DE69905424D1 - Positiv arbeitende lichtempfindliche Harzzusammensetzung - Google Patents
Positiv arbeitende lichtempfindliche HarzzusammensetzungInfo
- Publication number
- DE69905424D1 DE69905424D1 DE69905424T DE69905424T DE69905424D1 DE 69905424 D1 DE69905424 D1 DE 69905424D1 DE 69905424 T DE69905424 T DE 69905424T DE 69905424 T DE69905424 T DE 69905424T DE 69905424 D1 DE69905424 D1 DE 69905424D1
- Authority
- DE
- Germany
- Prior art keywords
- positive
- resin composition
- photosensitive resin
- working photosensitive
- working
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10180868A JP2000019733A (ja) | 1998-06-26 | 1998-06-26 | ポジ型感光性樹脂組成物 |
JP10186272A JP2000019735A (ja) | 1998-07-01 | 1998-07-01 | ポジ型感光性樹脂組成物 |
JP10186273A JP2000019736A (ja) | 1998-07-01 | 1998-07-01 | ポジ型感光性樹脂組成物 |
JP10186271A JP2000019734A (ja) | 1998-07-01 | 1998-07-01 | ポジ型感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69905424D1 true DE69905424D1 (de) | 2003-03-27 |
DE69905424T2 DE69905424T2 (de) | 2003-11-20 |
Family
ID=27474960
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69905424T Expired - Fee Related DE69905424T2 (de) | 1998-06-26 | 1999-06-25 | Positiv arbeitende lichtempfindliche Harzzusammensetzung |
Country Status (4)
Country | Link |
---|---|
US (1) | US6159656A (de) |
EP (1) | EP0967522B1 (de) |
KR (1) | KR20000006477A (de) |
DE (1) | DE69905424T2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0952489B1 (de) * | 1998-04-22 | 2014-08-13 | FUJIFILM Corporation | Positiv arbeitende, fotoempfindliche Harzzusammensetzung |
JP3969909B2 (ja) * | 1999-09-27 | 2007-09-05 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
TW564331B (en) * | 1999-10-28 | 2003-12-01 | Fuji Photo Film Co Ltd | Positive-form photoresist composition |
JP3802732B2 (ja) * | 2000-05-12 | 2006-07-26 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP4253423B2 (ja) * | 2000-06-14 | 2009-04-15 | 富士フイルム株式会社 | ポジ型レジスト積層物 |
US6692897B2 (en) * | 2000-07-12 | 2004-02-17 | Fuji Photo Film Co., Ltd. | Positive resist composition |
WO2002019034A1 (fr) * | 2000-08-29 | 2002-03-07 | Jsr Corporation | Composition possedant un indice de refraction sensiblement modifiable par rayonnement et procede pour former un motif d'indice de refraction |
DE60133929D1 (de) * | 2000-12-04 | 2008-06-19 | Ciba Holding Inc | Oniumsalze und ihre verwendung als latente säuren |
KR100795109B1 (ko) * | 2001-02-23 | 2008-01-17 | 후지필름 가부시키가이샤 | 포지티브 감광성 조성물 |
TWI226973B (en) * | 2001-03-19 | 2005-01-21 | Fuji Photo Film Co Ltd | Positive resist composition |
US6927009B2 (en) * | 2001-05-22 | 2005-08-09 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
KR100973799B1 (ko) * | 2003-01-03 | 2010-08-03 | 삼성전자주식회사 | Mmn 헤드 코터용 포토레지스트 조성물 |
US6852465B2 (en) * | 2003-03-21 | 2005-02-08 | Clariant International Ltd. | Photoresist composition for imaging thick films |
JP4544085B2 (ja) * | 2004-09-28 | 2010-09-15 | Jsr株式会社 | ポジ型感放射線性樹脂組成物 |
US20060204732A1 (en) * | 2005-03-08 | 2006-09-14 | Fuji Photo Film Co., Ltd. | Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate |
US7247419B2 (en) * | 2005-04-11 | 2007-07-24 | Az Electronic Materials Usa Corp. | Nanocomposite photosensitive composition and use thereof |
US7524606B2 (en) * | 2005-04-11 | 2009-04-28 | Az Electronic Materials Usa Corp. | Nanocomposite photoresist composition for imaging thick films |
US20090036862A1 (en) * | 2007-08-01 | 2009-02-05 | Owens-Ilinois Healthcare Packaging Inc. | Multilayer plastic container and method of storing lyophilized products |
KR100922841B1 (ko) * | 2007-12-18 | 2009-10-20 | 제일모직주식회사 | 감광성 고분자 및 이를 포함하는 레지스트 조성물 |
SI3476368T1 (sl) | 2008-06-06 | 2020-02-28 | Edwards Lifesciences Corporation | Transkatetrska srčna zaklopka z nizkim profilom |
DE102014119634B4 (de) | 2014-05-05 | 2023-05-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Verfahren zum herstellen von halbleitervorrichtungen und photolitographiematerial |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5128232A (en) * | 1989-05-22 | 1992-07-07 | Shiply Company Inc. | Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units |
JP3317576B2 (ja) * | 1994-05-12 | 2002-08-26 | 富士写真フイルム株式会社 | ポジ型感光性樹脂組成物 |
DE69515163D1 (de) * | 1994-12-20 | 2000-03-30 | Olin Microelectronic Chem Inc | Fotolackzusammensetzungen |
JP3433017B2 (ja) * | 1995-08-31 | 2003-08-04 | 株式会社東芝 | 感光性組成物 |
JP2907144B2 (ja) * | 1995-12-11 | 1999-06-21 | 日本電気株式会社 | 酸誘導体化合物、高分子化合物、それを用いた感光性樹脂組成物およびパターン形成方法 |
KR100536824B1 (ko) * | 1996-03-07 | 2006-03-09 | 스미토모 베이클라이트 가부시키가이샤 | 산불안정성펜던트기를지닌다중고리중합체를포함하는포토레지스트조성물 |
KR100195583B1 (ko) * | 1997-04-08 | 1999-06-15 | 박찬구 | 양성 포토레지스트 제조용 공중합체 및 이를 함유하는 화학증폭형 양성 포토레지스트 조성물 |
-
1999
- 1999-06-24 US US09/344,141 patent/US6159656A/en not_active Expired - Fee Related
- 1999-06-25 KR KR1019990024279A patent/KR20000006477A/ko not_active Application Discontinuation
- 1999-06-25 DE DE69905424T patent/DE69905424T2/de not_active Expired - Fee Related
- 1999-06-25 EP EP99111963A patent/EP0967522B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR20000006477A (ko) | 2000-01-25 |
DE69905424T2 (de) | 2003-11-20 |
EP0967522B1 (de) | 2003-02-19 |
EP0967522A1 (de) | 1999-12-29 |
US6159656A (en) | 2000-12-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |
|
8339 | Ceased/non-payment of the annual fee |