DE69913884D1 - Photohärtbare Zusammensetzung und lichtgehärtete geformte Gegenstände - Google Patents

Photohärtbare Zusammensetzung und lichtgehärtete geformte Gegenstände

Info

Publication number
DE69913884D1
DE69913884D1 DE69913884T DE69913884T DE69913884D1 DE 69913884 D1 DE69913884 D1 DE 69913884D1 DE 69913884 T DE69913884 T DE 69913884T DE 69913884 T DE69913884 T DE 69913884T DE 69913884 D1 DE69913884 D1 DE 69913884D1
Authority
DE
Germany
Prior art keywords
photo
light
curable composition
molded articles
cured molded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69913884T
Other languages
English (en)
Other versions
DE69913884T2 (de
Inventor
Manabu Sekiguchi
Naoki Sugiyama
Hozumi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP17088598A external-priority patent/JP4058808B2/ja
Priority claimed from JP19481798A external-priority patent/JP3965789B2/ja
Application filed by JSR Corp filed Critical JSR Corp
Application granted granted Critical
Publication of DE69913884D1 publication Critical patent/DE69913884D1/de
Publication of DE69913884T2 publication Critical patent/DE69913884T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69913884T 1998-06-18 1999-06-17 Photohärtbare Zusammensetzung und lichtgehärtete geformte Gegenstände Expired - Lifetime DE69913884T2 (de)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP17088598A JP4058808B2 (ja) 1998-06-18 1998-06-18 光硬化性組成物および硬化膜
JP17088598 1998-06-18
JP19481798A JP3965789B2 (ja) 1998-07-09 1998-07-09 硬化性組成物、硬化性金属酸化物粒子および硬化性金属酸化物粒子の製造方法
JP19481798 1998-07-09
JP22051498 1998-08-04
JP22051298 1998-08-04
JP22051498 1998-08-04
JP22051398 1998-08-04
JP22051398 1998-08-04
JP22051298 1998-08-04

Publications (2)

Publication Number Publication Date
DE69913884D1 true DE69913884D1 (de) 2004-02-05
DE69913884T2 DE69913884T2 (de) 2004-12-09

Family

ID=27528515

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69913884T Expired - Lifetime DE69913884T2 (de) 1998-06-18 1999-06-17 Photohärtbare Zusammensetzung und lichtgehärtete geformte Gegenstände

Country Status (5)

Country Link
US (1) US6207728B1 (de)
EP (1) EP0965618B1 (de)
KR (1) KR100617421B1 (de)
DE (1) DE69913884T2 (de)
TW (1) TW482817B (de)

Families Citing this family (59)

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JP2003531799A (ja) * 2000-05-01 2003-10-28 コーニング インコーポレイテッド 光ファイバ被覆
KR100540479B1 (ko) * 2000-06-28 2006-01-12 주식회사 하이닉스반도체 저유전율 다공성막의 형성 방법
JP3829050B2 (ja) * 2000-08-29 2006-10-04 松下電器産業株式会社 一体型電子部品
CA2387716A1 (en) * 2000-08-29 2002-03-07 Jsr Corporation Radiation sensitive refractive index changing composition and refractive index changing method
TW538319B (en) * 2000-10-10 2003-06-21 Shipley Co Llc Antireflective composition, method for forming antireflective coating layer, and method for manufacturing electronic device
WO2002048264A1 (fr) * 2000-12-11 2002-06-20 Jsr Corporation Composition sensible aux rayonnements, a indice de refraction variable et procede pour modifier son indice de refraction
EP1229092A3 (de) * 2001-01-31 2004-01-07 JSR Corporation Polymerzusammensetzung, gehärtetes Produkt, Laminate und Verfahren zur Herstellung des gehärteten Produktes
CA2406219A1 (en) * 2001-02-19 2002-10-15 Jsr Corporation Radiation sensitive refractive index changing composition
US7125647B2 (en) 2001-03-13 2006-10-24 Jsr Corporation Radiation-sensitive composition changing in refractive index and utilization thereof
US7312013B2 (en) * 2001-04-09 2007-12-25 Sekisui Chemical Co., Ltd. Photoreactive composition
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TWI300516B (de) * 2001-07-24 2008-09-01 Jsr Corp
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TWI273352B (en) 2002-01-24 2007-02-11 Jsr Corp Radiation sensitive composition for forming an insulating film, insulating film and display device
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JP4217886B2 (ja) 2003-06-25 2009-02-04 Ｊｓｒ株式会社 感放射線性屈折率変化性組成物、パターン形成法および光学材料
CN100404633C (zh) * 2003-07-22 2008-07-23 佳能株式会社 抗液性、耐碱性涂料组合物和适用于图案形成的涂层
AU2003254564A1 (en) * 2003-07-22 2005-02-25 Canon Kabushiki Kaisha Liquid-repellent coating composition and coating having high alkali resistance
KR101292341B1 (ko) 2003-07-24 2013-07-31 미츠비시 가스 가가쿠 가부시키가이샤 코팅제 조성물, 그로부터 제조되는 코팅막 및 광학 제품
TWI265378B (en) * 2003-10-07 2006-11-01 Hitachi Chemical Co Ltd Radiation-curing resin composition and preservation method thereof, forming method of curing film, forming method and operating method of pattern, electronic device and optical wave guide
JP4140506B2 (ja) * 2003-10-28 2008-08-27 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP2005239808A (ja) * 2004-02-25 2005-09-08 Konica Minolta Medical & Graphic Inc インクジェット記録用インク
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JP2007533816A (ja) * 2004-04-22 2007-11-22 Ｊｓｒ株式会社 低屈折率コーティング組成物
FR2872508B1 (fr) * 2004-07-02 2007-03-09 Saint Gobain Emballage Sa Composition de traitement d'un verre pour en ameliorer la resistance mecanique par guerison des defauts de surface, procedes de traitement correspondants et verres traites obtenus
WO2006013863A1 (ja) * 2004-08-04 2006-02-09 Toagosei Co., Ltd. ポリオルガノシロキサン及びそれを含む硬化性組成物
US20090252932A1 (en) * 2004-12-15 2009-10-08 Kuraray Co., Ltd. Actinic energy ray curable resion composition and use thereof
DE102005002960A1 (de) 2005-01-21 2006-08-03 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrogemusterte Schichten mit hohem Relaxationsvermögen, hoher chemischer Beständigkeit und mechanischer Stabilität
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US20100222449A1 (en) * 2006-01-18 2010-09-02 Kaneka Corporation Curable composition
TWI396941B (zh) * 2006-02-22 2013-05-21 Sanyo Chemical Ind Ltd 感光性樹脂組合物
JP4239030B2 (ja) * 2006-07-13 2009-03-18 信越化学工業株式会社 光硬化性樹脂組成物及びその硬化皮膜を有する物品
DE102006033280A1 (de) 2006-07-18 2008-01-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrostrukturierte Schichten
JP5032572B2 (ja) * 2007-06-28 2012-09-26 京セラ株式会社 弾性表面波装置およびその製造方法
US8134684B2 (en) 2008-02-22 2012-03-13 Sematech, Inc. Immersion lithography using hafnium-based nanoparticles
GB2466251B (en) * 2008-12-16 2011-03-09 Ind Tech Res Inst Encapsulant compositions and method for fabricating encapsulant materials
US7977398B2 (en) * 2008-12-17 2011-07-12 Robert Lee Cornell UV-curable coatings and methods for applying UV-curable coatings using thermal micro-fluid ejection heads
JP2010180375A (ja) * 2009-02-09 2010-08-19 Shin-Etsu Chemical Co Ltd 光硬化型コーティング剤組成物、被膜形成方法及び被覆物品
KR101736237B1 (ko) * 2009-06-08 2017-05-16 제이에스알 가부시끼가이샤 감방사선성 조성물, 보호막 및 층간 절연막 및, 그들의 형성 방법
JP5196078B2 (ja) 2010-08-03 2013-05-15 Ｊｓｒ株式会社 近赤外線カットフィルターおよびそれを含む撮像装置
KR101896943B1 (ko) * 2010-10-13 2018-09-11 제이엔씨 주식회사 광경화성 조성물
KR101885404B1 (ko) * 2011-05-11 2018-08-03 미쯔비시 케미컬 주식회사 활성 에너지선 경화성 조성물, 적층체, 및 적층체의 제조 방법
WO2012173459A2 (ko) * 2011-06-17 2012-12-20 주식회사 엘지화학 고굴절 조성물
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EP3202811A4 (de) * 2014-10-02 2018-05-16 Kaneka Corporation Durch aktinische strahlung härtbare zusammensetzung
KR102500274B1 (ko) * 2015-12-03 2023-02-16 삼성디스플레이 주식회사 폴딩 가능한 디스플레이 장치 및 그 제조방법
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Also Published As

Publication number Publication date
KR20000006232A (ko) 2000-01-25
DE69913884T2 (de) 2004-12-09
KR100617421B1 (ko) 2006-08-30
US6207728B1 (en) 2001-03-27
TW482817B (en) 2002-04-11
EP0965618B1 (de) 2004-01-02
EP0965618A1 (de) 1999-12-22

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