DE69525193D1 - Verfahren zur Herstellung eines Quarzglastiegels und Vorrichtung zur Durchführung dieses Verfahrens - Google Patents

Verfahren zur Herstellung eines Quarzglastiegels und Vorrichtung zur Durchführung dieses Verfahrens

Info

Publication number
DE69525193D1
DE69525193D1 DE69525193T DE69525193T DE69525193D1 DE 69525193 D1 DE69525193 D1 DE 69525193D1 DE 69525193 T DE69525193 T DE 69525193T DE 69525193 T DE69525193 T DE 69525193T DE 69525193 D1 DE69525193 D1 DE 69525193D1
Authority
DE
Germany
Prior art keywords
producing
carrying
quartz glass
glass crucible
crucible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69525193T
Other languages
English (en)
Other versions
DE69525193T2 (de
Inventor
Tooru Ikeda
Kazuo Asajima
Hiroyuki Kimura
Hiroyuki Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=16214260&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69525193(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Heraeus Quarzglas GmbH and Co KG, Shin Etsu Quartz Products Co Ltd filed Critical Heraeus Quarzglas GmbH and Co KG
Application granted granted Critical
Publication of DE69525193D1 publication Critical patent/DE69525193D1/de
Publication of DE69525193T2 publication Critical patent/DE69525193T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002—Crucibles or containers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/08—Quartz

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69525193T 1994-07-19 1995-07-18 Verfahren zur Herstellung eines Quarzglastiegels und Vorrichtung zur Durchführung dieses Verfahrens Expired - Fee Related DE69525193T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6187905A JP2830987B2 (ja) 1994-07-19 1994-07-19 石英ガラスルツボ及びその製造方法

Publications (2)

Publication Number Publication Date
DE69525193D1 true DE69525193D1 (de) 2002-03-14
DE69525193T2 DE69525193T2 (de) 2002-08-29

Family

ID=16214260

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69525193T Expired - Fee Related DE69525193T2 (de) 1994-07-19 1995-07-18 Verfahren zur Herstellung eines Quarzglastiegels und Vorrichtung zur Durchführung dieses Verfahrens

Country Status (4)

Country Link
US (1) US5762672A (de)
EP (1) EP0693461B1 (de)
JP (1) JP2830987B2 (de)
DE (1) DE69525193T2 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997010182A1 (en) * 1995-09-12 1997-03-20 Corning Incorporated Furnace, method of use, and optical product made by furnace in producing fused silica glass
US6182237B1 (en) 1998-08-31 2001-01-30 International Business Machines Corporation System and method for detecting phase errors in asics with multiple clock frequencies
WO2000059837A1 (en) * 1999-04-06 2000-10-12 Nanwa Quartz, Inc. Method for manufacturing quartz glass crucible
JP2001342026A (ja) * 2000-05-30 2001-12-11 Tosoh Quartz Corp 石英ガラスの製造方法及び製造装置
AUPR054000A0 (en) * 2000-10-04 2000-10-26 Austai Motors Designing Pty Ltd A planetary gear apparatus
US6546754B1 (en) * 2000-10-27 2003-04-15 General Electric Company Apparatus for silica crucible manufacture
US6502422B1 (en) * 2000-10-27 2003-01-07 General Electric Company Method for quartz crucible fabrication
US20040118156A1 (en) * 2001-03-08 2004-06-24 Gabriele Korus Method of producing a quartz glass crucible
US6755049B2 (en) * 2001-03-08 2004-06-29 Heraeus Quarzglas Gmbh & Co. Kg Method of producing a quartz glass crucible
US6510707B2 (en) * 2001-03-15 2003-01-28 Heraeus Shin-Etsu America, Inc. Methods for making silica crucibles
JP4841764B2 (ja) * 2001-07-23 2011-12-21 信越石英株式会社 シリコン単結晶引上げ用石英ガラスるつぼの製造方法及び装置
US20050120945A1 (en) * 2003-12-03 2005-06-09 General Electric Company Quartz crucibles having reduced bubble content and method of making thereof
US20070158653A1 (en) * 2004-02-02 2007-07-12 Shin-Etsu Handotai Co., Ltd. Silicon single crystal, a silicon wafer, an apparatus for producing the same, and a method for producing the same
US7837955B2 (en) * 2006-03-08 2010-11-23 Unimin Corporation Continuous reactor system for anoxic purification
TWI408259B (zh) * 2006-09-28 2013-09-11 Shinetsu Quartz Prod 具有鋇摻雜內壁的矽玻璃坩堝
WO2009017068A1 (ja) * 2007-07-28 2009-02-05 Japan Super Quartz Corporation 石英ガラスルツボの製造方法および製造装置
DE102008026890B3 (de) * 2008-06-05 2009-06-04 Heraeus Quarzglas Gmbh & Co. Kg Verfahren und Vorrichtung zur Herstellung eines Tiegels aus Quarzglas
US8272234B2 (en) * 2008-12-19 2012-09-25 Heraeus Shin-Etsu America, Inc. Silica crucible with pure and bubble free inner crucible layer and method of making the same
US9003832B2 (en) * 2009-11-20 2015-04-14 Heraeus Shin-Etsu America, Inc. Method of making a silica crucible in a controlled atmosphere
TW201202454A (en) * 2010-07-07 2012-01-16 Hon Hai Prec Ind Co Ltd Processing apparatus for smoothing film material and evaporation deposition device with same
CN102384646A (zh) * 2010-09-02 2012-03-21 方强 实现内加热的坩埚、炉体及坩埚电阻炉
US20120267280A1 (en) * 2011-04-25 2012-10-25 Glen Bennett Cook Vessel for molten semiconducting materials and methods of making the same
US8281620B1 (en) * 2011-04-27 2012-10-09 Japan Super Quartz Corporation Apparatus for manufacturing vitreous silica crucible
JP2013544745A (ja) * 2011-05-25 2013-12-19 サンゴバン・リサーチ・（シャンハイ）・カンパニー・リミテッド シリカ坩堝およびその製造方法
US8857214B2 (en) * 2011-11-18 2014-10-14 Sunedison Semiconductor Limited Methods for producing crucibles with a reduced amount of bubbles
US8524319B2 (en) 2011-11-18 2013-09-03 Memc Electronic Materials, Inc. Methods for producing crucibles with a reduced amount of bubbles
KR101659340B1 (ko) * 2015-03-30 2016-09-26 (주) 디에스테크노 고 순도 실린더형 석영 유리의 제조 장치
KR102129454B1 (ko) * 2018-01-18 2020-07-02 이석연 잉곳 도가니의 열처리장치
JP7023130B2 (ja) 2018-02-06 2022-02-21 信越石英株式会社 カーボン電極及び石英ガラスるつぼの製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2928089C3 (de) * 1979-07-12 1982-03-04 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verbundtiegel für halbleitertechnologische Zwecke und Verfahren zur Herstellung
DE3014311C2 (de) * 1980-04-15 1982-06-16 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung von Quarzglastiegeln und Vorrichtung zur Durchführung dieses Verfahrens
JPS59164645A (ja) * 1983-03-11 1984-09-17 Denki Kagaku Kogyo Kk 溶融珪酸の製造方法
GB8427915D0 (en) * 1984-11-05 1984-12-12 Tsl Thermal Syndicate Plc Vitreous silica products
US4632686A (en) * 1986-02-24 1986-12-30 Gte Products Corporation Method of manufacturing quartz glass crucibles with low bubble content
US4713104A (en) * 1986-03-31 1987-12-15 Gte Products Corporation Quartz glass crucibles
US4963178A (en) * 1986-03-31 1990-10-16 Gte Products Corporation Apparatus for making quartz glass crucibles
US4911896A (en) * 1986-07-24 1990-03-27 General Electric Company Fused quartz member for use in semiconductor manufacture
US4935046A (en) * 1987-12-03 1990-06-19 Shin-Etsu Handotai Company, Limited Manufacture of a quartz glass vessel for the growth of single crystal semiconductor
JPH01148718A (ja) * 1987-12-03 1989-06-12 Shin Etsu Handotai Co Ltd 石英るつぼの製造方法
JP2559604B2 (ja) * 1987-12-15 1996-12-04 東芝セラミックス株式会社 石英ガラスルツボの製造方法
JP2615292B2 (ja) * 1987-12-17 1997-05-28 東芝セラミックス株式会社 石英ガラスルツボの製造方法
JP2933404B2 (ja) * 1990-06-25 1999-08-16 信越石英 株式会社 シリコン単結晶引き上げ用石英ガラスルツボとその製造方法

Also Published As

Publication number Publication date
EP0693461A1 (de) 1996-01-24
JPH0826759A (ja) 1996-01-30
DE69525193T2 (de) 2002-08-29
US5762672A (en) 1998-06-09
JP2830987B2 (ja) 1998-12-02
EP0693461B1 (de) 2002-01-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee