DE69621264T2 - Vielfachschicht Strukturen für optische Elemente im Bereich weicher Röntgenstrahlung - Google Patents

Vielfachschicht Strukturen für optische Elemente im Bereich weicher Röntgenstrahlung

Info

Publication number
DE69621264T2
DE69621264T2 DE69621264T DE69621264T DE69621264T2 DE 69621264 T2 DE69621264 T2 DE 69621264T2 DE 69621264 T DE69621264 T DE 69621264T DE 69621264 T DE69621264 T DE 69621264T DE 69621264 T2 DE69621264 T2 DE 69621264T2
Authority
DE
Germany
Prior art keywords
rays
soft
area
optical elements
layer structures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69621264T
Other languages
English (en)
Other versions
DE69621264D1 (de
Inventor
Hiroshi Kumagai
Kouichi Toyoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Publication of DE69621264D1 publication Critical patent/DE69621264D1/de
Application granted granted Critical
Publication of DE69621264T2 publication Critical patent/DE69621264T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
DE69621264T 1995-01-19 1996-01-18 Vielfachschicht Strukturen für optische Elemente im Bereich weicher Röntgenstrahlung Expired - Fee Related DE69621264T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7024706A JP2906118B2 (ja) 1995-01-19 1995-01-19 軟ｘ線光学素子用多層膜構造

Publications (2)

Publication Number Publication Date
DE69621264D1 DE69621264D1 (de) 2002-06-27
DE69621264T2 true DE69621264T2 (de) 2003-04-03

Family

ID=12145629

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69621264T Expired - Fee Related DE69621264T2 (de) 1995-01-19 1996-01-18 Vielfachschicht Strukturen für optische Elemente im Bereich weicher Röntgenstrahlung

Country Status (4)

Country Link
US (1) US5945204A (de)
EP (2) EP0723273B1 (de)
JP (1) JP2906118B2 (de)
DE (1) DE69621264T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1018139C2 (nl) * 2001-05-23 2002-11-26 Stichting Fund Ond Material Meerlagenspiegel voor straling in het XUV-golflengtegebied en werkwijze voor de vervaardiging daarvan.
CA2492890A1 (en) * 2002-07-30 2004-02-05 Stephen John Henderson High reflectivity and high flux x-ray optic element and method of making same using atomic layer deposition techniques
JP2005083862A (ja) * 2003-09-08 2005-03-31 Canon Inc 光学薄膜およびこれを用いたミラー
EP3159912A1 (de) * 2007-01-25 2017-04-26 Nikon Corporation Optisches element, belichtungsvorrichtung mit verwendung davon und vorrichtungsherstellungsverfahren
DE102008040265A1 (de) * 2008-07-09 2010-01-14 Carl Zeiss Smt Ag Reflektives optisches Element und Verfahren zu seiner Herstellung
JP5751573B2 (ja) * 2010-10-21 2015-07-22 公立大学法人首都大学東京 中性子の集光および結像光学系、ならびにその製造方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4684565A (en) * 1984-11-20 1987-08-04 Exxon Research And Engineering Company X-ray mirrors made from multi-layered material
US4675889A (en) * 1985-07-08 1987-06-23 Ovonic Synthetic Materials Company, Inc. Multiple wavelength X-ray dispersive devices and method of making the devices
US5310603A (en) * 1986-10-01 1994-05-10 Canon Kabushiki Kaisha Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray
JPS63266397A (ja) * 1987-04-24 1988-11-02 Seiko Instr & Electronics Ltd Ｘ線反射鏡
JPS63266399A (ja) * 1987-04-24 1988-11-02 Seiko Instr & Electronics Ltd Ｘ線反射鏡
JPS63271200A (ja) * 1987-04-28 1988-11-09 Seiko Instr & Electronics Ltd Ｘ線反射鏡
JPH01296200A (ja) * 1988-05-24 1989-11-29 Agency Of Ind Science & Technol 軟ｘ線用多層膜反射鏡
JPH0240600A (ja) * 1988-07-30 1990-02-09 Nikon Corp 多層膜反射鏡
JPH0242399A (ja) * 1988-08-02 1990-02-13 Agency Of Ind Science & Technol 軟ｘ線用多層膜反射鏡
JPH0256000A (ja) * 1988-08-22 1990-02-26 Nikon Corp 軟ｘ線顕微鏡用多層膜反射鏡
JP2883100B2 (ja) * 1989-05-22 1999-04-19 キヤノン株式会社 軟ｘ線・真空紫外線用ハーフミラー又はビームスプリッター
JPH0321897A (ja) * 1989-06-20 1991-01-30 Olympus Optical Co Ltd Ｘ線用多層膜反射鏡
US5170291A (en) * 1989-12-19 1992-12-08 Leybold Aktiengesellschaft Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating
JPH03206999A (ja) * 1990-01-10 1991-09-10 Japan Aviation Electron Ind Ltd 軟ｘ線多層膜反射鏡
DE69122554T2 (de) * 1990-07-05 1997-02-13 Asahi Glass Co Ltd Beschichtung mit geringem Emissionsvermögen
JPH0476498A (ja) * 1990-07-18 1992-03-11 Seiko Instr Inc Ｘ線反射鏡
US5091244A (en) * 1990-08-10 1992-02-25 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
US5270858A (en) * 1990-10-11 1993-12-14 Viratec Thin Films Inc D.C. reactively sputtered antireflection coatings
JPH04169899A (ja) * 1990-11-02 1992-06-17 Seiko Instr Inc Ｘ線反射鏡
JPH04326098A (ja) * 1991-04-25 1992-11-16 Nikon Corp 多層膜反射鏡
JP3060624B2 (ja) * 1991-08-09 2000-07-10 株式会社ニコン 多層膜反射鏡
JPH06148399A (ja) * 1992-11-05 1994-05-27 Nikon Corp Ｘ線用多層膜ミラーおよびｘ線顕微鏡
JPH075298A (ja) * 1993-06-15 1995-01-10 Nikon Corp Ｘ線多層膜反射鏡

Also Published As

Publication number Publication date
EP0723273B1 (de) 2002-05-22
JPH08199342A (ja) 1996-08-06
DE69621264D1 (de) 2002-06-27
EP1091360A2 (de) 2001-04-11
EP0723273A2 (de) 1996-07-24
EP0723273A3 (de) 1997-04-09
US5945204A (en) 1999-08-31
JP2906118B2 (ja) 1999-06-14
EP1091360A3 (de) 2003-05-07

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Legal Events

Date Code Title Description
8370 Indication related to discontinuation of the patent is to be deleted
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee