DE69905424T2 - Positiv arbeitende lichtempfindliche Harzzusammensetzung - Google Patents

Positiv arbeitende lichtempfindliche Harzzusammensetzung

Info

Publication number
DE69905424T2
DE69905424T2 DE69905424T DE69905424T DE69905424T2 DE 69905424 T2 DE69905424 T2 DE 69905424T2 DE 69905424 T DE69905424 T DE 69905424T DE 69905424 T DE69905424 T DE 69905424T DE 69905424 T2 DE69905424 T2 DE 69905424T2
Authority
DE
Germany
Prior art keywords
positive
resin composition
photosensitive resin
working photosensitive
working
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69905424T
Other languages
English (en)
Other versions
DE69905424D1 (de
Inventor
Yasumasa Kawabe
Kenichiro Sato
Toshiaki Aoai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10180868A external-priority patent/JP2000019733A/ja
Priority claimed from JP10186273A external-priority patent/JP2000019736A/ja
Priority claimed from JP10186272A external-priority patent/JP2000019735A/ja
Priority claimed from JP10186271A external-priority patent/JP2000019734A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69905424D1 publication Critical patent/DE69905424D1/de
Application granted granted Critical
Publication of DE69905424T2 publication Critical patent/DE69905424T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
DE69905424T 1998-06-26 1999-06-25 Positiv arbeitende lichtempfindliche Harzzusammensetzung Expired - Fee Related DE69905424T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP10180868A JP2000019733A (ja) 1998-06-26 1998-06-26 ポジ型感光性樹脂組成物
JP10186273A JP2000019736A (ja) 1998-07-01 1998-07-01 ポジ型感光性樹脂組成物
JP10186272A JP2000019735A (ja) 1998-07-01 1998-07-01 ポジ型感光性樹脂組成物
JP10186271A JP2000019734A (ja) 1998-07-01 1998-07-01 ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
DE69905424D1 DE69905424D1 (de) 2003-03-27
DE69905424T2 true DE69905424T2 (de) 2003-11-20

Family

ID=27474960

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69905424T Expired - Fee Related DE69905424T2 (de) 1998-06-26 1999-06-25 Positiv arbeitende lichtempfindliche Harzzusammensetzung

Country Status (4)

Country Link
US (1) US6159656A (de)
EP (1) EP0967522B1 (de)
KR (1) KR20000006477A (de)
DE (1) DE69905424T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014119634B4 (de) 2014-05-05 2023-05-11 Taiwan Semiconductor Manufacturing Company, Ltd. Verfahren zum herstellen von halbleitervorrichtungen und photolitographiematerial

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100601078B1 (ko) * 1998-04-22 2006-07-19 후지 샤신 필름 가부시기가이샤 포지티브 감광성 수지 조성물
JP3969909B2 (ja) * 1999-09-27 2007-09-05 富士フイルム株式会社 ポジ型フォトレジスト組成物
KR20010040187A (ko) * 1999-10-28 2001-05-15 무네유키 가코우 포지티브 포토레지스트 조성물
JP3802732B2 (ja) * 2000-05-12 2006-07-26 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP4253423B2 (ja) * 2000-06-14 2009-04-15 富士フイルム株式会社 ポジ型レジスト積層物
US6692897B2 (en) * 2000-07-12 2004-02-17 Fuji Photo Film Co., Ltd. Positive resist composition
CN1273869C (zh) * 2000-08-29 2006-09-06 捷时雅株式会社 有放射线敏感性的折射率变化性组合物，及其光学制品
CN100383665C (zh) * 2000-12-04 2008-04-23 西巴特殊化学品控股有限公司 鎓盐和其作为潜酸的用途
KR100795109B1 (ko) * 2001-02-23 2008-01-17 후지필름 가부시키가이샤 포지티브 감광성 조성물
TWI226973B (en) * 2001-03-19 2005-01-21 Fuji Photo Film Co Ltd Positive resist composition
US6927009B2 (en) * 2001-05-22 2005-08-09 Fuji Photo Film Co., Ltd. Positive photosensitive composition
KR100973799B1 (ko) * 2003-01-03 2010-08-03 삼성전자주식회사 Ｍｍｎ 헤드 코터용 포토레지스트 조성물
US6852465B2 (en) * 2003-03-21 2005-02-08 Clariant International Ltd. Photoresist composition for imaging thick films
JP4544085B2 (ja) * 2004-09-28 2010-09-15 Ｊｓｒ株式会社 ポジ型感放射線性樹脂組成物
US20060204732A1 (en) * 2005-03-08 2006-09-14 Fuji Photo Film Co., Ltd. Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate
US7524606B2 (en) * 2005-04-11 2009-04-28 Az Electronic Materials Usa Corp. Nanocomposite photoresist composition for imaging thick films
US7247419B2 (en) * 2005-04-11 2007-07-24 Az Electronic Materials Usa Corp. Nanocomposite photosensitive composition and use thereof
US20090036862A1 (en) * 2007-08-01 2009-02-05 Owens-Ilinois Healthcare Packaging Inc. Multilayer plastic container and method of storing lyophilized products
KR100922841B1 (ko) * 2007-12-18 2009-10-20 제일모직주식회사 감광성 고분자 및 이를 포함하는 레지스트 조성물
CN202105047U (zh) 2008-06-06 2012-01-11 爱德华兹生命科学公司 小外形经导管的心瓣膜

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5128232A (en) * 1989-05-22 1992-07-07 Shiply Company Inc. Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
JP3317576B2 (ja) * 1994-05-12 2002-08-26 富士写真フイルム株式会社 ポジ型感光性樹脂組成物
DE69515163D1 (de) * 1994-12-20 2000-03-30 Olin Microelectronic Chem Inc Fotolackzusammensetzungen
JP3433017B2 (ja) * 1995-08-31 2003-08-04 株式会社東芝 感光性組成物
JP2907144B2 (ja) * 1995-12-11 1999-06-21 日本電気株式会社 酸誘導体化合物、高分子化合物、それを用いた感光性樹脂組成物およびパターン形成方法
AU725653B2 (en) * 1996-03-07 2000-10-19 B.F. Goodrich Company, The Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
KR100195583B1 (ko) * 1997-04-08 1999-06-15 박찬구 양성 포토레지스트 제조용 공중합체 및 이를 함유하는 화학증폭형 양성 포토레지스트 조성물

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014119634B4 (de) 2014-05-05 2023-05-11 Taiwan Semiconductor Manufacturing Company, Ltd. Verfahren zum herstellen von halbleitervorrichtungen und photolitographiematerial

Also Published As

Publication number Publication date
US6159656A (en) 2000-12-12
DE69905424D1 (de) 2003-03-27
EP0967522A1 (de) 1999-12-29
KR20000006477A (ko) 2000-01-25
EP0967522B1 (de) 2003-02-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee