DE60133929D1 - Oniumsalze und ihre verwendung als latente säuren - Google Patents
Oniumsalze und ihre verwendung als latente säurenInfo
- Publication number
- DE60133929D1 DE60133929D1 DE60133929T DE60133929T DE60133929D1 DE 60133929 D1 DE60133929 D1 DE 60133929D1 DE 60133929 T DE60133929 T DE 60133929T DE 60133929 T DE60133929 T DE 60133929T DE 60133929 D1 DE60133929 D1 DE 60133929D1
- Authority
- DE
- Germany
- Prior art keywords
- sub
- anthracyl
- phenanthryl
- unsubstituted
- phenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07H—SUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
- C07H9/00—Compounds containing a hetero ring sharing at least two hetero atoms with a saccharide radical
- C07H9/02—Compounds containing a hetero ring sharing at least two hetero atoms with a saccharide radical the hetero ring containing only oxygen as ring hetero atoms
- C07H9/04—Cyclic acetals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
- C07C25/18—Polycyclic aromatic halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C305/00—Esters of sulfuric acids
- C07C305/02—Esters of sulfuric acids having oxygen atoms of sulfate groups bound to acyclic carbon atoms of a carbon skeleton
- C07C305/04—Esters of sulfuric acids having oxygen atoms of sulfate groups bound to acyclic carbon atoms of a carbon skeleton being acyclic and saturated
- C07C305/06—Hydrogenosulfates
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C305/00—Esters of sulfuric acids
- C07C305/20—Esters of sulfuric acids having oxygen atoms of sulfate groups bound to carbon atoms of rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C305/00—Esters of sulfuric acids
- C07C305/22—Esters of sulfuric acids having oxygen atoms of sulfate groups bound to carbon atoms of six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C305/00—Esters of sulfuric acids
- C07C305/22—Esters of sulfuric acids having oxygen atoms of sulfate groups bound to carbon atoms of six-membered aromatic rings
- C07C305/24—Esters of sulfuric acids having oxygen atoms of sulfate groups bound to carbon atoms of six-membered aromatic rings of non-condensed six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
- C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D309/04—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D309/06—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/44—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D317/46—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems condensed with one six-membered ring
- C07D317/48—Methylenedioxybenzenes or hydrogenated methylenedioxybenzenes, unsubstituted on the hetero ring
- C07D317/50—Methylenedioxybenzenes or hydrogenated methylenedioxybenzenes, unsubstituted on the hetero ring with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to atoms of the carbocyclic ring
- C07D317/54—Radicals substituted by oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
- C07D333/14—Radicals substituted by singly bound hetero atoms other than halogen
- C07D333/16—Radicals substituted by singly bound hetero atoms other than halogen by oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B2200/00—Indexing scheme relating to specific properties of organic compounds
- C07B2200/11—Compounds covalently bound to a solid support
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
-
- C—CHEMISTRY; METALLURGY
- C40—COMBINATORIAL TECHNOLOGY
- C40B—COMBINATORIAL CHEMISTRY; LIBRARIES, e.g. CHEMICAL LIBRARIES
- C40B40/00—Libraries per se, e.g. arrays, mixtures
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Genetics & Genomics (AREA)
- Molecular Biology (AREA)
- General Health & Medical Sciences (AREA)
- Biotechnology (AREA)
- Biochemistry (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
- Plural Heterocyclic Compounds (AREA)
- Indole Compounds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00811147 | 2000-12-04 | ||
EP01810551 | 2001-06-08 | ||
PCT/EP2001/013725 WO2002046507A2 (en) | 2000-12-04 | 2001-11-26 | Onium salts and the use therof as latent acids |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60133929D1 true DE60133929D1 (de) | 2008-06-19 |
Family
ID=26074087
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60133929T Expired - Lifetime DE60133929D1 (de) | 2000-12-04 | 2001-11-26 | Oniumsalze und ihre verwendung als latente säuren |
Country Status (12)
Country | Link |
---|---|
US (1) | US6929896B2 (de) |
EP (1) | EP1344109B1 (de) |
JP (1) | JP4294317B2 (de) |
KR (1) | KR100862281B1 (de) |
CN (1) | CN100383665C (de) |
AT (1) | ATE394707T1 (de) |
AU (1) | AU2002227945A1 (de) |
BR (1) | BR0115944A (de) |
CA (1) | CA2428255C (de) |
DE (1) | DE60133929D1 (de) |
MX (1) | MXPA03004958A (de) |
WO (1) | WO2002046507A2 (de) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6787281B2 (en) | 2002-05-24 | 2004-09-07 | Kodak Polychrome Graphics Llc | Selected acid generating agents and their use in processes for imaging radiation-sensitive elements |
AT500298A1 (de) * | 2002-06-14 | 2005-11-15 | Agrolinz Melamin Gmbh | Verfahren zur härtung von aminoplasten |
US6790590B2 (en) | 2003-01-27 | 2004-09-14 | Kodak Polychrome Graphics, Llp | Infrared absorbing compounds and their use in imageable elements |
JP2005035162A (ja) * | 2003-07-14 | 2005-02-10 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法、平版印刷方法および機上現像用平版印刷原版 |
JP4644457B2 (ja) * | 2003-09-10 | 2011-03-02 | 富士フイルム株式会社 | 感光性組成物及びそれを用いたパターン形成方法 |
DE602005017972D1 (de) * | 2004-05-17 | 2010-01-14 | Fujifilm Corp | Verfahren zur Erzeugung eines Musters |
WO2006008251A2 (en) * | 2004-07-21 | 2006-01-26 | Ciba Specialty Chemicals Holding Inc. | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
JP4152928B2 (ja) * | 2004-08-02 | 2008-09-17 | 株式会社シンク・ラボラトリー | ポジ型感光性組成物 |
JP4770244B2 (ja) * | 2005-04-11 | 2011-09-14 | Jsr株式会社 | オニウム塩、それを用いた感放射線性酸発生剤及びポジ型感放射線性樹脂組成物 |
JP4810862B2 (ja) * | 2005-04-11 | 2011-11-09 | Jsr株式会社 | オニウム塩、それを用いた感放射線性酸発生剤及びポジ型感放射線性樹脂組成物 |
US20090081590A1 (en) * | 2005-05-11 | 2009-03-26 | Tokyo Ohka Kogyo Co., Ltd. | Negative resist composition and process for forming resist patterns |
JP2007041200A (ja) * | 2005-08-02 | 2007-02-15 | Fujifilm Corp | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
EP2922099B1 (de) | 2005-08-12 | 2019-01-02 | Cambrios Film Solutions Corporation | Transparente leiter auf Nanodrahtbasis |
US20070077452A1 (en) * | 2005-10-04 | 2007-04-05 | Jie Liu | Organic light emitting devices having latent activated layers and methods of fabricating the same |
US20070176167A1 (en) * | 2006-01-27 | 2007-08-02 | General Electric Company | Method of making organic light emitting devices |
GB0607668D0 (en) | 2006-04-18 | 2006-05-31 | Riso Nat Lab | Use of decomposable vehicles or solvents in printing or coating compositions |
WO2007124092A2 (en) | 2006-04-21 | 2007-11-01 | Cornell Research Foundation, Inc. | Photoacid generator compounds and compositions |
US20080014117A1 (en) * | 2006-07-14 | 2008-01-17 | Questel Adhesives | Food sterilization dosage indicator |
US8018568B2 (en) * | 2006-10-12 | 2011-09-13 | Cambrios Technologies Corporation | Nanowire-based transparent conductors and applications thereof |
KR101545219B1 (ko) | 2006-10-12 | 2015-08-18 | 캄브리오스 테크놀로지즈 코포레이션 | 나노와이어 기반의 투명 도전체 및 그의 응용 |
GB0623936D0 (en) * | 2006-11-29 | 2007-01-10 | Univ Strathclyde | Polymers with transmission into the ultraviolet |
KR101456838B1 (ko) | 2007-04-20 | 2014-11-04 | 캄브리오스 테크놀로지즈 코포레이션 | 복합 투명 도전체 및 그 제조 방법 |
KR100908601B1 (ko) | 2007-06-05 | 2009-07-21 | 제일모직주식회사 | 반사방지 하드마스크 조성물 및 이를 이용한 기판상 재료의패턴화 방법 |
US9034556B2 (en) | 2007-12-21 | 2015-05-19 | Tokyo Ohka Kogyo Co., Ltd. | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern |
JP4703674B2 (ja) * | 2008-03-14 | 2011-06-15 | 富士フイルム株式会社 | レジスト組成物及びそれを用いたパターン形成方法 |
US8163461B2 (en) * | 2008-04-09 | 2012-04-24 | Cornell Research Foundation, Inc. | Photoacid generator compounds and compositions |
US9551928B2 (en) * | 2009-04-06 | 2017-01-24 | Fujifilm Corporation | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith |
JP5607044B2 (ja) * | 2009-06-02 | 2014-10-15 | 山本化成株式会社 | ヨードニウム系光重合開始剤、その製造方法およびこれを含有してなる光硬化性組成物 |
JP2013522814A (ja) | 2010-02-24 | 2013-06-13 | カンブリオス テクノロジーズ コーポレイション | ナノワイヤベースの透明導体およびそれをパターン形成するための方法 |
JP5521996B2 (ja) * | 2010-11-19 | 2014-06-18 | 信越化学工業株式会社 | スルホニウム塩を含む高分子化合物、レジスト材料及びパターン形成方法、並びにスルホニウム塩単量体及びその製造方法 |
WO2012113829A1 (en) | 2011-02-23 | 2012-08-30 | Basf Se | Sulfonium sulfates, their preparation and use |
JP2013129649A (ja) * | 2011-11-22 | 2013-07-04 | Central Glass Co Ltd | 珪素化合物、縮合物およびそれを用いたレジスト組成物、ならびにそれを用いるパターン形成方法 |
JP2013148878A (ja) * | 2011-12-19 | 2013-08-01 | Sumitomo Chemical Co Ltd | レジスト組成物 |
US9631048B2 (en) * | 2012-04-19 | 2017-04-25 | Basf Se | Sulfonium compounds, their preparation and use |
WO2016124493A1 (en) | 2015-02-02 | 2016-08-11 | Basf Se | Latent acids and their use |
WO2018181906A1 (ja) * | 2017-03-31 | 2018-10-04 | ダイキン工業株式会社 | アルキル硫酸エステル又はその塩 |
EP3604350A4 (de) | 2017-03-31 | 2021-06-09 | Daikin Industries, Ltd. | Herstellungsverfahren für fluorpolymer, tensid zur polymerisierung und verwendung von tensid |
JP7356282B2 (ja) * | 2018-08-01 | 2023-10-04 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
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EP0249139B2 (de) | 1986-06-13 | 1998-03-11 | MicroSi, Inc. (a Delaware corporation) | Lackzusammensetzung und -anwendung |
JPH01226868A (ja) * | 1988-03-08 | 1989-09-11 | Sanshin Kagaku Kogyo Kk | スルホニウム化合物及びアシル化剤 |
US5345392A (en) * | 1991-01-25 | 1994-09-06 | International Business Machines Corporation | Battery charge monitor for a personal computer |
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JP2964107B2 (ja) | 1991-11-11 | 1999-10-18 | 日本電信電話株式会社 | ポジ型レジスト材料 |
US5550004A (en) * | 1992-05-06 | 1996-08-27 | Ocg Microelectronic Materials, Inc. | Chemically amplified radiation-sensitive composition |
JPH06199770A (ja) * | 1992-12-28 | 1994-07-19 | Japan Synthetic Rubber Co Ltd | 新規オニウム塩およびそれを含有する感放射線性樹脂 組成物 |
US5314747A (en) * | 1993-03-19 | 1994-05-24 | Xerox Corporation | Recording sheets containing cationic sulfur compounds |
JP3588822B2 (ja) * | 1994-07-07 | 2004-11-17 | Jsr株式会社 | 新規オニウム塩およびそれを含有する感放射線性樹脂 組成物 |
CA2187046A1 (fr) * | 1996-10-03 | 1998-04-03 | Alain Vallee | Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur |
JP3950241B2 (ja) * | 1997-10-17 | 2007-07-25 | 三菱重工業株式会社 | 樹脂組成物、樹脂硬化物、及び構造物の補修方法、補強方法、補修用材料、補強用材料 |
US6159656A (en) * | 1998-06-26 | 2000-12-12 | Fuji Photo Film Co., Ltd. | Positive photosensitive resin |
JP4262406B2 (ja) * | 1999-12-03 | 2009-05-13 | 東洋合成工業株式会社 | オニウム塩誘導体の製造方法 |
EP1164127A4 (de) | 1999-12-03 | 2005-06-01 | Toyo Gosei Kogyo Kk | Verfahren zur herstellung eines onium-salz-derivates und ein neues onium-salz derivat |
JP4161497B2 (ja) * | 1999-12-24 | 2008-10-08 | Jsr株式会社 | ネガ型感放射線性樹脂組成物 |
-
2001
- 2001-11-26 DE DE60133929T patent/DE60133929D1/de not_active Expired - Lifetime
- 2001-11-26 AT AT01989514T patent/ATE394707T1/de not_active IP Right Cessation
- 2001-11-26 JP JP2002548218A patent/JP4294317B2/ja not_active Expired - Fee Related
- 2001-11-26 MX MXPA03004958A patent/MXPA03004958A/es not_active Application Discontinuation
- 2001-11-26 WO PCT/EP2001/013725 patent/WO2002046507A2/en active IP Right Grant
- 2001-11-26 BR BR0115944-5A patent/BR0115944A/pt not_active Application Discontinuation
- 2001-11-26 CN CNB018200575A patent/CN100383665C/zh not_active Expired - Fee Related
- 2001-11-26 CA CA002428255A patent/CA2428255C/en not_active Expired - Fee Related
- 2001-11-26 AU AU2002227945A patent/AU2002227945A1/en not_active Abandoned
- 2001-11-26 KR KR1020037007500A patent/KR100862281B1/ko not_active IP Right Cessation
- 2001-11-26 EP EP01989514A patent/EP1344109B1/de not_active Expired - Lifetime
- 2001-11-26 US US10/432,263 patent/US6929896B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CA2428255A1 (en) | 2002-06-13 |
CN100383665C (zh) | 2008-04-23 |
EP1344109A2 (de) | 2003-09-17 |
CA2428255C (en) | 2010-01-05 |
EP1344109B1 (de) | 2008-05-07 |
CN1662853A (zh) | 2005-08-31 |
US20040053158A1 (en) | 2004-03-18 |
MXPA03004958A (es) | 2003-09-05 |
BR0115944A (pt) | 2003-12-23 |
WO2002046507A3 (en) | 2002-09-26 |
KR20040024534A (ko) | 2004-03-20 |
US6929896B2 (en) | 2005-08-16 |
AU2002227945A1 (en) | 2002-06-18 |
JP4294317B2 (ja) | 2009-07-08 |
WO2002046507A2 (en) | 2002-06-13 |
KR100862281B1 (ko) | 2008-10-15 |
ATE394707T1 (de) | 2008-05-15 |
JP2004526984A (ja) | 2004-09-02 |
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