DE69724711D1 - Verfahren und Vorrichtung zur optischen Inspektion - Google Patents
Verfahren und Vorrichtung zur optischen InspektionInfo
- Publication number
- DE69724711D1 DE69724711D1 DE69724711T DE69724711T DE69724711D1 DE 69724711 D1 DE69724711 D1 DE 69724711D1 DE 69724711 T DE69724711 T DE 69724711T DE 69724711 T DE69724711 T DE 69724711T DE 69724711 D1 DE69724711 D1 DE 69724711D1
- Authority
- DE
- Germany
- Prior art keywords
- optical inspection
- inspection
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
Landscapes
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL11887296 | 1996-07-16 | ||
IL11887296A IL118872A (en) | 1996-07-16 | 1996-07-16 | Optical inspection method and apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69724711D1 true DE69724711D1 (de) | 2003-10-16 |
DE69724711T2 DE69724711T2 (de) | 2004-07-15 |
Family
ID=11069086
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69724711T Expired - Fee Related DE69724711T2 (de) | 1996-07-16 | 1997-07-01 | Verfahren und Vorrichtung zur optischen Kontrolle |
Country Status (6)
Country | Link |
---|---|
US (1) | US5892579A (de) |
EP (1) | EP0819933B1 (de) |
JP (1) | JP3958835B2 (de) |
KR (1) | KR100491242B1 (de) |
DE (1) | DE69724711T2 (de) |
IL (1) | IL118872A (de) |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100200734B1 (ko) * | 1996-10-10 | 1999-06-15 | 윤종용 | 에어리얼 이미지 측정 장치 및 방법 |
US6175645B1 (en) * | 1998-01-22 | 2001-01-16 | Applied Materials, Inc. | Optical inspection method and apparatus |
DE19819492A1 (de) * | 1998-04-30 | 1999-11-11 | Leica Microsystems | Meßgerät zur Vermessung von Strukturen auf einem transparenten Substrat |
US6324298B1 (en) | 1998-07-15 | 2001-11-27 | August Technology Corp. | Automated wafer defect inspection system and a process of performing such inspection |
JP2000046750A (ja) * | 1998-07-30 | 2000-02-18 | Advanced Display Inc | 表面欠陥確認装置ならびに該装置を用いた基板欠陥分析方法および液晶表示装置の基板欠陥分析方法 |
US6618136B1 (en) * | 1998-09-07 | 2003-09-09 | Minolta Co., Ltd. | Method and apparatus for visually inspecting transparent body and translucent body |
AU5886299A (en) * | 1998-09-07 | 2000-03-27 | Hamish Alexander Nigel Kennedy | Produce identification system |
US6272018B1 (en) | 1999-02-11 | 2001-08-07 | Original Solutions Inc. | Method for the verification of the polarity and presence of components on a printed circuit board |
US6268093B1 (en) * | 1999-10-13 | 2001-07-31 | Applied Materials, Inc. | Method for reticle inspection using aerial imaging |
US6369888B1 (en) * | 1999-11-17 | 2002-04-09 | Applied Materials, Inc. | Method and apparatus for article inspection including speckle reduction |
US7136159B2 (en) * | 2000-09-12 | 2006-11-14 | Kla-Tencor Technologies Corporation | Excimer laser inspection system |
JP4131899B2 (ja) * | 2000-09-28 | 2008-08-13 | 株式会社東芝 | パターン検査装置 |
US7072502B2 (en) * | 2001-06-07 | 2006-07-04 | Applied Materials, Inc. | Alternating phase-shift mask inspection method and apparatus |
WO2003001318A2 (en) * | 2001-06-26 | 2003-01-03 | Allot Communications Ltd. | Method for filter selection and array matching |
EP2264557A1 (de) * | 2001-07-16 | 2010-12-22 | Werth Messtechnik GmbH | Verfahren zum Messen eines Objektes mit einem Koordinatenmessgerät mit Bildverarbeitungssenor |
WO2003096387A2 (en) | 2002-05-08 | 2003-11-20 | Phoseon Technology, Inc. | High efficiency solid-state light source and methods of use and manufacture |
US6930770B2 (en) * | 2002-08-08 | 2005-08-16 | Applied Materials, Israel, Ltd. | High throughput inspection system and method for generating transmitted and/or reflected images |
US7629993B2 (en) * | 2002-09-30 | 2009-12-08 | Rudolph Technologies, Inc. | Automated wafer defect inspection system using backside illumination |
US7525659B2 (en) * | 2003-01-15 | 2009-04-28 | Negevtech Ltd. | System for detection of water defects |
US7486861B2 (en) * | 2003-01-15 | 2009-02-03 | Negevtech Ltd. | Fiber optical illumination system |
US6892013B2 (en) * | 2003-01-15 | 2005-05-10 | Negevtech Ltd. | Fiber optical illumination system |
JP2004354088A (ja) * | 2003-05-27 | 2004-12-16 | Toshiba Corp | 検査装置及びマスク製造方法 |
US7524085B2 (en) * | 2003-10-31 | 2009-04-28 | Phoseon Technology, Inc. | Series wiring of highly reliable light sources |
US7819550B2 (en) * | 2003-10-31 | 2010-10-26 | Phoseon Technology, Inc. | Collection optics for led array with offset hemispherical or faceted surfaces |
DE10359723B4 (de) * | 2003-12-19 | 2014-03-13 | Vistec Semiconductor Systems Gmbh | Vorrichtung und Verfahren zur Inspektion eines Wafers |
TWI257718B (en) * | 2004-03-18 | 2006-07-01 | Phoseon Technology Inc | Direct cooling of LEDs |
US7638808B2 (en) | 2004-03-18 | 2009-12-29 | Phoseon Technology, Inc. | Micro-reflectors on a substrate for high-density LED array |
JP4596801B2 (ja) * | 2004-03-22 | 2010-12-15 | 株式会社東芝 | マスク欠陥検査装置 |
EP1743384B1 (de) * | 2004-03-30 | 2015-08-05 | Phoseon Technology, Inc. | Led-gruppe mit led-detektoren auf gruppenbasis |
ATE503963T1 (de) * | 2004-04-12 | 2011-04-15 | Phoseon Technology Inc | Hochdichtes led-array |
WO2005100961A2 (en) * | 2004-04-19 | 2005-10-27 | Phoseon Technology, Inc. | Imaging semiconductor strucutures using solid state illumination |
EP1766363A2 (de) * | 2004-07-12 | 2007-03-28 | Negevtech Ltd. | Mehrfachmodus-inspektionsverfahren und vorrichtung |
US20060012781A1 (en) * | 2004-07-14 | 2006-01-19 | Negevtech Ltd. | Programmable spatial filter for wafer inspection |
KR101288758B1 (ko) * | 2004-12-30 | 2013-07-23 | 포세온 테크날러지 인코퍼레이티드 | 산업 공정에서 광원을 사용하는 시스템 및 방법 |
US7804993B2 (en) * | 2005-02-28 | 2010-09-28 | Applied Materials South East Asia Pte. Ltd. | Method and apparatus for detecting defects in wafers including alignment of the wafer images so as to induce the same smear in all images |
US7813541B2 (en) * | 2005-02-28 | 2010-10-12 | Applied Materials South East Asia Pte. Ltd. | Method and apparatus for detecting defects in wafers |
JP4181159B2 (ja) * | 2005-09-29 | 2008-11-12 | 株式会社東芝 | 欠陥検査装置 |
US7642527B2 (en) * | 2005-12-30 | 2010-01-05 | Phoseon Technology, Inc. | Multi-attribute light effects for use in curing and other applications involving photoreactions and processing |
US8031931B2 (en) * | 2006-04-24 | 2011-10-04 | Applied Materials South East Asia Pte. Ltd. | Printed fourier filtering in optical inspection tools |
US7714998B2 (en) * | 2006-11-28 | 2010-05-11 | Applied Materials South East Asia Pte. Ltd. | Image splitting in optical inspection systems |
US7719674B2 (en) * | 2006-11-28 | 2010-05-18 | Applied Materials South East Asia Pte. Ltd. | Image splitting in optical inspection systems |
DE102007000981B4 (de) * | 2007-02-22 | 2020-07-30 | Vistec Semiconductor Systems Gmbh | Vorrichtung und Verfahren zum Vermessen von Strukturen auf einer Maske und zur Berechnung der aus den Strukturen resultierenden Strukturen in einem Photoresist |
US8098372B2 (en) * | 2007-07-23 | 2012-01-17 | Applied Materials South East Asia Pte. Ltd. | Optical inspection tool featuring multiple speed modes |
CN101887030A (zh) * | 2009-05-15 | 2010-11-17 | 圣戈本玻璃法国公司 | 用于检测透明基板表面和/或其内部的缺陷的方法及系统 |
TWI567381B (zh) * | 2009-11-16 | 2017-01-21 | 魯道夫科技股份有限公司 | 接合基板的紅外線檢查 |
JP4919307B1 (ja) * | 2011-05-13 | 2012-04-18 | レーザーテック株式会社 | 基板検査装置及びマスク検査装置 |
US8929406B2 (en) * | 2013-01-24 | 2015-01-06 | Kla-Tencor Corporation | 193NM laser and inspection system |
JP2014157086A (ja) * | 2013-02-15 | 2014-08-28 | Dainippon Screen Mfg Co Ltd | パターン検査装置 |
CN113834818A (zh) * | 2021-09-15 | 2021-12-24 | 江苏维普光电科技有限公司 | 基于频闪切换照明的掩膜版缺陷检测方法及系统 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3892492A (en) * | 1972-10-16 | 1975-07-01 | Loepfe Ag Geb | Optoelectrical apparatus with directional light sources for detecting reflection behaviour of an object |
DE2932660A1 (de) * | 1979-08-11 | 1981-02-26 | Feldmuehle Ag | Verfahren und vorrichtung zum definieren der fehlerart |
JPS57132044A (en) * | 1981-02-10 | 1982-08-16 | Hitachi Metals Ltd | Discriminating method of surface defect |
JPS5821110A (ja) * | 1981-07-29 | 1983-02-07 | Nippon Kogaku Kk <Nikon> | パタ−ン検査装置 |
JPS58162038A (ja) * | 1982-03-23 | 1983-09-26 | Canon Inc | 面状態検査装置 |
US4952058A (en) * | 1987-04-27 | 1990-08-28 | Hitach, Ltd. | Method and apparatus for detecting abnormal patterns |
US5235400A (en) * | 1988-10-12 | 1993-08-10 | Hitachi, Ltd. | Method of and apparatus for detecting defect on photomask |
JP2822243B2 (ja) * | 1989-12-20 | 1998-11-11 | 株式会社ニコン | 欠陥検査装置 |
DE69124288T2 (de) * | 1990-05-30 | 1997-05-07 | Dainippon Screen Mfg | Verfahren zum Lesen einer optischen Abbildung einer untersuchten Oberfläche und dafür einsetzbare Bildleseeinrichtung |
IL95205A0 (en) * | 1990-07-27 | 1991-06-10 | Optrotech Ltd | Method and apparatus for optical inspection of substrates |
US5586058A (en) * | 1990-12-04 | 1996-12-17 | Orbot Instruments Ltd. | Apparatus and method for inspection of a patterned object by comparison thereof to a reference |
IL125217A (en) * | 1990-12-04 | 1999-10-28 | Orbot Instr Ltd | Apparatus and method for microscopic inspection of articles |
JPH04339244A (ja) * | 1991-03-18 | 1992-11-26 | Canon Inc | 表面状態検査装置 |
US5563702A (en) * | 1991-08-22 | 1996-10-08 | Kla Instruments Corporation | Automated photomask inspection apparatus and method |
EP0532927B1 (de) * | 1991-08-22 | 1996-02-21 | Kla Instruments Corporation | Gerät zur automatischen Prüfung von Photomaske |
DE69208413T2 (de) * | 1991-08-22 | 1996-11-14 | Kla Instr Corp | Gerät zur automatischen Prüfung von Photomaske |
US5495337A (en) * | 1991-11-06 | 1996-02-27 | Machine Vision Products, Inc. | Method of visualizing minute particles |
JPH05296937A (ja) * | 1992-04-23 | 1993-11-12 | Nikon Corp | 異物検査装置 |
JPH08137093A (ja) * | 1994-09-16 | 1996-05-31 | Toshiba Corp | 欠陥検査装置 |
-
1996
- 1996-07-16 IL IL11887296A patent/IL118872A/xx not_active IP Right Cessation
-
1997
- 1997-04-16 US US08/843,453 patent/US5892579A/en not_active Expired - Lifetime
- 1997-07-01 EP EP97304746A patent/EP0819933B1/de not_active Expired - Lifetime
- 1997-07-01 DE DE69724711T patent/DE69724711T2/de not_active Expired - Fee Related
- 1997-07-10 KR KR1019970032033A patent/KR100491242B1/ko not_active IP Right Cessation
- 1997-07-11 JP JP18615997A patent/JP3958835B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69724711T2 (de) | 2004-07-15 |
IL118872A (en) | 2000-06-01 |
US5892579A (en) | 1999-04-06 |
EP0819933A2 (de) | 1998-01-21 |
KR980010480A (ko) | 1998-04-30 |
EP0819933A3 (de) | 1998-06-17 |
JP3958835B2 (ja) | 2007-08-15 |
EP0819933B1 (de) | 2003-09-10 |
IL118872A0 (en) | 1996-10-31 |
JPH10123059A (ja) | 1998-05-15 |
KR100491242B1 (ko) | 2005-09-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |