DE69518609D1 - Mikroskop mit Ausrichtungsfunktion - Google Patents

Mikroskop mit Ausrichtungsfunktion

Info

Publication number
DE69518609D1
DE69518609D1 DE69518609T DE69518609T DE69518609D1 DE 69518609 D1 DE69518609 D1 DE 69518609D1 DE 69518609 T DE69518609 T DE 69518609T DE 69518609 T DE69518609 T DE 69518609T DE 69518609 D1 DE69518609 D1 DE 69518609D1
Authority
DE
Germany
Prior art keywords
alignment microscope
microscope
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69518609T
Other languages
English (en)
Other versions
DE69518609T2 (de
Inventor
Masatoshi Yasutake
Naohiko Fujino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SII NANOTECHNOLOGY INC., CHIBA, JP
Mitsubishi Electric Corp
Original Assignee
Seiko Instruments Inc
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc, Mitsubishi Electric Corp filed Critical Seiko Instruments Inc
Application granted granted Critical
Publication of DE69518609D1 publication Critical patent/DE69518609D1/de
Publication of DE69518609T2 publication Critical patent/DE69518609T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
    • G01Q30/025—Optical microscopes coupled with SPM
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/868—Scanning probe structure with optical means
    • Y10S977/869—Optical microscope
DE69518609T 1994-11-29 1995-11-29 Mikroskop mit Ausrichtungsfunktion Expired - Lifetime DE69518609T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6295113A JPH08152430A (ja) 1994-11-29 1994-11-29 位置合わせ機能付き顕微鏡

Publications (2)

Publication Number Publication Date
DE69518609D1 true DE69518609D1 (de) 2000-10-05
DE69518609T2 DE69518609T2 (de) 2001-01-11

Family

ID=17816467

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69518609T Expired - Lifetime DE69518609T2 (de) 1994-11-29 1995-11-29 Mikroskop mit Ausrichtungsfunktion

Country Status (4)

Country Link
US (1) US5650614A (de)
EP (1) EP0715147B1 (de)
JP (1) JPH08152430A (de)
DE (1) DE69518609T2 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
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US6271916B1 (en) 1994-03-24 2001-08-07 Kla-Tencor Corporation Process and assembly for non-destructive surface inspections
US5952562A (en) * 1995-11-22 1999-09-14 Olympus Optical Co., Ltd. Scanning probe microscope incorporating an optical microscope
US5955661A (en) * 1997-01-06 1999-09-21 Kla-Tencor Corporation Optical profilometer combined with stylus probe measurement device
US20040057045A1 (en) * 2000-12-21 2004-03-25 Mehdi Vaez-Iravani Sample inspection system
US6201601B1 (en) 1997-09-19 2001-03-13 Kla-Tencor Corporation Sample inspection system
US6956644B2 (en) * 1997-09-19 2005-10-18 Kla-Tencor Technologies Corporation Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination
US6185030B1 (en) * 1998-03-20 2001-02-06 James W. Overbeck Wide field of view and high speed scanning microscopy
US20050134841A1 (en) * 1998-09-18 2005-06-23 Mehdi Vacz-Iravani Sample inspection system
US6455838B2 (en) 1998-10-06 2002-09-24 The Regents Of The University Of California High sensitivity deflection sensing device
US6085581A (en) * 1998-11-18 2000-07-11 Sandia Corporation Method for accurately positioning a device at a desired area of interest
US7292261B1 (en) * 1999-08-20 2007-11-06 Patrick Teo Virtual reality camera
US6552337B1 (en) * 1999-11-02 2003-04-22 Samsung Electronics Co., Ltd. Methods and systems for measuring microroughness of a substrate combining particle counter and atomic force microscope measurements
US6452161B1 (en) 2000-03-28 2002-09-17 Advanced Micro Devices, Inc. Scanning probe microscope having optical fiber spaced from point of hp
US6479817B1 (en) 2000-03-28 2002-11-12 Advanced Micro Devices, Inc. Cantilever assembly and scanning tip therefor with associated optical sensor
US6538730B2 (en) 2001-04-06 2003-03-25 Kla-Tencor Technologies Corporation Defect detection system
JP2002350128A (ja) * 2001-05-30 2002-12-04 Canon Inc 立体形状計測装置並びに立体形状計測方法および位置合わせ方法
US7116413B2 (en) * 2002-09-13 2006-10-03 Kla-Tencor Corporation Inspection system for integrated applications
WO2004031754A1 (en) * 2002-09-30 2004-04-15 Applied Materials Israel, Ltd. Dark field inspection system
JP4068525B2 (ja) * 2003-08-19 2008-03-26 エスアイアイ・ナノテクノロジー株式会社 防音ボックスおよびそれを用いたプローブ顕微鏡
US7430898B1 (en) * 2003-09-04 2008-10-07 Kla-Tencor Technologies Corp. Methods and systems for analyzing a specimen using atomic force microscopy profiling in combination with an optical technique
DE10346349B4 (de) * 2003-09-30 2005-11-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Sondenanordnung für ein Rastersondeninstrument
JP4563117B2 (ja) * 2004-09-03 2010-10-13 エスアイアイ・ナノテクノロジー株式会社 顕微鏡システム及び顕微鏡システムの走査法ならびに顕微鏡システムの画像合成法
US7554656B2 (en) * 2005-10-06 2009-06-30 Kla-Tencor Technologies Corp. Methods and systems for inspection of a wafer
US7697128B2 (en) * 2007-03-23 2010-04-13 Asml Netherlands B.V. Method of imaging radiation from an object on a detection device and an inspection device for inspecting an object
JP5123630B2 (ja) * 2007-09-27 2013-01-23 株式会社ニューフレアテクノロジー パターン検査装置及びパターン検査方法
KR100941980B1 (ko) * 2007-11-14 2010-02-11 한국표준과학연구원 고속 대면적 정밀측정 장치 및 방법
SI2289708T1 (sl) * 2009-08-26 2012-04-30 Indaffil Holding Ag Postopek za izdelavo povrĺˇinske strukture kovinske potisne ploĺˇäśe, brezkonäśnega traku ali reliefnega valja
JP6009862B2 (ja) * 2012-08-24 2016-10-19 株式会社日立ハイテクサイエンス 走査型プローブ顕微鏡
JP6229218B2 (ja) * 2014-03-13 2017-11-15 国立研究開発法人産業技術総合研究所 走査型プローブ顕微鏡
JP6723633B2 (ja) * 2015-12-10 2020-07-15 株式会社ディスコ 検査装置
CN111289778A (zh) * 2020-03-12 2020-06-16 中国石油化工股份有限公司 一种页岩样品扫描电镜和原子力显微镜原位观察的方法
US11619649B1 (en) * 2021-11-26 2023-04-04 Park Systems Corp. Atomic force microscope equipped with optical measurement device and method of acquiring information on surface of measurement target using the same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4595289A (en) * 1984-01-25 1986-06-17 At&T Bell Laboratories Inspection system utilizing dark-field illumination
JPS62130202A (ja) 1985-12-02 1987-06-12 Honda Motor Co Ltd 含浸における洗浄方法及び装置
JP2909829B2 (ja) * 1989-07-05 1999-06-23 セイコーインスツルメンツ株式会社 位置合わせ機能付複合走査型トンネル顕微鏡
US5394741A (en) * 1990-07-11 1995-03-07 Olympus Optical Co., Ltd. Atomic probe microscope
US5177559A (en) * 1991-05-17 1993-01-05 International Business Machines Corporation Dark field imaging defect inspection system for repetitive pattern integrated circuits
JPH0540034A (ja) * 1991-08-08 1993-02-19 Nikon Corp 複合型顕微鏡
US5376790A (en) * 1992-03-13 1994-12-27 Park Scientific Instruments Scanning probe microscope
JP2840801B2 (ja) 1992-12-01 1998-12-24 セイコーインスツルメンツ株式会社 座標変換係数の自動設定方法
US5426302A (en) * 1993-04-28 1995-06-20 Board Of Regents, University Of Texas Optically guided macroscopic-scan-range/nanometer resolution probing system
US5517027A (en) * 1993-06-08 1996-05-14 Mitsubishi Denki Kabushiki Kaisha Method for detecting and examining slightly irregular surface states, scanning probe microscope therefor, and method for fabricating a semiconductor device or a liquid crystal display device using these

Also Published As

Publication number Publication date
EP0715147B1 (de) 2000-08-30
US5650614A (en) 1997-07-22
JPH08152430A (ja) 1996-06-11
DE69518609T2 (de) 2001-01-11
EP0715147A2 (de) 1996-06-05
EP0715147A3 (de) 1996-08-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MITSUBISHI ELECTRIC CORP., AMAGASAKI, HYOGO, JP

Owner name: SII NANOTECHNOLOGY INC., CHIBA, JP