DE69800447T2 - Mit Wasser entwickelbare lichtempfindliche Harzzusammensetzung - Google Patents

Mit Wasser entwickelbare lichtempfindliche Harzzusammensetzung

Info

Publication number
DE69800447T2
DE69800447T2 DE69800447T DE69800447T DE69800447T2 DE 69800447 T2 DE69800447 T2 DE 69800447T2 DE 69800447 T DE69800447 T DE 69800447T DE 69800447 T DE69800447 T DE 69800447T DE 69800447 T2 DE69800447 T2 DE 69800447T2
Authority
DE
Germany
Prior art keywords
water
resin composition
photosensitive resin
developable photosensitive
developable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69800447T
Other languages
English (en)
Other versions
DE69800447D1 (de
Inventor
Katsuo Koshimura
Tadaaki Tanaka
Noboru Shimada
Kenji Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP7283097A external-priority patent/JPH10254134A/ja
Priority claimed from JP7671797A external-priority patent/JPH10254127A/ja
Application filed by JSR Corp filed Critical JSR Corp
Publication of DE69800447D1 publication Critical patent/DE69800447D1/de
Application granted granted Critical
Publication of DE69800447T2 publication Critical patent/DE69800447T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/107Polyamide or polyurethane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/108Polyolefin or halogen containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69800447T 1997-03-11 1998-03-10 Mit Wasser entwickelbare lichtempfindliche Harzzusammensetzung Expired - Lifetime DE69800447T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7283097A JPH10254134A (ja) 1997-03-11 1997-03-11 水現像性感光性樹脂組成物
JP7671797A JPH10254127A (ja) 1997-03-13 1997-03-13 水現像性感光性樹脂組成物

Publications (2)

Publication Number Publication Date
DE69800447D1 DE69800447D1 (de) 2001-02-01
DE69800447T2 true DE69800447T2 (de) 2001-06-07

Family

ID=26413968

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69800447T Expired - Lifetime DE69800447T2 (de) 1997-03-11 1998-03-10 Mit Wasser entwickelbare lichtempfindliche Harzzusammensetzung

Country Status (3)

Country Link
US (1) US6140017A (de)
EP (1) EP0864927B1 (de)
DE (1) DE69800447T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5902714A (en) * 1997-07-30 1999-05-11 Polyfibron Technologies, Inc. Latex-based, aqueous developable photopolymers and use thereof in printing plates
JP2000305267A (ja) 1999-04-22 2000-11-02 Jsr Corp 感光性樹脂組成物
US6558875B1 (en) * 1999-07-27 2003-05-06 Mitsubishi Chemical Corporation Method for treating photosensitive lithographic printing plate
EP1149866A3 (de) * 2000-04-27 2003-04-23 JSR Corporation Kautschukmischungen auf Basis von vernetzten Kautschukpartikeln und von unvernetzten Kautschuken
EP1149867B1 (de) * 2000-04-27 2010-06-16 JSR Corporation Vernetzte Kautschukpartikel und Kautschukzusammensetzungen
US6653404B2 (en) 2000-05-01 2003-11-25 Jsr Corporation Rubber compositions
US7005232B2 (en) 2003-06-16 2006-02-28 Napp Systems, Inc. Highly reflective substrates for the digital processing of photopolymer printing plates
US8492456B2 (en) * 2004-02-09 2013-07-23 Hewlett-Packard Development Company, L.P. Ink compositions for ink-jet printing
WO2006004098A1 (ja) * 2004-07-06 2006-01-12 Toagosei Co., Ltd. 電解質膜および当該電解質膜を用いた燃料電池
EP2189846B1 (de) * 2008-11-19 2015-04-22 Rohm and Haas Electronic Materials LLC Verfahren für die Fotolithographie unter Verwendung einer Fotolackzusammensetzung beinhaltend ein Blockcopolymer
EP2319821A1 (de) * 2009-11-06 2011-05-11 L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Stabilisierung von Bicycloheptadien

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69118586T2 (de) * 1990-06-12 1996-11-14 Mitsui Petrochemical Ind Äthylen-/Penten-1-Copolymerzusammensetzungen und ihre Verwendung
JP2793068B2 (ja) * 1991-04-24 1998-09-03 日本ペイント株式会社 感光性樹脂組成物
US5698361A (en) * 1991-10-07 1997-12-16 Fuji Photo Film Co., Ltd. Photosensitive composition
US5736298A (en) * 1992-10-02 1998-04-07 Japan Synthetic Rubber Co., Ltd. Water developable photosensitive resin composition
JP3336704B2 (ja) * 1993-10-19 2002-10-21 ジェイエスアール株式会社 水現像性感光性樹脂組成物
EP0675412B1 (de) * 1994-03-30 2001-01-17 Japan Synthetic Rubber Co., Ltd. Fotoempfindliche Harzzusammensetzung
JP2951554B2 (ja) * 1994-11-29 1999-09-20 日本ペイント株式会社 フレキソ印刷版材用樹脂組成物
JPH08320561A (ja) * 1995-05-24 1996-12-03 Nippon Paint Co Ltd フレキソ版材用感光性樹脂組成物
JPH0940728A (ja) * 1995-07-31 1997-02-10 Nippon Paint Co Ltd 変性ブロック共重合体およびその応用

Also Published As

Publication number Publication date
DE69800447D1 (de) 2001-02-01
EP0864927A1 (de) 1998-09-16
EP0864927B1 (de) 2000-12-27
US6140017A (en) 2000-10-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition