DK3010043T3 - Halvlederindretning og fremstillingsfremgangsmåde dertil - Google Patents

Halvlederindretning og fremstillingsfremgangsmåde dertil

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Publication number
DK3010043T3
DK3010043T3 DK14807330.7T DK14807330T DK3010043T3 DK 3010043 T3 DK3010043 T3 DK 3010043T3 DK 14807330 T DK14807330 T DK 14807330T DK 3010043 T3 DK3010043 T3 DK 3010043T3
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Denmark
Prior art keywords
semiconductor device
manufacturing process
manufacturing
semiconductor
Prior art date
Application number
DK14807330.7T
Other languages
English (en)
Inventor
Kai Cheng
Original Assignee
Enkris Semiconductor Inc
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Application filed by Enkris Semiconductor Inc filed Critical Enkris Semiconductor Inc
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Publication of DK3010043T3 publication Critical patent/DK3010043T3/da

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    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/401Multistep manufacturing processes
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    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Junction Field-Effect Transistors (AREA)
DK14807330.7T 2013-06-06 2014-01-06 Halvlederindretning og fremstillingsfremgangsmåde dertil DK3010043T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201310223571.7A CN103311284B (zh) 2013-06-06 2013-06-06 半导体器件及其制作方法
PCT/CN2014/070150 WO2014194669A1 (zh) 2013-06-06 2014-01-06 半导体器件及其制作方法

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Publication Number Publication Date
DK3010043T3 true DK3010043T3 (da) 2019-05-06

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US (1) US9640624B2 (da)
EP (1) EP3010043B1 (da)
JP (1) JP6195979B2 (da)
KR (1) KR101780890B1 (da)
CN (1) CN103311284B (da)
DK (1) DK3010043T3 (da)
SG (1) SG11201510008UA (da)
WO (1) WO2014194669A1 (da)

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CN103311284B (zh) * 2013-06-06 2015-11-25 苏州晶湛半导体有限公司 半导体器件及其制作方法
US9824990B2 (en) 2014-06-12 2017-11-21 Taiwan Semiconductor Manufacturing Company, Ltd. Pad design for reliability enhancement in packages
US9881857B2 (en) * 2014-06-12 2018-01-30 Taiwan Semiconductor Manufacturing Company, Ltd. Pad design for reliability enhancement in packages
US9812562B1 (en) 2016-06-03 2017-11-07 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor structure, HEMT structure and method of forming the same
JP2018157141A (ja) * 2017-03-21 2018-10-04 株式会社東芝 半導体装置及び半導体装置の製造方法
CN109935630B (zh) * 2017-12-15 2021-04-23 苏州能讯高能半导体有限公司 半导体器件及其制造方法
CN112349773A (zh) * 2019-08-07 2021-02-09 苏州能讯高能半导体有限公司 一种半导体器件及其制备方法
US11424356B2 (en) * 2020-03-16 2022-08-23 Raytheon Company Transistor having resistive field plate
CN111952360B (zh) * 2020-08-19 2023-02-21 深圳方正微电子有限公司 场效应管及其制备方法
CN114551340A (zh) * 2022-01-14 2022-05-27 深圳镓芯半导体科技有限公司 第三代半导体接触窗结构及其制造方法

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KR101780890B1 (ko) 2017-09-21
SG11201510008UA (en) 2016-01-28
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