DE69528051T2 - Kristallwachstumsverfahren - Google Patents

Kristallwachstumsverfahren

Info

Publication number
DE69528051T2
DE69528051T2 DE69528051T DE69528051T DE69528051T2 DE 69528051 T2 DE69528051 T2 DE 69528051T2 DE 69528051 T DE69528051 T DE 69528051T DE 69528051 T DE69528051 T DE 69528051T DE 69528051 T2 DE69528051 T2 DE 69528051T2
Authority
DE
Germany
Prior art keywords
crystal growth
growth process
crystal
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69528051T
Other languages
English (en)
Other versions
DE69528051D1 (de
Inventor
Toshiaki-Japan Energy Co Asahi
Osamu-Japan Energy Corpora Oda
Kenji-Japan Energy Corpor Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Publication of DE69528051D1 publication Critical patent/DE69528051D1/de
Application granted granted Critical
Publication of DE69528051T2 publication Critical patent/DE69528051T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/36—Single-crystal growth by pulling from a melt, e.g. Czochralski method characterised by the seed, e.g. its crystallographic orientation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/14—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method characterised by the seed, e.g. its crystallographic orientation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
    • C30B29/48—AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
DE69528051T 1994-11-11 1995-10-04 Kristallwachstumsverfahren Expired - Lifetime DE69528051T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP27801594 1994-11-11
PCT/JP1995/002025 WO1996015297A1 (fr) 1994-11-11 1995-10-04 Procede permettant d'obtenir la croissance d'un cristal massif

Publications (2)

Publication Number Publication Date
DE69528051D1 DE69528051D1 (de) 2002-10-10
DE69528051T2 true DE69528051T2 (de) 2003-01-02

Family

ID=17591457

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69528051T Expired - Lifetime DE69528051T2 (de) 1994-11-11 1995-10-04 Kristallwachstumsverfahren

Country Status (6)

Country Link
US (1) US5871580A (de)
EP (1) EP0751242B1 (de)
JP (1) JP3343615B2 (de)
CN (1) CN1070542C (de)
DE (1) DE69528051T2 (de)
WO (1) WO1996015297A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2759383B1 (fr) * 1997-02-07 1999-03-26 Sofradir Procede pour la realisation d'un semi-conducteur par cristallisation d'un bain liquide et installation pour la mise en oeuvre de ce procede
JP3648703B2 (ja) * 2000-01-07 2005-05-18 株式会社日鉱マテリアルズ 化合物半導体単結晶の製造方法
JP2002203799A (ja) * 2000-12-28 2002-07-19 Canon Inc 液相成長方法および液相成長装置
JP2002249399A (ja) * 2001-02-21 2002-09-06 Murata Mfg Co Ltd 単結晶の製造方法および単結晶
JP2002293686A (ja) * 2001-04-03 2002-10-09 Hitachi Cable Ltd 化合物半導体単結晶の成長方法及びそれから切り出した基板
US6886234B2 (en) * 2002-01-22 2005-05-03 Seagate Technology Llc Top cover removal machine for disc drives
US20030172870A1 (en) * 2002-03-14 2003-09-18 Axt, Inc. Apparatus for growing monocrystalline group II-VI and III-V compounds
CA2510415C (en) * 2005-06-21 2012-08-14 Redlen Technologies Inc. A cold-walled vessel process for compounding, homogenizing and consolidating semiconductor compounds
CA2649322C (en) * 2008-09-30 2011-02-01 5N Plus Inc. Cadmium telluride production process
US8493649B2 (en) * 2008-10-23 2013-07-23 Bae Systems Information And Electronic Systems Integration Inc. Method of producing nonlinear optical crystal CdSiP2
CN103374746A (zh) * 2012-04-27 2013-10-30 比亚迪股份有限公司 一种用于制作准单晶硅的装置及一种准单晶硅的制作方法
US9543457B2 (en) 2012-09-28 2017-01-10 First Solar, Inc. Method and system for manufacturing back contacts of photovoltaic devices
US9725821B1 (en) 2014-02-28 2017-08-08 The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration Cavity pull rod: device to promote single crystal growth from the melt
CN116536768B (zh) * 2023-06-29 2023-09-29 浙江珏芯微电子有限公司 一种碲锌镉单晶的生长用坩埚及生长方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4289570A (en) * 1978-12-13 1981-09-15 United Technologies Corporation Seed and method for epitaxial solidification
JPS5869800A (ja) * 1981-10-16 1983-04-26 Nec Corp ３−５族化合物半導体の結晶成長方法
US4869776A (en) * 1986-07-29 1989-09-26 Sharp Kabushiki Kaisha Method for the growth of a compound semiconductor crystal
JPS6335349A (ja) * 1986-07-31 1988-02-16 Toshiba Corp ワ−ドプロセツサ
JPH01122998A (ja) * 1987-11-09 1989-05-16 Sumitomo Electric Ind Ltd ＣｄＺｎＴｅ混晶半導体の製造方法
JPH0340987A (ja) * 1989-07-10 1991-02-21 Nippon Telegr & Teleph Corp <Ntt> 単結晶育成方法
JP2525930B2 (ja) * 1990-05-15 1996-08-21 スタンレー電気株式会社 ▲ｉｉ▼―▲ｖｉ▼族化合物半導体の結晶成長方法
JPH05279165A (ja) * 1992-03-27 1993-10-26 Asahi Glass Co Ltd 化合物半導体単結晶の製造装置
JP3196182B2 (ja) * 1992-05-11 2001-08-06 住友電気工業株式会社 単結晶の育成方法
US5499600A (en) * 1993-12-24 1996-03-19 Stanley Electric Co., Ltd. Methods for compound semiconductor crystal growth from solution
JP3465853B2 (ja) * 1994-01-25 2003-11-10 同和鉱業株式会社 ＺｎＳｅバルク単結晶の製造方法

Also Published As

Publication number Publication date
EP0751242A4 (de) 1998-04-01
DE69528051D1 (de) 2002-10-10
EP0751242A1 (de) 1997-01-02
EP0751242B1 (de) 2002-09-04
WO1996015297A1 (fr) 1996-05-23
US5871580A (en) 1999-02-16
CN1138882A (zh) 1996-12-25
JP3343615B2 (ja) 2002-11-11
CN1070542C (zh) 2001-09-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: NIKKO MATERIALS CO., LTD., TOKIO/TOKYO, JP

8327 Change in the person/name/address of the patent owner

Owner name: NIPPON MINING & METALS CO., LTD., TOKIO/TOKYO, JP

R082 Change of representative

Ref document number: 751242

Country of ref document: EP

Representative=s name: MEISSNER, BOLTE & PARTNER GBR, 86199 AUGSBURG, DE