JP5053426B2 - シリコン単結晶製造方法 - Google Patents
シリコン単結晶製造方法 Download PDFInfo
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- JP5053426B2 JP5053426B2 JP2010178014A JP2010178014A JP5053426B2 JP 5053426 B2 JP5053426 B2 JP 5053426B2 JP 2010178014 A JP2010178014 A JP 2010178014A JP 2010178014 A JP2010178014 A JP 2010178014A JP 5053426 B2 JP5053426 B2 JP 5053426B2
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- Prior art keywords
- single crystal
- silicon single
- melt
- magnetic field
- crucible
- Prior art date
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- 239000013078 crystal Substances 0.000 title claims description 135
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 130
- 229910052710 silicon Inorganic materials 0.000 title claims description 130
- 239000010703 silicon Substances 0.000 title claims description 130
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 239000000155 melt Substances 0.000 claims description 44
- 230000012010 growth Effects 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 19
- 230000004907 flux Effects 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 11
- 239000002994 raw material Substances 0.000 description 12
- 239000011261 inert gas Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 238000000926 separation method Methods 0.000 description 5
- 238000004804 winding Methods 0.000 description 5
- 230000021332 multicellular organism growth Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000008710 crystal-8 Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000002109 crystal growth method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/28—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using weight changes of the crystal or the melt, e.g. flotation methods
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
- C30B15/305—Stirring of the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B30/00—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions
- C30B30/04—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions using magnetic fields
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
2 シリコン単結晶、
3 ワイヤ、
4 直胴部、
5 重量測定部、
6 チャック、
7 成長面、
8 種結晶、
9 シリコン融液の液面、
10 駆動装置、
12 巻き上げ機、
14 ルツボ駆動機、
20 チャンバ、
22 ガス導入口、
24 ガス排出口、
30 ルツボ、
32 融液、
42、44 ヒータ、
50 磁場印加装置、
52 コイル、
60 整流筒、
100 シリコン単結晶製造装置。
Claims (1)
- チョクラルスキー法に基づいてシリコン単結晶を製造するシリコン単結晶製造方法であって、
磁場中心における磁束密度が1000ガウス以上2000ガウス以下である水平磁場をルツボ内に収容された融液に印加しつつ前記融液から前記シリコン単結晶を引上げ、前記シリコン単結晶の直胴部を成長させる第1の工程と、
前記第1の工程の後、前記融液の液面に対する前記シリコン単結晶の相対的な引上げ速度を0mm/分にする第2の工程と、
前記第2の工程の後、前記シリコン単結晶の見かけの重量が減少するまで、前記シリコン単結晶の相対的な引上げ速度を0mm/分とした停止状態を維持する第3の工程と、
前記第3の工程の後、前記停止状態をさらに維持し、前記融液に接するシリコン単結晶の成長面全体をシリコン単結晶の引上げ方向と反対方向に凸形状にする第4の工程と、
前記第4の工程の後、前記シリコン単結晶と前記融液とを切り離す第5の工程と、を有する、シリコン単結晶製造方法。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010178014A JP5053426B2 (ja) | 2010-08-06 | 2010-08-06 | シリコン単結晶製造方法 |
TW100125971A TWI424104B (zh) | 2010-08-06 | 2011-07-22 | 矽單晶生產方法 |
EP11175136A EP2415910B1 (en) | 2010-08-06 | 2011-07-25 | Silicon single crystal production method |
US13/189,645 US9051661B2 (en) | 2010-08-06 | 2011-07-25 | Silicon single crystal production method |
KR1020110073593A KR101289961B1 (ko) | 2010-08-06 | 2011-07-25 | 실리콘 단결정 제조 방법 |
CN201110220823.1A CN102373504B (zh) | 2010-08-06 | 2011-07-28 | 硅单晶生产方法 |
MYPI2011003622A MY149447A (en) | 2010-08-06 | 2011-08-03 | Silicon single crystal production method |
SG2011055993A SG178667A1 (en) | 2010-08-06 | 2011-08-03 | Silicon single crystal production method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010178014A JP5053426B2 (ja) | 2010-08-06 | 2010-08-06 | シリコン単結晶製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012036042A JP2012036042A (ja) | 2012-02-23 |
JP5053426B2 true JP5053426B2 (ja) | 2012-10-17 |
Family
ID=44587685
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010178014A Active JP5053426B2 (ja) | 2010-08-06 | 2010-08-06 | シリコン単結晶製造方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US9051661B2 (ja) |
EP (1) | EP2415910B1 (ja) |
JP (1) | JP5053426B2 (ja) |
KR (1) | KR101289961B1 (ja) |
CN (1) | CN102373504B (ja) |
MY (1) | MY149447A (ja) |
SG (1) | SG178667A1 (ja) |
TW (1) | TWI424104B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015205793A (ja) * | 2014-04-21 | 2015-11-19 | グローバルウェーハズ・ジャパン株式会社 | 単結晶引き上げ方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5980629A (en) * | 1995-06-14 | 1999-11-09 | Memc Electronic Materials, Inc. | Methods for improving zero dislocation yield of single crystals |
EP0947611A3 (en) * | 1998-03-17 | 2002-03-20 | Shin-Etsu Handotai Company Limited | A method for producing a silicon single crystal and the silicon single crystal produced thereby |
US6986925B2 (en) * | 2001-01-02 | 2006-01-17 | Memc Electronic Materials, Inc. | Single crystal silicon having improved gate oxide integrity |
DE10207284A1 (de) | 2002-02-21 | 2003-09-11 | Wacker Siltronic Halbleitermat | Verfahren zur Herstellung eines hochdotierten Einkristalls aus Silicium |
JP2007022865A (ja) | 2005-07-19 | 2007-02-01 | Sumco Corp | シリコン単結晶の製造方法 |
JP4986452B2 (ja) * | 2005-12-28 | 2012-07-25 | シルトロニック・ジャパン株式会社 | シリコン単結晶の製造方法および製造装置 |
JP2009292663A (ja) * | 2008-06-03 | 2009-12-17 | Sumco Corp | シリコン単結晶の育成方法 |
-
2010
- 2010-08-06 JP JP2010178014A patent/JP5053426B2/ja active Active
-
2011
- 2011-07-22 TW TW100125971A patent/TWI424104B/zh active
- 2011-07-25 KR KR1020110073593A patent/KR101289961B1/ko active IP Right Grant
- 2011-07-25 US US13/189,645 patent/US9051661B2/en active Active
- 2011-07-25 EP EP11175136A patent/EP2415910B1/en active Active
- 2011-07-28 CN CN201110220823.1A patent/CN102373504B/zh active Active
- 2011-08-03 SG SG2011055993A patent/SG178667A1/en unknown
- 2011-08-03 MY MYPI2011003622A patent/MY149447A/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN102373504A (zh) | 2012-03-14 |
MY149447A (en) | 2013-08-30 |
JP2012036042A (ja) | 2012-02-23 |
KR20120023528A (ko) | 2012-03-13 |
TWI424104B (zh) | 2014-01-21 |
US9051661B2 (en) | 2015-06-09 |
KR101289961B1 (ko) | 2013-07-26 |
CN102373504B (zh) | 2014-11-19 |
US20120031323A1 (en) | 2012-02-09 |
EP2415910A1 (en) | 2012-02-08 |
EP2415910B1 (en) | 2013-01-09 |
SG178667A1 (en) | 2012-03-29 |
TW201207165A (en) | 2012-02-16 |
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