DE69525693D1 - Arylesterverbindung, Verfahren zu ihrer Herstellung und diese enthaltende Epoxy-Harz-Zusammensetzung sowie kupferkaschiertes Laminat, das diese Zusammensetzung verwendet - Google Patents

Arylesterverbindung, Verfahren zu ihrer Herstellung und diese enthaltende Epoxy-Harz-Zusammensetzung sowie kupferkaschiertes Laminat, das diese Zusammensetzung verwendet

Info

Publication number
DE69525693D1
DE69525693D1 DE69525693T DE69525693T DE69525693D1 DE 69525693 D1 DE69525693 D1 DE 69525693D1 DE 69525693 T DE69525693 T DE 69525693T DE 69525693 T DE69525693 T DE 69525693T DE 69525693 D1 DE69525693 D1 DE 69525693D1
Authority
DE
Germany
Prior art keywords
copper
preparation
epoxy resin
ester compound
clad laminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69525693T
Other languages
English (en)
Other versions
DE69525693T2 (de
Inventor
Youichi Ueda
Yasuhiro Endo
Mitsuhiro Shibata
Kaori Yamasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP20517594A external-priority patent/JP3383709B2/ja
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of DE69525693D1 publication Critical patent/DE69525693D1/de
Application granted granted Critical
Publication of DE69525693T2 publication Critical patent/DE69525693T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00Auxiliary devices
    • H01P1/04Fixed joints
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D311/00Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/74Benzo[b]pyrans, hydrogenated in the carbocyclic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/017Esters of hydroxy compounds having the esterified hydroxy group bound to a carbon atom of a six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D311/00Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/58Benzo[b]pyrans, not hydrogenated in the carbocyclic ring other than with oxygen or sulphur atoms in position 2 or 4
    • C07D311/60Benzo[b]pyrans, not hydrogenated in the carbocyclic ring other than with oxygen or sulphur atoms in position 2 or 4 with aryl radicals attached in position 2
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule
    • C08G59/04Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
    • C08G59/06Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
    • C08G59/066Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols with chain extension or advancing agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/226Mixtures of di-epoxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups
    • C08G59/38Epoxy compounds containing three or more epoxy groups together with di-epoxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4223Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4238Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof heterocyclic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H01L23/49894Materials of the insulating layers or coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00Auxiliary devices
    • H01P1/32Non-reciprocal transmission devices
    • H01P1/38Circulators
    • H01P1/383Junction circulators, e.g. Y-circulators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00Waveguides; Transmission lines of the waveguide type
    • H01P3/16Dielectric waveguides, i.e. without a longitudinal conductor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0326Organic insulating material consisting of one material containing O
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31511Of epoxy ether
    • Y10T428/31515As intermediate layer
    • Y10T428/31522Next to metal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31511Of epoxy ether
    • Y10T428/31529Next to metal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/30Woven fabric [i.e., woven strand or strip material]
    • Y10T442/3382Including a free metal or alloy constituent
    • Y10T442/3415Preformed metallic film or foil or sheet [film or foil or sheet had structural integrity prior to association with the woven fabric]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Epoxy Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Laminated Bodies (AREA)
DE69525693T 1994-08-30 1995-08-29 Arylesterverbindung, Verfahren zu ihrer Herstellung und diese enthaltende Epoxy-Harz-Zusammensetzung sowie kupferkaschiertes Laminat, das diese Zusammensetzung verwendet Expired - Fee Related DE69525693T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP20517594A JP3383709B2 (ja) 1994-08-30 1994-08-30 エポキシ樹脂組成物および銅張り積層板
JP23118294 1994-09-27
JP1243795 1995-01-30
JP1618395 1995-02-02

Publications (2)

Publication Number Publication Date
DE69525693D1 true DE69525693D1 (de) 2002-04-11
DE69525693T2 DE69525693T2 (de) 2002-09-26

Family

ID=27455804

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69525693T Expired - Fee Related DE69525693T2 (de) 1994-08-30 1995-08-29 Arylesterverbindung, Verfahren zu ihrer Herstellung und diese enthaltende Epoxy-Harz-Zusammensetzung sowie kupferkaschiertes Laminat, das diese Zusammensetzung verwendet

Country Status (8)

Country Link
US (3) US5726257A (de)
EP (1) EP0699670B1 (de)
KR (1) KR100373563B1 (de)
CN (3) CN1060771C (de)
CA (1) CA2157149A1 (de)
DE (1) DE69525693T2 (de)
MY (1) MY113726A (de)
TW (1) TW401438B (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW475926B (en) * 1996-06-06 2002-02-11 Sumitomo Chemical Co Novel ester compound and thermosetting resin composition using the same
US6297332B1 (en) * 1998-04-28 2001-10-02 Mitsui Chemicals, Inc. Epoxy-resin composition and use thereof
US6310147B1 (en) * 1998-05-21 2001-10-30 Mitsui Chemicals, Inc. Epoxy-resin composition and use thereof
US6478998B1 (en) * 2000-09-13 2002-11-12 Borden Chemical, Inc. Hybrid phenol-formaldehyde and polymeric isocyanate based adhesive and methods of synthesis and use
US6960537B2 (en) * 2001-10-02 2005-11-01 Asm America, Inc. Incorporation of nitrogen into high k dielectric film
JP4240448B2 (ja) * 2002-08-22 2009-03-18 三井金属鉱業株式会社 樹脂層付銅箔を用いた多層プリント配線板の製造方法
JP3801117B2 (ja) * 2002-08-26 2006-07-26 株式会社日立製作所 低誘電正接フィルムおよび配線フィルム
TWI234210B (en) 2002-12-03 2005-06-11 Sanyo Electric Co Semiconductor module and manufacturing method thereof as well as wiring member of thin sheet
US6966084B2 (en) * 2003-04-16 2005-11-22 Kelsyus, Llc Support and method of using the same
DE602004028614D1 (de) * 2003-06-19 2010-09-23 Sumitomo Chemical Co Epoxidverbindung und gehärtetes epoxyharzprodukt
WO2005004563A1 (ja) * 2003-07-03 2005-01-13 Hitachi, Ltd. モジュール装置及びその製造方法
US7996825B2 (en) * 2003-10-31 2011-08-09 Hewlett-Packard Development Company, L.P. Cross-file inlining by using summaries and global worklist
US7271206B2 (en) * 2003-12-23 2007-09-18 Industrial Technology Research Institute Organic-inorganic hybrid compositions with sufficient flexibility, high dielectric constant and high thermal stability, and cured compositions thereof
PL1842864T3 (pl) * 2005-01-25 2013-12-31 Hodogaya Chemical Co Ltd Żywica rezorcynowo-formaldehydowa modyfikowana ketonem
US20070100116A1 (en) * 2005-11-01 2007-05-03 Zaldivar Rafael J Low temperature processed resin for thermal and chemical protective coatings
EP2356681B1 (de) * 2008-11-17 2013-01-23 Raytheon Company Röntgenundurchlässige beschichtung
CN101494949A (zh) * 2009-03-04 2009-07-29 腾辉电子(苏州)有限公司 高频覆铜箔基板,其半固化片及降低覆铜箔基板信号损失的方法
JP5234229B1 (ja) * 2011-05-27 2013-07-10 味の素株式会社 樹脂組成物
KR101443863B1 (ko) * 2012-10-22 2014-09-23 (주)파낙스이엠 반도체 감광액 용 레소시놀 화합물의 제조방법
WO2014186279A1 (en) * 2013-05-13 2014-11-20 Momentive Specialty Chem Inc Composites and epoxy resins based on aryl substituted compounds
CN112457631B (zh) * 2019-09-06 2023-04-07 广东生益科技股份有限公司 活性酯树脂及制备方法、包含其的热固性树脂组合物、预浸料和积层薄膜
JP7553271B2 (ja) * 2020-06-26 2024-09-18 日鉄ケミカル&マテリアル株式会社 多価ヒドロキシ樹脂、その製造方法、及びそれを含むエポキシ樹脂組成物、並びにエポキシ樹脂硬化物

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3650799A (en) * 1969-08-11 1972-03-21 Monsanto Co Substrates protected with prepared polymeric ultraviolet light stabilizers from phenol-formaldehyde condensates
US3861921A (en) * 1973-01-12 1975-01-21 Horst Hoffmann Subbing layers comprising polyamide and phenolic resin for metal bases of photopolymerizable elements
JPS565475A (en) * 1979-06-27 1981-01-20 Mitsui Petrochem Ind Ltd Polyalkyl-7-hydroxy-4h-chromene and its preparation
GB2064514B (en) * 1979-10-29 1984-01-18 Maruko Pharmaceutical Co Flavan compounds and acid addition salts thereof and pharmaceutical compositions thereof
US4297457A (en) * 1980-07-11 1981-10-27 General Electric Company Curable epoxy resin composition
EP0089387A1 (de) * 1982-03-19 1983-09-28 Uop Inc. Herstellung von mit Kupfer kaschierten Schichtstoffen
US4387207A (en) * 1982-07-14 1983-06-07 Paratech, Inc. Resorcinol composition and method of making same
JPS6253327A (ja) * 1985-08-31 1987-03-09 Res Dev Corp Of Japan 硬化性組成物
JPH0639518B2 (ja) * 1986-04-28 1994-05-25 東京応化工業株式会社 耐熱性感光性樹脂組成物
JP2629990B2 (ja) * 1989-12-20 1997-07-16 住友化学工業株式会社 ポジ型レジスト用組成物
US5182184A (en) * 1990-02-05 1993-01-26 Morton International, Inc. Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom
EP0496698A2 (de) * 1991-01-22 1992-07-29 Ciba-Geigy Ag Flexibile Laminate
JP3070116B2 (ja) * 1991-03-25 2000-07-24 住友化学工業株式会社 多価フェノール化合物およびそれを用いてなるポジ型レジスト組成物
JP2816774B2 (ja) * 1991-03-29 1998-10-27 日本石油株式会社 フェノール樹脂、その樹脂の製造法および封止材用エポキシ樹脂組成物
JP2976597B2 (ja) * 1991-04-17 1999-11-10 住友化学工業株式会社 キノンジアジドスルホン酸エステルの製造方法
JP3000731B2 (ja) * 1991-07-25 2000-01-17 住友化学工業株式会社 オキシフラバン類の製造法
JPH05188590A (ja) * 1992-01-16 1993-07-30 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP3232673B2 (ja) * 1992-08-07 2001-11-26 住友化学工業株式会社 多価フェノール化合物の製造方法
DE69332098T2 (de) * 1992-09-22 2003-03-13 Sumitomo Chemical Co., Ltd. Halogen enthaltende Epoxidharzzusammensetzung und kupferkaschiertes Laminat
JP3147531B2 (ja) * 1992-09-29 2001-03-19 住友化学工業株式会社 エポキシ樹脂銅張り積層板
JP3147532B2 (ja) * 1992-09-29 2001-03-19 住友化学工業株式会社 難燃性エポキシ樹脂銅張り積層板
JP3374317B2 (ja) * 1992-11-05 2003-02-04 住友化学工業株式会社 エポキシ樹脂組成物および銅張り積層板
KR100277365B1 (ko) * 1992-11-11 2001-09-17 고사이 아끼오 포지티브형레제스트조성물
MY130504A (en) 1994-01-28 2007-06-29 Shell Int Research Epoxy resin hardener, epoxy resin composition, and epoxy resin hardening process
JP3481338B2 (ja) * 1995-02-01 2003-12-22 ジャパンエポキシレジン株式会社 液状エポキシ樹脂組成物

Also Published As

Publication number Publication date
TW401438B (en) 2000-08-11
CN1155655C (zh) 2004-06-30
CN1125218A (zh) 1996-06-26
MY113726A (en) 2002-05-31
EP0699670A3 (de) 1997-04-02
CN1284521A (zh) 2001-02-21
CN1060771C (zh) 2001-01-17
CA2157149A1 (en) 1996-03-01
KR960007580A (ko) 1996-03-22
EP0699670A2 (de) 1996-03-06
EP0699670B1 (de) 2002-03-06
KR100373563B1 (ko) 2004-04-08
CN1284520A (zh) 2001-02-21
US20020010288A1 (en) 2002-01-24
US5916683A (en) 1999-06-29
US6469109B2 (en) 2002-10-22
US5726257A (en) 1998-03-10
DE69525693T2 (de) 2002-09-26

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