EE05140B1 - L„htematerjal tseeriumil p?hinevatele abrasiividele, selle tootmismeetod, tseeriumil p?hinevate abrasiivide tootmismeetod ja tseeriumil p?hinev abrasiiv - Google Patents

L„htematerjal tseeriumil p?hinevatele abrasiividele, selle tootmismeetod, tseeriumil p?hinevate abrasiivide tootmismeetod ja tseeriumil p?hinev abrasiiv

Info

Publication number
EE05140B1
EE05140B1 EEP200200016A EEP200200016A EE05140B1 EE 05140 B1 EE05140 B1 EE 05140B1 EE P200200016 A EEP200200016 A EE P200200016A EE P200200016 A EEP200200016 A EE P200200016A EE 05140 B1 EE05140 B1 EE 05140B1
Authority
EE
Estonia
Prior art keywords
cerium
based abrasives
manufacturing
source material
abrasives
Prior art date
Application number
EEP200200016A
Other languages
English (en)
Estonian (et)
Inventor
Ito Terunori
Yamasaki Hidehiko
Uchino Yoshitsugu
Original Assignee
Mitsui Mining & Smelting Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000222802A external-priority patent/JP3365993B2/ja
Priority claimed from JP2000375536A external-priority patent/JP3838871B2/ja
Priority claimed from JP2000375535A external-priority patent/JP3838870B2/ja
Application filed by Mitsui Mining & Smelting Co., Ltd. filed Critical Mitsui Mining & Smelting Co., Ltd.
Publication of EE200200016A publication Critical patent/EE200200016A/xx
Publication of EE05140B1 publication Critical patent/EE05140B1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/06—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/235—Cerium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C01P2006/82—Compositional purity water content

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
EEP200200016A 2000-05-16 2001-04-06 L„htematerjal tseeriumil p?hinevatele abrasiividele, selle tootmismeetod, tseeriumil p?hinevate abrasiivide tootmismeetod ja tseeriumil p?hinev abrasiiv EE05140B1 (et)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000143005 2000-05-16
JP2000222802A JP3365993B2 (ja) 2000-05-16 2000-07-24 セリウム系研摩材およびそのための原料、ならびにそれらの製造方法
JP2000375536A JP3838871B2 (ja) 2000-12-11 2000-12-11 セリウム系研摩材用原料の製造方法及びその方法により製造されるセリウム系研摩材用原料
JP2000375535A JP3838870B2 (ja) 2000-12-11 2000-12-11 セリウム系研摩材用原料の製造方法及びその方法により製造されるセリウム系研摩材用原料
PCT/JP2001/002988 WO2001088056A1 (fr) 2000-05-16 2001-04-06 Materiau abrasif a base de cerium, matiere premiere pour ce materiau et procede de preparation de ceux-ci

Publications (2)

Publication Number Publication Date
EE200200016A EE200200016A (et) 2003-04-15
EE05140B1 true EE05140B1 (et) 2009-02-16

Family

ID=27481295

Family Applications (1)

Application Number Title Priority Date Filing Date
EEP200200016A EE05140B1 (et) 2000-05-16 2001-04-06 L„htematerjal tseeriumil p?hinevatele abrasiividele, selle tootmismeetod, tseeriumil p?hinevate abrasiivide tootmismeetod ja tseeriumil p?hinev abrasiiv

Country Status (11)

Country Link
US (1) US6562092B1 (xx)
EP (1) EP1285956A4 (xx)
KR (1) KR100453802B1 (xx)
CN (1) CN1162499C (xx)
AU (1) AU762001B2 (xx)
BR (1) BR0106273A (xx)
EA (1) EA003909B1 (xx)
EE (1) EE05140B1 (xx)
MY (1) MY127740A (xx)
TW (1) TW524843B (xx)
WO (1) WO2001088056A1 (xx)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW528796B (en) * 2000-12-13 2003-04-21 Mitsui Mining & Amp Smelting C Cerium-based abrasive and method of evaluating the same
JP3463999B1 (ja) * 2002-05-16 2003-11-05 三井金属鉱業株式会社 セリウム系研摩材の製造方法
KR100560223B1 (ko) * 2002-06-05 2006-03-10 삼성코닝 주식회사 고정도 연마용 금속 산화물 분말 및 이의 제조방법
US6863825B2 (en) 2003-01-29 2005-03-08 Union Oil Company Of California Process for removing arsenic from aqueous streams
TWI313707B (en) * 2003-04-17 2009-08-21 Mitsui Mining & Smelting Co Cerium-based abrasive
KR100706096B1 (ko) * 2003-06-30 2007-04-13 미쓰이 긴조꾸 고교 가부시키가이샤 세륨계 연마재 및 그 원료
JP3875668B2 (ja) * 2003-08-26 2007-01-31 三井金属鉱業株式会社 フッ素を含有するセリウム系研摩材およびその製造方法
CN101010402A (zh) * 2004-09-03 2007-08-01 昭和电工株式会社 混合稀土氧化物、混合稀土氟化物、使用该材料的基于铈的磨料以及其制备方法
AT502308B1 (de) * 2005-07-20 2010-03-15 Treibacher Ind Ag Glasschleifmittel auf ceroxidbasis und verfahren zu dessen herstellung
CN100497508C (zh) * 2005-09-27 2009-06-10 上海华明高技术（集团）有限公司 一种富铈稀土抛光粉的生产方法
JP5353238B2 (ja) * 2006-04-21 2013-11-27 日立化成株式会社 酸化物粒子の製造方法、スラリー、研磨剤および基板の研磨方法
US8066874B2 (en) 2006-12-28 2011-11-29 Molycorp Minerals, Llc Apparatus for treating a flow of an aqueous solution containing arsenic
US8252087B2 (en) 2007-10-31 2012-08-28 Molycorp Minerals, Llc Process and apparatus for treating a gas containing a contaminant
US8349764B2 (en) 2007-10-31 2013-01-08 Molycorp Minerals, Llc Composition for treating a fluid
US9233863B2 (en) 2011-04-13 2016-01-12 Molycorp Minerals, Llc Rare earth removal of hydrated and hydroxyl species
CN103923602A (zh) * 2013-01-15 2014-07-16 安阳市岷山有色金属有限责任公司 一种铈系研磨材料的制造方法
CN103361030A (zh) * 2013-07-23 2013-10-23 内蒙古科技大学 一种含镨超细高精密度稀土抛光粉及其制备方法
CN103509472A (zh) * 2013-10-25 2014-01-15 上海华明高纳稀土新材料有限公司 铈基混合稀土抛光粉及其制备方法
CN106457073A (zh) 2014-03-07 2017-02-22 安全自然资源有限公司 具有杰出的砷去除性质的氧化铈(iv)
CN104194646B (zh) * 2014-09-02 2016-09-28 包头市金蒙研磨材料有限责任公司 一种稀土铈基抛光浆生产方法
CN104449401B (zh) * 2014-12-09 2016-07-27 东北大学 一种喷雾热分解制备铈基稀土抛光粉的方法及装置
CN112912171A (zh) * 2018-10-24 2021-06-04 三井金属矿业株式会社 吸附材料和其制造方法以及吸附成型体
CN115340824B (zh) * 2021-05-14 2024-02-06 河北雄安稀土功能材料创新中心有限公司 一种铈系研磨抛光材料的制备方法
CN117655937B (zh) * 2024-02-02 2024-04-26 四川江天科技有限公司 一种用于水晶玻璃抛光的稀土抛光盘及其制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3761571A (en) * 1970-02-10 1973-09-25 Atomic Energy Authority Uk Production of ceria
AT339253B (de) * 1975-07-25 1977-10-10 Treibacher Chemische Werke Ag Verfahren zur herstellung eines reinen ceroxids
FR2583736B1 (fr) * 1985-06-20 1987-08-14 Rhone Poulenc Spec Chim Nouveau compose de cerium iv et son procede de preparation.
FR2604443A1 (fr) * 1986-09-26 1988-04-01 Rhone Poulenc Chimie Composition de polissage a base de cerium destinee au polissage des verres organiques
JP2864451B2 (ja) * 1994-11-07 1999-03-03 三井金属鉱業株式会社 研磨材及び研磨方法
JP3602670B2 (ja) * 1996-12-25 2004-12-15 セイミケミカル株式会社 セリウム系研磨材の製造方法

Also Published As

Publication number Publication date
US6562092B1 (en) 2003-05-13
AU762001B2 (en) 2003-06-12
EP1285956A1 (en) 2003-02-26
EP1285956A4 (en) 2004-09-29
KR20020026878A (ko) 2002-04-12
EA200200170A1 (ru) 2002-06-27
EE200200016A (et) 2003-04-15
CN1372587A (zh) 2002-10-02
TW524843B (en) 2003-03-21
MY127740A (en) 2006-12-29
WO2001088056A1 (fr) 2001-11-22
KR100453802B1 (ko) 2004-10-22
BR0106273A (pt) 2002-03-26
EA003909B1 (ru) 2003-10-30
AU4685201A (en) 2001-11-26
CN1162499C (zh) 2004-08-18

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KB4A Valid patent at the end of a year

Effective date: 20101231

MM4A Lapsed by not paying the annual fees

Effective date: 20190406