EP0053278B1 - Unterdruck-Haltevorrichtung für flache Werkstücke - Google Patents

Unterdruck-Haltevorrichtung für flache Werkstücke Download PDF

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Publication number
EP0053278B1
EP0053278B1 EP81108978A EP81108978A EP0053278B1 EP 0053278 B1 EP0053278 B1 EP 0053278B1 EP 81108978 A EP81108978 A EP 81108978A EP 81108978 A EP81108978 A EP 81108978A EP 0053278 B1 EP0053278 B1 EP 0053278B1
Authority
EP
European Patent Office
Prior art keywords
vacuum
workholding
workpiece
designed
sealing member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP81108978A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0053278A3 (en
EP0053278A2 (de
Inventor
Lawrence Patrick Hayes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of EP0053278A2 publication Critical patent/EP0053278A2/de
Publication of EP0053278A3 publication Critical patent/EP0053278A3/de
Application granted granted Critical
Publication of EP0053278B1 publication Critical patent/EP0053278B1/de
Expired legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005—Vacuum work holders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/11—Vacuum
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T408/00—Cutting by use of rotating axially moving tool
    • Y10T408/55—Cutting by use of rotating axially moving tool with work-engaging structure other than Tool or tool-support
    • Y10T408/554—Magnetic or suction means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00—Cutting
    • Y10T83/748—With work immobilizer

Definitions

  • the invention relates to a vacuum holding device for flat workpieces, which consists of a plurality of support elements, each with a vacuum supply and an annular flexible sealing element enclosing the vacuum space, which is mounted on the support element so that it is initially effective as a support for the workpiece and with Reaching and releasing the placement of the workpiece on the surface of the support element under the effect of the intended negative pressure.
  • Devices for holding workpieces by means of negative pressure are known in many designs and applications.
  • Flat workpieces, in particular plates have special requirements with regard to the support and the holding force, especially when the workpieces are very sensitive and the thickness in relation to the diameter is very small.
  • the workpiece initially rests on a sealing ring made of rubber or soft plastic, which lies in a corresponding groove in a support element, and an opening opens into the inside of the sealing ring the support line leading vacuum line.
  • the groove for the sealing ring has such a cross-section, e.g. in hyperboloid form that when the intended negative pressure is reached in the space between the support element, sealing ring and workpiece, the sealing ring is compressed and deformed to such an extent that the workpiece finally comes to rest on the rigid surface of the support element.
  • the invention has for its object to provide a vacuum holding device of the type described above, which does not change the specified shape of the workpiece or at least not significantly, but can nevertheless be used for workpieces of different shapes and sizes. This object has been achieved by the device specified in claim 1.
  • the vacuum holding device offers the possibility of fixing even very sensitive workpieces, such as wafers, masks and the like, which are required for the production of integrated electrical circuits, practically without deformation, for example during a manufacturing or machining process or for testing purposes.
  • the support surface of the support element can be designed as a pin arranged centrally to the sealing element or can be formed by a ball embedded in the surface of the support element.
  • the sealing element is preferably designed as a sealing ring resting in an annular groove in the surface of the support element, the annular groove having an enlarged cross section to completely accommodate the sealing ring when the negative pressure takes effect.
  • the sealing element can also be formed as a sealing ring resting in an annular groove on the circumference of the support element, or a bellows arranged axially concentrically to the support element is used, the interior of which is connected to the vacuum line.
  • the workpiece shown in FIG. 1 is a mask M, as is used in the semiconductor industry for the production of integrated circuits.
  • Such masks often consist of glass plates of about 3 mm thick and for example 100 mm in diameter, but other dimensions can also be found. Although such plates appear completely flat to the eye, they still contain certain irregularities in terms of surface flatness. In order to make this clear, the mask M according to FIG. 1 is shown exaggeratedly deformed.
  • the holding device shown in FIG. 1 can, as can be seen, cause a certain deformation on the mask M, deviating from the original shape according to FIG. 1. This is due to the structure and the mode of operation this holding device conditionally.
  • the device according to FIG. 2 contains a base plate 10 with a number of support elements 11, two of which are shown. Each support element 11 be consists of a cylindrical support body with a central axial line 15, which is aligned with a line 16 in the base plate 10, which in turn is connected via a valve to a vacuum pump (not shown).
  • Such holding devices are usually operated in such a way that the workpiece is first placed on the support elements and then negative pressure is supplied, as a result of which the plate is held on the support element by means of atmospheric pressure.
  • a sealing ring 17 made of elastic material, such as rubber, soft plastic or the like, and of circular cross-section, as is generally known under the name O-ring.
  • the annular groove 18 has a cross section which is different from the cross section of the sealing ring 17 in the relaxed state and which is designed such that the sealing ring initially acts as a support for the workpiece, but is completely pressed into the annular groove 18 under the influence of the negative pressure.
  • the volume of the annular groove 18 is accordingly sufficient to accommodate the entire sealing ring 17.
  • the space between the surface 19 of the support element 11 and the workpiece between the sealing ring 17 comes under negative pressure, and the workpiece is pulled down onto the sealing ring 17 .
  • the sealing ring 17 is made of soft, easily deformable material, it is compressed more and more with increasing vacuum until the mask rests on the surface 19. Since the volume of the annular groove 18 is greater than the volume of the sealing ring 17, it is completely absorbed by the annular groove 18.
  • FIG. 3 The arrangement according to the invention shown in FIG. 3 consists of a base plate 30 with a number of support elements 31, two of which are shown in the drawing.
  • Each support element 31 consists of a hollow-cylindrical support body 32, in the center of which a pin 33 with a dome of convex shape is arranged.
  • the pin 33 protrudes beyond the surface 38 of the support body 32.
  • the interior of the support body 32 is connected to a vacuum line 35.
  • a sealing ring 36 is located in an annular groove 37 in the surface of the support body 32 and extends concentrically to the pin 33 and to the interior of the support body 32. 2 agree when the volume of the annular groove 37 is sufficient to completely accommodate the sealing ring 36 in the compressed state.
  • the sealing ring 36 As long as the sealing ring 36 is unloaded, it has a shape such that the surface formed by its upper edge projects beyond the tip 34 of the pin 33.
  • the negative pressure supplied through line 35 becomes effective, the chamber in support body 32 also comes under negative pressure, and the force exerted by mask M on sealing ring 36 increases under the increasing effect of atmospheric pressure, until mask M tangentially on tip 34 of the pin 33 rests. This position is shown in Fig. 3.
  • a further compression of the sealing ring 36 cannot therefore take place, so that the mask M is prevented from resting on the surface 38 of the support body 32.
  • the sealing ring 36 is shown to a greater extent on the right side of the support body 32 than on the left side, which is due to the original shape of the mask M, cf. Fig. 1.
  • a bellows 41 is fastened on a base plate 40, inside which a pin 42 with a crest 43 is arranged on the base plate 40.
  • a line 44 connects a vacuum source to the interior of the bellows 41. If a flat workpiece is placed on the upper surface of the bellows 41 and the vacuum is switched on, the bellows 41 is compressed until the workpiece rests on the crest 43 of the pin 42. as shown in FIG. 3.
  • a pin 50 with a Y-branched line 51 is fastened on a base plate 54 in such a way that the line 51 can be connected directly through the base plate 54 to a vacuum source.
  • a cuff 52 is arranged on the circumference of the pin 50, the upper area of which is designed in the form of a bead and protrudes somewhat beyond the pin 50.
  • the sleeve 52 is made of flexible material, namely rubber, soft plastic or the like, such that when the negative pressure takes effect in the space between the pin 50 and the sleeve 52, the workpiece comes to rest on the surface of the pin 50.
  • the Y-shaped branching of the line 51 has the purpose that the mouths of the lines in the surface of the pin 50 are not unintentionally covered by the workpiece.
  • a cylinder 60 is mounted on a base plate 61, and a line 62 leads through both, which line can be connected to a vacuum source.
  • a V-shaped annular groove 63 in which a sealing ring 64 rests, is arranged on the circumference of the cylinder 60 near its surface.
  • a Ku in a corresponding cutout Gel 65 used, which protrudes beyond the surface of the cylinder 60.
  • the mode of operation of this embodiment is basically the same as that of the embodiments according to FIGS. 3, 4 and 5.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
  • Manipulator (AREA)
EP81108978A 1980-11-28 1981-10-27 Unterdruck-Haltevorrichtung für flache Werkstücke Expired EP0053278B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/210,936 US4357006A (en) 1980-11-28 1980-11-28 Distortion free 3 point vacuum fixture
US210936 1980-11-28

Publications (3)

Publication Number Publication Date
EP0053278A2 EP0053278A2 (de) 1982-06-09
EP0053278A3 EP0053278A3 (en) 1983-07-20
EP0053278B1 true EP0053278B1 (de) 1985-05-22

Family

ID=22784934

Family Applications (1)

Application Number Title Priority Date Filing Date
EP81108978A Expired EP0053278B1 (de) 1980-11-28 1981-10-27 Unterdruck-Haltevorrichtung für flache Werkstücke

Country Status (4)

Country Link
US (1) US4357006A (zh)
EP (1) EP0053278B1 (zh)
JP (1) JPS5796794A (zh)
DE (1) DE3170635D1 (zh)

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USRE33369E (en) * 1982-06-05 1990-10-02 Hashimoto Corporation Remote control device using telephone circuit of electric apparatus
US4795518A (en) * 1984-02-17 1989-01-03 Burr-Brown Corporation Method using a multiple device vacuum chuck for an automatic microelectronic bonding apparatus
US4603867A (en) * 1984-04-02 1986-08-05 Motorola, Inc. Spinner chuck
US4841965A (en) * 1984-11-13 1989-06-27 Jacobs Deborah A Animal holding and position restoring device employing vacuum holder and mouthpiece
DE3514741A1 (de) * 1985-04-24 1986-10-30 Supfina Maschinenfabrik Hentzen Kg, 5630 Remscheid Vorrichtung zum feinbearbeiten ebener flaechen von scheibenfoermigen werkstuecken mit unbearbeiteter auflageseite und geringer wandstaerke
US4813319A (en) * 1987-04-01 1989-03-21 The Firestone Tire & Rubber Company Method and apparatus for transversely cutting strips of deformable material
JPH0511992Y2 (zh) * 1987-10-16 1993-03-25
US4895102A (en) * 1987-10-29 1990-01-23 Techna Vision Incorporated Spin coater
DE69133413D1 (de) * 1990-05-07 2004-10-21 Canon Kk Substratträger des Vakuumtyps
US5222719A (en) * 1992-02-18 1993-06-29 Jamesway Products & Services Inc. Means for holding workpiece for machining
US5226636A (en) * 1992-06-10 1993-07-13 International Business Machines Corporation Holding fixture for substrates
FR2699846B1 (fr) * 1992-12-24 1995-02-10 Christophe Boiteux Elément de calage articulé.
FR2707541A1 (fr) * 1993-07-13 1995-01-20 Couval Sa Dispositif pour supporter une pièce par dépression d'air.
US5743685A (en) * 1994-06-02 1998-04-28 Quickmill, Inc. Clamping device for a workpiece processing machine
US6099215A (en) * 1994-06-02 2000-08-08 Quickmill Inc. Clamping device
US5536559A (en) * 1994-11-22 1996-07-16 Wisconsin Alumni Research Foundation Stress-free mount for imaging mask
TW281795B (zh) * 1994-11-30 1996-07-21 Sharp Kk
DE29720269U1 (de) * 1997-01-04 1998-02-12 Göckel, Karl, 69254 Malsch Rüstbausatz für Vakuumspannvorrichtungen
US5870271A (en) * 1997-02-19 1999-02-09 Applied Materials, Inc. Pressure actuated sealing diaphragm for chucks
US5989760A (en) * 1998-03-18 1999-11-23 Motorola, Inc. Method of processing a substrate utilizing specific chuck
US6196532B1 (en) 1999-08-27 2001-03-06 Applied Materials, Inc. 3 point vacuum chuck with non-resilient support members
JP2001338878A (ja) * 2000-03-21 2001-12-07 Sharp Corp サセプタおよび表面処理方法
JP2001332480A (ja) * 2000-05-24 2001-11-30 Canon Inc 原版チャック、該原版チャックを備えた露光装置および半導体デバイス製造方法
US6716084B2 (en) * 2001-01-11 2004-04-06 Nutool, Inc. Carrier head for holding a wafer and allowing processing on a front face thereof to occur
FR2825661B1 (fr) * 2001-06-06 2006-11-24 Bourgogne Grasset Dispositif de pose pour jeton et installations de tampographie incorporant de tels dispositifs
ATE337134T1 (de) * 2002-01-22 2006-09-15 Pmj Automec Usa Inc D B A Pmj System zum ausnehmen von leiterplatten
DE10202994B4 (de) * 2002-01-26 2007-10-31 Alfons Haar, Maschinenbau Gmbh & Co.Kg Verfahren zum Betreiben eines Tafelanlagesystems für Stanzpressen und Verbindungsmittel zur Durchführung des Verfahrens
US7410919B2 (en) * 2003-06-27 2008-08-12 International Business Machines Corporation Mask and substrate alignment for solder bump process
US7198276B2 (en) * 2003-10-24 2007-04-03 International Business Machines Corporation Adaptive electrostatic pin chuck
TWI230110B (en) * 2004-01-19 2005-04-01 Ji-Wang Liang Suction device
US7059202B2 (en) * 2004-05-12 2006-06-13 S.C. Johnson Home Storage, Inc. Multi-axis force/torque sensor and data acquisition system
US8608146B2 (en) * 2009-12-18 2013-12-17 Lam Research Ag Reinforced pin for being used in a pin chuck, and a pin chuck using such reinforced pin
KR20120014746A (ko) * 2010-08-10 2012-02-20 삼성전자주식회사 패턴 전사 장치 및 패턴 전사 방법
DE202012013640U1 (de) * 2012-01-03 2018-11-12 solar-semi GmbH Substratteller
CN107642608A (zh) * 2017-08-16 2018-01-30 广东欧珀移动通信有限公司 治具、密封组件的安装结构及其分离方法
US11508608B2 (en) * 2020-08-20 2022-11-22 Taiwan Semiconductor Manufacturing Co., Ltd. Vacuum wafer chuck for manufacturing semiconductor devices
US11635291B2 (en) 2021-04-30 2023-04-25 Mitutoyo Corporation Workpiece holder for utilization in metrology system for measuring workpiece in different orientations
CN115157140B (zh) * 2022-07-05 2023-12-05 业成科技（成都）有限公司 贴合治具

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Also Published As

Publication number Publication date
EP0053278A3 (en) 1983-07-20
DE3170635D1 (en) 1985-06-27
US4357006A (en) 1982-11-02
EP0053278A2 (de) 1982-06-09
JPS5796794A (en) 1982-06-16
JPH025559B2 (zh) 1990-02-02

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