DE69304016T2 - Reflektion verringernde Schicht und Verfahren für deren Herstellung auf einem Glassubstrat - Google Patents

Reflektion verringernde Schicht und Verfahren für deren Herstellung auf einem Glassubstrat

Info

Publication number
DE69304016T2
DE69304016T2 DE69304016T DE69304016T DE69304016T2 DE 69304016 T2 DE69304016 T2 DE 69304016T2 DE 69304016 T DE69304016 T DE 69304016T DE 69304016 T DE69304016 T DE 69304016T DE 69304016 T2 DE69304016 T2 DE 69304016T2
Authority
DE
Germany
Prior art keywords
reflection
production
glass substrate
reducing layer
reducing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69304016T
Other languages
English (en)
Other versions
DE69304016D1 (de
Inventor
Atsushi Takamatsu
Osamu Takahashi
Hiroaki Arai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Application granted granted Critical
Publication of DE69304016D1 publication Critical patent/DE69304016D1/de
Publication of DE69304016T2 publication Critical patent/DE69304016T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C03C1/008Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route for the production of films or coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/008Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
    • C03C17/009Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/213SiO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/425Coatings comprising at least one inhomogeneous layer consisting of a porous layer
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/77Coatings having a rough surface
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • C03C2218/113Deposition methods from solutions or suspensions by sol-gel processes
DE69304016T 1992-11-13 1993-11-12 Reflektion verringernde Schicht und Verfahren für deren Herstellung auf einem Glassubstrat Expired - Fee Related DE69304016T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4303711A JP2716330B2 (ja) 1992-11-13 1992-11-13 低反射ガラスおよびその製法

Publications (2)

Publication Number Publication Date
DE69304016D1 DE69304016D1 (de) 1996-09-19
DE69304016T2 true DE69304016T2 (de) 1996-12-19

Family

ID=17924334

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69304016T Expired - Fee Related DE69304016T2 (de) 1992-11-13 1993-11-12 Reflektion verringernde Schicht und Verfahren für deren Herstellung auf einem Glassubstrat

Country Status (4)

Country Link
US (1) US5394269A (de)
EP (1) EP0597490B1 (de)
JP (1) JP2716330B2 (de)
DE (1) DE69304016T2 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000064830A1 (de) * 1999-04-26 2000-11-02 Flabeg Gmbh & Co. Kg VORGESPANNTES, MIT EINER WISCHFESTEN, PORÖSEN SiO2-ANTIREFLEX-SCHICHT VERSEHENES SICHERHEITSGLAS UND VERFAHREN ZU DESSEN HERSTELLUNG
DE10051724A1 (de) * 2000-10-18 2002-05-02 Flabeg Gmbh & Co Kg Thermisch vorgespanntes Glas mit einer abriebfesten, porösen SiO¶2¶-Antireflexschicht

Families Citing this family (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5909314A (en) * 1994-02-15 1999-06-01 Dai Nippon Printing Co., Ltd. Optical functional materials and process for producing the same
CA2162451A1 (en) * 1994-12-22 1996-06-23 John P. Murphy Anti-reflective clarifier film for eyeglasses
EP0748775A3 (de) * 1995-05-30 1998-11-25 Central Glass Company, Limited Wasserabweisende Glasscheibe mit fein aufgerauhter Metalloxidbasisschicht
WO1997006896A1 (en) * 1995-08-14 1997-02-27 Central Glass Company Limited Porous metal-oxide thin film and method of forming same on glass substrate
TW376408B (en) 1995-12-01 1999-12-11 Nissan Chemical Ind Ltd Coating film having water repellency and low refractive index
DE69730259T2 (de) * 1996-03-27 2005-09-08 Asahi Glass Co., Ltd. Laminat und Verfahren zu seiner Herstellung
JP3488965B2 (ja) * 1996-05-21 2004-01-19 日本山村硝子株式会社 ゾル−ゲル法による独立膜の製造方法
DE19642419A1 (de) * 1996-10-14 1998-04-16 Fraunhofer Ges Forschung Verfahren und Beschichtungszusammensetzung zur Herstellung einer Antireflexionsbeschichtung
JPH10259038A (ja) 1997-01-24 1998-09-29 Samsung Corning Co Ltd 耐久性撥水ガラス及びその製造方法
KR100281993B1 (ko) * 1997-06-26 2001-04-02 박영구 내구성 발수유리와 그 제조방법
FR2762097B1 (fr) * 1997-04-10 1999-07-02 Corning Sa Dispositif optique a revetement antireflechissant, materiau de revetement et procede de revetement correspondants
JP2001526798A (ja) * 1997-04-10 2001-12-18 コーニング ソシエテ アノニム 無反射コーティングを施した光学物品並びにそのコーティング材料及びコーティング方法
US5980983A (en) * 1997-04-17 1999-11-09 The President And Fellows Of Harvard University Liquid precursors for formation of metal oxides
EP0897898B1 (de) * 1997-08-16 2004-04-28 MERCK PATENT GmbH Verfahren zur Abscheidung optischer Schichten
DE19828231C2 (de) * 1997-08-16 2000-09-07 Merck Patent Gmbh Verfahren zur Abscheidung poröser optischer Schichten
DE19829172A1 (de) * 1998-06-30 2000-01-05 Univ Konstanz Verfahren zur Herstellung von Antireflexschichten
US6964731B1 (en) * 1998-12-21 2005-11-15 Cardinal Cg Company Soil-resistant coating for glass surfaces
TR200102186T2 (tr) 1998-12-21 2001-11-21 Cardinal Ig Company Cam yüzeyleri için kire-dayanıklı kaplamalar
US6660365B1 (en) * 1998-12-21 2003-12-09 Cardinal Cg Company Soil-resistant coating for glass surfaces
US6974629B1 (en) 1999-08-06 2005-12-13 Cardinal Cg Company Low-emissivity, soil-resistant coating for glass surfaces
JP4430194B2 (ja) 1999-05-31 2010-03-10 日本板硝子株式会社 透明積層体およびこれを用いたガラス物品
JP2001060708A (ja) 1999-06-18 2001-03-06 Nippon Sheet Glass Co Ltd 透明積層体およびこれを用いたガラス物品
JP2001060702A (ja) 1999-06-18 2001-03-06 Nippon Sheet Glass Co Ltd 光電変換装置用基板およびこれを用いた光電変換装置
TW468053B (en) 1999-12-14 2001-12-11 Nissan Chemical Ind Ltd Antireflection film, process for forming the antireflection film, and antireflection glass
US6921579B2 (en) * 2000-09-11 2005-07-26 Cardinal Cg Company Temporary protective covers
DE10051725A1 (de) 2000-10-18 2002-05-02 Merck Patent Gmbh Wäßrige Beschichtungslösung für abriebfeste SiO2-Antireflexschichten
MXPA02009426A (es) 2001-02-08 2003-10-06 Cardinal Cg Co Tratamientos marginales para sustratos recubiertos.
WO2002064524A1 (fr) * 2001-02-16 2002-08-22 Nippon Sheet Glass Co., Ltd. Film irregulier et son procede de fabrication
US6902813B2 (en) * 2001-09-11 2005-06-07 Cardinal Cg Company Hydrophilic surfaces carrying temporary protective covers
TW593188B (en) 2001-09-21 2004-06-21 Merck Patent Gmbh Hybrid sol for the production of abrasion-resistant SiO2 antireflection layers
DE10146687C1 (de) 2001-09-21 2003-06-26 Flabeg Solarglas Gmbh & Co Kg Glas mit einer porösen Antireflex-Oberflächenbeschichtung sowie Verfahren zur Herstellung des Glases und Verwendung eines derartigen Glases
JP2003186004A (ja) * 2001-12-14 2003-07-03 Nippon Sheet Glass Co Ltd 凸状膜の形成方法
US6919133B2 (en) * 2002-03-01 2005-07-19 Cardinal Cg Company Thin film coating having transparent base layer
CA2477845C (en) * 2002-03-01 2010-10-12 Cardinal Cg Company Thin film coating having transparent base layer
JP4118086B2 (ja) * 2002-05-31 2008-07-16 トヨタ自動車株式会社 親水性を有する防曇防汚性薄膜の製造方法
PL211548B1 (pl) * 2002-06-10 2012-05-31 Cnt Społka Z Ograniczoną Odpowiedzialnością Ustrój izolacji termicznej gazowej, zwłaszcza szyb zespolonych
TW200530350A (en) * 2003-12-18 2005-09-16 Nissan Chemical Ind Ltd Water repellent coating film having low refractive index
TWI404776B (zh) * 2003-12-19 2013-08-11 Nissan Chemical Ind Ltd A film having a low refractive index and a large contact angle with respect to water
EP1713736B1 (de) * 2003-12-22 2016-04-27 Cardinal CG Company Gradierte photokatalytische beschichtungen und verfahren zur herstellung
JP4182236B2 (ja) * 2004-02-23 2008-11-19 キヤノン株式会社 光学部材および光学部材の製造方法
DE102004019575A1 (de) * 2004-04-20 2005-11-24 Innovent E.V. Technologieentwicklung Verfahren zur Herstellung von transmissionsverbessernden und/oder reflexionsmindernden optischen Schichten
DE602005003228T2 (de) 2004-07-12 2008-08-28 Cardinal Cg Co., Eden Prairie Wartungsarme beschichtungen
US20060096614A1 (en) * 2004-11-08 2006-05-11 Krisko Annette J Surface treating methods, compositions and articles
US8092660B2 (en) * 2004-12-03 2012-01-10 Cardinal Cg Company Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films
US7923114B2 (en) * 2004-12-03 2011-04-12 Cardinal Cg Company Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US20090214796A1 (en) 2005-06-09 2009-08-27 Kaoru Okaniwa Method for Forming Antireflection Film
JP4893103B2 (ja) * 2005-06-17 2012-03-07 日産化学工業株式会社 被膜形成用塗布液及びその被膜並びに被膜形成方法
US7550040B2 (en) 2005-06-17 2009-06-23 Nissan Chemical Industries, Ltd. Coating fluid for forming film, and film thereof and film-forming process
EP1873126A1 (de) * 2006-02-22 2008-01-02 Central Glass Co., Ltd. Blendfreies Glassubstrat
US7989094B2 (en) 2006-04-19 2011-08-02 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US20080055729A1 (en) * 2006-08-28 2008-03-06 Micron Technology, Inc. Reducing reflections in image sensors
KR100919281B1 (ko) * 2007-08-31 2009-09-30 주식회사 엠디코드 유리기판의 표면처리제와, 이 표면처리제가 도포된표면처리필름 및, 이 표면처리필름을 갖는유기발광다이오드
US7820309B2 (en) * 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
DE102007053839B4 (de) * 2007-11-12 2009-09-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verwendung eines beschichteten, transparenten Substrats zur Beeinflussung der menschlichen Psyche
US8557877B2 (en) * 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
DE102009042159B4 (de) * 2009-09-11 2017-09-28 Schott Ag Verfahren zur Verbesserung der tribologischen Eigenschaften einer Glasoberfläche
KR20130096145A (ko) 2010-04-30 2013-08-29 닛산 가가쿠 고교 가부시키 가이샤 스프레이 도포용의 피막 형성용 도포액 및 피막
PL2582764T3 (pl) 2010-06-18 2015-08-31 Dsm Ip Assets Bv Nieorganiczna powłoka tlenkowa
PL2852641T3 (pl) 2012-05-22 2019-01-31 Dsm Ip Assets B.V. Kompozycja i sposób wytwarzania porowatej powłoki z nieorganicznego tlenku
KR20150036114A (ko) 2012-07-20 2015-04-07 레르 리키드 쏘시에떼 아노님 뿌르 레뜌드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 Ald/cvd 규소-함유 필름 애플리케이션을 위한 유기실란 전구체
CA2878704A1 (en) 2012-08-09 2014-02-13 Dsm Ip Assets B.V. Roll coating process and apparatus
US9971065B2 (en) * 2013-03-14 2018-05-15 Gaurdian Glass, LLC Anti-reflection glass made from sol made by blending tri-alkoxysilane and tetra-alkoxysilane inclusive sols
CN104101918B (zh) * 2013-04-03 2017-03-01 法国圣戈班玻璃公司 一种光学增透膜及其制备方法和光学组件
TW201509799A (zh) 2013-07-19 2015-03-16 Air Liquide 用於ald/cvd含矽薄膜應用之六配位含矽前驅物
US9382268B1 (en) 2013-07-19 2016-07-05 American Air Liquide, Inc. Sulfur containing organosilane precursors for ALD/CVD silicon-containing film applications
CN107210010A (zh) * 2015-01-26 2017-09-26 旭硝子株式会社 具有显示装置的建材玻璃板和建材玻璃结构
US10273573B2 (en) 2015-12-11 2019-04-30 Cardinal Cg Company Method of coating both sides of a substrate using a sacrificial coating
WO2017098053A1 (en) 2015-12-11 2017-06-15 Dsm Ip Assets B.V. System and method for optical measurements on a transparent sheet
EP3211122A1 (de) 2016-02-23 2017-08-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum sintern, kristallisieren und/oder vernetzen eines beschichtungsmaterials auf einem substrat
EP3541762B1 (de) 2016-11-17 2022-03-02 Cardinal CG Company Statisch-dissipative beschichtungstechnologie
JP7276775B2 (ja) 2017-04-18 2023-05-18 コベストロ (ネザーランズ) ビー.ブイ. コーティング及びコーティング配合物

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60127250A (ja) * 1983-12-15 1985-07-06 Hoya Corp 反射防止膜の形成方法
JPS62226840A (ja) * 1986-03-29 1987-10-05 Shimadzu Corp 反射防止膜およびその製造方法
US4828721A (en) * 1988-04-28 1989-05-09 Colgate-Palmolive Co. Particulate detergent compositions and manufacturing processes
US5268196A (en) * 1988-05-30 1993-12-07 Ford Motor Company Process for forming anti-reflective coatings comprising light metal fluorides
JPH02248357A (ja) * 1989-03-18 1990-10-04 Mitsubishi Mining & Cement Co Ltd ゾルの調製方法
JPH0323493A (ja) * 1989-06-20 1991-01-31 Pioneer Electron Corp 液晶表示装置
JPH04275950A (ja) * 1991-03-04 1992-10-01 Central Glass Co Ltd 基板面への微細凹凸形成法
JP2874391B2 (ja) * 1991-06-05 1999-03-24 日産自動車株式会社 撥水処理ガラスの製造方法
JP2716302B2 (ja) * 1991-11-29 1998-02-18 セントラル硝子株式会社 マイクロピット状表層を有する酸化物薄膜および該薄膜を用いた多層膜、ならびにその形成法
JPH05170486A (ja) * 1991-12-25 1993-07-09 Central Glass Co Ltd ガラス表面用撥水処理剤およびその撥水処理ガラス

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000064830A1 (de) * 1999-04-26 2000-11-02 Flabeg Gmbh & Co. Kg VORGESPANNTES, MIT EINER WISCHFESTEN, PORÖSEN SiO2-ANTIREFLEX-SCHICHT VERSEHENES SICHERHEITSGLAS UND VERFAHREN ZU DESSEN HERSTELLUNG
DE19918811A1 (de) * 1999-04-26 2000-11-02 Fraunhofer Ges Forschung Vorgespanntes, mit einer wischfesten, porösen SiO¶2¶-Antireflex-Schicht versehenes Sicherheitsglas u. Verfahren z. d. Herstellung
DE10051724A1 (de) * 2000-10-18 2002-05-02 Flabeg Gmbh & Co Kg Thermisch vorgespanntes Glas mit einer abriebfesten, porösen SiO¶2¶-Antireflexschicht
US7128944B2 (en) 2000-10-18 2006-10-31 Flabeg Solarglas Gmbh & Co., Kg Method for making thermally tempered glass comprising a non-abrasive, porous, SiO2 antireflection layer

Also Published As

Publication number Publication date
EP0597490B1 (de) 1996-08-14
JP2716330B2 (ja) 1998-02-18
JPH06157076A (ja) 1994-06-03
EP0597490A1 (de) 1994-05-18
DE69304016D1 (de) 1996-09-19
US5394269A (en) 1995-02-28

Similar Documents

Publication Publication Date Title
DE69304016T2 (de) Reflektion verringernde Schicht und Verfahren für deren Herstellung auf einem Glassubstrat
DE69422964T2 (de) Mehrlagiger, wasserabweisender Film und Verfahren zu dessen Herstellung auf einem Glassubstrat
DE69333152D1 (de) Verfahren zur Herstellung eines Halbleitersubstrates
DE69331815T2 (de) Verfahren zur Herstellung eines Halbleitersubstrates
DE69331816D1 (de) Verfahren zur Herstellung eines Halbleitersubstrats
DE69711335D1 (de) Hochtemperatur-Schutzschicht für ein Substrat aus einer Superlegierung und Verfahren zu deren Herstellung
DE69332511D1 (de) Verfahren zur Herstellung eines Halbleitersubstrats
DE69333282D1 (de) Verfahren zur Herstellung eines Halbleitersubstrats
DE69214683D1 (de) Halbleiterbauelement mit einem auf TEOS-Basis aufgeschleuderten Glas und Verfahren zu dessen Herstellung
DE69423309T2 (de) Herstellungsverfahren für eine Reliefstruktur auf einem Substrat aus Halbleitermaterial
DE68928402T2 (de) Verfahren zur Entfernung einer Oxidschicht auf einem Substrat
DE69220901T2 (de) Verfahren zur Herstellung eines wärmebehandelten beschichteten Glases
DE69333173D1 (de) Verfahren zur Herstellung eines Substrates mit einer Halbleiterschicht auf einem Isolator
DE69722832D1 (de) Verfahren zum Transportieren einer dünnen Schicht von einem Anfangssubstrat auf ein Endsubstrat
DE69210784D1 (de) Wasserabstossende Metalloxidschicht auf einem Glassubstrat und Herstellungsverfahren
DE3872339D1 (de) Anlage und verfahren zur herstellung einer schicht auf einem band.
DE69211022T2 (de) Auf Kunststoffsubstrat aufgebrachte gleitsichere Schicht und Verfahren zur deren Herstellung
DE69326706T2 (de) Verfahren zur Herstellung einer Schicht auf einem Halbleiterkörper
DE69201856D1 (de) Mikrorauhe Metalloxidschichten auf Glassubstrat und Verfahren zu ihrer Herstellung.
DE69505048T2 (de) Herstellungsmethode für Halbleiterelemente in einer aktiven Schicht auf einem Trägersubstrat
DE69231655T2 (de) Verfahren zur Herstellung einer Graberstruktur in einem Halbleitersubstrat
DE59503245D1 (de) Kratzfeste Beschichtung aus Aluminiumoxid auf einem Glas-Substrat und Verfahren zu ihrer Herstellung
DE69306600D1 (de) Verfahren zur Herstellung eines mehrschichtigen Leitersubstrats
DE69209488D1 (de) Verfahren zur Herstellung eines Halbleiterplätchens und Substrat für die Herstellung eines Halbleiters
DE69309358T2 (de) Verfahren zur Herstellung eines Schaltungssubstrats

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee