DE69500907T2 - Elektronenmikroskop zur Fehlerbeobachtung - Google Patents

Elektronenmikroskop zur Fehlerbeobachtung

Info

Publication number
DE69500907T2
DE69500907T2 DE69500907T DE69500907T DE69500907T2 DE 69500907 T2 DE69500907 T2 DE 69500907T2 DE 69500907 T DE69500907 T DE 69500907T DE 69500907 T DE69500907 T DE 69500907T DE 69500907 T2 DE69500907 T2 DE 69500907T2
Authority
DE
Germany
Prior art keywords
electron microscope
error monitoring
error
monitoring
microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69500907T
Other languages
English (en)
Other versions
DE69500907D1 (de
Inventor
Hiroshi Kakibayashi
Hisaya Murakoshi
Hidekazu Okuhira
Takashi Irie
Jiro Tokita
Keiichi Kanehori
Yasuhiro Mitsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69500907D1 publication Critical patent/DE69500907D1/de
Publication of DE69500907T2 publication Critical patent/DE69500907T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2617—Comparison or superposition of transmission images; Moiré
DE69500907T 1994-06-10 1995-06-09 Elektronenmikroskop zur Fehlerbeobachtung Expired - Fee Related DE69500907T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6128471A JPH07335165A (ja) 1994-06-10 1994-06-10 格子欠陥観察用電子顕微鏡

Publications (2)

Publication Number Publication Date
DE69500907D1 DE69500907D1 (de) 1997-11-27
DE69500907T2 true DE69500907T2 (de) 1998-05-28

Family

ID=14985554

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69500907T Expired - Fee Related DE69500907T2 (de) 1994-06-10 1995-06-09 Elektronenmikroskop zur Fehlerbeobachtung

Country Status (5)

Country Link
US (1) US5744800A (de)
EP (1) EP0686994B1 (de)
JP (1) JPH07335165A (de)
KR (1) KR960002461A (de)
DE (1) DE69500907T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19839871C2 (de) * 1998-09-02 2000-06-15 Dresden Ev Inst Festkoerper Manipulator zur Positionierung von Proben in Apparaturen und Kammern
US6825467B2 (en) * 2002-06-25 2004-11-30 Agere Systems, Inc. Apparatus for scanning a crystalline sample and associated methods
US6875982B2 (en) * 2003-08-29 2005-04-05 International Business Machines Corporation Electron microscope magnification standard providing precise calibration in the magnification range 5000X-2000,000X
JP4704776B2 (ja) * 2005-03-07 2011-06-22 富士通株式会社 結晶材料の格子歪みの評価方法及びその評価装置
GB0608258D0 (en) * 2006-04-26 2006-06-07 Perkinelmer Singapore Pte Ltd Spectroscopy using attenuated total internal reflectance (ATR)
JP4920370B2 (ja) * 2006-10-30 2012-04-18 株式会社日立製作所 透過型電子顕微鏡の情報伝達限界測定法およびこの測定法が適用された透過型電子顕微鏡
JP5368817B2 (ja) * 2008-04-24 2013-12-18 浜松ホトニクス株式会社 医療用ｘ線撮像システム
JP5383231B2 (ja) * 2008-07-08 2014-01-08 宮崎 裕也 試料ホルダー及び試料ホルダー駆動装置
DE102009001587A1 (de) * 2009-01-06 2010-07-08 Carl Zeiss Nts Gmbh Verfahren zur Einstellung eines Betriebsparameters eines Teilchenstrahlgeräts sowie Probenhalter zur Durchführung des Verfahrens
JP5250470B2 (ja) * 2009-04-22 2013-07-31 株式会社日立ハイテクノロジーズ 試料ホールダ，該試料ホールダの使用法、及び荷電粒子装置
JP5728162B2 (ja) * 2010-03-30 2015-06-03 株式会社メルビル 試料ホルダー、及び試料駆動装置
US20120037815A1 (en) * 2010-08-16 2012-02-16 Yunn-Shin Shiue Tem phase plate loading system
US9939386B2 (en) * 2012-04-12 2018-04-10 KLA—Tencor Corporation Systems and methods for sample inspection and review
JP6130185B2 (ja) * 2013-03-28 2017-05-17 日本電子株式会社 試料導入装置および荷電粒子線装置
JP2014240780A (ja) * 2013-06-11 2014-12-25 株式会社東芝 試料構造分析方法、透過電子顕微鏡およびプログラム
JP6433550B1 (ja) * 2017-07-19 2018-12-05 株式会社日立製作所 試料保持機構、及び荷電粒子線装置
US11257656B2 (en) * 2020-04-08 2022-02-22 Fei Company Rotating sample holder for random angle sampling in tomography

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3509335A (en) * 1967-06-26 1970-04-28 William Charles Nixon Electron microscope having two separate specimen stages
GB1225856A (de) * 1968-08-30 1971-03-24
US4760265A (en) * 1986-01-18 1988-07-26 Kabushiki Kaisha Toyoda Jidoshokki Seisakusho Method and device for detecting defects of patterns in microelectronic devices
JPS62260335A (ja) * 1986-05-06 1987-11-12 Hitachi Ltd パタ−ン検査方法および装置
JPH0614460B2 (ja) * 1987-05-22 1994-02-23 日本電子株式会社 電子顕微鏡等における試料装置
JP2673900B2 (ja) * 1988-12-05 1997-11-05 株式会社日立製作所 電子顕微鏡

Also Published As

Publication number Publication date
JPH07335165A (ja) 1995-12-22
US5744800A (en) 1998-04-28
EP0686994A1 (de) 1995-12-13
KR960002461A (ko) 1996-01-26
EP0686994B1 (de) 1997-10-22
DE69500907D1 (de) 1997-11-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee