JP6723633B2 - 検査装置 - Google Patents
検査装置 Download PDFInfo
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- JP6723633B2 JP6723633B2 JP2015240929A JP2015240929A JP6723633B2 JP 6723633 B2 JP6723633 B2 JP 6723633B2 JP 2015240929 A JP2015240929 A JP 2015240929A JP 2015240929 A JP2015240929 A JP 2015240929A JP 6723633 B2 JP6723633 B2 JP 6723633B2
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/392—Measuring reradiation, e.g. fluorescence, backscatter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4735—Solid samples, e.g. paper, glass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8822—Dark field detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/10—Scanning
- G01N2201/104—Mechano-optical scan, i.e. object and beam moving
Description
4 基台
6 保持テーブル(被検査物保持手段)
6a 保持面
8,8a,8b 欠陥検出ユニット(欠陥検出手段)
10 3次元測定ユニット(3次元測定手段)
12 支持構造
12a 前面
12b 後面
14 第1移動機構
16 第1ガイドレール
18 移動ブロック
20 第1ボールネジ
22 第1パルスモータ
24 第2移動機構
26 Y軸ガイドレール
28 Y軸移動プレート
30 Y軸ボールネジ
32 Y軸パルスモータ
34 Z軸ガイドレール
36 筐体
38 Z軸ボールネジ
40 Z軸パルスモータ
42 レーザー照射ユニット
44 集光ユニット
44a 内壁面
44b 開口
46 検出ユニット
48 光電子増倍管
52 光源
54 ハーフミラー
56 集光ユニット
58 鏡筒
60 干渉ユニット
62 プレート
64 ハーフミラー
66 参照ミラー
68 撮像ユニット
72 明視野光源
74 照明レンズ
76 ハーフミラー
78 鏡筒
80 対物レンズ
82 暗視野光源
84 ミラー
86 結像レンズ
88 撮像ユニット
11 被検査物
11a 被検査面
21 レーザー光線
23 散乱光
25,27,29 光
31 明視野光
33 暗視野光
Claims (4)
- 板状の被検査物を検査する検査装置であって、
該被検査物を保持する保持面を備えた被検査物保持手段と、
該被検査物の面に照射されたレーザー光線の散乱光に基づいて、研削又は研磨で発生した該面内のスクラッチを検出する欠陥検出手段と、
該欠陥検出手段で検出された該スクラッチが含まれる領域を3次元的に撮像して再評価する3次元測定手段と、を備え、
該3次元測定手段は、ミラウ型の干渉光学系を含み、Z軸方向の位置を変えて複数の画像を取得することを特徴とする検査装置。 - 板状の被検査物を検査する検査装置であって、
該被検査物を保持する保持面を備えた被検査物保持手段と、
該被検査物の面を明視野又は暗視野で撮像して、研削又は研磨で発生した該面内のスクラッチを検出する欠陥検出手段と、
該欠陥検出手段で検出された該スクラッチが含まれる領域を3次元的に撮像して再評価する3次元測定手段と、を備え、
該3次元測定手段は、ミラウ型の干渉光学系を含み、Z軸方向の位置を変えて複数の画像を取得することを特徴とする検査装置。 - 該欠陥検出手段は、該散乱光の光強度が予め設定された閾値を超えた場合に該スクラッチが存在すると判定することを特徴とする請求項1に記載の検査装置。
- 該被検査物保持手段に連結され該被検査物保持手段を回転させる回転駆動源と、
該被検査物保持手段を跨ぐように配置された支持構造と、
該支持構造に設けられ、該欠陥検出手段を左右方向に移動させる第1移動機構と、
該支持構造に設けられ、該3次元測定手段を該左右方向に移動させる第2移動機構と、を更に備え、
該被検査物保持手段を回転させるとともに、該欠陥検出手段又は該3次元測定手段を該左右方向に移動させることで、該欠陥検出手段による該スクラッチの検出又は該3次元測定手段による該領域の3次元的な撮像を行うことを特徴とする請求項1から請求項3のいずれかに記載の検査装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015240929A JP6723633B2 (ja) | 2015-12-10 | 2015-12-10 | 検査装置 |
TW105136686A TWI715662B (zh) | 2015-12-10 | 2016-11-10 | 檢查裝置 |
KR1020160153805A KR102557511B1 (ko) | 2015-12-10 | 2016-11-18 | 검사 장치 |
CN201611100049.XA CN106970082A (zh) | 2015-12-10 | 2016-12-02 | 检查装置 |
Applications Claiming Priority (1)
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JP2015240929A JP6723633B2 (ja) | 2015-12-10 | 2015-12-10 | 検査装置 |
Publications (2)
Publication Number | Publication Date |
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JP2017106816A JP2017106816A (ja) | 2017-06-15 |
JP6723633B2 true JP6723633B2 (ja) | 2020-07-15 |
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Country Status (4)
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JP (1) | JP6723633B2 (ja) |
KR (1) | KR102557511B1 (ja) |
CN (1) | CN106970082A (ja) |
TW (1) | TWI715662B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20230081403A (ko) * | 2021-11-30 | 2023-06-07 | 씨제이제일제당 (주) | 식품 텍스쳐 측정 장치 및 식품 텍스쳐 측정 방법 |
Family Cites Families (26)
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JPH0278938A (ja) * | 1988-09-16 | 1990-03-19 | Toshiba Corp | 光学式表面欠陥検査装置 |
JP2981117B2 (ja) * | 1993-06-08 | 1999-11-22 | 三菱電機株式会社 | 微小異物の検出および検査方法、それに用いられる走査型プローブ顕微鏡ならびにこれらを用いた半導体素子または液晶表示素子の製法 |
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CN1214116A (zh) * | 1996-03-15 | 1999-04-14 | 株式会社日立制作所 | 表面晶体缺陷的测量方法及装置 |
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JP2001116529A (ja) * | 1999-10-15 | 2001-04-27 | Canon Inc | 異物検査装置及びそれを用いたデバイスの製造方法 |
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JP4704040B2 (ja) * | 2002-09-30 | 2011-06-15 | アプライド マテリアルズ イスラエル リミテッド | 光学的検査のための照明システム |
JP2007071803A (ja) * | 2005-09-09 | 2007-03-22 | Hitachi High-Technologies Corp | 欠陥観察方法及びその装置 |
JP4784555B2 (ja) * | 2007-05-25 | 2011-10-05 | トヨタ自動車株式会社 | 形状評価方法、形状評価装置および三次元検査装置 |
JP5274919B2 (ja) * | 2008-07-09 | 2013-08-28 | 株式会社ディスコ | 研削装置及びスクラッチ検出装置 |
WO2010008067A1 (ja) * | 2008-07-18 | 2010-01-21 | 旭硝子株式会社 | 欠陥検査のための画像データの処理装置および方法、これらを用いた欠陥検査装置および方法、これらを用いた板状体の製造方法、並びに記録媒体 |
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CN102288622A (zh) * | 2011-04-29 | 2011-12-21 | 浙江师范大学 | 光学元件内部缺陷的检测方法及装置 |
KR20140022064A (ko) * | 2011-05-10 | 2014-02-21 | 아사히 가라스 가부시키가이샤 | 투광성 판상체의 미소 결점의 검사 방법 및 투광성 판상체의 미소 결점의 검사 장치 |
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-
2015
- 2015-12-10 JP JP2015240929A patent/JP6723633B2/ja active Active
-
2016
- 2016-11-10 TW TW105136686A patent/TWI715662B/zh active
- 2016-11-18 KR KR1020160153805A patent/KR102557511B1/ko active IP Right Grant
- 2016-12-02 CN CN201611100049.XA patent/CN106970082A/zh active Pending
Also Published As
Publication number | Publication date |
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TW201730550A (zh) | 2017-09-01 |
KR102557511B1 (ko) | 2023-07-19 |
JP2017106816A (ja) | 2017-06-15 |
KR20170069143A (ko) | 2017-06-20 |
CN106970082A (zh) | 2017-07-21 |
TWI715662B (zh) | 2021-01-11 |
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