DE69722876D1 - Vorrichtung und Verfahren zur optischen Profilmessung - Google Patents

Vorrichtung und Verfahren zur optischen Profilmessung

Info

Publication number
DE69722876D1
DE69722876D1 DE69722876T DE69722876T DE69722876D1 DE 69722876 D1 DE69722876 D1 DE 69722876D1 DE 69722876 T DE69722876 T DE 69722876T DE 69722876 T DE69722876 T DE 69722876T DE 69722876 D1 DE69722876 D1 DE 69722876D1
Authority
DE
Germany
Prior art keywords
profile measurement
optical profile
optical
measurement
profile
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69722876T
Other languages
English (en)
Other versions
DE69722876T2 (de
Inventor
Huizong Lu
Ali Reza Taheri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE69722876D1 publication Critical patent/DE69722876D1/de
Application granted granted Critical
Publication of DE69722876T2 publication Critical patent/DE69722876T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9506—Optical discs

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
DE69722876T 1996-09-23 1997-08-28 Vorrichtung und Verfahren zur optischen Profilmessung Expired - Fee Related DE69722876T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US710807 1996-09-23
US08/710,807 US5784163A (en) 1996-09-23 1996-09-23 Optical differential profile measurement apparatus and process

Publications (2)

Publication Number Publication Date
DE69722876D1 true DE69722876D1 (de) 2003-07-24
DE69722876T2 DE69722876T2 (de) 2004-05-13

Family

ID=24855631

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69722876T Expired - Fee Related DE69722876T2 (de) 1996-09-23 1997-08-28 Vorrichtung und Verfahren zur optischen Profilmessung

Country Status (5)

Country Link
US (1) US5784163A (de)
EP (1) EP0831295B1 (de)
KR (1) KR100245064B1 (de)
DE (1) DE69722876T2 (de)
TW (1) TW331587B (de)

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* Cited by examiner, † Cited by third party
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US6396941B1 (en) * 1996-08-23 2002-05-28 Bacus Research Laboratories, Inc. Method and apparatus for internet, intranet, and local viewing of virtual microscope slides
US5987189A (en) * 1996-12-20 1999-11-16 Wyko Corporation Method of combining multiple sets of overlapping surface-profile interferometric data to produce a continuous composite map
FR2760085B1 (fr) * 1997-02-26 1999-05-14 Instruments Sa Dispositif et procede de mesures tridimensionnelles et d'observation in situ d'une couche superficielle deposee sur un empilement de couches minces
JP4246326B2 (ja) * 1999-08-27 2009-04-02 東レエンジニアリング株式会社 表面形状測定方法及びその装置
US6992773B1 (en) 1999-08-30 2006-01-31 Advanced Micro Devices, Inc. Dual-differential interferometry for silicon device damage detection
US6700670B1 (en) 2000-05-23 2004-03-02 Nanometrics Incorporated Method of measuring dishing using relative height measurements
US6710888B1 (en) 2000-05-23 2004-03-23 Nanometrics Incorporated Method of measuring dishing
US6636301B1 (en) 2000-08-10 2003-10-21 Kla-Tencor Corporation Multiple beam inspection apparatus and method
WO2002014846A2 (en) * 2000-08-10 2002-02-21 Kla-Tencor Corporation Multiple beam inspection apparatus and method
US6879390B1 (en) 2000-08-10 2005-04-12 Kla-Tencor Technologies Corporation Multiple beam inspection apparatus and method
US6568290B1 (en) 2000-08-10 2003-05-27 Nanometrics Incorporated Method of measuring dishing using relative height measurement
US6633389B1 (en) 2000-11-28 2003-10-14 Nanometrics Incorporated Profiling method
US6580515B1 (en) 2001-05-29 2003-06-17 Nanometrics Incorporated Surface profiling using a differential interferometer
US7129508B2 (en) * 2002-01-18 2006-10-31 Honeywell International Inc. Compact VCSEL sensor with multiple sensing capabilities
US7019840B2 (en) * 2003-06-17 2006-03-28 Seagate Technology Llc Dual-beam interferometer for ultra-smooth surface topographical measurements
DE102004001411B4 (de) * 2004-01-09 2006-05-11 Infineon Technologies Ag Verfahren und Vorrichtung zum Bestimmen von Defekten in einer regelmäßigen Struktur
US20050254065A1 (en) * 2004-05-12 2005-11-17 Stokowski Stanley E Method and apparatus for detecting surface characteristics on a mask blank
TWI394930B (zh) * 2005-05-19 2013-05-01 Zygo Corp 取得薄膜結構資訊之低同調干涉信號的分析方法及裝置
US8243281B2 (en) * 2007-09-25 2012-08-14 Carl Zeiss Smt Gmbh Method and system for measuring a surface of an object
TWI405959B (zh) * 2008-12-31 2013-08-21 Hannstar Display Corp 利用穿透式外差干涉術量測異方性物質之物理參數的裝置及方法
TWI407078B (zh) * 2010-06-08 2013-09-01 Chung Shan Inst Of Science Micro - lens array surface profile detection system and its detection method
US9535200B2 (en) * 2012-12-19 2017-01-03 The Aerospace Corporate Complete-stokes fourier-domain imaging polarimeter
TWI579525B (zh) * 2015-12-23 2017-04-21 國立臺灣大學 運動物件之絕對定位距離與偏擺角度同步量測之光學系統與方法
KR101873966B1 (ko) * 2016-11-10 2018-07-04 한양대학교 에리카산학협력단 타원해석기
JP7116568B2 (ja) * 2018-03-27 2022-08-10 株式会社トプコン レーザ媒質の選別方法及び照射位置検出装置
CN112414326B (zh) * 2020-11-10 2022-05-20 浙江华睿科技股份有限公司 物体表面平整度的检测方法、装置、电子装置和存储介质
IL294457B2 (en) * 2022-06-30 2023-12-01 Nova Ltd Systems and methods for optical measurement of sample properties using polarized rays.

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2133687A1 (de) * 1971-07-07 1973-01-25 Ibm Deutschland Anordnung zur stabilisierung der optischen weglaengendifferenz
FR2300998A2 (fr) * 1975-02-11 1976-09-10 Anvar Dispositif pour la spectrometrie interferentielle a modulation selective
DE2851750B1 (de) * 1978-11-30 1980-03-06 Ibm Deutschland Verfahren und Vorrichtung zur Messung der Ebenheit der Rauhigkeit oder des Kruemmungsradius einer Messflaeche
US4353650A (en) * 1980-06-16 1982-10-12 The United States Of America As Represented By The United States Department Of Energy Laser heterodyne surface profiler
US4534649A (en) * 1981-10-30 1985-08-13 Downs Michael J Surface profile interferometer
JPS62211503A (ja) * 1986-03-13 1987-09-17 Hitachi Ltd 段差計測装置
US4844616A (en) * 1988-05-31 1989-07-04 International Business Machines Corporation Interferometric dimensional measurement and defect detection method
US5122648A (en) * 1990-06-01 1992-06-16 Wyko Corporation Apparatus and method for automatically focusing an interference microscope
US5469259A (en) * 1994-01-03 1995-11-21 International Business Machines Corporation Inspection interferometer with scanning autofocus, and phase angle control features
US5557399A (en) * 1995-03-22 1996-09-17 Zygo Corporation Optical gap measuring apparatus and method

Also Published As

Publication number Publication date
US5784163A (en) 1998-07-21
EP0831295B1 (de) 2003-06-18
DE69722876T2 (de) 2004-05-13
EP0831295A1 (de) 1998-03-25
KR100245064B1 (ko) 2000-03-02
TW331587B (en) 1998-05-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee