DE69724711D1 - Verfahren und Vorrichtung zur optischen Inspektion - Google Patents

Verfahren und Vorrichtung zur optischen Inspektion

Info

Publication number
DE69724711D1
DE69724711D1 DE69724711T DE69724711T DE69724711D1 DE 69724711 D1 DE69724711 D1 DE 69724711D1 DE 69724711 T DE69724711 T DE 69724711T DE 69724711 T DE69724711 T DE 69724711T DE 69724711 D1 DE69724711 D1 DE 69724711D1
Authority
DE
Germany
Prior art keywords
optical inspection
inspection
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69724711T
Other languages
English (en)
Other versions
DE69724711T2 (de
Inventor
Emanuel Elyasaf
Yair Eran
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orbot Instruments Ltd
Original Assignee
Orbot Instruments Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbot Instruments Ltd filed Critical Orbot Instruments Ltd
Application granted granted Critical
Publication of DE69724711D1 publication Critical patent/DE69724711D1/de
Publication of DE69724711T2 publication Critical patent/DE69724711T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination

Landscapes

  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE69724711T 1996-07-16 1997-07-01 Verfahren und Vorrichtung zur optischen Kontrolle Expired - Fee Related DE69724711T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL11887296 1996-07-16
IL11887296A IL118872A (en) 1996-07-16 1996-07-16 Optical inspection method and apparatus

Publications (2)

Publication Number Publication Date
DE69724711D1 true DE69724711D1 (de) 2003-10-16
DE69724711T2 DE69724711T2 (de) 2004-07-15

Family

ID=11069086

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69724711T Expired - Fee Related DE69724711T2 (de) 1996-07-16 1997-07-01 Verfahren und Vorrichtung zur optischen Kontrolle

Country Status (6)

Country Link
US (1) US5892579A (de)
EP (1) EP0819933B1 (de)
JP (1) JP3958835B2 (de)
KR (1) KR100491242B1 (de)
DE (1) DE69724711T2 (de)
IL (1) IL118872A (de)

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US7136159B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Excimer laser inspection system
JP4131899B2 (ja) * 2000-09-28 2008-08-13 株式会社東芝 パターン検査装置
US7072502B2 (en) * 2001-06-07 2006-07-04 Applied Materials, Inc. Alternating phase-shift mask inspection method and apparatus
WO2003001318A2 (en) * 2001-06-26 2003-01-03 Allot Communications Ltd. Method for filter selection and array matching
EP2264557A1 (de) * 2001-07-16 2010-12-22 Werth Messtechnik GmbH Verfahren zum Messen eines Objektes mit einem Koordinatenmessgerät mit Bildverarbeitungssenor
WO2003096387A2 (en) 2002-05-08 2003-11-20 Phoseon Technology, Inc. High efficiency solid-state light source and methods of use and manufacture
US6930770B2 (en) * 2002-08-08 2005-08-16 Applied Materials, Israel, Ltd. High throughput inspection system and method for generating transmitted and/or reflected images
US7629993B2 (en) * 2002-09-30 2009-12-08 Rudolph Technologies, Inc. Automated wafer defect inspection system using backside illumination
US7525659B2 (en) * 2003-01-15 2009-04-28 Negevtech Ltd. System for detection of water defects
US7486861B2 (en) * 2003-01-15 2009-02-03 Negevtech Ltd. Fiber optical illumination system
US6892013B2 (en) * 2003-01-15 2005-05-10 Negevtech Ltd. Fiber optical illumination system
JP2004354088A (ja) * 2003-05-27 2004-12-16 Toshiba Corp 検査装置及びマスク製造方法
US7524085B2 (en) * 2003-10-31 2009-04-28 Phoseon Technology, Inc. Series wiring of highly reliable light sources
US7819550B2 (en) * 2003-10-31 2010-10-26 Phoseon Technology, Inc. Collection optics for led array with offset hemispherical or faceted surfaces
DE10359723B4 (de) * 2003-12-19 2014-03-13 Vistec Semiconductor Systems Gmbh Vorrichtung und Verfahren zur Inspektion eines Wafers
TWI257718B (en) * 2004-03-18 2006-07-01 Phoseon Technology Inc Direct cooling of LEDs
US7638808B2 (en) 2004-03-18 2009-12-29 Phoseon Technology, Inc. Micro-reflectors on a substrate for high-density LED array
JP4596801B2 (ja) * 2004-03-22 2010-12-15 株式会社東芝 マスク欠陥検査装置
EP1743384B1 (de) * 2004-03-30 2015-08-05 Phoseon Technology, Inc. Led-gruppe mit led-detektoren auf gruppenbasis
ATE503963T1 (de) * 2004-04-12 2011-04-15 Phoseon Technology Inc Hochdichtes led-array
WO2005100961A2 (en) * 2004-04-19 2005-10-27 Phoseon Technology, Inc. Imaging semiconductor strucutures using solid state illumination
EP1766363A2 (de) * 2004-07-12 2007-03-28 Negevtech Ltd. Mehrfachmodus-inspektionsverfahren und vorrichtung
US20060012781A1 (en) * 2004-07-14 2006-01-19 Negevtech Ltd. Programmable spatial filter for wafer inspection
KR101288758B1 (ko) * 2004-12-30 2013-07-23 포세온 테크날러지 인코퍼레이티드 산업 공정에서 광원을 사용하는 시스템 및 방법
US7804993B2 (en) * 2005-02-28 2010-09-28 Applied Materials South East Asia Pte. Ltd. Method and apparatus for detecting defects in wafers including alignment of the wafer images so as to induce the same smear in all images
US7813541B2 (en) * 2005-02-28 2010-10-12 Applied Materials South East Asia Pte. Ltd. Method and apparatus for detecting defects in wafers
JP4181159B2 (ja) * 2005-09-29 2008-11-12 株式会社東芝 欠陥検査装置
US7642527B2 (en) * 2005-12-30 2010-01-05 Phoseon Technology, Inc. Multi-attribute light effects for use in curing and other applications involving photoreactions and processing
US8031931B2 (en) * 2006-04-24 2011-10-04 Applied Materials South East Asia Pte. Ltd. Printed fourier filtering in optical inspection tools
US7714998B2 (en) * 2006-11-28 2010-05-11 Applied Materials South East Asia Pte. Ltd. Image splitting in optical inspection systems
US7719674B2 (en) * 2006-11-28 2010-05-18 Applied Materials South East Asia Pte. Ltd. Image splitting in optical inspection systems
DE102007000981B4 (de) * 2007-02-22 2020-07-30 Vistec Semiconductor Systems Gmbh Vorrichtung und Verfahren zum Vermessen von Strukturen auf einer Maske und zur Berechnung der aus den Strukturen resultierenden Strukturen in einem Photoresist
US8098372B2 (en) * 2007-07-23 2012-01-17 Applied Materials South East Asia Pte. Ltd. Optical inspection tool featuring multiple speed modes
CN101887030A (zh) * 2009-05-15 2010-11-17 圣戈本玻璃法国公司 用于检测透明基板表面和/或其内部的缺陷的方法及系统
TWI567381B (zh) * 2009-11-16 2017-01-21 魯道夫科技股份有限公司 接合基板的紅外線檢查
JP4919307B1 (ja) * 2011-05-13 2012-04-18 レーザーテック株式会社 基板検査装置及びマスク検査装置
US8929406B2 (en) * 2013-01-24 2015-01-06 Kla-Tencor Corporation 193NM laser and inspection system
JP2014157086A (ja) * 2013-02-15 2014-08-28 Dainippon Screen Mfg Co Ltd パターン検査装置
CN113834818A (zh) * 2021-09-15 2021-12-24 江苏维普光电科技有限公司 基于频闪切换照明的掩膜版缺陷检测方法及系统

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JPS57132044A (en) * 1981-02-10 1982-08-16 Hitachi Metals Ltd Discriminating method of surface defect
JPS5821110A (ja) * 1981-07-29 1983-02-07 Nippon Kogaku Kk <Nikon> パタ−ン検査装置
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US4952058A (en) * 1987-04-27 1990-08-28 Hitach, Ltd. Method and apparatus for detecting abnormal patterns
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JP2822243B2 (ja) * 1989-12-20 1998-11-11 株式会社ニコン 欠陥検査装置
DE69124288T2 (de) * 1990-05-30 1997-05-07 Dainippon Screen Mfg Verfahren zum Lesen einer optischen Abbildung einer untersuchten Oberfläche und dafür einsetzbare Bildleseeinrichtung
IL95205A0 (en) * 1990-07-27 1991-06-10 Optrotech Ltd Method and apparatus for optical inspection of substrates
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EP0532927B1 (de) * 1991-08-22 1996-02-21 Kla Instruments Corporation Gerät zur automatischen Prüfung von Photomaske
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US5495337A (en) * 1991-11-06 1996-02-27 Machine Vision Products, Inc. Method of visualizing minute particles
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JPH08137093A (ja) * 1994-09-16 1996-05-31 Toshiba Corp 欠陥検査装置

Also Published As

Publication number Publication date
DE69724711T2 (de) 2004-07-15
IL118872A (en) 2000-06-01
US5892579A (en) 1999-04-06
EP0819933A2 (de) 1998-01-21
KR980010480A (ko) 1998-04-30
EP0819933A3 (de) 1998-06-17
JP3958835B2 (ja) 2007-08-15
EP0819933B1 (de) 2003-09-10
IL118872A0 (en) 1996-10-31
JPH10123059A (ja) 1998-05-15
KR100491242B1 (ko) 2005-09-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee