DE69428894D1 - Bipolartransistor mit isolierter Steuerelektrode - Google Patents
Bipolartransistor mit isolierter SteuerelektrodeInfo
- Publication number
- DE69428894D1 DE69428894D1 DE69428894T DE69428894T DE69428894D1 DE 69428894 D1 DE69428894 D1 DE 69428894D1 DE 69428894 T DE69428894 T DE 69428894T DE 69428894 T DE69428894 T DE 69428894T DE 69428894 D1 DE69428894 D1 DE 69428894D1
- Authority
- DE
- Germany
- Prior art keywords
- bipolar transistor
- control electrode
- isolated control
- isolated
- bipolar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thyristors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP94830393A EP0697739B1 (de) | 1994-08-02 | 1994-08-02 | Bipolartransistor mit isolierter Steuerelektrode |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69428894D1 true DE69428894D1 (de) | 2001-12-06 |
DE69428894T2 DE69428894T2 (de) | 2002-04-25 |
Family
ID=8218502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69428894T Expired - Fee Related DE69428894T2 (de) | 1994-08-02 | 1994-08-02 | Bipolartransistor mit isolierter Steuerelektrode |
Country Status (4)
Country | Link |
---|---|
US (1) | US5631483A (de) |
EP (1) | EP0697739B1 (de) |
JP (1) | JP3469967B2 (de) |
DE (1) | DE69428894T2 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5798554A (en) * | 1995-02-24 | 1998-08-25 | Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno | MOS-technology power device integrated structure and manufacturing process thereof |
EP0768714B1 (de) * | 1995-10-09 | 2003-09-17 | Consorzio per la Ricerca sulla Microelettronica nel Mezzogiorno - CoRiMMe | Herstellungsverfahren für Leistungsanordnung mit Schutzring |
DE69533134T2 (de) * | 1995-10-30 | 2005-07-07 | Stmicroelectronics S.R.L., Agrate Brianza | Leistungsbauteil hoher Dichte in MOS-Technologie |
EP0772242B1 (de) * | 1995-10-30 | 2006-04-05 | STMicroelectronics S.r.l. | Leistungsbauteil in MOS-Technologie mit einer einzelnen kritischen Grösse |
US6228719B1 (en) | 1995-11-06 | 2001-05-08 | Stmicroelectronics S.R.L. | MOS technology power device with low output resistance and low capacitance, and related manufacturing process |
DE69518653T2 (de) * | 1995-12-28 | 2001-04-19 | St Microelectronics Srl | MOS-Technologie-Leistungsanordnung in integrierter Struktur |
US5977569A (en) * | 1996-09-24 | 1999-11-02 | Allen-Bradley Company, Llc | Bidirectional lateral insulated gate bipolar transistor having increased voltage blocking capability |
DE19811297B4 (de) * | 1997-03-17 | 2009-03-19 | Fuji Electric Co., Ltd., Kawasaki | MOS-Halbleitervorrichtung mit hoher Durchbruchspannung |
EP0961325B1 (de) | 1998-05-26 | 2008-05-07 | STMicroelectronics S.r.l. | MOS-Technologie-Leistungsanordnung mit hoher Integrationsdichte |
CN100420031C (zh) * | 2000-08-08 | 2008-09-17 | 美高森美公司 | 具有非对称沟道结构的功率mos器件 |
US20030106545A1 (en) * | 2001-12-06 | 2003-06-12 | Verini Nicholas A. | Non-lethal handgun |
US20070151551A1 (en) * | 2004-05-13 | 2007-07-05 | Verini Nicholas A | Non-lethal hand pistol |
US7723803B2 (en) * | 2005-03-07 | 2010-05-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Bipolar device compatible with CMOS process technology |
US20070181927A1 (en) * | 2006-02-03 | 2007-08-09 | Yedinak Joseph A | Charge balance insulated gate bipolar transistor |
US20070189067A1 (en) * | 2006-02-15 | 2007-08-16 | Francis Goodwin | Dynamic memory |
US8835987B2 (en) * | 2007-02-27 | 2014-09-16 | Cree, Inc. | Insulated gate bipolar transistors including current suppressing layers |
JP2010056134A (ja) * | 2008-08-26 | 2010-03-11 | Mitsubishi Electric Corp | 半導体装置 |
US8415764B2 (en) * | 2009-06-02 | 2013-04-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | High-voltage BJT formed using CMOS HV processes |
US8450672B2 (en) * | 2009-06-30 | 2013-05-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | CMOS image sensors formed of logic bipolar transistors |
US8541787B2 (en) * | 2009-07-15 | 2013-09-24 | Cree, Inc. | High breakdown voltage wide band-gap MOS-gated bipolar junction transistors with avalanche capability |
CN102034823B (zh) * | 2009-09-30 | 2013-01-02 | 意法半导体研发(深圳)有限公司 | 用于spu和stog良好性能的功率晶体管的布局和焊盘布图规划 |
KR101248658B1 (ko) * | 2011-04-12 | 2013-03-28 | 주식회사 케이이씨 | 절연형 게이트 바이폴라 트랜지스터 |
JP2013235890A (ja) * | 2012-05-07 | 2013-11-21 | Denso Corp | 半導体装置 |
GB2575810A (en) * | 2018-07-23 | 2020-01-29 | Ween Semiconductors Tech Co Ltd | Power semiconductor device |
GB2575809B (en) * | 2018-07-23 | 2023-01-04 | Ween Semiconductors Co Ltd | Power Semiconductor device |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4001860A (en) * | 1973-11-12 | 1977-01-04 | Signetics Corporation | Double diffused metal oxide semiconductor structure with isolated source and drain and method |
JPS52132684A (en) * | 1976-04-29 | 1977-11-07 | Sony Corp | Insulating gate type field effect transistor |
JPS5846863B2 (ja) * | 1977-08-25 | 1983-10-19 | 松下電器産業株式会社 | 半導体集積回路装置 |
US4199774A (en) * | 1978-09-18 | 1980-04-22 | The Board Of Trustees Of The Leland Stanford Junior University | Monolithic semiconductor switching device |
US4344081A (en) * | 1980-04-14 | 1982-08-10 | Supertex, Inc. | Combined DMOS and a vertical bipolar transistor device and fabrication method therefor |
DE3224642A1 (de) * | 1982-07-01 | 1984-01-05 | Siemens AG, 1000 Berlin und 8000 München | Igfet mit injektorzone |
JPS6143474A (ja) * | 1984-08-08 | 1986-03-03 | Toshiba Corp | 半導体装置 |
US4620211A (en) * | 1984-08-13 | 1986-10-28 | General Electric Company | Method of reducing the current gain of an inherent bipolar transistor in an insulated-gate semiconductor device and resulting devices |
US4694313A (en) * | 1985-02-19 | 1987-09-15 | Harris Corporation | Conductivity modulated semiconductor structure |
JPS6318675A (ja) * | 1986-07-11 | 1988-01-26 | Toshiba Corp | 半導体装置 |
JPS6442177A (en) * | 1987-08-10 | 1989-02-14 | Hitachi Ltd | Insulated gate transistor |
JPH0766968B2 (ja) * | 1987-08-24 | 1995-07-19 | 株式会社日立製作所 | 半導体装置及びその製造方法 |
JPH04291767A (ja) * | 1991-03-20 | 1992-10-15 | Fuji Electric Co Ltd | 伝導度変調型mosfet |
DE4216810C2 (de) * | 1991-05-31 | 1999-09-16 | Fuji Electric Co Ltd | Steuerschaltung für einen Leitfähigkeitsänderungs-MISFET |
JP3163820B2 (ja) * | 1992-07-28 | 2001-05-08 | 富士電機株式会社 | 半導体装置 |
-
1994
- 1994-08-02 DE DE69428894T patent/DE69428894T2/de not_active Expired - Fee Related
- 1994-08-02 EP EP94830393A patent/EP0697739B1/de not_active Expired - Lifetime
-
1995
- 1995-07-28 JP JP19326495A patent/JP3469967B2/ja not_active Expired - Fee Related
- 1995-08-01 US US08/509,881 patent/US5631483A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0864811A (ja) | 1996-03-08 |
JP3469967B2 (ja) | 2003-11-25 |
US5631483A (en) | 1997-05-20 |
EP0697739A1 (de) | 1996-02-21 |
EP0697739B1 (de) | 2001-10-31 |
DE69428894T2 (de) | 2002-04-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |