DE69526308D1 - Harzzusammensetzung für Stereolithographie - Google Patents

Harzzusammensetzung für Stereolithographie

Info

Publication number
DE69526308D1
DE69526308D1 DE69526308T DE69526308T DE69526308D1 DE 69526308 D1 DE69526308 D1 DE 69526308D1 DE 69526308 T DE69526308 T DE 69526308T DE 69526308 T DE69526308 T DE 69526308T DE 69526308 D1 DE69526308 D1 DE 69526308D1
Authority
DE
Germany
Prior art keywords
stereolithography
resin composition
resin
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69526308T
Other languages
English (en)
Other versions
DE69526308T2 (de
Inventor
Tsuneo Hagiwara
Yorikazu Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nabtesco Corp
Original Assignee
Teijin Seiki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26558663&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69526308(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Teijin Seiki Co Ltd filed Critical Teijin Seiki Co Ltd
Application granted granted Critical
Publication of DE69526308D1 publication Critical patent/DE69526308D1/de
Publication of DE69526308T2 publication Critical patent/DE69526308T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Polymerisation Methods In General (AREA)
DE69526308T 1994-11-29 1995-11-28 Harzzusammensetzung für Stereolithographie Expired - Lifetime DE69526308T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP31778094 1994-11-29
JP07291699A JP3117394B2 (ja) 1994-11-29 1995-10-16 光学的立体造形用樹脂組成物

Publications (2)

Publication Number Publication Date
DE69526308D1 true DE69526308D1 (de) 2002-05-16
DE69526308T2 DE69526308T2 (de) 2002-08-14

Family

ID=26558663

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69526308T Expired - Lifetime DE69526308T2 (de) 1994-11-29 1995-11-28 Harzzusammensetzung für Stereolithographie

Country Status (4)

Country Link
US (2) US5849459A (de)
EP (1) EP0715212B1 (de)
JP (1) JP3117394B2 (de)
DE (1) DE69526308T2 (de)

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JP3318593B2 (ja) 1996-05-10 2002-08-26 シーシーアイ株式会社 エネルギー変換組成物
JP3844824B2 (ja) 1996-11-26 2006-11-15 株式会社Ａｄｅｋａ エネルギー線硬化性エポキシ樹脂組成物、光学的立体造形用樹脂組成物及び光学的立体造形方法
WO2000036044A1 (fr) * 1998-12-11 2000-06-22 Shishiai-Kabushikigaisha Compose convertisseur d'energie
JP2001181313A (ja) * 1999-12-24 2001-07-03 Teijin Seiki Co Ltd 光学的立体造形用樹脂組成物
US7189344B2 (en) * 2001-03-12 2007-03-13 Ivoclar Vivadent Ag Method for producing a synthetic material part
US6811937B2 (en) 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US20040054025A1 (en) * 2002-06-20 2004-03-18 Lawton John A. Compositions comprising a benzophenone photoinitiator
US7211368B2 (en) * 2003-01-07 2007-05-01 3 Birds, Inc. Stereolithography resins and methods
DE112004001165T5 (de) * 2003-06-25 2006-05-04 Cmet Inc., Yokohama Durch aktinische Strahlung härtbare stereolithographische Harzzusammensetzung mit verbesserter Stabilität
FR2874101A1 (fr) * 2004-11-19 2006-02-10 Commissariat Energie Atomique Resine photosensible, application a la fabrication d'une structure tridimensionnelle
US7524345B2 (en) * 2005-02-22 2009-04-28 Saint-Gobain Abrasives, Inc. Rapid tooling system and methods for manufacturing abrasive articles
US7875091B2 (en) * 2005-02-22 2011-01-25 Saint-Gobain Abrasives, Inc. Rapid tooling system and methods for manufacturing abrasive articles
US7867302B2 (en) * 2005-02-22 2011-01-11 Saint-Gobain Abrasives, Inc. Rapid tooling system and methods for manufacturing abrasive articles
US7358283B2 (en) * 2005-04-01 2008-04-15 3D Systems, Inc. Radiation curable compositions useful in image projection systems
EP1757979B1 (de) 2005-08-26 2012-12-12 Cmet Inc. Zusammensetzungen für Rapid Prototyping
US8293810B2 (en) * 2005-08-29 2012-10-23 Cmet Inc. Rapid prototyping resin compositions
US20140093690A1 (en) * 2011-05-31 2014-04-03 Nanoptics, Incorporated Method and apparatus for lithographic manufacture of multi-component polymeric fiber plates
JP6405721B2 (ja) * 2014-06-04 2018-10-17 東洋インキＳｃホールディングス株式会社 光学立体造形用硬化性材料および立体造形物
US10569470B2 (en) 2015-01-30 2020-02-25 Hewlett-Packard Development Company, L.P. Agent calibration
WO2016153711A1 (en) * 2015-03-23 2016-09-29 Dow Global Technologies Llc Photocurable compositions for three-dimensional printing
US10668708B2 (en) 2016-09-27 2020-06-02 Lawrence Livermore National Security, Llc Optically enhanced patternable photosensitivity via oxygen excitation
WO2018074380A1 (ja) 2016-10-21 2018-04-26 クラレノリタケデンタル株式会社 光学的立体造形用組成物
JP6871003B2 (ja) * 2017-02-03 2021-05-12 日本特殊陶業株式会社 セラミック成形体の製造方法
EP3732021A1 (de) * 2017-12-29 2020-11-04 DSM IP Assets B.V. Zusammensetzungen und artikel zur generativen fertigung und verfahren zur verwendung davon
EP3795359A1 (de) 2019-08-26 2021-03-24 Shofu Inc. Zahnfotopolymerisierbare zusammensetzung für 3d-drucker
WO2021154897A1 (en) * 2020-01-28 2021-08-05 Quadratic 3D, Inc. Photohardenable compositions including an upconverting component and methods
WO2021177462A1 (ja) 2020-03-06 2021-09-10 クラレノリタケデンタル株式会社 光造形用樹脂組成物
US11458882B1 (en) 2022-04-12 2022-10-04 Steven D. Couch Load securing device

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JPS56144478A (en) * 1980-04-12 1981-11-10 Hideo Kodama Stereoscopic figure drawing device
JPS60247515A (ja) * 1984-05-23 1985-12-07 Oosakafu 光学的造形法
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4839401A (en) * 1985-07-12 1989-06-13 Jeneric/Pentron, Inc. Light curable dental pit and fissure sealant
JPH0689293B2 (ja) * 1986-05-27 1994-11-09 日本油脂株式会社 紫外線硬化型塗料
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JP2525216B2 (ja) * 1988-01-27 1996-08-14 ディーエスエム・エヌヴィ 光学的立体造形用樹脂組成物
JPH0826121B2 (ja) * 1988-02-19 1996-03-13 旭電化工業株式会社 光学的造形用樹脂組成物
JP2676838B2 (ja) * 1988-10-24 1997-11-17 ソニー株式会社 立体像形成方法
JP2612484B2 (ja) * 1988-11-18 1997-05-21 ディーエスエム・エヌヴィ 光学的立体造形用樹脂組成物
JPH02208305A (ja) * 1989-02-07 1990-08-17 Mitsui Eng & Shipbuild Co Ltd 光硬化性組成物
US5002855A (en) * 1989-04-21 1991-03-26 E. I. Du Pont De Nemours And Company Solid imaging method using multiphasic photohardenable compositions
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JPH02153722A (ja) * 1989-09-25 1990-06-13 Osaka Prefecture 光学的造形法
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JPH047065A (ja) * 1990-04-23 1992-01-10 Sekisui Chem Co Ltd 北硬化性塗料の塗布方法
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JP2588330B2 (ja) * 1991-09-25 1997-03-05 積水化学工業株式会社 光硬化型樹脂組成物の硬化方法
JP3176430B2 (ja) * 1992-03-30 2001-06-18 ジェイエスアール株式会社 光学的立体造形用樹脂組成物
EP0579503B1 (de) * 1992-07-17 1997-11-05 Ethicon Inc. Strahlenhärtbare Urethan-Acrylatprepolymere und vernetzte Polymere
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TW269017B (de) * 1992-12-21 1996-01-21 Ciba Geigy Ag
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US5496685A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
JPH07238106A (ja) * 1994-03-02 1995-09-12 Japan Synthetic Rubber Co Ltd 立体造形用光硬化性組成物及び光硬化促進方法
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Also Published As

Publication number Publication date
EP0715212B1 (de) 2002-04-10
JP3117394B2 (ja) 2000-12-11
US5849459A (en) 1998-12-15
DE69526308T2 (de) 2002-08-14
JPH08224790A (ja) 1996-09-03
EP0715212A1 (de) 1996-06-05
US6162576A (en) 2000-12-19

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Legal Events

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