DE69601249D1 - Mit Wasser entwickelbare, fotoempfindliche Harzzusammensetzung - Google Patents

Mit Wasser entwickelbare, fotoempfindliche Harzzusammensetzung

Info

Publication number
DE69601249D1
DE69601249D1 DE69601249T DE69601249T DE69601249D1 DE 69601249 D1 DE69601249 D1 DE 69601249D1 DE 69601249 T DE69601249 T DE 69601249T DE 69601249 T DE69601249 T DE 69601249T DE 69601249 D1 DE69601249 D1 DE 69601249D1
Authority
DE
Germany
Prior art keywords
resin composition
photosensitive resin
developable photosensitive
water developable
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69601249T
Other languages
English (en)
Other versions
DE69601249T2 (de
Inventor
Kazunori Kanda
Koichi Ueda
Tadahiro Kakiuchi
Hisaichi Muramoto
Katsuo Koshimura
Kenji Yasuda
Hozumi Sato
Takashi Nishioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Nippon Paint Co Ltd
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd, Japan Synthetic Rubber Co Ltd filed Critical Nippon Paint Co Ltd
Publication of DE69601249D1 publication Critical patent/DE69601249D1/de
Application granted granted Critical
Publication of DE69601249T2 publication Critical patent/DE69601249T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE69601249T 1995-06-02 1996-05-31 Mit Wasser entwickelbare, fotoempfindliche Harzzusammensetzung Expired - Lifetime DE69601249T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7136551A JPH08328248A (ja) 1995-06-02 1995-06-02 水現像性感光性樹脂組成物

Publications (2)

Publication Number Publication Date
DE69601249D1 true DE69601249D1 (de) 1999-02-11
DE69601249T2 DE69601249T2 (de) 1999-06-10

Family

ID=15177871

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69601249T Expired - Lifetime DE69601249T2 (de) 1995-06-02 1996-05-31 Mit Wasser entwickelbare, fotoempfindliche Harzzusammensetzung

Country Status (4)

Country Link
US (1) US5861232A (de)
EP (1) EP0745900B1 (de)
JP (1) JPH08328248A (de)
DE (1) DE69601249T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000305267A (ja) * 1999-04-22 2000-11-02 Jsr Corp 感光性樹脂組成物
US6312870B1 (en) 2000-07-19 2001-11-06 Arch Specialty Chemicals, Inc. t-butyl cinnamate polymers and their use in photoresist compositions
CA2430101C (en) 2000-11-28 2009-05-26 Asahi Kasei Kabushiki Kaisha Improved photosensitive resin for flexographic printing developable with an aqueous developer solution
JP4627871B2 (ja) * 2000-11-28 2011-02-09 旭化成イーマテリアルズ株式会社 水系現像可能なフレキソ印刷用感光性樹脂
US6579664B2 (en) * 2001-03-30 2003-06-17 Napp Systems, Inc. High performance, photoimageable resin compositions and printing plates prepared therefrom
US7338748B2 (en) 2002-09-30 2008-03-04 Fujifilm Corporation Polymerizable composition and planographic printing plate precursor
JP2004123775A (ja) * 2002-09-30 2004-04-22 Taiyo Ink Mfg Ltd 感光性熱硬化性ペースト組成物
JP4291638B2 (ja) * 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP4355944B2 (ja) * 2004-04-16 2009-11-04 信越化学工業株式会社 パターン形成方法及びこれに用いるレジスト上層膜材料
JP4697406B2 (ja) * 2004-08-05 2011-06-08 信越化学工業株式会社 高分子化合物，レジスト保護膜材料及びパターン形成方法
ATE517371T1 (de) * 2006-08-25 2011-08-15 Fujifilm Corp Verfahren zur herstellung einer lithographiedruckplatte
JP2010204330A (ja) * 2009-03-03 2010-09-16 Fujifilm Corp 平版印刷版原版
CN109777177B (zh) 2013-03-15 2022-03-15 宣伟投资管理有限公司 耐沾污性的水基组合物
US10221322B2 (en) 2013-03-15 2019-03-05 The Sherwin-Williams Company Dirt pick-up resistant composition
US10196537B2 (en) 2013-03-15 2019-02-05 The Sherwin-Williams Company Dirt pick-up resistant composition
CN117264491A (zh) 2014-09-12 2023-12-22 宣伟投资管理有限公司 耐沾污性的水基涂料组合物
US10738241B2 (en) * 2018-01-23 2020-08-11 Shenzhen China Star Optoelectronics Technology Co., Ltd. Resin composition, cured photoresist and display panel
JP6431999B1 (ja) * 2018-05-22 2018-11-28 デクセリアルズ株式会社 漏油補修材、漏油補修方法、及び、配管
EP3802711A4 (de) 2018-05-29 2022-03-02 Swimc Llc Wässrige zusammensetzungen mit beibehaltung von langfristigem glanz
WO2024117230A1 (ja) * 2022-12-01 2024-06-06 積水化学工業株式会社 光硬化性樹脂組成物、粘着シート、及び、積層体の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2101121B (en) * 1981-05-11 1985-07-10 Daicel Chem Process for producing e-caprolactone-modified hydroxyalkyl acrylate or methacrylate and coating copolymer from the same
JPH0239784B2 (ja) * 1984-10-17 1990-09-07 Japan Synthetic Rubber Co Ltd Kankoseijushisoseibutsu
JPS61181811A (ja) * 1985-02-08 1986-08-14 Japan Synthetic Rubber Co Ltd ランダム共役ジエン系共重合体およびその製造方法
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
US5175076A (en) * 1986-09-22 1992-12-29 Nippon Paint Co., Ltd. Water-developable photosensitive composition for producing relief plates
JPH01179146A (ja) * 1988-01-08 1989-07-17 Tokyo Ohka Kogyo Co Ltd 感光性組成物
JPH01300246A (ja) * 1988-05-28 1989-12-04 Nippon Paint Co Ltd フレキソ印刷用感光性樹脂組成物
JP2750461B2 (ja) * 1989-11-10 1998-05-13 ダイセル化学工業株式会社 光重合性組成物
JP2793068B2 (ja) * 1991-04-24 1998-09-03 日本ペイント株式会社 感光性樹脂組成物
JPH06214386A (ja) * 1993-01-20 1994-08-05 Japan Synthetic Rubber Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
EP0745900A1 (de) 1996-12-04
DE69601249T2 (de) 1999-06-10
JPH08328248A (ja) 1996-12-13
US5861232A (en) 1999-01-19
EP0745900B1 (de) 1998-12-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: JSR CORP., TOKIO/TOKYO, JP