DE69905424D1 - Positiv arbeitende lichtempfindliche Harzzusammensetzung - Google Patents
Positiv arbeitende lichtempfindliche HarzzusammensetzungInfo
- Publication number
- DE69905424D1 DE69905424D1 DE69905424T DE69905424T DE69905424D1 DE 69905424 D1 DE69905424 D1 DE 69905424D1 DE 69905424 T DE69905424 T DE 69905424T DE 69905424 T DE69905424 T DE 69905424T DE 69905424 D1 DE69905424 D1 DE 69905424D1
- Authority
- DE
- Germany
- Prior art keywords
- positive
- resin composition
- photosensitive resin
- working photosensitive
- working
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10180868A JP2000019733A (ja) | 1998-06-26 | 1998-06-26 | ポジ型感光性樹脂組成物 |
JP10186273A JP2000019736A (ja) | 1998-07-01 | 1998-07-01 | ポジ型感光性樹脂組成物 |
JP10186272A JP2000019735A (ja) | 1998-07-01 | 1998-07-01 | ポジ型感光性樹脂組成物 |
JP10186271A JP2000019734A (ja) | 1998-07-01 | 1998-07-01 | ポジ型感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69905424D1 true DE69905424D1 (de) | 2003-03-27 |
DE69905424T2 DE69905424T2 (de) | 2003-11-20 |
Family
ID=27474960
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69905424T Expired - Fee Related DE69905424T2 (de) | 1998-06-26 | 1999-06-25 | Positiv arbeitende lichtempfindliche Harzzusammensetzung |
Country Status (4)
Country | Link |
---|---|
US (1) | US6159656A (de) |
EP (1) | EP0967522B1 (de) |
KR (1) | KR20000006477A (de) |
DE (1) | DE69905424T2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100601078B1 (ko) * | 1998-04-22 | 2006-07-19 | 후지 샤신 필름 가부시기가이샤 | 포지티브 감광성 수지 조성물 |
JP3969909B2 (ja) * | 1999-09-27 | 2007-09-05 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
KR20010040187A (ko) * | 1999-10-28 | 2001-05-15 | 무네유키 가코우 | 포지티브 포토레지스트 조성물 |
JP3802732B2 (ja) * | 2000-05-12 | 2006-07-26 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP4253423B2 (ja) * | 2000-06-14 | 2009-04-15 | 富士フイルム株式会社 | ポジ型レジスト積層物 |
US6692897B2 (en) * | 2000-07-12 | 2004-02-17 | Fuji Photo Film Co., Ltd. | Positive resist composition |
CN1273869C (zh) * | 2000-08-29 | 2006-09-06 | 捷时雅株式会社 | 有放射线敏感性的折射率变化性组合物,及其光学制品 |
CN100383665C (zh) * | 2000-12-04 | 2008-04-23 | 西巴特殊化学品控股有限公司 | 鎓盐和其作为潜酸的用途 |
KR100795109B1 (ko) * | 2001-02-23 | 2008-01-17 | 후지필름 가부시키가이샤 | 포지티브 감광성 조성물 |
TWI226973B (en) * | 2001-03-19 | 2005-01-21 | Fuji Photo Film Co Ltd | Positive resist composition |
US6927009B2 (en) * | 2001-05-22 | 2005-08-09 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
KR100973799B1 (ko) * | 2003-01-03 | 2010-08-03 | 삼성전자주식회사 | Mmn 헤드 코터용 포토레지스트 조성물 |
US6852465B2 (en) * | 2003-03-21 | 2005-02-08 | Clariant International Ltd. | Photoresist composition for imaging thick films |
JP4544085B2 (ja) * | 2004-09-28 | 2010-09-15 | Jsr株式会社 | ポジ型感放射線性樹脂組成物 |
US20060204732A1 (en) * | 2005-03-08 | 2006-09-14 | Fuji Photo Film Co., Ltd. | Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate |
US7524606B2 (en) * | 2005-04-11 | 2009-04-28 | Az Electronic Materials Usa Corp. | Nanocomposite photoresist composition for imaging thick films |
US7247419B2 (en) * | 2005-04-11 | 2007-07-24 | Az Electronic Materials Usa Corp. | Nanocomposite photosensitive composition and use thereof |
US20090036862A1 (en) * | 2007-08-01 | 2009-02-05 | Owens-Ilinois Healthcare Packaging Inc. | Multilayer plastic container and method of storing lyophilized products |
KR100922841B1 (ko) * | 2007-12-18 | 2009-10-20 | 제일모직주식회사 | 감광성 고분자 및 이를 포함하는 레지스트 조성물 |
CN202105047U (zh) | 2008-06-06 | 2012-01-11 | 爱德华兹生命科学公司 | 小外形经导管的心瓣膜 |
DE102014119634B4 (de) | 2014-05-05 | 2023-05-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Verfahren zum herstellen von halbleitervorrichtungen und photolitographiematerial |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5128232A (en) * | 1989-05-22 | 1992-07-07 | Shiply Company Inc. | Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units |
JP3317576B2 (ja) * | 1994-05-12 | 2002-08-26 | 富士写真フイルム株式会社 | ポジ型感光性樹脂組成物 |
DE69515163D1 (de) * | 1994-12-20 | 2000-03-30 | Olin Microelectronic Chem Inc | Fotolackzusammensetzungen |
JP3433017B2 (ja) * | 1995-08-31 | 2003-08-04 | 株式会社東芝 | 感光性組成物 |
JP2907144B2 (ja) * | 1995-12-11 | 1999-06-21 | 日本電気株式会社 | 酸誘導体化合物、高分子化合物、それを用いた感光性樹脂組成物およびパターン形成方法 |
AU725653B2 (en) * | 1996-03-07 | 2000-10-19 | B.F. Goodrich Company, The | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
KR100195583B1 (ko) * | 1997-04-08 | 1999-06-15 | 박찬구 | 양성 포토레지스트 제조용 공중합체 및 이를 함유하는 화학증폭형 양성 포토레지스트 조성물 |
-
1999
- 1999-06-24 US US09/344,141 patent/US6159656A/en not_active Expired - Fee Related
- 1999-06-25 DE DE69905424T patent/DE69905424T2/de not_active Expired - Fee Related
- 1999-06-25 KR KR1019990024279A patent/KR20000006477A/ko not_active Application Discontinuation
- 1999-06-25 EP EP99111963A patent/EP0967522B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6159656A (en) | 2000-12-12 |
EP0967522A1 (de) | 1999-12-29 |
KR20000006477A (ko) | 2000-01-25 |
DE69905424T2 (de) | 2003-11-20 |
EP0967522B1 (de) | 2003-02-19 |
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ID16180A (id) | Komposisi resin fotosensitif |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |
|
8339 | Ceased/non-payment of the annual fee |