EA200701725A1 - Слои неявных кристаллов с низкой диэлектрической проницаемостью и наноструктуры для применения в высоких технологиях - Google Patents

Слои неявных кристаллов с низкой диэлектрической проницаемостью и наноструктуры для применения в высоких технологиях

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EA200701725A1
EA200701725A1 EA200701725A EA200701725A EA200701725A1 EA 200701725 A1 EA200701725 A1 EA 200701725A1 EA 200701725 A EA200701725 A EA 200701725A EA 200701725 A EA200701725 A EA 200701725A EA 200701725 A1 EA200701725 A1 EA 200701725A1
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crystals
implicit
nanowires
layers
present
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EA200701725A
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EA013649B1 (ru
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Сереф Калем
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Тубитак
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
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    • H01L21/02356Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment to change the morphology of the insulating layer, e.g. transformation of an amorphous layer into a crystalline layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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Abstract

Настоящее изобретение предлагает способ получения пригодных для применения слоев неявных кристаллов с низким значением диэлектрической проницаемости на известных в технике полупроводниковых подложках, а также получения наноструктур, сформированных из этих неявных кристаллов, и относится к оптическим и электронным устройствам, которые могут быть получены из этих материалов. Полученные результаты показывают, что модифицирование структуры и химического состава матрицы монокристалла с использованием метода химического осаждения из паровой фазы обеспечивает получение высококачественных гомогенных слоев неявных кристаллов, которые образуют гладкую границу раздела с полупроводниковой подложкой. С помощью этого способа можно осуществить осаждение диэлектрических неявных кристаллов со скоростью 1 мкм/ч. Настоящее изобретение также обеспечивает способ получения микро- и нанопроволок путем преобразования неявных кристаллов в упорядоченные структуры. Настоящее изобретение также предлагает способ получения микро- и нанопроволок с размерами от нескольких нанометров до 1000 нм и длиной до 50 мкм. Неявные кристаллы, нанопроволоки и упорядоченные структуры могут быть использованы в будущих межкомпонентных соединениях в качестве межуровневых и интерметаллических диэлектриков, в производстве ячеек памяти со сверхвысокой плотностью, системах информационной безопасности в качестве кодовых генераторов, в производстве компонентов для фотоники и датчиков.
EA200701725A 2005-03-16 2006-02-08 Микрокристаллические и нанокристаллические структуры с низкой диэлектрической проницаемостью для применения в области высоких технологий EA013649B1 (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TR2005/00923A TR200500923A2 (tr) 2005-03-16 2005-03-16 İleri Teknoloji Uygulamaları için Küçük Dielektrik Sabitli K
PCT/IB2006/050406 WO2006097858A2 (en) 2005-03-16 2006-02-08 Low-dielectric constant cryptocrystal layers and nanostructures

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EA200701725A1 true EA200701725A1 (ru) 2008-08-29
EA013649B1 EA013649B1 (ru) 2010-06-30

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US (1) US20080191218A1 (ru)
EP (1) EP1878043B1 (ru)
JP (1) JP5112289B2 (ru)
KR (1) KR20070112410A (ru)
CN (1) CN101176189B (ru)
CA (1) CA2602365C (ru)
EA (1) EA013649B1 (ru)
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WO (1) WO2006097858A2 (ru)

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CA2602365C (en) 2017-05-09
CN101176189B (zh) 2011-05-11
EP1878043A2 (en) 2008-01-16
EA013649B1 (ru) 2010-06-30
JP5112289B2 (ja) 2013-01-09
WO2006097858A3 (en) 2007-07-19
CA2602365A1 (en) 2006-09-21
TR200500923A2 (tr) 2010-02-22
US20080191218A1 (en) 2008-08-14
EP1878043B1 (en) 2021-11-03
CN101176189A (zh) 2008-05-07
JP2008537844A (ja) 2008-09-25
WO2006097858A2 (en) 2006-09-21
KR20070112410A (ko) 2007-11-23

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