DE69603774T2 - Wässrig entwickelbare, mehrschichtige, durch Licht abbildbare, dauerhafte Überzugsmittel für gedruckte Schaltungen - Google Patents

Wässrig entwickelbare, mehrschichtige, durch Licht abbildbare, dauerhafte Überzugsmittel für gedruckte Schaltungen

Info

Publication number
DE69603774T2
DE69603774T2 DE1996603774 DE69603774T DE69603774T2 DE 69603774 T2 DE69603774 T2 DE 69603774T2 DE 1996603774 DE1996603774 DE 1996603774 DE 69603774 T DE69603774 T DE 69603774T DE 69603774 T2 DE69603774 T2 DE 69603774T2
Authority
DE
Germany
Prior art keywords
developable
reproducible
layered
aqueous
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1996603774
Other languages
English (en)
Other versions
DE69603774D1 (de
Inventor
Thomas Eugene Dueber
Iii Frank Leonard Schadt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE69603774D1 publication Critical patent/DE69603774D1/de
Publication of DE69603774T2 publication Critical patent/DE69603774T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/901—Printed circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31786—Of polyester [e.g., alkyd, etc.]
    • Y10T428/31797—Next to addition polymer from unsaturated monomers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
DE1996603774 1995-04-28 1996-04-27 Wässrig entwickelbare, mehrschichtige, durch Licht abbildbare, dauerhafte Überzugsmittel für gedruckte Schaltungen Expired - Fee Related DE69603774T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/431,376 US5643657A (en) 1995-04-28 1995-04-28 Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits

Publications (2)

Publication Number Publication Date
DE69603774D1 DE69603774D1 (de) 1999-09-23
DE69603774T2 true DE69603774T2 (de) 1999-12-09

Family

ID=23711674

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1996603774 Expired - Fee Related DE69603774T2 (de) 1995-04-28 1996-04-27 Wässrig entwickelbare, mehrschichtige, durch Licht abbildbare, dauerhafte Überzugsmittel für gedruckte Schaltungen

Country Status (5)

Country Link
US (1) US5643657A (de)
EP (1) EP0740211B1 (de)
JP (1) JP3585644B2 (de)
KR (1) KR100208109B1 (de)
DE (1) DE69603774T2 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0845479B1 (de) * 1996-11-28 2004-07-14 Kaneka Corporation Verfahren zur Herstellung eines (Meth)acrylpolymers mit endständiger Hydroxylgruppe und dieses Polymer
US6284309B1 (en) 1997-12-19 2001-09-04 Atotech Deutschland Gmbh Method of producing copper surfaces for improved bonding, compositions used therein and articles made therefrom
SG85613A1 (en) * 1998-02-06 2002-01-15 Morton Int Inc Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers
US6037096A (en) * 1998-05-26 2000-03-14 International Business Machines Corporation Film composition and method for a planar surface atop a plated through hole
US6489042B2 (en) * 1998-12-23 2002-12-03 3M Innovative Properties Company Photoimageable dielectric material for circuit protection
US6542379B1 (en) 1999-07-15 2003-04-01 International Business Machines Corporation Circuitry with integrated passive components and method for producing
US6521844B1 (en) * 1999-10-29 2003-02-18 International Business Machines Corporation Through hole in a photoimageable dielectric structure with wired and uncured dielectric
JP2001240842A (ja) * 2000-02-28 2001-09-04 Nitto Denko Corp 紫外線硬化型粘着剤組成物とその粘着シ―ト類
JP2003005359A (ja) * 2001-06-27 2003-01-08 Hitachi Chem Co Ltd 高解像・高密着性の感光性樹脂組成物及びその用途
JP2003035953A (ja) * 2001-07-23 2003-02-07 Hitachi Chem Co Ltd 高密度・高解像度用の感光性樹脂組成物及びその用途
GB0221893D0 (en) * 2002-09-20 2002-10-30 Avecia Ltd Process
US20040058276A1 (en) * 2002-09-23 2004-03-25 Dueber Thomas E. Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto
US20060079593A1 (en) * 2002-10-15 2006-04-13 Hirotoshi Kamata Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same
KR100468096B1 (ko) * 2002-10-25 2005-01-26 손창민 광 셔터용 조성물
EP1489460A3 (de) * 2003-06-20 2008-07-09 FUJIFILM Corporation Lichtempfindlicher Bogen mit einer Unterlage sowie einer ersten und einer zweiten lichtempfindlichen Schicht
EP1507171A3 (de) * 2003-08-15 2008-03-05 FUJIFILM Corporation Lichtempfindlicher Bogen mit einer Unterlage, einer ersten und einer zweiten lichtempfindlichen Schicht sowie einer Barriereschicht
US7220490B2 (en) * 2003-12-30 2007-05-22 E. I. Du Pont De Nemours And Company Polyimide based adhesive compositions useful in flexible circuit applications, and compositions and methods relating thereto
US7524617B2 (en) * 2004-11-23 2009-04-28 E.I. Du Pont De Nemours And Company Low-temperature curable photosensitive compositions
JP2006243546A (ja) * 2005-03-04 2006-09-14 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
US8816012B2 (en) 2010-08-18 2014-08-26 Ferro Corporation Curable acrylate based printing medium
EP2788398B1 (de) * 2011-12-15 2018-07-25 Sun Chemical Corporation Sulfiderweiterte epoxidharze und ihre anwendung als sperrschichten
JP6343439B2 (ja) * 2013-09-30 2018-06-13 太陽インキ製造株式会社 プリント配線板用硬化型組成物、これを用いた硬化塗膜及びプリント配線板
JP6538432B2 (ja) * 2014-09-01 2019-07-03 日東電工株式会社 透明導電性フィルム用キャリアフィルム及び積層体
US11634358B2 (en) 2018-01-03 2023-04-25 Ferro Corporation Polycarbonate diol coating composition for caustic and UV resistance
CN116755290A (zh) * 2023-05-17 2023-09-15 珠海市能动科技光学产业有限公司 一种高附着力的阻焊干膜光阻剂及其制备方法与应用

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3547730A (en) * 1966-12-16 1970-12-15 Du Pont Machine for making resist images
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
JPS592018B2 (ja) * 1975-03-26 1984-01-17 住友化学工業株式会社 カイリヨウサレタカンコウセイジユシソセイブツカラナルゲンケイ
US4349620A (en) * 1979-06-15 1982-09-14 E. I. Du Pont De Nemours And Company Solvent developable photoresist film
US4352870A (en) * 1979-11-27 1982-10-05 Bell Telephone Laboratories, Incorporated High resolution two-layer resists
US4506004A (en) * 1982-04-01 1985-03-19 Sullivan Donald F Printed wiring board
DE3134123A1 (de) * 1981-08-28 1983-03-17 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraushergestelltes photopolymerisierbares kopiermaterial
US4621043A (en) * 1983-01-31 1986-11-04 E. I. Du Pont De Nemours And Company Storage stable photopolymerizable composition
US4937172A (en) * 1986-12-02 1990-06-26 E. I. Du Pont De Nemours And Company Photopolymerizable composition having superior adhesion, articles and processes
DE3814567A1 (de) * 1988-04-29 1989-11-09 Du Pont Deutschland Photopolymerisierbare zusammensetzungen mit carboxylgruppen enthaltenden bindemitteln
JP2700933B2 (ja) * 1989-11-28 1998-01-21 日本石油株式会社 永久保護膜用樹脂組成物および永久保護膜の製造方法
JPH04274428A (ja) * 1991-03-01 1992-09-30 Nippon Paint Co Ltd オフセット印刷用感光性組成物
EP0628180B1 (de) * 1992-02-24 1998-09-16 E.I. Du Pont De Nemours And Company Flexible, wässrig entwickelbare, durch licht abblidbare dauerhafte ueberzugsmittel fuer gedruckte schaltungen
US5288589A (en) * 1992-12-03 1994-02-22 Mckeever Mark R Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits

Also Published As

Publication number Publication date
US5643657A (en) 1997-07-01
JP3585644B2 (ja) 2004-11-04
EP0740211B1 (de) 1999-08-18
KR100208109B1 (ko) 1999-07-15
JPH095992A (ja) 1997-01-10
DE69603774D1 (de) 1999-09-23
KR960038485A (ko) 1996-11-21
EP0740211A1 (de) 1996-10-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee