EE200200016A - Lähtematerjal tseeriumil põhinevatele abrasiividele, selle tootmismeetodid, tseeriumil põhinevate abrasiivide tootmismeetodid ja tseeriumil põhinev abrasiiv - Google Patents

Lähtematerjal tseeriumil põhinevatele abrasiividele, selle tootmismeetodid, tseeriumil põhinevate abrasiivide tootmismeetodid ja tseeriumil põhinev abrasiiv

Info

Publication number
EE200200016A
EE200200016A EEP200200016A EEP200200016A EE200200016A EE 200200016 A EE200200016 A EE 200200016A EE P200200016 A EEP200200016 A EE P200200016A EE P200200016 A EEP200200016 A EE P200200016A EE 200200016 A EE200200016 A EE 200200016A
Authority
EE
Estonia
Prior art keywords
cerium
based abrasives
production
methods
source material
Prior art date
Application number
EEP200200016A
Other languages
English (en)
Inventor
Ito Terunori
Yamasaki Hidehiko
Uchino Yoshitsugu
Original Assignee
Mitsui Mining & Smelting Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000222802A external-priority patent/JP3365993B2/ja
Priority claimed from JP2000375535A external-priority patent/JP3838870B2/ja
Priority claimed from JP2000375536A external-priority patent/JP3838871B2/ja
Application filed by Mitsui Mining & Smelting Co., Ltd. filed Critical Mitsui Mining & Smelting Co., Ltd.
Publication of EE200200016A publication Critical patent/EE200200016A/et
Publication of EE05140B1 publication Critical patent/EE05140B1/et

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/06Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0009Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00Compounds of rare earth metals
    • C01F17/20Compounds containing only rare earth metals as the metal element
    • C01F17/206Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224Oxides or hydroxides of lanthanides
    • C01F17/235Cerium oxides or hydroxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1409Abrasive particles per se
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • C01P2006/82Compositional purity water content

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
EEP200200016A 2000-05-16 2001-04-06 L„htematerjal tseeriumil p?hinevatele abrasiividele, selle tootmismeetod, tseeriumil p?hinevate abrasiivide tootmismeetod ja tseeriumil p?hinev abrasiiv EE05140B1 (et)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000143005 2000-05-16
JP2000222802A JP3365993B2 (ja) 2000-05-16 2000-07-24 セリウム系研摩材およびそのための原料、ならびにそれらの製造方法
JP2000375535A JP3838870B2 (ja) 2000-12-11 2000-12-11 セリウム系研摩材用原料の製造方法及びその方法により製造されるセリウム系研摩材用原料
JP2000375536A JP3838871B2 (ja) 2000-12-11 2000-12-11 セリウム系研摩材用原料の製造方法及びその方法により製造されるセリウム系研摩材用原料
PCT/JP2001/002988 WO2001088056A1 (fr) 2000-05-16 2001-04-06 Materiau abrasif a base de cerium, matiere premiere pour ce materiau et procede de preparation de ceux-ci

Publications (2)

Publication Number Publication Date
EE200200016A true EE200200016A (et) 2003-04-15
EE05140B1 EE05140B1 (et) 2009-02-16

Family

ID=27481295

Family Applications (1)

Application Number Title Priority Date Filing Date
EEP200200016A EE05140B1 (et) 2000-05-16 2001-04-06 L„htematerjal tseeriumil p?hinevatele abrasiividele, selle tootmismeetod, tseeriumil p?hinevate abrasiivide tootmismeetod ja tseeriumil p?hinev abrasiiv

Country Status (11)

Country Link
US (1) US6562092B1 (et)
EP (1) EP1285956A4 (et)
KR (1) KR100453802B1 (et)
CN (1) CN1162499C (et)
AU (1) AU762001B2 (et)
BR (1) BR0106273A (et)
EA (1) EA003909B1 (et)
EE (1) EE05140B1 (et)
MY (1) MY127740A (et)
TW (1) TW524843B (et)
WO (1) WO2001088056A1 (et)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW528796B (en) * 2000-12-13 2003-04-21 Mitsui Mining & Amp Smelting C Cerium-based abrasive and method of evaluating the same
JP3463999B1 (ja) * 2002-05-16 2003-11-05 三井金属鉱業株式会社 セリウム系研摩材の製造方法
KR100560223B1 (ko) * 2002-06-05 2006-03-10 삼성코닝 주식회사 고정도 연마용 금속 산화물 분말 및 이의 제조방법
US6863825B2 (en) 2003-01-29 2005-03-08 Union Oil Company Of California Process for removing arsenic from aqueous streams
TWI313707B (en) * 2003-04-17 2009-08-21 Mitsui Mining & Smelting Co Cerium-based abrasive
JP4450424B2 (ja) * 2003-06-30 2010-04-14 三井金属鉱業株式会社 セリウム系研摩材およびその原料
JP3875668B2 (ja) * 2003-08-26 2007-01-31 三井金属鉱業株式会社 フッ素を含有するセリウム系研摩材およびその製造方法
JP3949147B2 (ja) * 2004-09-03 2007-07-25 昭和電工株式会社 混合希土類酸化物、混合希土類フッ素化物及びそれらを用いたセリウム系研磨材、並びにそれらの製造方法
AT502308B1 (de) * 2005-07-20 2010-03-15 Treibacher Ind Ag Glasschleifmittel auf ceroxidbasis und verfahren zu dessen herstellung
CN100497508C (zh) * 2005-09-27 2009-06-10 上海华明高技术(集团)有限公司 一种富铈稀土抛光粉的生产方法
TWI372729B (en) * 2006-04-21 2012-09-21 Hitachi Chemical Co Ltd Manufacturing method of oxide particles, slurry, polishing agent and polishing method of the substrate
US8066874B2 (en) 2006-12-28 2011-11-29 Molycorp Minerals, Llc Apparatus for treating a flow of an aqueous solution containing arsenic
US8252087B2 (en) 2007-10-31 2012-08-28 Molycorp Minerals, Llc Process and apparatus for treating a gas containing a contaminant
US8349764B2 (en) 2007-10-31 2013-01-08 Molycorp Minerals, Llc Composition for treating a fluid
US9233863B2 (en) 2011-04-13 2016-01-12 Molycorp Minerals, Llc Rare earth removal of hydrated and hydroxyl species
CN103923602A (zh) * 2013-01-15 2014-07-16 安阳市岷山有色金属有限责任公司 一种铈系研磨材料的制造方法
CN103361030A (zh) * 2013-07-23 2013-10-23 内蒙古科技大学 一种含镨超细高精密度稀土抛光粉及其制备方法
CN103509472A (zh) * 2013-10-25 2014-01-15 上海华明高纳稀土新材料有限公司 铈基混合稀土抛光粉及其制备方法
US9975787B2 (en) 2014-03-07 2018-05-22 Secure Natural Resources Llc Removal of arsenic from aqueous streams with cerium (IV) oxide compositions
CN104194646B (zh) * 2014-09-02 2016-09-28 包头市金蒙研磨材料有限责任公司 一种稀土铈基抛光浆生产方法
CN104449401B (zh) * 2014-12-09 2016-07-27 东北大学 一种喷雾热分解制备铈基稀土抛光粉的方法及装置
WO2020085438A1 (ja) * 2018-10-24 2020-04-30 三井金属鉱業株式会社 吸着材およびその製造方法、並びに吸着成形体
CN115340824B (zh) * 2021-05-14 2024-02-06 河北雄安稀土功能材料创新中心有限公司 一种铈系研磨抛光材料的制备方法
CN117655937B (zh) * 2024-02-02 2024-04-26 四川江天科技有限公司 一种用于水晶玻璃抛光的稀土抛光盘及其制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3761571A (en) * 1970-02-10 1973-09-25 Atomic Energy Authority Uk Production of ceria
AT339253B (de) * 1975-07-25 1977-10-10 Treibacher Chemische Werke Ag Verfahren zur herstellung eines reinen ceroxids
FR2583736B1 (fr) * 1985-06-20 1987-08-14 Rhone Poulenc Spec Chim Nouveau compose de cerium iv et son procede de preparation.
FR2604443A1 (fr) * 1986-09-26 1988-04-01 Rhone Poulenc Chimie Composition de polissage a base de cerium destinee au polissage des verres organiques
JP2864451B2 (ja) 1994-11-07 1999-03-03 三井金属鉱業株式会社 研磨材及び研磨方法
JP3602670B2 (ja) * 1996-12-25 2004-12-15 セイミケミカル株式会社 セリウム系研磨材の製造方法

Also Published As

Publication number Publication date
CN1372587A (zh) 2002-10-02
EP1285956A4 (en) 2004-09-29
AU762001B2 (en) 2003-06-12
CN1162499C (zh) 2004-08-18
EA200200170A1 (ru) 2002-06-27
WO2001088056A1 (fr) 2001-11-22
KR20020026878A (ko) 2002-04-12
TW524843B (en) 2003-03-21
BR0106273A (pt) 2002-03-26
MY127740A (en) 2006-12-29
AU4685201A (en) 2001-11-26
KR100453802B1 (ko) 2004-10-22
US6562092B1 (en) 2003-05-13
EP1285956A1 (en) 2003-02-26
EE05140B1 (et) 2009-02-16
EA003909B1 (ru) 2003-10-30

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Legal Events

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KB4A Valid patent at the end of a year

Effective date: 20101231

MM4A Lapsed by not paying the annual fees

Effective date: 20190406