DE69919172T2 - Photohärtbare polymerzusammensetzung und diese enthaltende flexodruckplatten - Google Patents

Photohärtbare polymerzusammensetzung und diese enthaltende flexodruckplatten Download PDF

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Publication number
DE69919172T2
DE69919172T2 DE69919172T DE69919172T DE69919172T2 DE 69919172 T2 DE69919172 T2 DE 69919172T2 DE 69919172 T DE69919172 T DE 69919172T DE 69919172 T DE69919172 T DE 69919172T DE 69919172 T2 DE69919172 T2 DE 69919172T2
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DE
Germany
Prior art keywords
weight
block copolymer
photocurable
polymer composition
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69919172T
Other languages
German (de)
English (en)
Other versions
DE69919172D1 (de
Inventor
McArthur Larry KEGLEY
Xavier Muyldermans
Shingo Sugiyama
Nobuyuki Tsukakoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kraton Polymers Research BV
Original Assignee
Kraton Polymers Research BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kraton Polymers Research BV filed Critical Kraton Polymers Research BV
Application granted granted Critical
Publication of DE69919172D1 publication Critical patent/DE69919172D1/de
Publication of DE69919172T2 publication Critical patent/DE69919172T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/04Printing plates or foils; Materials therefor metallic
    • B41N1/06Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/12Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00Inking and printing with a printer's forme
    • B41M1/02Letterpress printing, e.g. book printing
    • B41M1/04Flexographic printing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/02Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2666/00Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
    • C08L2666/02Organic macromolecular compounds, natural resins, waxes or and bituminous materials
    • C08L2666/24Graft or block copolymers according to groups C08L51/00, C08L53/00 or C08L55/02; Derivatives thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/108Polyolefin or halogen containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Printing Methods (AREA)
  • Graft Or Block Polymers (AREA)
DE69919172T 1998-06-29 1999-06-23 Photohärtbare polymerzusammensetzung und diese enthaltende flexodruckplatten Expired - Lifetime DE69919172T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9114598P 1998-06-29 1998-06-29
US91145P 1998-06-29
PCT/EP1999/004349 WO2000000546A1 (en) 1998-06-29 1999-06-23 Photo-curable polymer composition and flexographic printing plates containing the same

Publications (2)

Publication Number Publication Date
DE69919172D1 DE69919172D1 (de) 2004-09-09
DE69919172T2 true DE69919172T2 (de) 2004-12-02

Family

ID=22226302

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69919172T Expired - Lifetime DE69919172T2 (de) 1998-06-29 1999-06-23 Photohärtbare polymerzusammensetzung und diese enthaltende flexodruckplatten

Country Status (13)

Country Link
US (1) US6506541B2 (https=)
EP (1) EP1091998B1 (https=)
JP (1) JP2002519465A (https=)
KR (1) KR100607582B1 (https=)
CN (1) CN1138830C (https=)
AU (1) AU5409099A (https=)
BR (1) BR9911536B1 (https=)
CA (1) CA2335977A1 (https=)
DE (1) DE69919172T2 (https=)
ES (1) ES2221418T3 (https=)
TR (1) TR200003824T2 (https=)
TW (1) TW467936B (https=)
WO (1) WO2000000546A1 (https=)

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WO2001068769A1 (en) * 2000-03-16 2001-09-20 Kraton Polymers Research B.V. Polymeric composition
EP1158364A3 (de) * 2000-05-03 2003-04-23 BASF Drucksysteme GmbH Fotopolymerisierbare Flexodruckelemente mit SIS/SBS-Gemischen als Bindemittel zur Herstellung von Flexodruckformen
WO2001090818A1 (en) * 2000-05-22 2001-11-29 Kraton Polymers Research B.V. Process for preparing flexographic printing plates
JP2002080689A (ja) * 2000-09-07 2002-03-19 Hokushin Ind Inc 高接着性熱可塑性エラストマー組成物
WO2003035752A1 (en) * 2001-10-18 2003-05-01 Kraton Polymers Research B.V. Solid curable polymeric composition
US7012118B2 (en) * 2002-02-07 2006-03-14 Kraton Polymers U.S. Llc Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers
KR20050074489A (ko) 2002-10-23 2005-07-18 가부시키가이샤 구라레 경화성 수지조성물 및 그 경화성 수지조성물을 사용한플랙소인쇄 판재
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
US20060095102A1 (en) * 2003-09-17 2006-05-04 Thomas Perez Method and apparatus for sublingual application of light to blood
DE602004018362D1 (de) 2003-09-25 2009-01-22 Zeon Corp Block-copolymerzusammensetzung für eine lichtempfindliche flexographische platte
US7241540B2 (en) * 2004-04-27 2007-07-10 Kraton Polymers U.S. Llc Photocurable compositions and flexographic printing plates comprising the same
KR100833743B1 (ko) 2004-06-11 2008-05-29 아사히 가세이 케미칼즈 가부시키가이샤 플렉소 인쇄판용 감광성 수지
JP4798333B2 (ja) * 2004-10-06 2011-10-19 ジェイエスアール クレイトン エラストマー株式会社 感光性印刷版材用ブロック共重合体およびその組成物およびそれを用いた感光性エラストマー組成物
KR100883254B1 (ko) * 2004-11-11 2009-02-10 아사히 가세이 케미칼즈 가부시키가이샤 플렉소 인쇄용 감광성 수지 조성물
JP4868920B2 (ja) * 2006-04-07 2012-02-01 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物
CN101981121B (zh) 2008-03-31 2013-02-06 日本瑞翁株式会社 嵌段共聚物组合物、其制备方法及薄膜
JP5527220B2 (ja) 2008-12-26 2014-06-18 日本ゼオン株式会社 ブロック共重合体組成物およびホットメルト粘接着剤組成物
JP5673105B2 (ja) 2008-12-26 2015-02-18 日本ゼオン株式会社 ブロック共重合体組成物、フィルムおよびブロック共重合体組成物の製造方法
WO2010098356A1 (ja) 2009-02-27 2010-09-02 日本ゼオン株式会社 フレキソ版用ブロック共重合体組成物
KR20100099048A (ko) * 2009-03-02 2010-09-10 주식회사 동진쎄미켐 감광성 수지 조성물
WO2010113882A1 (ja) 2009-03-31 2010-10-07 日本ゼオン株式会社 伸縮性フィルム用組成物
PL2415846T3 (pl) 2009-03-31 2018-03-30 Zeon Corporation Kompozycja klejowa do etykiet
EP2450396B1 (en) 2009-06-30 2015-02-25 Zeon Corporation Composition for stretchable film
US9598622B2 (en) 2012-09-25 2017-03-21 Cold Chain Technologies, Inc. Gel comprising a phase-change material, method of preparing the gel, thermal exchange implement comprising the gel, and method of preparing the thermal exchange implement
JP6138976B2 (ja) * 2015-01-23 2017-05-31 株式会社タムラ製作所 感光性樹脂組成物
JPWO2018168647A1 (ja) * 2017-03-14 2020-01-16 日本ゼオン株式会社 フレキソ版用ブロック共重合体組成物
CN111051373B (zh) * 2017-08-29 2023-01-03 引能仕克莱顿·伊利斯特摩股份有限公司 耐磨耗性优异的感光性印刷版材用嵌段共聚物及制造方法
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Also Published As

Publication number Publication date
US6506541B2 (en) 2003-01-14
CN1138830C (zh) 2004-02-18
TR200003824T2 (tr) 2001-07-23
TW467936B (en) 2001-12-11
US20020045129A1 (en) 2002-04-18
KR20010053228A (ko) 2001-06-25
ES2221418T3 (es) 2004-12-16
BR9911536B1 (pt) 2009-01-13
KR100607582B1 (ko) 2006-08-02
CA2335977A1 (en) 2000-01-06
BR9911536A (pt) 2001-03-20
CN1307614A (zh) 2001-08-08
AU5409099A (en) 2000-01-17
JP2002519465A (ja) 2002-07-02
EP1091998A1 (en) 2001-04-18
EP1091998B1 (en) 2004-08-04
WO2000000546A1 (en) 2000-01-06
DE69919172D1 (de) 2004-09-09

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Representative=s name: STOLMAR SCHEELE & PARTNER, 80331 MUENCHEN