DE69431971D1 - Dünnschichtkondensator und Herstellungsverfahren - Google Patents
Dünnschichtkondensator und HerstellungsverfahrenInfo
- Publication number
- DE69431971D1 DE69431971D1 DE69431971T DE69431971T DE69431971D1 DE 69431971 D1 DE69431971 D1 DE 69431971D1 DE 69431971 T DE69431971 T DE 69431971T DE 69431971 T DE69431971 T DE 69431971T DE 69431971 D1 DE69431971 D1 DE 69431971D1
- Authority
- DE
- Germany
- Prior art keywords
- thin film
- manufacturing process
- film capacitor
- capacitor
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/20—Dielectrics using combinations of dielectrics from more than one of groups H01G4/02 - H01G4/06
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4918—Disposition being disposed on at least two different sides of the body, e.g. dual array
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6631793 | 1993-03-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69431971D1 true DE69431971D1 (de) | 2003-02-13 |
DE69431971T2 DE69431971T2 (de) | 2003-11-27 |
Family
ID=13312340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69431971T Expired - Lifetime DE69431971T2 (de) | 1993-03-25 | 1994-03-24 | Dünnschichtkondensator und Herstellungsverfahren |
Country Status (3)
Country | Link |
---|---|
US (1) | US5406445A (de) |
EP (1) | EP0617439B1 (de) |
DE (1) | DE69431971T2 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5760432A (en) * | 1994-05-20 | 1998-06-02 | Kabushiki Kaisha Toshiba | Thin film strained layer ferroelectric capacitors |
US5578846A (en) * | 1995-03-17 | 1996-11-26 | Evans, Jr.; Joseph T. | Static ferroelectric memory transistor having improved data retention |
JP3094868B2 (ja) * | 1995-09-07 | 2000-10-03 | 三菱マテリアル株式会社 | 高純度誘電体薄膜の作製方法 |
US5798903A (en) * | 1995-12-26 | 1998-08-25 | Bell Communications Research, Inc. | Electrode structure for ferroelectric capacitor integrated on silicon |
US5777356A (en) * | 1996-01-03 | 1998-07-07 | Bell Communications Research, Inc. | Platinum-free ferroelectric memory cell with intermetallic barrier layer and method of making same |
JP3612839B2 (ja) * | 1996-02-13 | 2005-01-19 | 三菱電機株式会社 | 高誘電率薄膜構造、高誘電率薄膜形成方法および高誘電率薄膜形成装置 |
KR100215861B1 (ko) * | 1996-03-13 | 1999-08-16 | 구본준 | 유전체 박막 제조방법 및 이를 이용한 반도체 장치제조방법 |
US5882410A (en) * | 1996-10-01 | 1999-03-16 | Mitsubishi Denki Kabushiki Kaisha | High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film |
US6194754B1 (en) * | 1999-03-05 | 2001-02-27 | Telcordia Technologies, Inc. | Amorphous barrier layer in a ferroelectric memory cell |
US6319764B1 (en) | 1999-08-25 | 2001-11-20 | Micron Technology, Inc. | Method of forming haze-free BST films |
TWI255057B (en) * | 2004-02-27 | 2006-05-11 | Canon Kk | Dielectric element, piezoelectric element, ink jet head and ink jet recording apparatus and manufacturing method of same |
US7855021B2 (en) | 2004-12-22 | 2010-12-21 | Brookhaven Science Associates, Llc | Electrocatalysts having platium monolayers on palladium, palladium alloy, and gold alloy core-shell nanoparticles, and uses thereof |
US7691780B2 (en) | 2004-12-22 | 2010-04-06 | Brookhaven Science Associates, Llc | Platinum- and platinum alloy-coated palladium and palladium alloy particles and uses thereof |
US9005331B2 (en) | 2004-12-22 | 2015-04-14 | Brookhaven Science Associates, Llc | Platinum-coated non-noble metal-noble metal core-shell electrocatalysts |
JP7141667B2 (ja) | 2017-09-15 | 2022-09-26 | 国立研究開発法人科学技術振興機構 | チタン酸アルカリ土類金属結晶積層体 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63237514A (ja) * | 1987-03-26 | 1988-10-04 | 松下電器産業株式会社 | 薄膜コンデンサ |
US5006363A (en) * | 1988-12-08 | 1991-04-09 | Matsushita Electric Industries Co., Ltd. | Plasma assited MO-CVD of perooskite dalectric films |
JPH04184911A (ja) * | 1990-11-20 | 1992-07-01 | Toshiba Corp | 薄膜コンデンサ |
DE69205063T2 (de) * | 1991-05-16 | 1996-02-29 | Nec Corp | Dünnschichtkondensator. |
US5142437A (en) * | 1991-06-13 | 1992-08-25 | Ramtron Corporation | Conducting electrode layers for ferroelectric capacitors in integrated circuits and method |
JPH05235416A (ja) * | 1992-02-21 | 1993-09-10 | Murata Mfg Co Ltd | 強誘電体薄膜素子 |
US5212620A (en) * | 1992-03-03 | 1993-05-18 | Radiant Technologies | Method for isolating SiO2 layers from PZT, PLZT, and platinum layers |
US5323023A (en) * | 1992-12-02 | 1994-06-21 | Xerox Corporation | Epitaxial magnesium oxide as a buffer layer on (111) tetrahedral semiconductors |
-
1994
- 1994-03-24 EP EP94104693A patent/EP0617439B1/de not_active Expired - Lifetime
- 1994-03-24 US US08/216,966 patent/US5406445A/en not_active Expired - Lifetime
- 1994-03-24 DE DE69431971T patent/DE69431971T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0617439A3 (en) | 1997-10-15 |
EP0617439B1 (de) | 2003-01-08 |
EP0617439A2 (de) | 1994-09-28 |
US5406445A (en) | 1995-04-11 |
DE69431971T2 (de) | 2003-11-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: PANASONIC CORP., KADOMA, OSAKA, JP |