DE69309830D1 - Supraleitende dünne Schicht und ihr Herstellungsverfahren - Google Patents

Supraleitende dünne Schicht und ihr Herstellungsverfahren

Info

Publication number
DE69309830D1
DE69309830D1 DE69309830T DE69309830T DE69309830D1 DE 69309830 D1 DE69309830 D1 DE 69309830D1 DE 69309830 T DE69309830 T DE 69309830T DE 69309830 T DE69309830 T DE 69309830T DE 69309830 D1 DE69309830 D1 DE 69309830D1
Authority
DE
Germany
Prior art keywords
thin film
manufacturing process
superconducting thin
superconducting
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69309830T
Other languages
English (en)
Other versions
DE69309830T2 (de
Inventor
Yo Ichikawa
Koichi Mizuno
Toshifumi Sato
Hideaki Adachi
Kentaro Setsune
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69309830D1 publication Critical patent/DE69309830D1/de
Application granted granted Critical
Publication of DE69309830T2 publication Critical patent/DE69309830T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H10N60/0632—Intermediate layers, e.g. for growth control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9265—Special properties
    • Y10S428/93—Electric superconducting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y10S505/702—Josephson junction present

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Containers, Films, And Cooling For Superconductive Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69309830T 1992-09-29 1993-09-27 Supraleitende dünne Schicht und ihr Herstellungsverfahren Expired - Fee Related DE69309830T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4259448A JP3037514B2 (ja) 1992-09-29 1992-09-29 薄膜超伝導体及びその製造方法

Publications (2)

Publication Number Publication Date
DE69309830D1 true DE69309830D1 (de) 1997-05-22
DE69309830T2 DE69309830T2 (de) 1997-10-16

Family

ID=17334222

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69309830T Expired - Fee Related DE69309830T2 (de) 1992-09-29 1993-09-27 Supraleitende dünne Schicht und ihr Herstellungsverfahren

Country Status (4)

Country Link
US (1) US5434126A (de)
EP (1) EP0590560B1 (de)
JP (1) JP3037514B2 (de)
DE (1) DE69309830T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4421593A1 (de) * 1994-06-21 1996-01-04 Richard Dr Sizmann Supraleitfähige Festkörperstruktur
JP3052842B2 (ja) * 1996-06-07 2000-06-19 富士ゼロックス株式会社 強誘電体薄膜素子の製造方法
JP2939530B2 (ja) * 1996-11-29 1999-08-25 工業技術院長 ビスマスを構成元素に含む多元系酸化物薄膜の結晶成長法
JP2006027958A (ja) * 2004-07-16 2006-02-02 Sumitomo Electric Ind Ltd 薄膜材料およびその製造方法
DE102010038656A1 (de) * 2010-07-29 2012-02-02 THEVA DüNNSCHICHTTECHNIK GMBH Hochtemperatur-Supraleiter-Bandleiter mit hoher kritischer Stromtragfähigkeit

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01241874A (ja) * 1988-03-23 1989-09-26 Mitsubishi Electric Corp ジョゼフソン接合素子
JPH01305580A (ja) * 1988-06-03 1989-12-08 Mitsubishi Metal Corp 半導体素子製造用超電導セラミック薄膜形成単結晶ウエハー材
JPH02120229A (ja) * 1988-10-27 1990-05-08 Nec Corp 酸化物超伝導薄膜の製造方法
JPH02122065A (ja) * 1988-10-28 1990-05-09 Matsushita Electric Ind Co Ltd 薄膜超電導体の製造方法
JPH02167827A (ja) * 1988-12-22 1990-06-28 Matsushita Electric Ind Co Ltd 薄膜超電導体
JPH02170308A (ja) * 1988-12-22 1990-07-02 Matsushita Electric Ind Co Ltd 薄膜超電導体
JPH02172821A (ja) * 1988-12-23 1990-07-04 Hitachi Ltd 超電導薄膜作製法
JPH0354116A (ja) * 1989-07-24 1991-03-08 Sumitomo Electric Ind Ltd 複合酸化物超電導薄膜および作製方法
JPH0822742B2 (ja) * 1989-08-28 1996-03-06 松下電器産業株式会社 薄膜超電導体およびその製造方法
US5155658A (en) * 1992-03-05 1992-10-13 Bell Communications Research, Inc. Crystallographically aligned ferroelectric films usable in memories and method of crystallographically aligning perovskite films

Also Published As

Publication number Publication date
JP3037514B2 (ja) 2000-04-24
US5434126A (en) 1995-07-18
EP0590560A3 (en) 1994-08-10
EP0590560B1 (de) 1997-04-16
JPH06116094A (ja) 1994-04-26
DE69309830T2 (de) 1997-10-16
EP0590560A2 (de) 1994-04-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee