DE69816273T2 - Anorganisches polymermaterial auf der basis von tantaloxyd , insbesondere mit erhöhtem brechungsindex , mechanisch verschleissfest , sein verfahren zur herstellung - Google Patents
Anorganisches polymermaterial auf der basis von tantaloxyd , insbesondere mit erhöhtem brechungsindex , mechanisch verschleissfest , sein verfahren zur herstellung Download PDFInfo
- Publication number
- DE69816273T2 DE69816273T2 DE69816273T DE69816273T DE69816273T2 DE 69816273 T2 DE69816273 T2 DE 69816273T2 DE 69816273 T DE69816273 T DE 69816273T DE 69816273 T DE69816273 T DE 69816273T DE 69816273 T2 DE69816273 T2 DE 69816273T2
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- refractive index
- layer
- oxide
- solution
- tantalum
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims description 31
- 229920000592 inorganic polymer Polymers 0.000 title claims description 4
- 239000002861 polymer material Substances 0.000 title 1
- 239000010410 layer Substances 0.000 claims description 294
- 239000000463 material Substances 0.000 claims description 160
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 125
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 119
- 239000000758 substrate Substances 0.000 claims description 98
- 238000000034 method Methods 0.000 claims description 86
- 230000003287 optical effect Effects 0.000 claims description 55
- 239000000377 silicon dioxide Substances 0.000 claims description 55
- 238000011282 treatment Methods 0.000 claims description 55
- 238000000151 deposition Methods 0.000 claims description 53
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 45
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 45
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- 239000002243 precursor Substances 0.000 claims description 43
- 230000008021 deposition Effects 0.000 claims description 42
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- 238000004132 cross linking Methods 0.000 claims description 40
- 239000002184 metal Substances 0.000 claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 36
- 229910052715 tantalum Inorganic materials 0.000 claims description 35
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 35
- -1 halide ions Chemical class 0.000 claims description 33
- 230000008569 process Effects 0.000 claims description 27
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- 150000001875 compounds Chemical class 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 25
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- 238000005056 compaction Methods 0.000 claims description 19
- 150000002738 metalloids Chemical class 0.000 claims description 19
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 18
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- 239000000084 colloidal system Substances 0.000 claims description 14
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 12
- 239000000395 magnesium oxide Substances 0.000 claims description 12
- 150000004706 metal oxides Chemical class 0.000 claims description 12
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 12
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 11
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 11
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- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 10
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- 239000010936 titanium Substances 0.000 claims description 10
- 238000001704 evaporation Methods 0.000 claims description 9
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- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 8
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 7
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 7
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- 229910021529 ammonia Inorganic materials 0.000 claims description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 6
- 238000000137 annealing Methods 0.000 claims description 5
- 229910052794 bromium Inorganic materials 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 229910052740 iodine Inorganic materials 0.000 claims description 5
- KUEVMRNKSBZFQV-UHFFFAOYSA-N O(O)O.[Ta] Chemical compound O(O)O.[Ta] KUEVMRNKSBZFQV-UHFFFAOYSA-N 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 4
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
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- 150000003839 salts Chemical class 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
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- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- 229910052776 Thorium Inorganic materials 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052706 scandium Inorganic materials 0.000 claims description 2
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 2
- HYXGAEYDKFCVMU-UHFFFAOYSA-N scandium oxide Chemical compound O=[Sc]O[Sc]=O HYXGAEYDKFCVMU-UHFFFAOYSA-N 0.000 claims description 2
- 150000003482 tantalum compounds Chemical class 0.000 claims description 2
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 claims description 2
- 229910003452 thorium oxide Inorganic materials 0.000 claims description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- RAIYCBAPBOTDOI-UHFFFAOYSA-N 1-chloroethanolate tantalum(5+) Chemical compound ClC([O-])C.[Ta+5].ClC([O-])C.ClC([O-])C.ClC([O-])C.ClC([O-])C RAIYCBAPBOTDOI-UHFFFAOYSA-N 0.000 claims 2
- 238000006386 neutralization reaction Methods 0.000 claims 2
- 229920006037 cross link polymer Polymers 0.000 claims 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims 1
- 150000004820 halides Chemical class 0.000 claims 1
- 229910000484 niobium oxide Inorganic materials 0.000 claims 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims 1
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- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000001935 peptisation Methods 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- XOFYZVNMUHMLCC-ZPOLXVRWSA-N prednisone Chemical compound O=C1C=C[C@]2(C)[C@H]3C(=O)C[C@](C)([C@@](CC4)(O)C(=O)CO)[C@@H]4[C@@H]3CCC2=C1 XOFYZVNMUHMLCC-ZPOLXVRWSA-N 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 150000003481 tantalum Chemical class 0.000 description 1
- IQFNDONPIKTUQM-UHFFFAOYSA-N tantalum hydrate Chemical compound O.[Ta] IQFNDONPIKTUQM-UHFFFAOYSA-N 0.000 description 1
- HSXKFDGTKKAEHL-UHFFFAOYSA-N tantalum(v) ethoxide Chemical compound [Ta+5].CC[O-].CC[O-].CC[O-].CC[O-].CC[O-] HSXKFDGTKKAEHL-UHFFFAOYSA-N 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
- C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G35/00—Compounds of tantalum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/84—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by UV- or VIS- data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Silicon Compounds (AREA)
- Optical Elements Other Than Lenses (AREA)
- Laminated Bodies (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9701486A FR2759360B1 (fr) | 1997-02-10 | 1997-02-10 | Materiau polymerique inorganique a base d'oxyde de tantale notamment a indice de refraction eleve, mecaniquement resistant a l'abrasion, son procede de fabrication et materiau optique comprenant ce materiau |
| FR9701486 | 1997-02-10 | ||
| PCT/FR1998/000229 WO1998034876A1 (fr) | 1997-02-10 | 1998-02-06 | Materiau polymerique inorganique a base d'oxyde de tantale, notamment a indice de refraction eleve, mecaniquement resistant a l'abrasion, son procede de fabrication, et materiau optique comprenant ce materiau |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69816273D1 DE69816273D1 (de) | 2003-08-14 |
| DE69816273T2 true DE69816273T2 (de) | 2004-05-27 |
Family
ID=9503507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69816273T Expired - Lifetime DE69816273T2 (de) | 1997-02-10 | 1998-02-06 | Anorganisches polymermaterial auf der basis von tantaloxyd , insbesondere mit erhöhtem brechungsindex , mechanisch verschleissfest , sein verfahren zur herstellung |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US6387517B1 (https=) |
| EP (1) | EP0961756B1 (https=) |
| JP (1) | JP4330661B2 (https=) |
| CN (1) | CN1191200C (https=) |
| AU (1) | AU737747B2 (https=) |
| BR (1) | BR9807197A (https=) |
| CA (1) | CA2279828C (https=) |
| DE (1) | DE69816273T2 (https=) |
| ES (1) | ES2202818T3 (https=) |
| FR (1) | FR2759360B1 (https=) |
| WO (1) | WO1998034876A1 (https=) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2775914B1 (fr) | 1998-03-13 | 2000-04-21 | Saint Gobain Vitrage | Procede de depot de couches a base d'oxyde(s) metallique(s) |
| US6444008B1 (en) | 1998-03-19 | 2002-09-03 | Cabot Corporation | Paint and coating compositions containing tantalum and/or niobium powders |
| EP1089093B1 (en) * | 1999-09-28 | 2008-04-02 | FUJIFILM Corporation | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate |
| JP3779174B2 (ja) * | 2000-11-13 | 2006-05-24 | Hoya株式会社 | 蒸着組成物、それを利用した反射防止膜の形成方法及び光学部材 |
| DE10127225A1 (de) * | 2001-05-22 | 2002-11-28 | Zeiss Carl | Ultraviolettlicht-Abschwächungsfilter |
| US7071613B2 (en) * | 2001-10-10 | 2006-07-04 | Lg.Philips Lcd Co., Ltd. | Organic electroluminescent device |
| US7442412B2 (en) * | 2003-05-08 | 2008-10-28 | Texas Instruments Incorporated | Hydrophobic coating for oxide surfaces |
| US20050008789A1 (en) * | 2003-06-26 | 2005-01-13 | Rafac Robert J. | Method and apparatus for stabilizing optical dielectric coatings |
| EP1687135A4 (en) * | 2003-10-28 | 2007-02-07 | Tru Vue Inc | ANTIREFLECTIVE COATING FOR A SUBSTRATE |
| US20060065989A1 (en) * | 2004-09-29 | 2006-03-30 | Thad Druffel | Lens forming systems and methods |
| JP2008518799A (ja) * | 2004-11-08 | 2008-06-05 | 日本板硝子株式会社 | 表面処理方法、組成物、および製品 |
| JP2007052305A (ja) * | 2005-08-19 | 2007-03-01 | Fujinon Sano Kk | 反射体、光源装置、液晶プロジェクタ及び反射膜の成膜方法 |
| JP5202819B2 (ja) * | 2006-04-26 | 2013-06-05 | 富士フイルム株式会社 | 反射防止フィルムの製造方法 |
| KR101234233B1 (ko) * | 2006-05-18 | 2013-02-18 | 삼성에스디아이 주식회사 | 포스페이트를 포함하는 반도체 전극 및 이를 채용한태양전지 |
| US8512581B2 (en) * | 2006-10-09 | 2013-08-20 | Solexel, Inc. | Methods for liquid transfer coating of three-dimensional substrates |
| US20100035069A1 (en) * | 2007-06-20 | 2010-02-11 | Zhi Chao Li | Hydrophobic lens coating |
| US8179030B2 (en) * | 2009-11-30 | 2012-05-15 | General Electric Company | Oxide multilayers for high temperature applications and lamps |
| US9470827B2 (en) * | 2010-10-27 | 2016-10-18 | Konica Minolta, Inc. | Near-infrared reflective film, method for producing same, and near-infrared reflector provided with near-infrared reflective film |
| CN108594599B (zh) * | 2011-07-08 | 2022-04-22 | Asml荷兰有限公司 | 抗蚀剂材料、光刻图案化方法和氧化物的用途 |
| US20140272125A1 (en) * | 2013-03-14 | 2014-09-18 | Guardian Industries Corp | Anti-reflection glass made from aged sol including mixture of tri-alkoxysilane and tetra-alkoxysilane |
| US9971065B2 (en) | 2013-03-14 | 2018-05-15 | Gaurdian Glass, LLC | Anti-reflection glass made from sol made by blending tri-alkoxysilane and tetra-alkoxysilane inclusive sols |
| CN103752574A (zh) * | 2014-02-13 | 2014-04-30 | 苏州众显电子科技有限公司 | 一种利用光学清洗剂清洗液晶显示屏基板工艺 |
| FR3045672B1 (fr) | 2015-12-18 | 2018-03-16 | Corporation De L'ecole Polytechnique De Montreal | Article comprenant une couche organique-inorganique de bas indice de refraction |
| CN106517817B (zh) * | 2016-10-27 | 2019-04-19 | 宜昌南玻显示器件有限公司 | 一种抗uv光学膜玻璃及其制备方法 |
| US10644048B2 (en) * | 2017-02-01 | 2020-05-05 | Omnivision Technologies, Inc. | Anti-reflective coating with high refractive index material at air interface |
| EP3638627A4 (en) * | 2017-06-16 | 2021-01-20 | Essilor International | HIGH REFRACTIVE INDEX NANO PARTICLES |
| US12281036B2 (en) * | 2019-07-12 | 2025-04-22 | Corning Incorporated | Methods for forming glass ceramic articles |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE736411C (de) | 1939-05-28 | 1943-06-19 | Jenaer Glaswerk Schott & Gen | Verfahren zur AEnderung des Reflexionsvermoegens optischer Glaeser |
| DE937913C (de) | 1939-11-18 | 1956-01-19 | Leitz Ernst Gmbh | Verfahren zur Herstellung von UEberzugsschichten auf optisch wirksamen Oberflaechen,insbesondere auf Glas |
| US2432484A (en) | 1943-03-12 | 1947-12-09 | American Optical Corp | Reflection reducing coating having a gradually increasing index of refraction |
| US2584905A (en) * | 1944-11-06 | 1952-02-05 | American Optical Corp | Surface reflection modifying solutions |
| US2466119A (en) * | 1944-11-06 | 1949-04-05 | American Optical Corp | Reflection modifying coatings and articles so coated and method of making the same |
| US2432483A (en) | 1946-04-01 | 1947-12-09 | Miller Walter | Latch operated axially engaging positive clutch |
| US2710267A (en) | 1950-06-17 | 1955-06-07 | Monsanto Chemicals | Process of coating glass with a titanium polymer and article produced thereby |
| US2768909A (en) | 1953-07-28 | 1956-10-30 | Du Pont | Method of coating surface with transparent film and product resulting therefrom |
| US3460956A (en) | 1968-07-19 | 1969-08-12 | Joseph Dahle | Titanate product and method of making the same |
| US3875043A (en) * | 1973-04-19 | 1975-04-01 | Electronor Corp | Electrodes with multicomponent coatings |
| JPS5830252B2 (ja) | 1978-07-07 | 1983-06-28 | シャープ株式会社 | 酸化タンタル膜の製造方法 |
| IN152814B (https=) * | 1978-08-08 | 1984-04-14 | Westinghouse Electric Corp | |
| US4272588A (en) | 1979-08-23 | 1981-06-09 | Westinghouse Electric Corp. | Oxide protected mirror |
| US4271210A (en) * | 1979-10-25 | 1981-06-02 | Westinghouse Electric Corp. | Method of forming transmissive, porous metal oxide optical layer of a vitreous substrate |
| US4328260A (en) | 1981-01-23 | 1982-05-04 | Solarex Corporation | Method for applying antireflective coating on solar cell |
| US4595609A (en) * | 1984-11-21 | 1986-06-17 | Regents Of The University Of Minnesota | Corrosion resistant tantalum pentaoxide coatings |
| US4966812A (en) | 1988-01-26 | 1990-10-30 | The United States Of America As Represented By The Department Of Energy | Sol-gel antireflective coating on plastics |
| US4929278A (en) | 1988-01-26 | 1990-05-29 | United States Department Of Energy | Sol-gel antireflective coating on plastics |
| FR2635530A1 (fr) * | 1988-08-19 | 1990-02-23 | Central Glass Co Ltd | Procede pour la formation d'un film de revetement en oxyde contenant du titane en utilisant une solution d'alcoxyde |
| JP2831431B2 (ja) * | 1990-04-10 | 1998-12-02 | 株式会社ジャパンエナジー | 高純度金属アルコキサイドの製造方法 |
| FR2680583B1 (fr) | 1991-08-22 | 1993-10-08 | Commissariat A Energie Atomique | Materiau presentant des proprietes antireflet, hydrophobes et de resistance a l'abrasion et procede de depot d'une couche antireflet, hydrophobe et resistante a l'abrasion sur un substrat. |
| FR2682486B1 (fr) | 1991-10-15 | 1993-11-12 | Commissariat A Energie Atomique | Miroir dielectrique interferentiel et procede de fabrication d'un tel miroir. |
| JP2647796B2 (ja) * | 1992-12-09 | 1997-08-27 | 株式会社ジャパンエナジー | 酸化タンタル膜形成用材料 |
| FR2703791B1 (fr) | 1993-04-05 | 1995-05-19 | Commissariat Energie Atomique | Procédé de fabrication de couches minces présentant des propriétés optiques et des propriétés de résistance à l'abrasion . |
| US5698266A (en) | 1993-04-05 | 1997-12-16 | Commissariat A L'energie Atomique | Process for the production of thin coatings having optical and abrasion resistance properties |
| FR2707763B1 (fr) | 1993-07-16 | 1995-08-11 | Commissariat Energie Atomique | Matériau composite à indice de réfraction élevé, procédé de fabrication de ce matériau composite et matériau optiquement actif comprenant ce matériau composite. |
| FR2759464B1 (fr) * | 1997-02-10 | 1999-03-05 | Commissariat Energie Atomique | Procede de preparation d'un materiau optique multicouches avec reticulation-densification par insolation aux rayons ultraviolets et materiau optique ainsi prepare |
-
1997
- 1997-02-10 FR FR9701486A patent/FR2759360B1/fr not_active Expired - Fee Related
-
1998
- 1998-02-06 EP EP98908140A patent/EP0961756B1/fr not_active Expired - Lifetime
- 1998-02-06 BR BR9807197-1A patent/BR9807197A/pt not_active IP Right Cessation
- 1998-02-06 US US09/355,763 patent/US6387517B1/en not_active Expired - Lifetime
- 1998-02-06 AU AU66255/98A patent/AU737747B2/en not_active Expired
- 1998-02-06 JP JP53388798A patent/JP4330661B2/ja not_active Expired - Lifetime
- 1998-02-06 WO PCT/FR1998/000229 patent/WO1998034876A1/fr not_active Ceased
- 1998-02-06 CN CN98802336.9A patent/CN1191200C/zh not_active Expired - Lifetime
- 1998-02-06 ES ES98908140T patent/ES2202818T3/es not_active Expired - Lifetime
- 1998-02-06 CA CA2279828A patent/CA2279828C/fr not_active Expired - Lifetime
- 1998-02-06 DE DE69816273T patent/DE69816273T2/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| ES2202818T3 (es) | 2004-04-01 |
| JP2001511107A (ja) | 2001-08-07 |
| CA2279828C (fr) | 2010-06-01 |
| CN1248229A (zh) | 2000-03-22 |
| EP0961756A1 (fr) | 1999-12-08 |
| US6387517B1 (en) | 2002-05-14 |
| AU737747B2 (en) | 2001-08-30 |
| AU6625598A (en) | 1998-08-26 |
| JP4330661B2 (ja) | 2009-09-16 |
| BR9807197A (pt) | 2000-05-23 |
| WO1998034876A1 (fr) | 1998-08-13 |
| CA2279828A1 (fr) | 1998-08-13 |
| DE69816273D1 (de) | 2003-08-14 |
| FR2759360B1 (fr) | 1999-03-05 |
| CN1191200C (zh) | 2005-03-02 |
| EP0961756B1 (fr) | 2003-07-09 |
| FR2759360A1 (fr) | 1998-08-14 |
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