DE69629111D1 - Verfahren zur herstellung eines synthetischen quarzpulvers und geformtem quarzglas - Google Patents

Verfahren zur herstellung eines synthetischen quarzpulvers und geformtem quarzglas

Info

Publication number
DE69629111D1
DE69629111D1 DE69629111T DE69629111T DE69629111D1 DE 69629111 D1 DE69629111 D1 DE 69629111D1 DE 69629111 T DE69629111 T DE 69629111T DE 69629111 T DE69629111 T DE 69629111T DE 69629111 D1 DE69629111 D1 DE 69629111D1
Authority
DE
Germany
Prior art keywords
producing
molded
quartz glass
powder
synthetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69629111T
Other languages
English (en)
Other versions
DE69629111T2 (de
Inventor
Yoshio Katsuro
Masaru Shimoyama
Hiroshi Maeda
Shoji Oishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10588995A external-priority patent/JP3735887B2/ja
Priority claimed from JP10588895A external-priority patent/JP3735886B2/ja
Priority claimed from JP25245895A external-priority patent/JP3806953B2/ja
Priority claimed from JP25245695A external-priority patent/JP3875735B2/ja
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Publication of DE69629111D1 publication Critical patent/DE69629111D1/de
Application granted granted Critical
Publication of DE69629111T2 publication Critical patent/DE69629111T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/11—Powder tap density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Silicon Compounds (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
DE69629111T 1995-04-28 1996-04-26 Verfahren zur herstellung eines synthetischen quarzpulvers und geformtem quarzglas Expired - Lifetime DE69629111T2 (de)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP10588895 1995-04-28
JP10588995A JP3735887B2 (ja) 1995-04-28 1995-04-28 合成石英粉の製造方法及び石英ガラス成形体の製造方法
JP10588895A JP3735886B2 (ja) 1995-04-28 1995-04-28 合成石英粉の製造方法及び石英ガラス成形体の製造方法
JP10588995 1995-04-28
JP25245695 1995-09-29
JP25245895A JP3806953B2 (ja) 1995-09-29 1995-09-29 合成石英粉の製造方法
JP25245895 1995-09-29
JP25245795 1995-09-29
JP25245795 1995-09-29
JP25245695A JP3875735B2 (ja) 1995-09-29 1995-09-29 合成石英粉の製造方法
PCT/JP1996/001176 WO1996033950A1 (fr) 1995-04-28 1996-04-26 Procedes pour produire de la poudre de quartz synthetique et pour produire du verre de quartz forme

Publications (2)

Publication Number Publication Date
DE69629111D1 true DE69629111D1 (de) 2003-08-21
DE69629111T2 DE69629111T2 (de) 2004-04-22

Family

ID=27526249

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69629111T Expired - Lifetime DE69629111T2 (de) 1995-04-28 1996-04-26 Verfahren zur herstellung eines synthetischen quarzpulvers und geformtem quarzglas

Country Status (5)

Country Link
US (1) US6129899A (de)
EP (1) EP0823403B1 (de)
KR (1) KR19990008146A (de)
DE (1) DE69629111T2 (de)
WO (1) WO1996033950A1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1088789A3 (de) * 1999-09-28 2002-03-27 Heraeus Quarzglas GmbH & Co. KG Poröse Granulate aus Siliciumdioxid, deren Herstellungsverfahren und deren Verwendung bei einem Verfahren zur Herstellung von Quarzglas
DE60123878T2 (de) * 2000-06-28 2007-05-24 Japan Super Quartz Corp. Synthetisches Quarzpulver, Verfahren zur Herstellung und synthetischer Quarztiegel
US6838068B2 (en) * 2000-06-30 2005-01-04 Mitsubishi Chemical Corporation Silica gel
WO2002026647A1 (en) * 2000-09-28 2002-04-04 Corning Incorporated Optical glass silica soot particles and method of making same
WO2003008332A1 (fr) * 2001-07-19 2003-01-30 Mitsubishi Chemical Corporation Poudre de quartz de grande purete, procede de fabrication et article obtenu a partir de cette poudre
MY135619A (en) * 2002-11-12 2008-05-30 Nitto Denko Corp Epoxy resin composition for semiconductor encapsulation, and semiconductor device using the same
EP1648604A1 (de) * 2003-06-30 2006-04-26 Shell Internationale Researchmaatschappij B.V. Herstellung eines katalysators
US7637126B2 (en) * 2003-12-08 2009-12-29 Heraeus Quarzglas Gmbh & Co. Kg Method for the production of laser-active quartz glass and use thereof
JP2008056533A (ja) * 2006-08-31 2008-03-13 Shinetsu Quartz Prod Co Ltd 石英ガラス及びその製造方法
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof
US8197782B2 (en) 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof
US10308541B2 (en) 2014-11-13 2019-06-04 Gerresheimer Glas Gmbh Glass forming machine particle filter, a plunger unit, a blow head, a blow head support and a glass forming machine adapted to or comprising said filter
WO2017103125A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
TWI812586B (zh) 2015-12-18 2023-08-21 德商何瑞斯廓格拉斯公司 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點
TWI794149B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 石英玻璃粉粒、不透明成型體及彼等之製備方法
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
TW201731782A (zh) 2015-12-18 2017-09-16 何瑞斯廓格拉斯公司 在多腔式爐中製備石英玻璃體
CN108698887B (zh) 2015-12-18 2022-01-21 贺利氏石英玻璃有限两合公司 由均质石英玻璃制得的玻璃纤维和预成形品
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
CN108698892A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 从二氧化硅颗粒制备石英玻璃体
TWI813534B (zh) 2015-12-18 2023-09-01 德商何瑞斯廓格拉斯公司 利用露點監測在熔融烘箱中製備石英玻璃體
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58181735A (ja) * 1982-04-19 1983-10-24 Seiko Epson Corp 石英ガラスの製造法
JPS6335411A (ja) * 1986-07-29 1988-02-16 Tonen Sekiyukagaku Kk 高純度合成石英の製造方法
US5030433A (en) * 1988-07-18 1991-07-09 International Minerals & Chemical Corp. Process for producing pure and dense amorphous synthetic silica particles
EP0474158B1 (de) * 1990-09-07 1995-04-19 Mitsubishi Chemical Corporation Silica-Glas Pulver und Verfahren seiner Herstellung und daraus hergestellter Silica-Glasgegenstand
EP0486004B1 (de) * 1990-11-16 1996-09-11 Mitsubishi Chemical Corporation Verfahren zum Herstellen von hochreinem Glaspulver
WO1994003404A1 (en) * 1992-07-31 1994-02-17 Shin-Etsu Quartz Products Co., Ltd. Quartz glass plate large in size and high in purity, and method and device for making said plate
JPH06191824A (ja) * 1992-12-24 1994-07-12 Mitsubishi Kasei Corp 石英粉の廻転加熱方法
JPH072513A (ja) * 1993-06-15 1995-01-06 Kimmon Mfg Co Ltd 合成石英ガラス粉の製造方法
WO1996020128A1 (fr) * 1994-12-26 1996-07-04 Mitsubishi Chemical Corporation Procede de production de poudre de quartz synthetique
DE19729505A1 (de) * 1997-07-10 1999-01-14 Heraeus Quarzglas Verfahren zur Herstellung von Si0¶2¶-Granulat

Also Published As

Publication number Publication date
US6129899A (en) 2000-10-10
WO1996033950A1 (fr) 1996-10-31
EP0823403B1 (de) 2003-07-16
EP0823403A4 (de) 1998-02-25
EP0823403A1 (de) 1998-02-11
DE69629111T2 (de) 2004-04-22
KR19990008146A (ko) 1999-01-25

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