp. Method of making truly complementary and self-aligned bipolar and CMOS transistor structures with minimized base and gate resistances and parasitic capacitance
KR0141165B1 (ko) * 1995-03-08 1998-07-15 김광호 반도체장치의 트랜지스터 제조방법
JPH09306924A (ja) * 1996-03-15 1997-11-28 Toshiba Corp 半導体装置の製造方法
JP3321553B2 (ja) * 1997-10-08 2002-09-03 松下電器産業株式会社 Ｂｉ−ＣＭＯＳ集積回路装置の製造方法
JP6070333B2 (ja) * 2013-03-25 2017-02-01 セイコーエプソン株式会社 半導体装置の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4074304A (en) * 1974-10-04 1978-02-14 Nippon Electric Company, Ltd. Semiconductor device having a miniature junction area and process for fabricating same
EP0010100A1 (de) * 1978-02-07 1980-04-30 Hermes Precisa International S.A. Einstellvorrichtung für die zeilenanfangslinie einer schreibmaschine
EP0139266A2 (de) * 1983-10-07 1985-05-02 Kabushiki Kaisha Toshiba Integrierte Halbleiterschaltung mit einem MOS-Transistor und einem Bipolartransistor und Herstellungsverfahren
EP0215583A2 (de) * 1985-09-18 1987-03-25 Advanced Micro Devices, Inc. Bipolare/MOS-Bauelemente auf IC-Substraten

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3211761A1 (de) * 1982-03-30 1983-10-06 Siemens Ag Verfahren zum herstellen von integrierten mos-feldeffekttransistorschaltungen in siliziumgate-technologie mit silizid beschichteten diffusionsgebieten als niederohmige leiterbahnen
DE3230077A1 (de) * 1982-08-12 1984-02-16 Siemens AG, 1000 Berlin und 8000 München Integrierte bipolar- und mos-transistoren enthaltende halbleiterschaltung auf einem chip und verfahren zu ihrer herstellung
JPS5955052A (ja) * 1982-09-24 1984-03-29 Hitachi Ltd 半導体集積回路装置の製造方法
US4521952A (en) * 1982-12-02 1985-06-11 International Business Machines Corporation Method of making integrated circuits using metal silicide contacts
JPS59117150A (ja) * 1982-12-24 1984-07-06 Hitachi Ltd 半導体集積回路装置とその製造法
US4554572A (en) * 1983-06-17 1985-11-19 Texas Instruments Incorporated Self-aligned stacked CMOS
FR2549293B1 (fr) * 1983-07-13 1986-10-10 Silicium Semiconducteur Ssc Transistor bipolaire haute frequence et son procede de fabrication
US4546536A (en) * 1983-08-04 1985-10-15 International Business Machines Corporation Fabrication methods for high performance lateral bipolar transistors
JPS6058644A (ja) * 1983-09-12 1985-04-04 Toshiba Corp 半導体装置
FR2555365B1 (fr) * 1983-11-22 1986-08-29 Efcis Procede de fabrication de circuit integre avec connexions de siliciure de tantale et circuit integre realise selon ce procede
JPS61110457A (ja) * 1984-11-05 1986-05-28 Nec Corp 半導体装置
JPH0666425B2 (ja) * 1984-12-07 1994-08-24 日本電信電話株式会社 複合型半導体装置
ATE59917T1 (de) * 1985-09-13 1991-01-15 Siemens Ag Integrierte bipolar- und komplementaere mostransistoren auf einem gemeinsamen substrat enthaltende schaltung und verfahren zu ihrer herstellung.
JPH0628296B2 (ja) * 1985-10-17 1994-04-13 日本電気株式会社 半導体装置の製造方法
US4764482A (en) * 1986-11-21 1988-08-16 General Electric Company Method of fabricating an integrated circuit containing bipolar and MOS transistors

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4074304A (en) * 1974-10-04 1978-02-14 Nippon Electric Company, Ltd. Semiconductor device having a miniature junction area and process for fabricating same
EP0010100A1 (de) * 1978-02-07 1980-04-30 Hermes Precisa International S.A. Einstellvorrichtung für die zeilenanfangslinie einer schreibmaschine
EP0139266A2 (de) * 1983-10-07 1985-05-02 Kabushiki Kaisha Toshiba Integrierte Halbleiterschaltung mit einem MOS-Transistor und einem Bipolartransistor und Herstellungsverfahren
EP0215583A2 (de) * 1985-09-18 1987-03-25 Advanced Micro Devices, Inc. Bipolare/MOS-Bauelemente auf IC-Substraten

Also Published As

Publication number Publication date
JPS6328060A (ja) 1988-02-05
US5100811A (en) 1992-03-31
ATE94688T1 (de) 1993-10-15
JP2807677B2 (ja) 1998-10-08
KR880002245A (ko) 1988-04-29
CA1310763C (en) 1992-11-24
EP0250721B1 (de) 1993-09-15
DE3787407D1 (de) 1993-10-21
KR950006984B1 (ko) 1995-06-26
EP0250721A2 (de) 1988-01-07

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