DE69609907T2 - Verfahren zur Herstellung fehlerfreier Einkristalle mit grösserer Ausbringung - Google Patents

Verfahren zur Herstellung fehlerfreier Einkristalle mit grösserer Ausbringung

Info

Publication number
DE69609907T2
DE69609907T2 DE69609907T DE69609907T DE69609907T2 DE 69609907 T2 DE69609907 T2 DE 69609907T2 DE 69609907 T DE69609907 T DE 69609907T DE 69609907 T DE69609907 T DE 69609907T DE 69609907 T2 DE69609907 T2 DE 69609907T2
Authority
DE
Germany
Prior art keywords
production
single crystals
larger output
flawless single
flawless
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69609907T
Other languages
English (en)
Other versions
DE69609907D1 (de
Inventor
Richard L Hansen
Robert D Shelley
Larry E Drafall
Robert M Mccutchan
John D Holder
Leon A Allan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SunEdison Inc
General Electric Co
Original Assignee
SunEdison Inc
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SunEdison Inc, General Electric Co filed Critical SunEdison Inc
Application granted granted Critical
Publication of DE69609907D1 publication Critical patent/DE69609907D1/de
Publication of DE69609907T2 publication Critical patent/DE69609907T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002Crucibles or containers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
DE69609907T 1995-06-14 1996-06-10 Verfahren zur Herstellung fehlerfreier Einkristalle mit grösserer Ausbringung Expired - Lifetime DE69609907T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/490,473 US5980629A (en) 1995-06-14 1995-06-14 Methods for improving zero dislocation yield of single crystals

Publications (2)

Publication Number Publication Date
DE69609907D1 DE69609907D1 (de) 2000-09-28
DE69609907T2 true DE69609907T2 (de) 2000-12-21

Family

ID=23948209

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69609907T Expired - Lifetime DE69609907T2 (de) 1995-06-14 1996-06-10 Verfahren zur Herstellung fehlerfreier Einkristalle mit grösserer Ausbringung

Country Status (9)

Country Link
US (1) US5980629A (de)
EP (1) EP0753605B1 (de)
JP (1) JP3054362B2 (de)
KR (1) KR100408906B1 (de)
CN (1) CN1087362C (de)
DE (1) DE69609907T2 (de)
MY (1) MY113247A (de)
SG (1) SG55205A1 (de)
TW (1) TW302499B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11162186B2 (en) 2016-09-23 2021-11-02 Sumco Corporation Quartz glass crucible, manufacturing method thereof, and manufacturing method of silicon single crystal using quartz glass crucible

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0892091A1 (de) * 1997-07-03 1999-01-20 MEMC Electronic Materials, Inc. Graphit Stütztiegel mit geringer Konzentration an Calziumverunreinigungen und seine Verwendung zur Herstellung Siliziumeinkristallen
EP0911429A1 (de) * 1997-09-30 1999-04-28 Heraeus Quarzglas GmbH Quarzglastiegel zum Herstellen Siliciumeinkristall sowie Verfahren zu seiner Herstellung
US6319313B1 (en) * 1999-03-15 2001-11-20 Memc Electronic Materials, Inc. Barium doping of molten silicon for use in crystal growing process
US6350312B1 (en) * 1999-03-15 2002-02-26 Memc Electronic Materials, Inc. Strontium doping of molten silicon for use in crystal growing process
DE19943103A1 (de) 1999-09-09 2001-03-15 Wacker Chemie Gmbh Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung
US6302957B1 (en) * 1999-10-05 2001-10-16 Sumitomo Metal Industries, Ltd. Quartz crucible reproducing method
US6344083B1 (en) 2000-02-14 2002-02-05 Memc Electronic Materials, Inc. Process for producing a silicon melt
US6749683B2 (en) 2000-02-14 2004-06-15 Memc Electronic Materials, Inc. Process for producing a silicon melt
US6632413B2 (en) 2000-08-21 2003-10-14 Astropower, Inc. Method for purifying silicon
AUPR054000A0 (en) * 2000-10-04 2000-10-26 Austai Motors Designing Pty Ltd A planetary gear apparatus
WO2002040732A1 (en) * 2000-11-15 2002-05-23 G.T. Equipment Technologies Inc. A protective layer for quartz crucibles used for silicon crystallization
US20020076501A1 (en) * 2000-11-15 2002-06-20 Michael Costantini Crucible coating system
US6491971B2 (en) * 2000-11-15 2002-12-10 G.T. Equipment Technologies, Inc Release coating system for crucibles
US20040118156A1 (en) * 2001-03-08 2004-06-24 Gabriele Korus Method of producing a quartz glass crucible
US6755049B2 (en) * 2001-03-08 2004-06-29 Heraeus Quarzglas Gmbh & Co. Kg Method of producing a quartz glass crucible
US7118789B2 (en) 2001-07-16 2006-10-10 Heraeus Shin-Etsu America Silica glass crucible
US6641663B2 (en) 2001-12-12 2003-11-04 Heracus Shin-Estu America Silica crucible with inner layer crystallizer and method
US20030024467A1 (en) * 2001-08-02 2003-02-06 Memc Electronic Materials, Inc. Method of eliminating near-surface bubbles in quartz crucibles
US6712901B2 (en) * 2001-10-16 2004-03-30 Japan Super Quartz Corporation Surface modification process of quartz glass crucible
DE10156137B4 (de) * 2001-11-15 2004-08-19 Wacker-Chemie Gmbh Verfahren zur Herstellung eines Kieselglastiegels mit kristallinen Bereichen aus einem porösen Kieselglasgrünkörper
US6875515B2 (en) * 2002-05-10 2005-04-05 General Electric Company Fused quartz article having controlled devitrification
JP4086283B2 (ja) * 2002-07-31 2008-05-14 信越石英株式会社 シリコン単結晶引上げ用石英ガラスルツボおよびその製造方法
JP4444559B2 (ja) * 2002-10-09 2010-03-31 ジャパンスーパークォーツ株式会社 石英ガラスルツボの強化方法とシリコン単結晶の引き上げ方法
DE10339676A1 (de) * 2003-08-28 2005-03-24 Wacker-Chemie Gmbh SiO2-Formkörper, Verfahren zu ihrer Herstellung und Verwendung
US8105457B2 (en) * 2003-12-22 2012-01-31 Asml Netherlands B.V. Method for joining at least a first member and a second member, lithographic apparatus and device manufacturing method, as well as a device manufactured thereby
US7497907B2 (en) * 2004-07-23 2009-03-03 Memc Electronic Materials, Inc. Partially devitrified crucible
JP4517953B2 (ja) * 2005-06-22 2010-08-04 株式会社Sumco シリコン単結晶の製造方法
US7383696B2 (en) * 2005-09-08 2008-06-10 Heraeus Shin-Etsu America, Inc. Silica glass crucible with bubble-free and reduced bubble growth wall
US7427327B2 (en) * 2005-09-08 2008-09-23 Heraeus Shin-Etsu America, Inc. Silica glass crucible with barium-doped inner wall
TW200730672A (en) * 2005-11-29 2007-08-16 Japan Super Quartz Corp Quartz glass crucible, method of producing the same, and application thereof
JP4994647B2 (ja) * 2005-11-30 2012-08-08 ジャパンスーパークォーツ株式会社 結晶化し易い石英ガラス部材とその用途
US7716948B2 (en) * 2006-12-18 2010-05-18 Heraeus Shin-Etsu America, Inc. Crucible having a doped upper wall portion and method for making the same
US20090120353A1 (en) * 2007-11-13 2009-05-14 Memc Electronic Materials, Inc. Reduction of air pockets in silicon crystals by avoiding the introduction of nearly-insoluble gases into the melt
JP2011088755A (ja) 2008-03-14 2011-05-06 Japan Siper Quarts Corp 石英ガラスルツボおよびその製造方法
JP4985554B2 (ja) * 2008-06-16 2012-07-25 三菱マテリアル株式会社 シリコン溶融用ルツボ及びシリコン単結晶引上装置
US20100095880A1 (en) * 2008-10-17 2010-04-22 Japan Super Quartz Corporation Arc melting high-purity carbon electrode and application thereof
DE102009013715B4 (de) 2009-03-20 2013-07-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Quarzglaskörpers, insbesondere eines Quarzglastiegels
JP2012533507A (ja) * 2009-07-16 2012-12-27 エムイーエムシー・シンガポール・プライベイト・リミテッド 被覆坩堝並びに被覆坩堝の作製および使用方法
JP5058378B2 (ja) * 2009-09-09 2012-10-24 ジャパンスーパークォーツ株式会社 複合ルツボ
US20110210470A1 (en) * 2010-02-26 2011-09-01 6N Silicon Inc. Crucible and method for furnace capacity utilization
CN101811832B (zh) * 2010-05-10 2012-10-03 宁波宝斯达坩埚保温制品有限公司 石英坩埚内表面处理工艺
FR2963341B1 (fr) 2010-07-27 2013-02-22 Saint Gobain Quartz Sas Creuset a ouverture polygonale
JP5053426B2 (ja) * 2010-08-06 2012-10-17 ジルトロニック アクチエンゲゼルシャフト シリコン単結晶製造方法
JP5574534B2 (ja) 2010-12-28 2014-08-20 株式会社Sumco 複合ルツボ
JP4854814B1 (ja) * 2011-04-28 2012-01-18 Ftb研究所株式会社 シリコン結晶成長用石英坩堝のコーティング方法及びシリコン結晶成長用石英坩堝
KR101539385B1 (ko) * 2011-05-25 2015-07-24 세인트-고바인 리서치 (상하이) 코포레이션 리미티드 실리카 도가니 및 이것을 제조하는 방법
WO2013031091A1 (ja) * 2011-09-01 2013-03-07 信越半導体株式会社 シリコン単結晶の製造方法
JP5509189B2 (ja) 2011-12-26 2014-06-04 ジルトロニック アクチエンゲゼルシャフト 単結晶シリコンの製造方法
DE102012011793A1 (de) 2012-06-15 2013-12-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Quarzglastiegels
KR101856091B1 (ko) * 2013-12-28 2018-05-09 가부시키가이샤 섬코 석영 유리 도가니 및 그의 왜곡 측정 장치
DE102014107590B3 (de) * 2014-05-28 2015-10-01 Infineon Technologies Ag Halbleitervorrichtung, Siliziumwafer und Verfahren zum Herstellen eines Siliziumwafers
CN105239159A (zh) * 2015-09-10 2016-01-13 上海超硅半导体有限公司 直拉法生长单晶硅用石英坩埚的设计及制备方法
JP6743753B2 (ja) * 2017-04-27 2020-08-19 株式会社Sumco シリコン単結晶の引上げ方法
EP3428132B1 (de) 2017-07-10 2023-08-30 Heraeus Quarzglas GmbH & Co. KG Quarzglasbauteil mit hoher thermischer stabilität, halbzeug dafür und verfahren zur herstellung desselben
US10170304B1 (en) 2017-10-25 2019-01-01 Globalfoundries Inc. Self-aligned nanotube structures
JP7014679B2 (ja) * 2018-06-29 2022-02-01 クアーズテック株式会社 石英ガラスルツボ
CN111850681B (zh) * 2019-04-29 2021-09-07 上海新昇半导体科技有限公司 一种半导体晶体生长方法和装置

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3240568A (en) * 1961-12-20 1966-03-15 Monsanto Co Process and apparatus for the production of single crystal compounds
CH474032A (de) * 1964-01-13 1969-06-15 Siemens Ag Quarztiegel zum Schmelzen von Silizium
US3508894A (en) * 1966-09-29 1970-04-28 Owens Illinois Inc Method for metailizing a glass surface
US4102666A (en) * 1968-02-22 1978-07-25 Heraeus-Schott Quarzschmelze Gmbh Method of surface crystallizing quartz
US3776809A (en) * 1968-02-22 1973-12-04 Heraeus Schott Quarzschmelze Quartz glass elements
DE1771305C3 (de) * 1968-05-03 1974-07-04 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Reinigen eines für die Halbleiterherstellung dienenden Behandlungsgefäßes aus Quarz
DE2038564C3 (de) * 1970-08-04 1973-09-13 Heraeus Schott Quarzschmelze Gmbh, 6450 Hanau Quarzglasgeräteteil, insbesondere Quarzglasrohr, mit in seiner Außenoberflächenschicht enthaltenen, Kristallbildung fördernden Keimen zur Verwendung bei hohen Temperaturen, insbesondere für die Durchführung halbleitertechnologischer Verfahren
US4010064A (en) * 1975-05-27 1977-03-01 International Business Machines Corporation Controlling the oxygen content of Czochralski process of silicon crystals by sandblasting silica vessel
JPS5238873A (en) * 1975-09-23 1977-03-25 Nippon Telegr & Teleph Corp <Ntt> Electron gun
GB1577413A (en) * 1976-03-17 1980-10-22 Metals Research Ltd Growth of crystalline material
US4028124A (en) * 1976-04-26 1977-06-07 Corning Glass Works Method of enhancing the refractoriness of high purity fused silica
US4047966A (en) * 1976-04-26 1977-09-13 Corning Glass Works Method of enhancing the refractoriness of high purity fused silica
JPS5328058A (en) * 1976-08-27 1978-03-15 Kubota Ltd Method of producing rolling roll
NL7903842A (nl) * 1979-05-16 1980-11-18 Philips Nv Werkwijze voor het bereiden van gedoteerd kwartsglas en daaruit vervaardigde voorwerpen.
DE3014311C2 (de) * 1980-04-15 1982-06-16 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung von Quarzglastiegeln und Vorrichtung zur Durchführung dieses Verfahrens
US4429009A (en) * 1981-10-30 1984-01-31 Hughes Aircraft Company Process for surface conversion of vitreous silica to cristobalite
JPS60137892A (ja) * 1983-12-26 1985-07-22 Toshiba Ceramics Co Ltd 石英ガラスルツボ
US5053359A (en) * 1989-03-24 1991-10-01 Pyromatics, Inc. Cristobalite reinforcement of high silica glass
US4935046A (en) * 1987-12-03 1990-06-19 Shin-Etsu Handotai Company, Limited Manufacture of a quartz glass vessel for the growth of single crystal semiconductor
JPH02107587A (ja) * 1988-10-13 1990-04-19 Mitsubishi Metal Corp 半導体単結晶育成装置
JP2933404B2 (ja) * 1990-06-25 1999-08-16 信越石英 株式会社 シリコン単結晶引き上げ用石英ガラスルツボとその製造方法
FR2704309B1 (fr) * 1993-04-19 1995-06-09 Quartz Silice Sa Creuset comportant un revetement protecteur en couche mince, procede de fabrication et applications.
JP3100836B2 (ja) * 1994-06-20 2000-10-23 信越石英株式会社 石英ガラスルツボとその製造方法
US5976247A (en) * 1995-06-14 1999-11-02 Memc Electronic Materials, Inc. Surface-treated crucibles for improved zero dislocation performance
DE19916241C2 (de) * 1999-04-10 2001-04-19 Dental Kunstleder & Lederservi Operationsleuchte, insbesondere für den Dentalbereich

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11162186B2 (en) 2016-09-23 2021-11-02 Sumco Corporation Quartz glass crucible, manufacturing method thereof, and manufacturing method of silicon single crystal using quartz glass crucible

Also Published As

Publication number Publication date
US5980629A (en) 1999-11-09
KR970001618A (ko) 1997-01-24
EP0753605B1 (de) 2000-08-23
EP0753605A1 (de) 1997-01-15
DE69609907D1 (de) 2000-09-28
KR100408906B1 (ko) 2004-04-13
JP3054362B2 (ja) 2000-06-19
MY113247A (en) 2001-12-31
CN1152037A (zh) 1997-06-18
CN1087362C (zh) 2002-07-10
SG55205A1 (en) 1998-12-21
TW302499B (de) 1997-04-11
JPH09110579A (ja) 1997-04-28

Similar Documents

Publication Publication Date Title
DE69609907D1 (de) Verfahren zur Herstellung fehlerfreier Einkristalle mit grösserer Ausbringung
DE59600015D1 (de) Verfahren zur Herstellung von Thermoplasten
DE69600826T2 (de) Integriertes Verfahren zur Herstellung von Buten-1
DE69502336T2 (de) Verfahren zur Herstellung von Essigsäure
DE69604452D1 (de) Verfahren zur Herstellung polykristalliner Halbleiter
DE59603321D1 (de) Verfahren zur Herstellung von Polypropylenfolien
DE69623585D1 (de) Verfahren zur Herstellung polykristalliner Halbleiter
DE59600302D1 (de) Verfahren zur Herstellung von Thermoplasten
DE69605098T2 (de) Verfahren zur Herstellung fester Formkörper
DE59600373D1 (de) Verfahren zur Herstellung von Thermoplasten
DE69510596T2 (de) Verfahren zur Herstellung von Organooxysilane
DE59600724D1 (de) Verfahren zur Herstellung von Astaxanthin
DE69521175D1 (de) Verfahren zur Herstellung von Xanthangummi
DE69619067D1 (de) Verfahren zur Herstellung von 3-Amino-2-oxo-1-Halogenpropan-Derivaten
DE59603916D1 (de) Verfahren zur Herstellung von Imidazo-Benzodiazepin-Derivaten
DE69625253T2 (de) Verfahren zur Herstellung von Imidazochinazolinon-Derivaten
DE69504563D1 (de) Verfahren zur Herstellung von Dünnschichten
DE59600080D1 (de) Verfahren zur Herstellung von Thermoplasten
DE69635421D1 (de) Verfahren zur herstellung von 2-chlorthiazolderivaten
DE69611331D1 (de) Verfahren zur Herstellung von S-Phenyl-L-Cystein
DE69603243D1 (de) Verfahren zur Herstellung von Ethenylamiden
DE69614058T2 (de) Verfahren zur Herstellung von Chinacridonen
DE69409733T2 (de) Verfahren zur Herstellung optisch aktiven 2-Norbornanons
DE69620974D1 (de) Verfahren zur Herstellung von Acetalen
DE59508921D1 (de) Verfahren zur Herstellung von Polarisationsfolien

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
R082 Change of representative

Ref document number: 753605

Country of ref document: EP